Search results for "BST"

showing 10 items of 10311 documents

MeV-energy Xe ion-induced damage in LiF: The contribution of electronic and nuclear stopping mechanisms

2016

The contribution of electronic and nuclear damage mechanisms in the modification of structure and micromechanical properties of LiF crystals irradiated with 52, 224, and 450 MeV Xe ions at fluences 1010–1014 ions cm−2 has been studied. The ion-induced formation of dislocations and hardening in LiF at fluences above 1010 ions cm−2 has been observed. The depth profiles of nanoindentation show a joint contribution of electronic excitation and nuclear (impact) mechanisms to the ion-induced hardening. The electronic excitation mechanism dominates in the major part of the ion range while the impact mechanism prevails in a narrow zone at the end of the ion range. The efficiency of hardening produc…

010302 applied physicsMaterials science02 engineering and technologyNanoindentation021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesElectronic Optical and Magnetic MaterialsIon0103 physical sciencesHardening (metallurgy)SubstructureIrradiationDislocationAtomic physics0210 nano-technologyOrder of magnitudeExcitationphysica status solidi (b)
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Modification of magnetic anisotropy in Ni thin films by poling of (011) PMN-PT piezosubstrates

2016

ABSTRACTThis study reports the magnetic and magnetotransport properties of 20 nm thick polycrystalline Ni films deposited by magnetron sputtering on unpoled piezoelectric (011) [PbMg1/3Nb2/3O3]0.68-[PbTiO3]0.32 (PMN-PT) substrates. The magnetoresistance (MR), as well as the magnetization reversal, is found to depend on the polarization state of the piezosubstrate. Upon poling the PMN-PT substrate, which results in a transfer of strain to the Ni film, the MR value decreases by a factor of 12 at room temperature and a factor of 21 at 50 K for the current direction along the PMN-PT [100] direction, and slightly increases for the [01] current direction. Simultaneously, a strong increase in the …

010302 applied physicsMaterials scienceCondensed matter physicsMagnetoresistancePoling02 engineering and technologySubstrate (electronics)Sputter depositionCoercivity021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesElectronic Optical and Magnetic MaterialsMagnetic anisotropyNuclear magnetic resonanceArtificial multiferroicsthin films0103 physical sciencesmagnetoelectric couplingddc:530CrystalliteThin film0210 nano-technology
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Rhodamine (B) photocatalysis under solar light on high crystalline ZnO films grown by home-made DC sputtering

2018

Abstract ZnO thin films were deposited by home-made DC sputtering of zinc target under mixed gases (Argon, Oxygen) plasma on glass substrates. Films were deposited by varying oxygen partial pressure (PO2) from 0.09 to 1.3 mbar in the deposition chamber, at a fixed substrate temperature of 100 °C. The samples were characterized by photoluminescence (PL), X-ray diffraction (XRD), optical transmissions (UV–vis), scanning electron microscopy (SEM) and electrical (Hall effect) measurements. The results indicate that by varying the oxygen pressure in the deposition chamber, the films show a precise and well defined photoluminescence emissions for each range of pressure covering almost the entire …

010302 applied physicsMaterials sciencePhotoluminescenceZnO thin films Sputtering Photoluminescence Rhodamine (B) Solar light PhotocatalysisScanning electron microscopeBand gapAnalytical chemistry02 engineering and technologySubstrate (electronics)021001 nanoscience & nanotechnology01 natural sciencesSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic Materialschemistry.chemical_compoundchemistrySputtering0103 physical sciencesPhotocatalysisRhodamine BElectrical and Electronic EngineeringThin film0210 nano-technology
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Effect of oxidation post treatments on TiO2 coating manufactured using reactive very low-pressure plasma spraying (R-VLPPS)

2020

Abstract TiO2 coatings manufactured using reactive very low-pressure plasma spraying (R-VLPPS) were analyzed in different regions related to their position compared to the plasma flame. For that, a screen was used in order to hide an area of the substrate from the direct plasma flux. The coating morphology changed from quasi lamellar structure to highly vapor structure and coatings exhibited obvious modifications in terms of phases and mechanical properties. The effect of oxidation post treatment on the as sprayed coating was then studied by selecting two methods: in situ oxidation post treatment and classical thermal treatment. The two post treatments provided an increase of the main rutil…

010302 applied physicsMaterials scienceSubstrate (chemistry)02 engineering and technologySurfaces and InterfacesGeneral ChemistryPlasmaThermal treatmentengineering.material021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesSurfaces Coatings and Films[SPI]Engineering Sciences [physics]CoatingRutilePhase (matter)0103 physical sciencesMaterials ChemistryengineeringLamellar structureComposite material0210 nano-technologyPorositySurface and Coatings Technology
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Peculiarities of the diffusion-controlled radiation defect accumulation kinetics under high fluencies

2020

We are grateful to A. Lushchik and E. Shablonin for numerous and valuable discussions. This work has been carried out within the framework of the EUROfusion Consortium and has received funding from the Euratom research and training programme 2014-2018 and 2019-2020 under grant agreement No 633053. The views and opinions expressed herein do not necessarily reflect those of the European Commission. The raw/processed data required to reproduce these findings cannot be shared at this time as the data also forms part of an ongoing study.

