Search results for "PLASMA"

showing 10 items of 4043 documents

Oscillator strengths of sulphur 3s23p34s3So-3s23p34p3P transitions measured by time resolved two-photon laser spectroscopy

1997

Oscillator strengths for the three 3s23p34s 3S1o-3s23p34p 3P0,1,2 transitions in neutral sulphur have been determined directly from lifetime measurements. Two-photon UV laser excitation and subsequent fluorescence detection have been used on atoms produced in a thermal sulphur beam or in a laser-driven plasma. A good agreement was found between data obtained in both schemes. The lifetime data obtained, τ(3P0) = 46.1(1.0) ns, τ(3P1) = 46.1(1.0) ns and τ(3P2) = 46.1(1.0) ns are compared with results of theoretical and experimental data from literature. The absorption oscillator strengths derived are f(3S1o-3P0) = 0.120(0.003), f(3S1o-3P1) = 0.360(0.008) and f(3S1o-3P2) = 0.600(0.013), respect…

Materials scienceTwo-photon excitation microscopyThermalPlasmaAtomic physicsCondensed Matter PhysicsAbsorption (electromagnetic radiation)SpectroscopyFluorescenceMathematical PhysicsAtomic and Molecular Physics and OpticsBeam (structure)ExcitationPhysica Scripta
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Laser Ultrasonic Testing for Estimation of Adhesion of Al2O3Plasma Sprayed Coatings

2001

Abstract The aim of the present study was to investigate the possibility of using a laser ultrasonic technique for the estimation of the adhesion of ceramic coatings, deposited onto metallic substrates by thermal spraying techniques. For this purpose, a pulsed Nd : YAG laser (λ = 1064 nm, 14 ns) was used to irradiate Al2O3 coatings, of different thickness (30–350 µm), deposited onto stainless steel substrates by atmospheric plasma spraying. The laser generated ultrasonic waves were in situ recorded at the epicentre using a laser heterodyne interferometer. The acoustic waveforms were correlated with the interaction between the pulsed laser radiation and the coated metal, taking into account …

Materials scienceUltrasonic testingAtmospheric-pressure plasmaSurfaces and InterfacesSubstrate (electronics)engineering.materialCondensed Matter PhysicsLaserSurfaces Coatings and Filmslaw.inventionCoatinglawvisual_artMaterials Chemistryengineeringvisual_art.visual_art_mediumUltrasonic sensorCeramicComposite materialThermal sprayingSurface Engineering
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Temperature control during Spark Plasma Sintering and application to up-scaling and complex shaping

2013

International audience; The determination and the homogeneity of the sample temperature during consolidation of powders by Spark Plasma Sintering (SPS) are addressed. Densifications were carried out in three different facilities differing by their constructors and their size. A structural transformation activated in a TiAl alloy was used as a marker of the sample temperature and finite element modeling were performed to evaluate the temperature at each point of the set-up. A good agreement between experimental and simulated data is exhibited. Alloys with identical microstructures were sintered and the homogeneity of the microstructure was better in the largest machines or when the sample wa…

Materials scienceUp scalingAlloySpark plasma sintering02 engineering and technologyengineering.materialIndustrial and Manufacturing Engineering0203 mechanical engineeringHomogeneity (physics)TIAL-BASED ALLOYSFIELDPOWDERTemperature controlConsolidation (soil)MetallurgyMetals and AlloysMECHANICAL-PROPERTIES021001 nanoscience & nanotechnologyMicrostructureFinite element methodComputer Science Applications020303 mechanical engineering & transportsModeling and SimulationCeramics and Compositesengineering0210 nano-technology
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Microstructure-oxidation resistance relationship in Ti3AlC2 MAX phase

2020

International audience; Spark Plasma Sintering and Hot Isostatic Pressing were used to synthesize coarse-grained and fine-grained Ti3AlC2 specimens. Moreover, Spark Plasma Sintering processing parameters were modified in order to vary the TiC, Al2O3 and TixAly impurity and the porosity contents in the fine-grained samples. The influence of the Ti3AlC2 microstructure on the oxidation resistance was assesed. It is demonstrated that the grain size can drastically modify the oxidation resistance. The higher density of grain boundaries, in fine-grained specimens, increases the number of Al diffusion paths and leads to the formation of a protective alumina scale. In coarse-grained sample, Al diff…

