Search results for "Microscopy"

Detection of defects buried in metallic samples by scanning microwave microscopy

2011

This paper reports the local detection of buried calibrated metal defects in metal samples by a new experimental technique, scanning microwave microscopy. This technique combines the electromagnetic measurement capabilities of a microwave vector network analyzer with the subnanometer-resolution capabilities of an atomic force microscope. The network analyzer authorizes the use of several frequencies in the range 1--6 GHz, allowing three-dimensional tomographical investigation, which is useful for the detection of bulk defects in metal materials.

Strong enhancement of the Breit-Wigner-Fano Raman line in carbon nanotube bundles caused by plasmon band formation

2002

We investigate the origin of the Breit-Wigner-Fano line in the Raman spectra of individual single-walled carbon nanotubes and their bundles. Using confocal Raman microscopy and atomic-force microscopy we found that the Breit-Wigner-Fano line intensity increases strongly with the bundle thickness. We confirmed this result by Raman investigations of partially decomposed bundles, which were additionally investigated by transmission electron microscopy. Our random-phase approximation based theory, which identifies the Breit-Wigner-Fano line as an excited band of plasmon-phonon modes, is fully consistent with the experimental results.

2021

Gold-assisted mechanical exfoliation currently represents a promising method to separate ultralarge (centimeter scale) transition metal dichalcogenide (TMD) monolayers (1L) with excellent electronic and optical properties from the parent van der Waals (vdW) crystals. The strong interaction between Au and chalcogen atoms is key to achieving this nearly perfect 1L exfoliation yield. On the other hand, it may significantly affect the doping and strain of 1L TMDs in contact with Au. In this paper, we systematically investigated the morphology, strain, doping, and electrical properties of large area 1L MoS2 exfoliated on ultraflat Au films (0.16-0.21 nm roughness) and finally transferred to an i…

Deformation-Free Topography from Combined Scanning Force and Tunnelling Experiments

1993

We show that by measuring force and stiffness on a constant-current scanning tunnelling microscopy (STM) contour a deformation-free topography can be extracted. With reference to mono- and bicomponent self-assembled monolayers, we find that the characteristic depression pattern and the protrusions on a multicomponent film found in STM are to a great extent due to electronic effects.

At-wavelength inspection of sub-40 nm defects in extreme ultraviolet lithography mask blank by photoemission electron microscopy.

2007

A new at-wavelength inspection technology to probe nanoscale defects buried underneath Mo/Si multilayers on an extreme ultraviolet (EUV) lithography mask blank has been implemented using EUV photoemission electron microscopy (EUV-PEEM). EUV-PEEM images of programmed defect structures of various lateral and vertical sizes recorded at an ~13.5 nm wavelength show that 35 nm wide and 4 nm high buried line defects are clearly detectable. The imaging technique proves to be sensitive to small phase jumps, enhancing the edge visibility of the phase defects, which is explained in terms of a standing wave enhanced image contrast at resonant EUV illumination.

Actinic EUVL mask blank defect inspection by EUV photoelectron microscopy

2006

A new method for the actinic at-wavelength inspection of defects inside and ontop of Extreme Ultraviolet Lithography (EUVL) multilayer-coated mask blanks is presented. The experimental technique is based on PhotoElectron Emission Microscopy (PEEM) supported by the generation of a standing wave field inside and above the multilayer mask blank when illuminated near the resonance Bragg wavelength at around 13.5 nm wavelength. Experimental results on programmed defect samples based on e-beam lithographic structures or PSL equivalent silica balls overcoated with an EUV multilayer show that buried defects scaling down to 50 nm in lateral size are detectable with further scalability down to 30 nm …

Actinic inspection of sub-50 nm EUV mask blank defects

2007

A new actinic mask inspection technology to probe nano-scaled defects buried underneath a Mo/Si multilayer reflection coating of an Extreme Ultraviolet Lithography mask blank has been implemented using EUV Photoemission Electron Microscopy (EUV-PEEM). EUV PEEM images of programmed defect structures of various lateral and vertical sizes recorded at around 13 nm wavelength show that 35 nm wide and 4 nm high buried line defects are clearly detectable. The imaging technique proves to be sensitive to small phase jumps enhancing the visibility of the edges of the phase defects which is explained in terms of a standing wave enhanced image contrast at resonant EUV illumination.

Inspection of EUVL mask blank defects and patterned masks using EUV photoemission electron microscopy

2008

We report on recent developments of an "at-wavelength" full-field imaging technique for inspection of multilayer mask blank defects and patterned mask samples for extreme ultraviolet lithography (EUVL) by EUV photoemission electron microscopy (EUV-PEEM). A bump-type line defect with a width of approximately 35nm that is buried beneath Mo/Si multilayer has been detected clearly, and first inspection results obtained from a patterned TaN absorber EUVL mask sample is reported. Different image contrast of a similar width of multilayer-covered substrate line defect and on top TaN absorber square has been observed in the EUV-PEEM images, and origin of the difference in their EUV-PEEM image contra…

Usage of moving nanoparticles for improved holographic recording

2013

Metal nanoparticles are used for different applications in holographic configurations. The metal nanoparticles are placed close to an object and encode it by a time varying random mask. A decoding mask is computed and used to obtain super-resolution digital hologram and eliminate the twin image and DC from a digital hologram. The method is also shown to be applicable for other optical methods.

Infrared microspectroscopy of biochemical response of living cells in microfabricated devices

2010

Abstract First experiments demonstrating the suitability of novel microfabricated fluidic devices for measuring living cells in physiological environment by synchrotron radiation (SR) Fourier Transform Infrared microspectroscopy (μ-FTIR) are presented. The devices were fabricated on CaF 2 windows, using the photoresist XARP 3100/10 to define the liquid cell lay-out. Therefore, the sample holder is transparent to both visible and infrared light, robust, completely recyclable and with a precise spacing. Using prototype devices of thicknesses 9, 5 and 3 μm, we studied the response of the U937 monocytic cell line to mechanical compression. The temporal evolution of the FTIR spectra, characteris…