Search results for "RF"

showing 10 items of 23683 documents

Effect of oxidation post treatments on TiO2 coating manufactured using reactive very low-pressure plasma spraying (R-VLPPS)

2020

Abstract TiO2 coatings manufactured using reactive very low-pressure plasma spraying (R-VLPPS) were analyzed in different regions related to their position compared to the plasma flame. For that, a screen was used in order to hide an area of the substrate from the direct plasma flux. The coating morphology changed from quasi lamellar structure to highly vapor structure and coatings exhibited obvious modifications in terms of phases and mechanical properties. The effect of oxidation post treatment on the as sprayed coating was then studied by selecting two methods: in situ oxidation post treatment and classical thermal treatment. The two post treatments provided an increase of the main rutil…

010302 applied physicsMaterials scienceSubstrate (chemistry)02 engineering and technologySurfaces and InterfacesGeneral ChemistryPlasmaThermal treatmentengineering.material021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesSurfaces Coatings and Films[SPI]Engineering Sciences [physics]CoatingRutilePhase (matter)0103 physical sciencesMaterials ChemistryengineeringLamellar structureComposite material0210 nano-technologyPorositySurface and Coatings Technology
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Reducing the Schottky barrier height at the MoSe2/Mo(110) interface in thin-film solar cells: Insights from first-principles calculations

2016

Abstract We report on first-principles calculations of the properties of the MoSe2/Mo(110) interface. Due to mismatch between the lattice parameters of the two structures, different patterns can form at the interface. We have studied the formation energy and the band alignment of six patterns for the MoSe2 (0001)/Mo(110) interface and one pattern for the MoSe2 (11 2 0)/Mo(110) interface. The MoSe2 (11 2 0)/Mo(110) interface is more stable than the MoSe 2 (0001)/Mo(110) interface and in contrast to MoSe2 (0001)/Mo(110), no Schottky barrier forms at MoSe2 (11 2 0)/Mo(110). Doping with Na modifies the band alignment at the interfaces. The Schottky barrier height decreases, provided that a Na a…

010302 applied physicsMaterials science[PHYS.NUCL]Physics [physics]/Nuclear Theory [nucl-th]Schottky barriercu(InDopingMetals and Alloys02 engineering and technologySurfaces and InterfacesInterface[PHYS.NEXP]Physics [physics]/Nuclear Experiment [nucl-ex]021001 nanoscience & nanotechnology01 natural sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCrystallographyGa)Se 2MoSe2/Mo(110)Lattice (order)0103 physical sciencesMaterials ChemistryThin film solar cellThin-film solar cell0210 nano-technologySchottky barrier
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SiC MOSFET vs SiC/Si Cascode short circuit robustness benchmark

2019

Abstract Nowadays, MOSFET SiC semiconductors short circuit capability is a key issue. SiC/Si Cascodes are compound semiconductors that, in some aspects, show a similar MOSFET behaviour. No interlayer dielectric insulation suggests, in theory, Cascode JFETs as more robust devices. The purpose of this paper is to compare the drift and degradation of two commercial devices static parameters by exposing them to different levels of repetitive 1.5 μs short-circuit campaigns at 85% of its breakdown voltage. Short-circuit time has been set experimentally, and longer times result in catastrophic failure of MOSFET devices due to over self-heating. For this purpose, pre- and post-test short circuit ch…

010302 applied physicsMaterials sciencebusiness.industry020208 electrical & electronic engineering02 engineering and technologyDielectricCondensed Matter Physics01 natural sciencesAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsSemiconductorCatastrophic failureRobustness (computer science)0103 physical sciencesMOSFET0202 electrical engineering electronic engineering information engineeringOptoelectronicsBreakdown voltageCascodeElectrical and Electronic EngineeringSafety Risk Reliability and QualitybusinessShort circuitMicroelectronics Reliability
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2018