Materials science[PHYS.MPHY]Physics [physics]/Mathematical Physics [math-ph]OxideSpark plasma sinteringSPS02 engineering and technology010402 general chemistry01 natural sciences[SPI.AUTO]Engineering Sciences [physics]/Automaticchemistry.chemical_compound[SPI]Engineering Sciences [physics][PHYS.QPHY]Physics [physics]/Quantum Physics [quant-ph]Powder metallurgyHot isostatic pressingPowder metallurgyOxidationMaterials Chemistry[PHYS.MECA.MEFL]Physics [physics]/Mechanics [physics]/Fluid mechanics [physics.class-ph][PHYS.MECA.BIOM]Physics [physics]/Mechanics [physics]/Biomechanics [physics.med-ph]Composite materialPorosityMicrostructureComputingMilieux_MISCELLANEOUS[SPI.ACOU]Engineering Sciences [physics]/Acoustics [physics.class-ph][PHYS.MECA.VIBR]Physics [physics]/Mechanics [physics]/Vibrations [physics.class-ph][SPI.FLUID]Engineering Sciences [physics]/Reactive fluid environmentMechanical Engineering[SPI.NRJ]Engineering Sciences [physics]/Electric powerMetals and Alloys[CHIM.MATE]Chemical Sciences/Material chemistry[PHYS.MECA.MSMECA]Physics [physics]/Mechanics [physics]/Materials and structures in mechanics [physics.class-ph]021001 nanoscience & nanotechnologyMicrostructureGrain sizeGrain size[PHYS.MECA.ACOU]Physics [physics]/Mechanics [physics]/Acoustics [physics.class-ph]0104 chemical sciences[SPI.ELEC]Engineering Sciences [physics]/Electromagnetism[CHIM.POLY]Chemical Sciences/PolymerschemistryMechanics of Materials[PHYS.MECA.THER]Physics [physics]/Mechanics [physics]/Thermics [physics.class-ph]MAX phaseGrain boundary0210 nano-technology
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X-ray imaging of the heating zone of non-normal incidence pumped XRL plasma

2006

Soft x-ray emission, above 600 eV, from a grazing incidence pumped Ni-like Mo x-ray laser (GRIP-XRL) [1] plasma was investigated. Using a pinhole camera looking along the target surface, perpendicular to the direction of the XRL emission, spatially-resolved information was obtained with a resolution which was limited only by the pinhole size of 10 μm. The relative distance from the target surface to the plasma zone heated by th e picosecond pulse was investigated for different GRIP angles, energy ratios and delays between the plasma producing and the plasma heating pulses.

Materials science[PHYS.PHYS.PHYS-ATOM-PH]Physics [physics]/Physics [physics]/Atomic Physics [physics.atom-ph]business.industryResolution (electron density)X-rayPlasmaLaser01 natural sciences010305 fluids & plasmaslaw.inventionOpticslaw[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph]0103 physical sciencesPinhole cameraPerpendicularPinhole (optics)010306 general physicsbusinessIncidence (geometry)
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<br /> Ga_2O_3 films alloyed with SnO_2 and treated by RF plasma: an interesting way for the development of transparent contacts for UV-emittin…

2016

International audience; Layers of Ga2O3 alloyed up to 15 at% with Sn4+ has been studied after treatment by RF plasma. An increased conductivity was measured which is an interesting step towards transparent contacts for UV-emitting photonics devices.

