Search results for "lithography"
showing 10 items of 242 documents
Direct observation of localized surface plasmon coupling
1999
We report on the direct observation of localized surface plasmon coupling using a photon scanning tunneling microscope. The surface plasmons are excited in gold nanostructures tailored by electron beam lithography. Electromagnetic energy transfer from a resonantly excited nanoparticle to a nanowire, which is not directly excited by the incident light is observed. Our experimental results appear to be in good agreement with theoretical computations based on Green's dyadic technique.
All-optical and electro-optical active plasmonic telecom components
2011
Active plasmonics is an attractive emerging field in which the ability to control the surface plasmon polariton (SPP) propagation finds many applications such as realization of fully functional integrated photonic circuitry. We demonstrate both numerically and experimentally switching of the SPP transmission based on two different approaches namely the all-optical and electro-optical at telecom wavelengths. The plasmonic component consists of a compact and efficient SPP switch utilizing highly sensitive ring resonator which has high sensitivity to the refractive index changes. Fabrication was done via e-beam lithography utilizing advanced proximity corrections. The compenents were character…
Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode
2007
We report on recent developments of an "at wavelength" full-field imaging technique for defect inspection of multilayer mask blanks for extreme ultraviolet lithography (EUVL). Our approach uses photoemission electron microscopy (PEEM) in a near normal incidence mode at 13.5 nut wavelength to image the photoemission induced by the EUV wave field on the multilayer blank surface. We analyze buried defects on Mo/Si multilayer samples down to a lateral size of 50 nm and report on first, results obtained from a six inches mask blank prototype as prerequisite for industrial usage. (c) 2007 Elsevier B.V. All rights reserved.
Nanofabrication on 2D and 3D Topography via Positive‐Tone Direct‐Write Laser Lithography
2019
Direct laser writing (DLW) lithography using two‐photon absorption is a powerful technique mostly used for fabrication of complex structures in micro‐ and nanoscale, by photopolymerizing a negative‐tone resist. In contrast, in this study it is demonstrated that DLW is also well suited for fabricating nano‐ to microscale metallic structures using lift‐off and a positive‐tone photoresist. It is shown first that versatile, fast and large area fabrication is possible on flat two‐dimensional insulating substrates, and an expression for how the line width varies with the scanning speed is derived, with excellent agreement with the experiments. Even more interestingly, a unique application for the…
Time-resolved FDTD and experimental FTIR study of gold micropatch arrays for wavelength-selective mid-infrared optical coupling
2021
The work was partially supported by Sweden's innovation agency Vinnova (Large area CVD graphene-based sensors/IR-photodetectors 2020-00797) and EU CAMART2 project (European Union's Horizon 2020 Framework Programme H2020-WIDESPREAD-01-2016-2017-TeamingPhase2 under grant agreement No.739508). TY acknowledges European Regional Development Fund Project No. 1.1.1.2/VIAA/4/20/740.
A new approach for actinic defect inspection of EUVL multilayer mask blanks: Standing wave photoemission electron microscopy
2006
Extreme ultraviolet lithography (EUVL) at 13.5 nm is the next generation lithography technique capable of printing sub-50 nm structures. With decreasing feature sizes to be printed, the requirements for the lithography mask also become more stringent in terms of defect sizes and densities that are still acceptable and the development of lithography optics has to go along with the development of new mask defect inspection techniques that are fast and offer high resolution (preferable in the range of the minimum feature size) at the same time. We report on the development and experimental results of a new 'at wavelength' full-field imaging technique for defect inspection of multilayer mask bl…
2D photonic defect layers in 3D inverted opals on Si platforms
2006
Dielectric spheres synthesised for the fabrication of self-organized photonic crystals such as opals offer large opportunities for the design of novel nanophotonic devices. In this paper, we show a hexagonal superlattice monolayer of dielectric spheres inscribed on a 3D colloidal photonic crystal by e-beam lithography. The crystal is produced by a variation of the vertical drawing deposition method assisted by an acoustic field. The structures were chosen after simulations showed that a hexagonal super-lattice monolayer in air exhibits an even photonic band gap below the light cone if the refractive index of the spheres is higher than 1.93.
Direct Writing of Channels for Microfluidics in Silica by MeV Ion Beam Lithography
2011
The lithographic exposure characteristic of amorphous silica (SiO2) was investigated for 6.8 MeV16O3+ions. A programmable proximity aperture lithography (PPAL) technique was used for the ion beam exposure. After exposure, the exposed pattern was developed by selective etching in 4% v/v HF. Here, we report on the development of SiO2in term of the etch depth dependence on the ion fluence. This showed an exponential approach towards a constant asymptotic etch depth with increasing ion fluence. An example of microfluidic channels produced by this technique is demonstrated.
Elastic configurations of self-supported oxide membranes for fuel cells
2013
Abstract Ultra-thin oxide films are of interest in energy conversion technologies such as low temperature solid oxide fuel cells and permeation membranes. Understanding their thermo-mechanical stability is an important problem. Edge clamped, self-supported thin film membranes show hierarchical wrinkles; with the largest wavelengths in the center, while smaller ones arise near the clamped boundary; correspondingly the largest strains, with tensile stress comparable to the residual stress, are in the vicinity of the clamped boundary. Our results can be understood by simple scaling arguments and are valid for membranes in the post-buckling regime far from threshold. We confirm the validity of …
Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays
2010
A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays. (C) 2010 Elsevier B.V. All rights reserved.