Search results for "Crystalline Silicon"

showing 10 items of 74 documents

3D modeling of doping from the atmosphere in floating zone silicon crystal growth

2017

Abstract Three-dimensional numerical simulations of the inert gas flow, melt flow and dopant transport in both phases are carried out for silicon single crystal growth using the floating zone method. The mathematical model allows to predict the cooling heat flux density at silicon surfaces and realistically describes the dopant transport in case of doping from the atmosphere. A very good agreement with experiment is obtained for the radial resistivity variation profiles by taking into account the temperature dependence of chemical reaction processes at the free surface.

Materials scienceSiliconDopantDopingchemistry.chemical_element02 engineering and technology021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciences010305 fluids & plasmasInorganic ChemistryMonocrystalline siliconHeat fluxchemistryElectrical resistivity and conductivityChemical physicsCondensed Matter::SuperconductivityFree surface0103 physical sciencesMaterials Chemistry0210 nano-technologyInert gasJournal of Crystal Growth
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Evaluation of the Performance of Published Point Defect Parameter Sets in Cone and Body Phase of a 300 mm Czochralski Silicon Crystal

2021

Prediction and adjustment of point defect (vacancies and self-interstitials) distribution in silicon crystals is of utmost importance for microelectronic applications. The simulation of growth processes is widely applied for process development and quite a few different sets of point defect parameters have been proposed. In this paper the transient temperature, thermal stress and point defect distributions are simulated for 300 mm Czochralski growth of the whole crystal including cone and cylindrical growth phases. Simulations with 12 different published point defect parameter sets are compared to the experimentally measured interstitial–vacancy boundary. The results are evaluated for stand…

Materials scienceSiliconGeneral Chemical EngineeringPhase (waves)chemistry.chemical_element02 engineering and technology01 natural sciencesInorganic ChemistryCrystalMonocrystalline silicon0103 physical sciencesheat transfercomputer simulationpoint defectsGeneral Materials SciencePoint (geometry)010302 applied physicsEquilibrium pointCrystallographyCzochralskisilicon021001 nanoscience & nanotechnologyCondensed Matter PhysicsCrystallographic defectthermal stressComputational physicschemistryQD901-999Heat transfer0210 nano-technologyCrystals
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Residual crystalline silicon phase in silicon-rich-oxide films subjected to high temperature annealing

2002

Structural properties of silicon rich oxide films (SRO) have been investigated by means of micro-Raman spectroscopy and transmission electron microscopy (TEM). The layers were deposited by plasma enhanced chemical vapor deposition using different SiH4/O2 gas mixtures. The Raman spectra of the as-deposited SRO films are dominated by a broad band in the region 400-500 cm-1 typical of a highly disordered silicon network. After annealing at temperatures above 1000°C in N2, the formation of silicon nanocrystals is observed both in the Raman spectra and in the TEM images. However, most of the precipitated silicon does not crystallize and assumes an amorphous microstructure. © 2002 The Electrochem…

Materials scienceSiliconNanocrystal RamanAnnealing (metallurgy)Analytical chemistrychemistry.chemical_elementMineralogySurfaces Coatings and FilmSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materiasymbols.namesakePlasma-enhanced chemical vapor depositionMaterials ChemistryElectrochemistryCrystalline siliconRAMAN-SPECTROSCOPY; MICROCRYSTALLINE SILICON; THIN-FILMS; SCATTERING; SPECTRA; SUPERLATTICES; NANOCRYSTALS; SIO2-FILMS; SIZERenewable Energy Sustainability and the EnvironmentNanocrystalline siliconSurfaces and InterfacesCondensed Matter PhysicsCrystallographic defectSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAmorphous solidchemistrysymbolsRaman spectroscopy
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One-step formation of nanostructures on silicon surfaces using pure hydrogen-radical-initiated reactions

2013

One-step formation of silicon nanowires, sheets, and texture surface on a silicon substrate has been achieved using hydrogen-radical etching reactions. Metallic tungsten and for comparison purposes a tungsten hot wire, were used as catalysts for the hydrogen-molecular cracking. It was shown that a variety of surface structures on silicon such as inverted pyramid texture, V-groove texture, dense silicon nanowire growth over texture, and nanosheet structure can be obtained by controlling the process conditions. The obtained results suggested that the formation of nanotungsten silicide particle is an essential prerequisite to obtain these structures. The particles work as an etching mask again…

Materials scienceSiliconNanowireNanocrystalline siliconchemistry.chemical_elementNanotechnologySurfaces and InterfacesSubstrate (electronics)TungstenCondensed Matter Physics7. Clean energySurfaces Coatings and FilmsElectronic Optical and Magnetic Materialschemistry.chemical_compoundchemistryEtching (microfabrication)SilicideMaterials ChemistryTexture (crystalline)Electrical and Electronic Engineeringphysica status solidi (a)
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Improved Temperature Coefficient Modeling through the Recombination Parameter $\gamma$

2020

This study presents an injection dependent numerical model relating Shocldey-Read-Hall defect parameters in crystalline silicon with the recombination parameter $\gamma$ . We demonstrate how the model can be used to predict $\gamma$ for various single level defects. Additionally, we show that $\gamma$ can be significantly influenced by the injection level, in contrast to what is commonly assumed. The injection dependence is found to correlate with the temperature sensitivity of the Shocldey-Read-Hall lifetime. Finally, we demonstrate that the model can be used to predict the temperature coefficient of the open circuit voltage without the use of a temperature dependent measurement, enabling …