010302 applied physicsNuclear and High Energy PhysicsMaterials scienceDiffusionKineticsThermodynamicsFluence effects02 engineering and technologyRadiation021001 nanoscience & nanotechnologyAbstract theoryRadiation defects01 natural sciencesFluenceAccumulation kineticsDiffusionChemical kinetics0103 physical sciences:NATURAL SCIENCES:Physics [Research Subject Categories]0210 nano-technologySaturation (chemistry)InstrumentationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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Stopping cross-section measurements of 4He in TiN1.1O0.27

2000

Abstract The stopping cross-section for 4He projectiles in TiNx compounds has been measured using the backscattering method. A multi-compound marker layer deposited between the test film and the substrate was used to obtain the stopping cross-section at several energies with one energy of the incident beam. Two RBS spectra at definite tilt angles of the sample are taken for each beam energy. The assistance of computer codes to synthesize RBS spectra is very useful to obtain the pertinent information from the displacements of the peaks of the marker layers. Stopping cross-section values are obtained with an estimated uncertainty of about 6%.

010302 applied physicsNuclear and High Energy PhysicsMaterials scienceProjectile02 engineering and technologySubstrate (electronics)021001 nanoscience & nanotechnology01 natural sciencesSpectral lineCross section (physics)Tilt (optics)0103 physical sciencesAtomic physics0210 nano-technologyInstrumentationLayer (electronics)Beam energyEnergy (signal processing)Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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Defect-related photoluminescence and photoluminescence excitation as a method to study the excitonic bandgap of AlN epitaxial layers: Experimental an…

2020

We report defect-related photoluminescence (PL) and its vacuum ultraviolet photoluminescence excitation (PLE) spectra of aluminum nitride layers with various layer thicknesses and dislocation densities grown on two different substrates: sapphire and silicon. The defect-related transitions have been distinguished and examined in the emission and excitation spectra investigated under synchrotron radiation. The broad PL bands of two defect levels in the AlN were detected at around 3 eV and 4 eV. In the PLE spectra of these bands, a sharp excitonic peak originating most probably from the A-exciton of AlN was clearly visible. Taking into account the exciton binding energy, the measurements allow…

010302 applied physicsPhotoluminescenceMaterials sciencePhysics and Astronomy (miscellaneous)Band gapExciton02 engineering and technologySubstrate (electronics)Nitride021001 nanoscience & nanotechnologyEpitaxy01 natural sciencesMolecular physicsCondensed Matter::Materials Science0103 physical sciencesSapphirePhotoluminescence excitation0210 nano-technologyApplied Physics Letters
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An Analytic Approach to the Modeling of Multijunction Solar Cells

2020

Analytic expressions for the $JV$ -characteristics of three types of multijunction configurations are derived. From these, expressions for the short-circuit current, open-circuit voltage, and voltage at the maximum power point are found for multiterminal devices, and for series-connected tandem stacks. For voltage-matched devices, expressions for the optimal ratio of the number of bottom cells to the number of top cells are established. Luminescent coupling is incorporated throughout the article. It should be highlighted that the maximum power point of a series-connected tandem stack is described, with good accuracy for all interesting band gap combinations, by a single analytic expression.…

010302 applied physicsPhysicsCouplingMaximum power principleTandem02 engineering and technology021001 nanoscience & nanotechnologyCondensed Matter PhysicsTopology01 natural sciencesElectronic Optical and Magnetic MaterialsStack (abstract data type)0103 physical sciencesLimit (music)Radiative transferEnergy transformationElectrical and Electronic Engineering0210 nano-technologyVoltageIEEE Journal of Photovoltaics
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Hydrogen plasma induced photoelectron emission from low work function cesium covered metal surfaces

2017

Experimental results of hydrogen plasma induced photoelectron emission from cesium covered metal surfaces under ion source relevant conditions are reported. The transient photoelectron current during the Cs deposition process is measured from Mo, Al, Cu, Ta, Y, Ni, and stainless steel (SAE 304) surfaces. The photoelectron emission is 2–3.5 times higher at optimal Cs layer thickness in comparison to the clean substrate material. Emission from the thick layer of Cs is found to be 60%–80% lower than the emission from clean substrates. peerReviewed

010302 applied physicsPhysicsta114HydrogenTantalumAnalytical chemistrytransitionchemistry.chemical_elementSubstrate (electronics)plasmasCondensed Matter Physics01 natural sciencesIon sourcework functions010305 fluids & plasmasion sourceschemistryAluminiumCaesium0103 physical sciencesWork functionLayer (electronics)photoemissionPhysics of Plasmas
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Measurement of the activation energies of oxygen ion diffusion in yttria stabilized zirconia by flicker noise spectroscopy

2019

The low-frequency noise in a nanometer-sized virtual memristor consisting of a contact of a conductive atomic force microscope (CAFM) probe to an yttria stabilized zirconia (YSZ) thin film deposited on a conductive substrate is investigated. YSZ is a promising material for the memristor application since it is featured by high oxygen ion mobility, and the oxygen vacancy concentration in YSZ can be controlled by varying the molar fraction of the stabilizing yttrium oxide. Due to the low diameter of the CAFM probe contact to the YSZ film (similar to 10nm), we are able to measure the electric current flowing through an individual filament both in the low resistive state (LRS) and in the high r…

010302 applied physicsResistive touchscreenMaterials sciencePhysics and Astronomy (miscellaneous)business.industryMemristor Noise induced phenomenaOxide02 engineering and technologySubstrate (electronics)021001 nanoscience & nanotechnology01 natural sciencesNoise (electronics)chemistry.chemical_compoundchemistry0103 physical sciencesOptoelectronicsFlicker noiseThin filmElectric current0210 nano-technologybusinessYttria-stabilized zirconia
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