Materials sciencebusiness.industry02 engineering and technologyChemical vapor depositionPlasmaConductivity021001 nanoscience & nanotechnologyMass spectrometry01 natural sciences[SPI.MAT]Engineering Sciences [physics]/Materials010309 opticsTransmission electron microscopy0103 physical sciencesOptoelectronicsPhotonics0210 nano-technologybusinessAfter treatment13th International Conference on Fiber Optics and Photonics
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In situ monitoring of pulsed laser indium–tin-oxide film deposition by optical emission spectroscopy

2001

We performed optical emission spectroscopy to monitor the plasma produced during the ablation of indium-tin-oxide targets under different oxygen pressure conditions using a pulsed UV laser. Molecular bands of InO were identified in the fluorescent spectra produced by pulsed laser ablation. InO line monitoring allowed obtaining the optimal conditions for good-quality ITO film deposition. We demonstrated that it is possible to correlate InO line spectroscopic parameters with the conditions required to fabricate a high-conductivity and high-transparent ITO thin film. In particular, low resistivity (10-4 to 10-3 Ω cm) was obtained in films deposited at room temperature by regulating oxygen pres…

Materials sciencebusiness.industryAnalytical chemistryPlasmaIndium–tin-oxide films Pulsed laser deposition Optical emission spectroscopy Plasma diagnosticsSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsAnalytical ChemistryIndium tin oxidePulsed laser depositionElectrical resistivity and conductivityOptoelectronicsPlasma diagnosticsPLD ITO optical spectroscopyThin filmbusinessInstrumentationSpectroscopyDeposition (law)Line (formation)Spectrochimica Acta Part B: Atomic Spectroscopy
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Experimental approach of the interaction between a sub-microscopic cathode tip and the plasma

2007

The interaction between electrical arc and cathode represents a crucial problem in the conception of arc jet thrusters, circuit breakers, and plasma torch or arc heaters. At the cathode surface, the current and energy transfers are controlled by the current emitting site (cathodic spot). Theories and experimental observations, at macroscopic and mesoscopic scale, deal with the erosion of the cathodic surface. Under micrometer range, theories refer to the arc root to describe the erosion of the surface. The works presented here propose an original method to evaluate the arc-cathode interaction at micrometric scale. A nanotechnology is used in order to control the roughness of the electrode s…

Materials sciencebusiness.industryAnalytical chemistrySurface finish01 natural sciencesCathode010305 fluids & plasmasCathodic protectionlaw.inventionElectric arcOpticsPlasma torchlaw0103 physical sciencesCathodic arc depositionElectrodeSurface roughness010306 general physicsbusinessComputingMilieux_MISCELLANEOUS2007 8th International Conference on Electric Fuses and their Applications
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Some Advantages of the Gyrotrons with Width Emitters

2020

The main trends in gyrotron development are escalation of the radiated power and increasing the frequency of coherent radiation. For both trends it is beneficial to develop gyrotrons with wide emitters because this allows one to use cryomagnets with smaller inner bore sizes. For analyzing and optimizing the operation of gyrotrons with wide emitters it is proposed to represent such emitters as a superposition of thin rings and analyze the properties of electron beams emitted by each of these rings. The analysis of electron beam properties, for electron optical systems with different emitters is presented. The possibility to reduce velocity spread by anode profiling is discussed. The dynamics…

Materials sciencebusiness.industryElectronEffective radiated powerlaw.inventionAnodeSuperposition principleOpticsPhysics::Plasma PhysicslawGyrotronElectron opticsCathode rayPhysics::Accelerator PhysicsStimulated emissionbusiness2020 IEEE 21st International Conference on Vacuum Electronics (IVEC)
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Suppression of leakage currents in GaN-based LEDs induced by reactive-ion etching damages

2008

Forward and reverse leakage currents in GaN/InGaN multi-quantum well light-emitting diodes (LEDs) are caused by reactive-ion etching (RIE) damages during device patterning. A method to recover the damaged surfaces, based on a chemical etch in KOH: ethylene-glycol is described. Leakage currents decrease of more than a factor of 10 and are completely suppressed in most of devices.

Materials sciencebusiness.industryN-TYPE GANLIGHT-EMITTING-DIODEStechnology industry and agriculturePLASMA-INDUCED DAMAGECondensed Matter PhysicsElectronic Optical and Magnetic Materialslaw.inventionlawOptoelectronicsReactive-ion etchingbusinessInstrumentationDiodeLight-emitting diodeLeakage (electronics)The European Physical Journal Applied Physics
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