6533b872fe1ef96bd12d2dc3
RESEARCH PRODUCT
Atomic layer deposition of aluminum oxide on modified steel substrates
Emma SalmiMikael SchuiskyJörgen WestlinderMikko RitalaTaivo JõgiaasMarkku LeskeläKenichiro MizohataKaupo KukliKaupo KukliR. Zabelssubject
010302 applied physicsYield (engineering)Materials scienceMetallurgy02 engineering and technologySurfaces and InterfacesGeneral ChemistryChemical vapor depositionNanoindentation021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesSurfaces Coatings and FilmsAtomic layer deposition0103 physical sciencesMaterials ChemistrySurface modificationThin filmComposite material0210 nano-technologyElastic modulusAluminum oxidedescription
Abstract Al 2 O 3 thin films were grown by atomic layer deposition to thicknesses ranging from 10 to 90 nm on flexible steel substrates at 300 °C using Al(CH 3 ) 3 and H 2 O as precursors. The films grown to thicknesses 9–90 nm covered the rough steel surfaces uniformly, allowing reliable evaluation of their dielectric permittivity and electrical current densities with appreciable contact yield. Mechanical behavior of the coatings was evaluated by nanoindentation. The maximum hardness values of the Al 2 O 3 films on steel reached 12 GPa and the elastic modulus exceeded 280 GPa.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2016-10-01 | Surface and Coatings Technology |