Damping distances of surface plasmon polariton modes sustained by different thin titanium nitride (TiN) films are measured at the telecom wavelength of 1.55 μm. The damping distances are correlated to the electrical direct current resistivity of the films sustaining the surface plasmon modes. It is found that TiN/Air surface plasmon mode damping distances drop non-linearly from 40 to 16μm as the resistivity of the layers increases from 28 to 130μΩ.cm, respectively. The relevance of the direct current (dc) electrical resistivity for the characterization of TiN plasmonic properties is investigated in the framework of the Drude model, on the basis of parameters extracted from spectroscopic ell…

010302 applied physicsMaterials sciencebusiness.industryDirect currentSurface plasmonPhysics::Opticschemistry.chemical_element02 engineering and technology021001 nanoscience & nanotechnology01 natural sciencesDrude modelSurface plasmon polaritonAtomic and Molecular Physics and OpticsCondensed Matter::Materials ScienceOpticschemistryElectrical resistivity and conductivityPhysical vapor deposition0103 physical sciencesOptoelectronics0210 nano-technologybusinessTinPlasmonOptics Express
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Power efficiency improvements with the radio frequency H− ion source

2016

CW 13.56 MHz radio frequency-driven H(-) ion source is under development at the University of Jyväskylä for replacing an existing filament-driven ion source at the MCC30/15 cyclotron. Previously, production of 1 mA H(-) beam, which is the target intensity of the ion source, has been reported at 3 kW of RF power. The original ion source front plate with an adjustable electromagnet based filter field has been replaced with a new front plate with permanent magnet filter field. The new structure is more open and enables a higher flux of ro-vibrationally excited molecules towards the plasma electrode and provides a better control of the potential near the extraction due to a stronger separation …

010302 applied physicsMaterials scienceta114ta213Electromagnetbusiness.industryRF power amplifierCyclotronPlasma01 natural sciencesIon sourcelaw.inventionion sourceslawMagnet0103 physical sciencesOptoelectronicsRadio frequencypower efficiency010306 general physicsbusinessInstrumentationElectrical efficiencyReview of Scientific Instruments
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State-space formulation of scalar Preisach hysteresis model for rapid computation in time domain

2015

A state-space formulation of classical scalar Preisach model (CSPM) of hysteresis is proposed. The introduced state dynamics and memory interface allow to use the state equation, which is rapid in calculation, instead of the original Preisach equation. The main benefit of the proposed modeling approach is the reduced computational effort which requires only a single integration over the instantaneous line segment in the Preisach plane. Numerical evaluations of the computation time and model accuracy are provided in comparison to the CSPM which is taken as a reference model.

010302 applied physicsMemory interfacePreisach model of hysteresis0209 industrial biotechnologyApplied MathematicsComputationScalar (mathematics)02 engineering and technologySystems and Control (eess.SY)01 natural sciences020901 industrial engineering & automationLine segmentControl theoryModeling and Simulation0103 physical sciencesFOS: Electrical engineering electronic engineering information engineeringApplied mathematicsComputer Science - Systems and ControlTime domainReference modelMathematics
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Influence of surface topography on depth profiles obtained by Rutherford backscattering spectrometry

2000

A method for determining correct depth profiles from samples with rough surfaces is presented. The method combines Rutherford backscattering spectrometry with atomic force microscopy. The topographical information obtained by atomic force microscopy is used to calculate the effect of the surface roughness on the backscattering spectrum. As an example, annealed Au/ZnSe heterostructures are studied. Gold grains were observed on the surfaces of the annealed samples. The annealing also caused diffusion of gold into the ZnSe. Backscattering spectra of the samples were measured with a 2 MeV 4He+ ion beam. A scanning nuclear microprobe was used to verify the results by measuring backscattering fro…

