6533b826fe1ef96bd12847a5
RESEARCH PRODUCT
Towards Plastic Electronics: Patterning Semiconducting Polymers by Nanoimprint Lithography
J. SeekampS. ZankovychJouni AhopeltoC. M. Sotomayor TorresR. ZentelMarc Behlsubject
chemistry.chemical_classificationMaterials sciencebusiness.industryMechanical EngineeringNanotechnologyPolymerNanoimprint lithographylaw.inventionchemistryMechanics of MaterialslawOptoelectronicsGeneral Materials SciencebusinessPlastic electronicsdescription
The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room‐temperature process described is time‐saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2002-04-18 | Advanced Materials |