Hardness and modulus of elasticity of atomic layer deposited Al2O3-ZrO2 nanolaminates and mixtures
This work was funded by the European Regional Development Fund project TK134 “Emerging orders in quantum and nanomaterials”, Estonian Research Agency project PRG4 “Emerging novel phases in strongly frustrated quantum magnets”.
Mechanical properties of aluminum, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer deposition
ABSTRACT The mechanical properties of two different metal oxide nanolaminates comprised of Ta 2 O 5 and Al 2 O 3 , HfO 2 or ZrO 2 , grown on soda–lime glass substrate by atomic layer deposition, were investigated. Ta 2 O 5 and Al 2 O 3 layers were amorphous, whereas ZrO 2 and HfO 2 possessed crystalline structure. Thickness of single oxide layers was varied between 2.5 and 15 nm. The total thickness of the laminate structures was in the range of 160–170 nm. The hardness values of single layer oxides on glass ranged from 6.7 GPa (Ta 2 O 5 ) to 9.5 GPa (Al 2 O 3 ). Corresponding elastic moduli were 96 GPa and 101 GPa. The hardnesses of laminates were in the range of 6.8–7.8 GPa and elastic mo…
Atomic layer deposition of aluminum oxide on modified steel substrates
Abstract Al 2 O 3 thin films were grown by atomic layer deposition to thicknesses ranging from 10 to 90 nm on flexible steel substrates at 300 °C using Al(CH 3 ) 3 and H 2 O as precursors. The films grown to thicknesses 9–90 nm covered the rough steel surfaces uniformly, allowing reliable evaluation of their dielectric permittivity and electrical current densities with appreciable contact yield. Mechanical behavior of the coatings was evaluated by nanoindentation. The maximum hardness values of the Al 2 O 3 films on steel reached 12 GPa and the elastic modulus exceeded 280 GPa.