Search results for "physical vapor deposition"
showing 10 items of 30 documents
Topological insulator nanoribbon Josephson junctions: Evidence for size effects in transport properties
2020
We have used Bi$_2$Se$_3$ nanoribbons, grown by catalyst-free Physical Vapor Deposition to fabricate high quality Josephson junctions with Al superconducting electrodes. In our devices we observe a pronounced reduction of the Josephson critical current density $J_c$ by reducing the width of the junction, which in our case corresponds to the width of the nanoribbon. Because the topological surface states extend over the entire circumference of the nanoribbon, the superconducting transport associated to them is carried by modes on both the top and bottom surfaces of the nanoribbon. We show that the $J_c$ reduction as a function of the nanoribbons width can be accounted for by assuming that on…
2018
Damping distances of surface plasmon polariton modes sustained by different thin titanium nitride (TiN) films are measured at the telecom wavelength of 1.55 μm. The damping distances are correlated to the electrical direct current resistivity of the films sustaining the surface plasmon modes. It is found that TiN/Air surface plasmon mode damping distances drop non-linearly from 40 to 16μm as the resistivity of the layers increases from 28 to 130μΩ.cm, respectively. The relevance of the direct current (dc) electrical resistivity for the characterization of TiN plasmonic properties is investigated in the framework of the Drude model, on the basis of parameters extracted from spectroscopic ell…
High transparency Bi 2 Se 3 topological insulator nanoribbon Josephson junctions with low resistive noise properties
2019
Bi$_2$Se$_3$ nanoribbons, grown by catalyst-free Physical Vapour Deposition, have been used to fabricate high quality Josephson junctions with Al superconducting electrodes. The conductance spectra (dI/dV) of the junctions show clear dip-peak structures characteristic of multiple Andreev reflections. The temperature dependence of the dip-peak features reveals a highly transparent Al/Bi$_2$Se$_3$ topological insulator nanoribbon interface and Josephson junction barrier. This is supported by the high values of the Bi$_2$Se$_3$ induced gap and of I$_c$R$_n$ (I$_c$ critical current, R$_n$ normal resistance of the junction) product both of the order of 160 $\mu$eV, a value close to the Al gap. T…
Reactive direct current magnetron sputtered TiO2 thin films with amorphous to crystalline structures.
2008
International audience; TiO2 thin films were deposited on soda–lime glass substrates by reactive direct current magnetron sputtering in a mixture of pure argon and oxygen. The influence of both the deposition time, td, and the post-annealing treatments on the films morphology, composition and structure was analyzed by scanning electron microscopy, ellipsometry, X-ray photoelectrons spectroscopy, X-ray diffraction (XRD) and Raman spectroscopy. Amorphous TiO2 was obtained for the shortest deposition time, td=15 min. Increasing td up to 30 min, poorly crystallized anatase and rutile phases were formed together with amorphous TiO2, as was revealed by complementary XRD patterns and Raman spectra…
Study of the Chemical Conversion of Aluminum Alloys by Coupling CFDE and EQCM
2004
The ability of the channel flow double electrode (CFDE) technique and electrochemical quartz crystal microbalance (EQCM) for studying in situ chromate phosphate conversion coating on 5182 aluminum alloys was explored. It was first demonstrated that aqueous Cr(VI) can be analyzed quantitatively with the CFDE technique by reduction into Cr(III) on a graphite electrode. Samples used for EQCM were quartz plated by physical vapor deposition using a 5182 alloy target, allowing thin layers of aluminum alloys with a similar chemical composition to be obtained. EQCM was adapted in order to account for the hydrodynamic conditions in an industrial process, by placing the quartz in a flow cell. In orde…
Effect of the surface stoichiometry on the interaction of Mo with TiO2 (110)
2000
Abstract Molydenum has been deposited at room temperature on (110) TiO2 surfaces with different stoichiometries, roughnesses and crystallinities. Whatever the substrate preparation is, in-situ Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) studies as well as ex-situ atomic force microscopy (AFM) and reflexion high-energy electron diffraction (RHEED) studies reveal a Stranski–Krastanov growth mode: the completion of three monolayers followed by islands growth is observed in every case. The three monolayers are always composed of amorphous molybdenum oxide with an oxidation state of molybdenum less than IV. The oxidation of the molybdenum layers generates Ti3+ an…
Preparation of photocatalysts by physical methodologies
2021
The synthesis of photocatalytic materials is an important task for obtaining better results in terms of activity and/or selectivity in photocatalysis. This chapter reports an overview of the main methodologies using physical techniques to obtain bulky, supported powders or films and coatings to be used as heterogeneous photocatalysts. The classical chemical methodologies for the preparation of photocatalytic materials are presented in the previous chapter, so the information presented here complements the aforementioned one. Materials scientists and engineers have made significant progresses in the improvement of methods of synthesis of nanomaterial solids by developing different apparatuse…
MoO (x≤2) ultrathin film growth from reactions between metallic molybdenum and TiO2 surfaces
2001
Abstract Exposures to oxygen at room temperature and annealings under vacuum were carried out on deposits obtained from molybdenum interacting with (1 1 0) TiO 2 surfaces in order to obtain molybdenum oxide ultra thin films. Exposures to oxygen at room temperature show that the interfacial molybdenum oxide layers resulting from the TiO 2 /Mo interactions are inactive towards oxygen whereas the metallic molybdenum clusters, which grew on top of the interfacial layers, oxidise into MoO 3 . Besides, during annealings under vacuum, substrate oxygen anions can diffuse into the deposit. Thus, between 400 and 500°C, molybdenum oxide layers are progressively oxidised into MoO 2 . Moreover, from the…
Investigations of TiO2 films deposited by different techniques
1991
High refractive TiO2 films deposited by reactive electron beam evaporation, reactive ion plating and dip coating have been characterized by optical spectroscopy, electron spectroscopy for chemical analysis, Rutherford backscattering spectroscopy, nuclear reaction analysis and Raman spectroscopy. The spectral refractive index n exhibits a strong dependence on the deposition conditions. These findings will be connected to variations in density, stoichiometry, hydrogen content (H2O) and binding structure of the layers. A strong correlation is found between optical quantities and microscopic properties of TiO2 films.
Epitaxy of thin films of the Heusler compound
2007
Abstract Epitaxial thin films of the highly spin polarized Heusler compound Co 2 Cr 0.6 Fe 0.4 Al are deposited by DC magnetron sputtering. It is shown by XRD and TEM investigations how the use of an Fe buffer layer on MgO(1 0 0) substrates supports the growth of highly ordered Co 2 Cr 0.6 Fe 0.4 Al at low deposition temperatures. The as-grown samples show a relatively large ordered magnetic moment of μ ≃ 3.0 μ B / f . u . providing evidence for a low level of disorder.