Search results for "PHOTOELECTRON"
showing 8 items of 458 documents
Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
2019
Due to the safety challenges associated with the use of trimethylaluminum as a metal precursor for the deposition of alumina, different chemicals have been investigated over the years to replace it. The authors have investigated the use of aluminum tri-isopropoxide (TIPA) as an alternative alkoxide precursor for the safe and cost-effective deposition of alumina. In this work, TIPA is used as a stable Al source for atomic layer deposition (ALD) of Al2O3 when different oxidizing agents including water, oxygen plasma, water plasma, and ozone are employed. The authors have explored the deposition of Al2O3 using TIPA in ALD systems operating in vacuum and atmospheric pressure conditions. For the…
Photoelectron emission experiments with ECR-driven multi-dipolar negative ion plasma source
2017
Photoelectron emission measurements have been performed using a 2.45 GHz ECR-driven multi-dipolar plasma source in a low pressure hydrogen discharge. Photoelectron currents induced by light emitted from ECR zone and H− production region are measured from Al, Cu, Mo, Ta, and stainless steel (SAE 304) surfaces as a function of microwave power and neutral hydrogen pressure. The total photoelectron current from the plasma chamber wall is estimated to reach values up to 1 A for 900 W of injected microwave power. It is concluded that the volumetric photon emission rate in wavelength range relevant for photoelectron emission is a few times higher in arc discharge. peerReviewed
Effect of Hot Dip Galvanized Steel Surface Chemistry and Morphology on Titanium Hexafluoride Pretreatment
2017
Titanium hexafluoride pretreatments are known to improve paint adhesion and function as a barrier between the coating and the hot dip galvanized (HDG) steel surface. Interactions at the zinc/pretreatment interface are of utmost importance for the formation of pretreatment layers and the corrosion resistance of color coated hot dip galvanized steels. Removal rate of inert aluminum oxide from HDG steel samples by chemical dissolution was studied. XPS measurements showed that the surface Al2O3 layer thickness decreased rapidly already at mild alkaline cleaning, while complete removal of Al required severe etching. Low reactivity of an Al2O3-rich surface was confirmed by impaired formation of a…
Energy level determination of purine containing blue light emitting organic compounds
2018
Organic light emitting diodes (OLED) have found their applications in the mobile and TV screens. Till now the commercially available diodes are made by expensive thermal evaporation in a vacuum. The costs of OLED fabrication could be decreased by applying low-cost wet casting methods, for example, spin-coating. In this work, we have studied a group of blue light emitting purine derivatives which could potentially be used in OLEDs. The advantage of these compounds is their ability to form amorphous thin films from solutions. All the thin films were prepared by the spincoating method from chloroform solution on ITO glass. The position of hole and electron transport energy levels is important …
Pd2Au36(SR)(24) cluster: structure studies
2015
The location of the Pd atoms in Pd2Au36(SC2H4Ph)(24), is studied both experimentally and theoretically. X-ray photoelectron spectroscopy (XPS) indicates oxidized Pd atoms. Palladium K-edge extended X-ray absorption fine-structure (EXAFS) data clearly show Pd-S bonds, which is supported by far infrared spectroscopy and by comparing theoretical EXAFS spectra in R space and circular dichroism spectra of the staple, surface and core doped structures with experimental spectra.
Progress in HAXPES performance combining full-field k-imaging with time-of-flight recording
2019
Journal of synchrotron radiation 26(6), 1996-2012 (2019). doi:10.1107/S1600577519012773
Hydrogen plasma induced photoelectron emission from metal surfaces
2018
Low temperature hydrogen plasmas are strong sources of vacuum ultraviolet radiation. The properties of laboratory plasmas can be influenced by surface processes induced by photons with their energies exceeding the surface work function of the wall material. In this work, the plasma induced photoelectron emission has been studied with different ion sources. The emission depends on the mechanical design of the plasma device, plasma heating method and the discharge power (density). Parametric studies include the quantifying of the emission from different metal surfaces, commonly used as plasma facing materials in ion sources, as well as alkali metal covered surfaces. Experimental studies sugges…
XPS structural data and correlation with Mossbauer spectra for Tin-organic compounds: adducts of RnSnCl4-n with 1,2-bis(diphenylphosphino)ethane
1982
Abstract Core level X-ray photoelectron spectra of 1:1 adducts of SnCl4 and RSnCl3 with DPE {[RnSnCl4−n} · DPE (n = 1, R = Me, Bun, Octn, Phn; n = 2, R = Ph; DPE = 1,2-bis(diphenylphosphino)ethane], have been measured in solid phase. The Sn3d 5 2 binding energies, corrected for the Madelung potential at the metal atom, are well correlated with both partial atomic charge on tin, accounting for relaxation upon ionization, and 119Sn Mossbauer isomer shifts. The results are discussed in terms of these molecular parameters.