Search results for "PHOTOELECTRON"

showing 10 items of 458 documents

Chemical characterization of gallium droplets grown by LP-MOCVD.

2006

International audience; This study is concerned with the chemical characterization of metallic gallium droplets, obtained on silicon (1 0 0) substrates with a single growth step, by the LP-MOCVD technique with TMGa like precursor. These structures are characterized by SIMS, XPS and TEM. The analyses results lead to a structure proposition for the droplets. The core is composed of metastable metallic gallium with a non-negligible carbon quantity probably coming from incomplete precursor decomposition. The outer part, composed of gallium oxide maintains the structure stability. Covering of the substrate by a thin gallium layer of gallium compounds is observed.

Materials scienceSiliconAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_element02 engineering and technologySubstrate (electronics)Chemical vapor deposition010402 general chemistry01 natural sciencesX-ray photoelectron spectroscopyGallium dropletsXPSMetalorganic vapour phase epitaxyGalliumSurfaces and InterfacesGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter Physics0104 chemical sciencesSurfaces Coatings and FilmschemistryTransmission electron microscopyMOCVDTEM0210 nano-technologyLayer (electronics)SIMS
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Changes of lead silicate glasses induced by leaching

1998

Abstract The structural differences in the surface region between freshly fractured and leached silicate glasses containing 16.7, 18.8 and 44.4 mol% PbO, respectively, were investigated by photoelectron spectroscopy (XPS). The optical properties and the thicknesses of leached layers were determined by reflection measurements. The binding energies of the O1s signal components for untreated samples can be ascribed to non-bridging (NBO) and bridging (BO) oxygen and oxygen associated with lead as network former (OPb). The binding energy of OPb was found to be 529.1 ± 0.2 eV. For quantitative conclusions, relative XPS sensitivity factors were determined for oxygen, silicon and lead in these glas…

Materials scienceSiliconBinding energyAnalytical chemistryLessivagechemistry.chemical_elementCondensed Matter PhysicsOxygenElectronic Optical and Magnetic MaterialsSilanolchemistry.chemical_compoundX-ray photoelectron spectroscopychemistryMaterials ChemistryCeramics and CompositesOrganic chemistryLeaching (metallurgy)Natural bond orbitalJournal of Non-Crystalline Solids
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Effect of silicon on corrosion resistance of Ti–Si alloys

2011

Abstract The corrosion resistance of Ti–Si alloys has been studied in acid solutions and the alloys exhibit a high resistance to corrosion. SEM examinations combined with EDAX allowed to conclude that the passive films on Ti–Si alloys are mainly composed of TiO 2 /SiO 2 oxides. XPS analysis indicated the formation of Si–O and Si–O–Ti bonds in the passive film, respectively corresponding to SiO 2 and Si-doping TiO 2 . The effect of silicon on the corrosion was correlated to the formation of a stable SiO 2 film, Si-doping on TiO 2 and the extended lattice imperfections formed along TiO 2 /SiO 2 grain boundaries and phase-boundaries. The calculated donor densities based on the point defect mod…

Materials scienceSiliconMechanical EngineeringAlloyMetallurgyPassivitychemistry.chemical_elementengineering.materialCondensed Matter PhysicsCorrosionX-ray photoelectron spectroscopyChemical engineeringchemistryMechanics of MaterialsengineeringGeneral Materials ScienceGrain boundaryMaterials Science and Engineering: B
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Initial stages of TiO2 thin films MOCVD growth studied by in situ surface analyses

2005

Abstract In situ chemical surface analyses using X-ray photoelectron spectroscopy (XPS) were performed to understand the initial stages of TiO 2 thin-film MOCVD growth. Deposits on Si (1 0 0), a few nanometres thick, were obtained at a fixed temperature of 650 °C and for two different pressures, 2.9 and 0.05 mbar, using titanium tetraisopropoxide (TTIP) as precursor. Pressure lowering led to a higher deposit growth rate. Reduction of titanium with respect to stoichiometric titanium dioxide and oxidation of the wet-cleaned silicon substrate are observed from decomposition of the Ti 2p and Si 2p peaks. The formation of a TiSi x O y mixed oxide is also pointed out and confirmed by the presence…