010302 applied physicsMicroprobeMaterials scienceIon beamAnnealing (metallurgy)Analytical chemistryGeneral Physics and AstronomyHeterojunction02 engineering and technologyCondensed Matter::Mesoscopic Systems and Quantum Hall Effect021001 nanoscience & nanotechnologyRutherford backscattering spectrometry01 natural sciencesSpectral lineCondensed Matter::Materials Science0103 physical sciencesSurface roughness0210 nano-technologySpectroscopyJournal of Applied Physics
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Charge breeding time investigations of electron cyclotron resonance charge breeders

2018

To qualify electron cyclotron resonance charge breeders, the method that is traditionally used to evaluate the charge breeding time consists in generating a rising edge of the injected beam current and measuring the time in which the extracted multicharged ion beam reaches 90% of its final current. It is demonstrated in the present paper that charge breeding times can be more accurately measured by injecting short pulses of 1 + ions and recording the time resolved responses of N + ions. This method is used to probe the effect of the 1 + ion accumulation in the plasma known to disturb the buffer gas plasma equilibrium and is a step further in understanding the large discrepancies reported in…

010302 applied physicsNuclear and High Energy PhysicsMaterials sciencePhysics and Astronomy (miscellaneous)ta114syklotronit[PHYS.PHYS.PHYS-ACC-PH]Physics [physics]/Physics [physics]/Accelerator Physics [physics.acc-ph]electronsCharge (physics)Surfaces and Interfacesresonanssielektronit7. Clean energy01 natural sciencesElectron cyclotron resonance010305 fluids & plasmasresonance0103 physical sciencescharge breederslcsh:QC770-798lcsh:Nuclear and particle physics. Atomic energy. RadioactivityAtomic physicscyclotronsReview Articles
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Lattice sites of diffused gold and platinum in epitaxial ZnSe layers

2000

Abstract The lattice location of diffused gold and platinum in zinc selenide (ZnSe) epitaxial layers was studied using the Rutherford backscattering (RBS) channeling technique. Thin Au and Pt films were evaporated onto ZnSe samples. The Au/ZnSe samples were annealed at 525°C and the residual Au film was removed by etching. Channeling angular scan measurements showed that about 30% of Au atoms were close to substitutional site (displaced about 0.2 A). In the case of the Pt/ZnSe samples the annealing temperatures ranged from 600°C to 800°C. The Pt minimum yields along 〈1 0 0〉 direction were close to the random value, varying from 80% to 90%. The measured Pt angular scans along 〈1 0 0〉 and 〈1 …

010302 applied physicsNuclear and High Energy PhysicsMaterials scienceScatteringAnnealing (metallurgy)chemistry.chemical_element02 engineering and technologyAtmospheric temperature range021001 nanoscience & nanotechnologyEpitaxy01 natural sciencessymbols.namesakechemistry.chemical_compoundCrystallographyTransition metalchemistry0103 physical sciencessymbolsZinc selenideRutherford scattering0210 nano-technologyPlatinumInstrumentationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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Investigation of ZrO[sub 2]–Gd[sub 2]O[sub 3] Based High-k Materials as Capacitor Dielectrics

2010

Atomic layer deposition (ALD) of ZrO 2 ―Gd 2 O 3 nanolaminates and mixtures was investigated for the preparation of a high permittivity dielectric material. Variation in the relative number of ALD cycles for constituent oxides allowed one to obtain films with controlled composition. Pure ZrO 2 films possessed monoclinic and higher permittivity cubic or tetragonal phases, whereas the inclusion of Gd 2 O 3 resulted in the disappearance of the monoclinic phase. Changes in phase composition were accompanied with increased permittivity of mixtures and laminates with low Gd content. Further increase in the lower permittivity Gd 2 O 3 content above 3.4 cat. % resulted in the decreased permittivity…

010302 applied physicsPermittivityMaterials scienceRenewable Energy Sustainability and the EnvironmentAnalytical chemistryEquivalent oxide thickness02 engineering and technologyDielectric021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAtomic layer depositionElectric field0103 physical sciencesMaterials ChemistryElectrochemistry0210 nano-technologyCurrent densityLeakage (electronics)High-κ dielectricJournal of The Electrochemical Society
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