6533b852fe1ef96bd12aacbe
RESEARCH PRODUCT
Elaboration and characterization of barium silicate thin films.
Luc ImhoffP.m. PeterléOlivier HeintzSylvie BourgeoisValérie PotinBruno DomenichiniT. Genevèssubject
Materials scienceAnnealing (metallurgy)Ultra-high vacuumAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_element02 engineering and technology01 natural scienceschemistry.chemical_compoundIn-situ analysesX-ray photoelectron spectroscopyStructural Biology0103 physical sciencesXPSGeneral Materials ScienceThin filmBarium silicateSilicon oxide010302 applied physicstechnology industry and agricultureBariumCell Biology021001 nanoscience & nanotechnologySilicateSecondary ion mass spectrometrychemistry0210 nano-technologydescription
International audience; Room temperature depositions of barium on a thermal silicon oxide layer were performed in ultra high vacuum (UHV). In-situ X-ray photoelectron spectroscopy (XPS) analyses were carried out as well after exposure to air as after subsequent annealings. These analyses were ex-situ completed by secondary ion mass spectrometry (SIMS) profiles and transmission electron microscopy (TEM) cross-sectional images. The results showed that after air exposure, the barium went carbonated. Annealing at sufficient temperature permitted to decompose the carbonate to benefit of a barium silicate. The silicate layer was formed by interdiffusion of barium with the initial SiO2 layer.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2008-01-01 |