Materials scienceSilicontechnology industry and agricultureAnalytical chemistrychemistry.chemical_elementSubstrate (electronics)Condensed Matter PhysicsInorganic Chemistrychemistry.chemical_compoundchemistryX-ray photoelectron spectroscopyTitanium dioxideMaterials ChemistryMixed oxideMetalorganic vapour phase epitaxyThin filmTitaniumJournal of Crystal Growth
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Interfacial reaction during MOCVD growth revealed by in situ ARXPS.

2006

International audience; Angle-resolved X-ray photoelectron spectroscopy (ARXPS) experiments were performed to study in situ the reaction at the film–substrate interface during metal organic chemical vapor deposition (MOCVD) growth of TiO2 thin films deposited on the silicon substrate. The in-depth distribution of chemical species was determined using several ARXPS thickness calculation models considering either single or bilayer systems. By the comparison of two single-layermodels, the presence of a second layer composed of silicon oxidewas evidenced. High-resolution transmission electron microscopy (HRTEM) observations confirmed the stratification of the film in two layers, as well as the …

Materials scienceSiliconthickness measurementthin filmAnalytical chemistrychemistry.chemical_elementARXPS02 engineering and technologyChemical vapor deposition01 natural sciencesX-ray photoelectron spectroscopy0103 physical sciencesMaterials ChemistryTiO2Thin filmSilicon oxideHigh-resolution transmission electron microscopy010302 applied physicsBilayer[CHIM.MATE]Chemical Sciences/Material chemistrySurfaces and InterfacesGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and Filmschemistry[ CHIM.MATE ] Chemical Sciences/Material chemistryMOCVDinterfaceWetting0210 nano-technology
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Au/CeO2-SBA-15 catalysts for CO oxidation: Effect of ceria loading on physic-chemical properties and catalytic performances

2012

In this work gold catalysts supported over SBA-15 with different CeO 2 loadings (5-30 wt%) were prepared, characterized by N 2 physisorption analyses, SAXS, XRD, STEM and XPS techniques and their catalytic performances were evaluated in the CO oxidation, chosen as reaction test. Over a selected catalyst, Au/CeO 2(20 wt%)-SBA-15, the effect of CO 2 and of the mixture (CO 2 + H 2O) on the CO conversion to CO 2 was also evaluated. Characterizations by SAXS, XRD, STEM and XPS were carried out on selected spent catalysts after CO oxidation. The results were discussed in terms of relationship between morphological, structural, electronic and catalytic properties as a function of the ceria loading…

Materials scienceSmall-angle X-ray scatteringOxideNucleationSinteringNanotechnologyGeneral ChemistryCatalysisCatalysischemistry.chemical_compoundAu CeO2 SBA-15 catalysts CO oxidationchemistryX-ray photoelectron spectroscopyChemical engineeringPhysisorptionParticle sizeCatalysis Today
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Influence of alkylphosphonic acid grafting on the electronic and magnetic properties of La2/3Sr1/3MnO3 surfaces

2015

Self-assembled monolayers (SAMs) are highly promising materials for molecular engineering of electronic and spintronics devices thanks to their surface functionalization properties. In this direction, alkylphosphonic acids have been used to functionalize the most common ferromagnetic electrode in organic spintronics: La2/3Sr1/3MnO3 (LSMO). However, a study on the influence of SAMs grafting on LSMO electronic and magnetic properties is still missing. In this letter, we probe the influence of alkylphosphonic acids-based SAMs on the electronic and magnetic properties of the LSMO surface using different spectroscopies. We observe by X-ray photoemission and X-ray absorption that the grafting of …

