Search results for "sputtering"
showing 6 items of 136 documents
Structure and composition of sputter-deposited nickel-tungsten oxide films
2011
Films of mixed nickel-tungsten oxide, denoted NixW1-x oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry. X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x<0.50 the films comprised a mixture of amorphous WO3 and nanosized NiWO4, at x = 0.50 the nanosized NiWO4 phase was dominating, and at x>0.50 the films contained nanosized NiO and NiWO4.
Co-GLAD sputtering of tungsten-based nanostructured metallic thin films
2022
A structural and electrical study of tungsten-based metal thin films prepared by co-sputtering GLAD is the subject of this thesis. For this purpose, three different systems (W-W, W-Ag and W-Mo) have been developed using two opposite metallic targets (tilt angle α = 80° with the substrate). In addition to the choice of the second metallic element, different parameters involved in the growth of these films have undergone a variation (working pressure, thickness and second target current) to understand their influence on structural and electrical behaviors of these films. All three systems present a columnar and porous structure. The morphology of these films (especially the inclination of the…
Tungsten oxide thin films sputter deposited by the reactive gas pulsing process for the dodecane detection
2015
International audience; The DC reactive magnetron sputtering of a metallic tungsten target was performed in an argon + oxygen atmosphere for depositing tungsten oxide thin films. In order to control the oxygen concentration in the films, the reactive gas pulsing process, namely RGPP, was implemented. Rectangular pulses were used with a constant pulsing period T = 16 s whereas the duty cycle α (time of oxygen injection to pulsing period T ratio) was systematically changed from 0 to 100% of T. This pulsing injection of the reactive gas allowed a gradual evolution of the films composition from pure metallic to over-stoichiometric WO3+ɛ’ compounds. These WOx films were sputter deposited on comm…
Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
2018
A comparative study of mechanical properties and elemental and structural composition was made for aluminum nitride thin films deposited with reactive magnetron sputtering and plasma enhanced atomic layer deposition (PEALD). The sputtered films were deposited on Si (100), Mo (110), and Al (111) oriented substrates to study the effect of substrate texture on film properties. For the PEALD trimethylaluminum–ammonia films, the effects of process parameters, such as temperature, bias voltage, and plasma gas (ammonia versus N2/H2), on the AlN properties were studied. All the AlN films had a nominal thickness of 100 nm. Time-of-flight elastic recoil detection analysis showed the sputtered films t…
<title>Electrochromism of W-oxide-based films: some theoretical and experimental results</title>
1995
We survey some recent work related to electrochromic W-oxide-based thin films. The electronic structure of cubic (perovskite) WO3 and HWO3 was calculated from first principles. It was found, among other things, that hydroxide formation was energetically favored. Experimental studies were made on films prepared by reactive magnetron sputtering in Ar + O2 with and without CF4 addition and substrate bias. Structural studies by atomic force microscopy, x-ray diffraction, infrared reflectance spectroscopy, and Raman spectroscopy indicated that the electron bombardment associated with a positive substrate bias led to grain growth and partial crystallization while maintaining a high density of W e…
Characterization of structural, optical and electric properties of TiO2 thin films prepared by reactive DC magnetron sputtering.
2007
International audience