Materials scienceSiliconOpen-circuit voltageSemiconductor device modelingchemistry.chemical_element02 engineering and technology010402 general chemistry021001 nanoscience & nanotechnology01 natural sciencesTemperature measurement0104 chemical sciencesComputational physicschemistryCrystalline siliconSensitivity (control systems)0210 nano-technologyTemperature coefficientRecombination2020 47th IEEE Photovoltaic Specialists Conference (PVSC)
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Scanning electron microscopy analysis of defect clusters in multicrystalline solar grade silicon solar cells

2014

Solar cells from an identical commercial manufacturing unit have been investigated by electroluminescence to first detect the defect clusters. A further analysis has been done by scanning electron microscopy in secondary electron imaging mode to understand the propagation mechanism of defects. It appears that defect cluster boundaries can be very sharp or spread in the bulk with little apparent effect on the overall cell efficiency. And it is shown that grain boundaries act clearly as arrests to further propagation of these defects.

Materials scienceSiliconScanning electron microscopebusiness.industryfood and beverageschemistry.chemical_elementElectroluminescenceSecondary electronsPolymer solar cellMonocrystalline siliconchemistryCluster (physics)OptoelectronicsGrain boundarybusiness2014 IEEE 40th Photovoltaic Specialist Conference (PVSC)
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Modeling and parameter identification of crystalline silicon photovoltaic devices

2011

In this paper the physical correctness of the standard single-exponential (one-diode) model of crystalline-Si photovoltaic devices is examined. In particular, we focus on the shunt current. I-V curves of in situ illuminated polycrystalline-Si photovoltaic modules are measured, and based on these measurements, we extract the shunt current. There is a certain voltage range in which the shunt current shows an Ohmic-like behavior, but the value of the resistance varies with irradiance and the quality of illumination. In addition, the Ohmic behavior takes place at voltages well below the maximum-power point (MPP). At higher voltages, the shunt current drops to negligible values. We conclude that…

Materials scienceSiliconbusiness.industryEstimation theoryPhotovoltaic systemIrradianceElectrical engineeringchemistry.chemical_elementchemistryOptoelectronicsCrystalline siliconbusinessOhmic contactShunt (electrical)Voltage2011 37th IEEE Photovoltaic Specialists Conference
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Memory effects in MOS capacitors with silicon rich oxide insulators

2000

ABSTRACTTo form crystalline Si dots embedded in SiO2, we have deposited thin films of silicon rich oxide (SRO) by plasma-enhanced chemical vapor deposition of SiH4 and O2. Then the materials wereannealed in N2 ambient at temperatures between 950 and 1100 °C. Under such processing, the supersaturation of Si in the amorphous SRO film produces the formation of crystalline Si dots embedded in SiO2. The narrow dot size distributions, analyzed by transmission electron microscopy, are characterized by average grain radii and standard deviations down to about 1 nm. The memory function of such structures has been investigated in metal-oxidesemiconductor (MOS) capacitors with a SRO film sandwiched be…

Materials scienceSiliconbusiness.industryOxidechemistry.chemical_elementNanotechnologyChemical vapor depositionengineering.materialSettore ING-INF/01 - ElettronicaElectronic Optical and Magnetic MaterialsAmorphous solidlaw.inventionCapacitorchemistry.chemical_compoundPolycrystalline siliconchemistryTransmission electron microscopylawengineeringOptoelectronicsThin filmbusiness
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Initial light-induced degradation study of multicrystalline modules made from silicon material processed through different manufacturing routes

2012

The paper presents results of initial lightinduced degradation (LID) of multicrystalline silicon photovoltaic (PV) modules made of crystalline silicon from different manufacturing processes. The modules were installed within the Sunbelt, in Hyderabad, India. Current-voltage (I–V) characteristics are measured and infra-red (IR) images of the modules are taken at regular intervals. A relationship of the IV degradation with the IR images is discussed. Results from laboratory LID tests at room temperature are performed parallel to the outdoor degradation of PV modules. It was found that the total LID, measured on the module level, after the initial 40 hours is similar for both materials resulti…

Materials scienceSiliconbusiness.industryPhotovoltaic systemchemistry.chemical_elementCellular levelTemperature measurementchemistryLight inducedOptoelectronicsDegradation (geology)Power outputCrystalline siliconbusiness2012 38th IEEE Photovoltaic Specialists Conference
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Assessment of a New Analytical Expression for the Maximum-Power Point Voltage with Series Resistance

2021

This work compares a recently developed analytical expression for the maximum-power point voltage with experimental data, to test its usability for crystalline silicon solar cells. The experimental data covers measurements from 18 multicrystalline silicon solar cells with different bulk resistivities and cell architectures. We show that the expression is able to predict the maximum power obtainable by the measured cells with relative discrepancies below 1%. Additionally, we compare the accuracy of this new expression with two already existing models.

Materials scienceSiliconchemistryMaximum power principleEquivalent series resistancechemistry.chemical_elementExperimental dataPoint (geometry)Crystalline siliconExpression (mathematics)Computational physicsVoltage2021 IEEE 48th Photovoltaic Specialists Conference (PVSC)
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