Materials scienceSpintronicsMagnetismMagnetismGeneral Physics and AstronomyNanotechnologySelf-assembled monolayerSelf-assembled monolayersSurfaces and InterfacesGeneral ChemistrySpintronicsCondensed Matter PhysicsSurfaces Coatings and FilmsFerromagnetismMonolayerSurface modificationWork functionUltraviolet photoelectron spectroscopy
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Electron Binding in a Superatom with a Repulsive Coulomb Barrier: The Case of [Ag44(SC6H3F2)30]4– in the Gas Phase

2020

The electron binding mechanism in [Ag44(SC6H3F2)30]4- (SC6H3F2 = 3,4-difluorobenzenethiolate) tetra-anion was studied by photoelectron spectroscopy (PES), collision-induced dissociation mass spectrometry (CID-MS), and density functional theory (DFT) computations. PES showed that [Ag44(SC6H3F2)30]4- is energetically metastable with respect to electron autodetachment {[Ag44(SC6H3F2)30]3- + e-} and features a repulsive Coulomb barrier (RCB) with a height of 2.7 eV. However, CID-MS revealed that [Ag44(SC6H3F2)30]4- does not release an electron upon collisional excitation but undergoes dissociation. DFT computations performed on the known structure of [Ag44(SC6H3F2)30]4- confirmed the negative a…

Materials scienceSuperatomCoulomb barrierElectron010402 general chemistry01 natural sciencesMolecular physicsDissociation (chemistry)0104 chemical sciencesX-ray photoelectron spectroscopyMetastability0103 physical sciencesGeneral Materials ScienceDensity functional theoryPhysical and Theoretical Chemistry010306 general physicsCollisional excitationThe Journal of Physical Chemistry Letters
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Unraveling the Formation of Core−Shell Structures in Nanoparticles by S-XPS

2010

The combination of the surface sensitivity of X-ray photoelectron spectroscopy (XPS) with the high flux and variable photon energy excitation of Synchrotron radiation (S-XPS) is used to probe the atomic distribution of bimetallic nanoparticles. Based on the energy dependence of the photoemission differential cross section of core level photoelectrons, we propose a methodology to monitor the formation and to evaluate sizes of the core−shell structure. We have successfully applied it to unveil the mechanism involved in the atomic rearrangement of thermally treated Pt0.7Pd0.3 nanoparticles.

Materials scienceSynchrotron radiationNanoparticlePhotoelectric effectPhoton energySynchrotronlaw.inventionX-ray photoelectron spectroscopylawChemical physicsPhysics::Atomic and Molecular ClustersGeneral Materials SciencePhysical and Theoretical ChemistryAtomic physicsHigh-resolution transmission electron microscopyBimetallic stripThe Journal of Physical Chemistry Letters
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Structural and electrical properties of magnetron sputtered Ti(ON) thin films:The case of TiN doped in situ with oxygen.

2009

International audience; Incorporation of oxygen into TiN lattice results in formation of titanium oxynitrides, TiOxNy that have become particularly interesting for photocatalytic applications. Elaboration as well as characterization of TiN and in situ oxygen-doped thin films is the subject of this paper. Thin films, 250–320nm in thickness, have been deposited by dc-pulsed magnetron reactive sputtering from Ti target under controllable gas flows of Ar, N2 and O2. Optical monitoring of Ti plasma emission line at = 500nm has been implemented in order to stabilize the sputtering rate. Scanning electron microscopy (SEM), X-ray diffraction in grazing incidence (GIXRD), micro-Raman spectroscopy, X…

Materials scienceThin filmsAnalytical chemistryEnergy Engineering and Power Technologychemistry.chemical_element02 engineering and technology01 natural scienceschemistry.chemical_compoundLattice constantX-ray photoelectron spectroscopySputtering0103 physical sciencesElectrical and Electronic EngineeringPhysical and Theoretical ChemistryThin film010302 applied physics[PHYS]Physics [physics]Titanium oxynitrideOxygen dopingOptical propertiesRenewable Energy Sustainability and the EnvironmentSputter deposition021001 nanoscience & nanotechnologyTitanium nitridechemistry0210 nano-technologyTinMagnetron sputteringTitanium
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