Search results for "sputter deposition"
showing 10 items of 93 documents
Deformation behavior and interfacial sliding in carbon/copper nanocomposite films deposited by high power DC magnetron sputtering
2015
Abstract Amorphous carbon–copper nanocomposite films with a carbon content from 7 to 40 at.% have been deposited onto steel, silicon and glass substrates using a high power (> 60 W/cm 2 ) and high-rate DC magnetron sputtering technique. XRD, Raman spectroscopy and TEM results confirm that the deposited films consist of copper nanograins (size
Electric breakdown of dielectric thin films for high-voltage display applications
2016
Smectic A liquid crystal is one of the most promising material for smart glass application due to infinite bistability and low haze at clear state. Voltage is needed to switch from scattering to transparent and it is likely for dielectric breakdown to occur. In order to reduce the probability of dielectric breakdown to occur, a dielectric insulating coating is usually employed. In this work we have compared electrical and optical properties of SiO2 thin films with thickness up to 500 nm coated by flexographic printing and reactive magnetron sputtering. IV characteristics and dielectric breakdown values show sputtered coatings to have higher dielectric strength. For sputtered coatings with t…
Unexpected Epitaxial Growth of a Few WS2 Layers on {11̅00} Facets of ZnO Nanowires
2016
Core–shell nanowires are an interesting and perspective class of radially heterostructured nanomaterials where epitaxial growth of the shell can be realized even at noticeable core–shell lattice mismatch. In this study epitaxial hexagonally shaped shell consisting of WS2 nanolayers was grown on {1100} facets of prismatic wurtzite-structured [0001]-oriented ZnO nanowires for the first time. A synthesis was performed by annealing in a sulfur atmosphere of ZnO/WO3 core–shell structures, produced by reactive dc magnetron sputtering of an amorphous a-WO3 layer on top of ZnO nanowire array. The morphology and phase composition of synthesized ZnO/WS2 core–shell nanowires were confirmed by scanning…
A perpendicular graphene/ferromagnet electrode for spintronics
2020
We report on the large-scale integration of graphene layers over a FePd perpendicular magnetic anisotropy (PMA) platform, targeting further downscaling of spin circuits. An L10 FePd ordered alloy showing both high magneto-crystalline anisotropy and a low magnetic damping constant, is deposited by magnetron sputtering. The graphene layer is then grown on top of it by large-scale chemical vapor deposition. A step-by-step study, including structural and magnetic analyses by x-ray diffraction and Kerr microscopy, shows that the measured FePd properties are preserved after the graphene deposition process. This scheme provides a graphene protected perpendicular spin electrode showing resistance t…
Temperature and bias-voltage dependence of atomic-layer-deposited HfO2-based magnetic tunnel junctions
2014
Magnetic tunnel junctions with HfO2 tunnel barriers were prepared through a combination of magnetron sputtering and atomic layer deposition. We investigated the tunneling transport behavior, including the tunnel magnetoresistance ratio and the current-voltage characteristics between room temperature and 2 K. Here, we achieved a tunneling magneto resistance ratio of 10.3% at room temperature and 19.3% at 2 K. Furthermore, we studied the bias-voltage and temperature dependencies and compared the results with those of commonly used alumina- and magnesia-based magnetic tunnel junctions. We observed a polycrystalline/amorphous electrode-barrier system via high-resolution transmission electron mi…
A new method of nanocrystalline nickel powder formation by magnetron sputtering on the water-soluble substrates
2018
Due to the accurate and relatively easy control magnetron sputtering is an attractive technique for the synthesis of metallic particles. This work describes a new method of nickel powder production by depositing nickel on the surface of sodium chloride particles which were used as the template and are soluble in water. Ni powder with flake-like structure was obtained after washing Ni coated salt particles in ultrasonic cleaner. Salt particles and nickel powder were characterized using scanning electron microscope (SEM), energy-dispersive x-ray spectrometer, XRD and X-ray photoelectron spectroscopy (XPS) techniques. SEM images showed that thickness of the received Ni particles varied in the …
Electrochromic Devices Incorporating Cr Oxide And Ni Oxide Films:
2000
Abstract Transparent films of Cr oxide and Ni oxide were made by reactive DC magnetron sputtering in Ar+O2+H2. They displayed anodic electrochromism with charge capacities similar to that of W oxide. Cr oxide was stable in acidic environments, while Ni oxide was stable in basic environments. Electrochromic devices were made with pristine Cr oxide or Ni oxide films operating in conjunction with W oxide and a proton conducting electrolyte. Of the two oxides, Cr oxide film allowed device operation at a lower voltage span, while the device with Ni oxide film yielded a higher transmittance in the bleached state, a larger absorptance modulation, and a more neutral color.
Deposition and characterization of cold sprayed nanocrystalline NiTi
2011
International audience; Binary 50Ni–50Ti mixture was prepared by mechanical alloying from elemental powders. After 48 h of milling, the nanocrystalline B2-NiTi powder was produced. Then, this as-milled powder was deposited by cold spraying in order to produce a target which can be used to create thin films by magnetron sputtering technique. The objective is to improve the electrical characterizations of the NiTi/SiO2/Si M.O.S structures. Themorphology evolution of the powder particles, the phase identification and the alloying evolution process as function of milling time were studied using scanning electron microscopy, X-ray diffraction and transmission electron microscopy. In addition, th…
Deposition of Pt and Sn doped CeOx layers on silicon substrate
2013
Abstract Radio Frequency Magnetron Sputtering is used to elaborate CeO x layers doped with platinum and/or tin on a SiO 2 /Si substrate. Morphology, chemical composition and crystallographic structures were investigated by Transmission Electron Microscopy. The presence of nanoparticles of mainly ceria and metallic platinum is exhibited.
Epitaxial film growth and magnetic properties ofCo2FeSi
2006
We have grown thin films of the Heusler compound ${\mathrm{Co}}_{2}\mathrm{Fe}\mathrm{Si}$ by RF magnetron sputtering. On (100)-oriented MgO substrates we find fully epitaxial (100)-oriented and $L{2}_{1}$ ordered growth. On ${\mathrm{Al}}_{2}{\mathrm{O}}_{3}(11\overline{2}0)$ substrates, the film growth is (110)-oriented, and several in-plane epitaxial domains are observed. The temperature dependence of the electrical resistivity shows a power law with an exponent of $7∕2$ at low temperatures. Investigation of the bulk magnetic properties reveals an extrapolated saturation magnetization of $5.0{\ensuremath{\mu}}_{B}∕\mathrm{f.u.}$ at $0\phantom{\rule{0.3em}{0ex}}\mathrm{K}$. The films on $…