Search results for "photor"
showing 10 items of 340 documents
Photocatalytic degradation of 4-nitrophenol in a continuous reactor containing titanium dioxide supported on glass beads
2008
WOS: 000258975200009
Fabrication of Electrical Contacts on Pyramid-Shaped NTD-Ge Microcalorimeters Using Free-Standing Shadow Masks
2011
In our effort to fabricate arrays of germanium microcalorimeters for X-ray detection, a truncated square-based pyramid shape has been identified as a suitable geometry for the sensors. It allows to obtain a uniform current spreading across each sensor, and represents a good compromise between having a large support area for the radiation absorber and for maintaining an overall small bolometer volume. This three-dimensional geometry, however, does not allow to create the electrical contacts for the sensors using a regular photoresist-based lift-off metallization process. In this paper we show how to deposit metal contacts on the lateral faces of the pyramidal sensors by metal evaporation thr…
ortho -Fluorination of azophenols increases the mesophase stability of photoresponsive hydrogen-bonded liquid crystals
2018
Photoresponsive liquid crystals (LCs) whose alignment can be controlled with UV-Visible light are appealing for a range of photonic applications. From the perspective of exploring the interplay between the light response and the self-assembly of the molecular components, supramolecular liquid crystals are of particular interest. They allow elaborating the structure-property relationships that govern the optical performance of LC materials by subtle variation of the chemical structures of the building blocks. Herein we present a supramolecular system comprising azophenols and stilbazoles as hydrogen-bond donors and acceptors, respectively, and show that ortho-fluorination of the azophenol dr…
ERG signal analysis using wavelet transform
2009
The wavelet analysis is a powerful tool for analyzing and detecting features of signals characterized by time-dependent statistical properties, as biomedical signals. The identification and the analysis of the components of these signals in the time-frequency domain, give meaningful information about the physiological mechanisms that govern them. This article presents the results of the wavelet analysis applied to the a-wave component of the human electroretinogram. In order to deepen and improve our knowledge about the behavior of the early photoreceptoral response, including the possible activation of interactions and correlations among the photoreceptors, we have detected and identified …
Taurine in the interphotoreceptor matrix
2014
TAURINE IN THE INTERPHOTORECEPTOR MATRIX Gueli Maria Concetta Dipartimento di Biomedicina Sperimentale e Neuroscienze Cliniche (BioNEC), Università degli Studi di Palermo Taurine (Tau) is the most abundant amino compound free in the retina. It is concentrated in the photoreceptor inner segment, in the outer nuclear layer and in the synapses. The retina synthesizes and receives Tau from choroidal blood via the pigment epithelium (PE). The high content in the retina suggest the possibily of verifying whether it was present in the interphotoreceptor matrix (IPM), which occupies the subretinal space. In this study we have determined the Tau level in the IPM, separating it from other soluble ami…
Resist-based silver nanocomposites synthesized by lithographic methods
2010
In this work, the formation of silver metal nanoparticles inside a negative-tone resist based on poly(vinyl alcohol) is achieved by electron beam lithography. The chemistry of this sensitive resist allows the production of nanoparticles as well as the polymer crosslinking by the electron radiation. Due to the presence of the silver nanoparticles, the final composite exhibits a plasmonic behavior, which was characterized by measuring the absorbance. The lithographic properties of the resist have been characterized. The technique has also been exported to UV lithography, where silver nanoparticles are obtained inside the polymeric patterns after optical lithography.
Applicability of a binary amplitude mask for creating correctors of higher-order ocular aberrations in a photoresistive layer
2012
Ocular aberrations can be corrected with wavefront correctors created in a photoresist layer. The simplest type of the mask used in optical lithography is a binary amplitude mask. It is known that such a mask has a periodic hole pattern. The purpose of this research was to assess applicability of a binary amplitude mask for creating ocular wavefront correctors. The photoresist was applied to the substrate by using the dip-coating method. The photoresist layer was illuminated through a mask printed on a transparent film by using a laser printer. The surface of the wavefront correctors was evaluated by aberrometry, scanning electron microscopy and profilometry method. The dip-coating method c…
Quasi-isoactinic reactor for photocatalytic kinetics studies
2007
Photochemical reactors characterized by almost uniform values of the local volumetric rate of photon absorption (LVRPA), i.e., quasi-isoactinic photoreactors, are particularly suitable for assessing the influence of radiant field intensity in kinetic studies. In this work, Monte Carlo simulations have been performed to obtain LVRPA values in a flat photoreactor irradiated on both sides. This configuration appears to be particularly suitable for obtaining quasi-isoactinic conditions. The influence of catalyst albedo and scattering phase function is assessed, and the conditions for obtaining iso-actinicity are discussed. Finally, these conditions are related to an easy-to-measure parameter, n…
Intérêt d'une supplémentation en acides gras polyinsaturés dans un modèle expérimental de glaucome chez le rat
2009
Diplôme : Dr. d'Université
On the Schwarzschild Effect in 3D Two‐Photon Laser Lithography
2019
International audience; The two‐photon Schwarzschild effect in photoresists suitable for 3D laser lithography is revisited. The study ranges over seven orders of magnitude in exposure time (from 1 µs to 10 s) and investigates a wide variety of different photoresist compositions. For short exposure times (“regime I”), the laser power at the polymerization threshold can scale with the inverse square root of the exposure time, as naively to be expected for two‐photon absorption. Substantial deviations occur, however, for low photoinitiator concentrations. For intermediate exposure times (“regime II”), a Schwarzschild‐type of behavior is found, as discussed previously. For very long exposure ti…