Search results for "sputtering"
showing 10 items of 136 documents
Curvature radius measurement by optical profiler and determination of the residual stress in thin films
2019
Abstract The Stoney formula, based on the measurement of the substrate curvature, is often used for the determination of the thin films' residual stress. In this study, titanium nitride coatings were deposited by DC reactive magnetron sputtering on silicon substrates. An optical profiler was used to determine the curvature of the surface before and after coating. Two radii were then obtained, along the principal perpendicular directions of the surface curvature. A simple and efficient method to determine the experimental error on the stress calculation was developed taking into account the film thickness dispersion and the radii dispersion. Using constant deposition parameters, some samples…
Fine plastic foil as backing for sputtered nickel targets
2013
Targets of 58Ni and 60Ni with areal density between 71 and 105 μg/cm2 backed with polyimide foil of 35–40 μg/cm2 were prepared by sputtering with Ar ions produced by a home made sputtering device at the Target Laboratory, University of Jyväskylä. The efficiency of the procedure was about 20 %.
Correlated effects of fluorine and hydrogen in fluorinated tin oxide (FTO) transparent electrodes deposited by sputtering at room temperature
2021
The optical and electrical properties of fluorinated tin oxide (FTO) films deposited at room temperature by sputtering have been investigated varying the fluorine content and the hydrogen atmosphere. The complex behavior of the obtained films is disclosed using a wide set of characterization techniques that reveals the combined effects of these two parameters on the generated defects. These defects control the electrical transport (carrier density, mobility and conductivity), the optical properties (band gap and defects-related absorption and photoluminescence) and finally promote the amorphization of the samples. H2 in the sputtering gas does not modify the H content in the films but induc…
Li intercalation in transparent Ti–Ce oxide films: Energetics and ion dynamics
1997
Films of Ti dioxide, mixed Ti–Ce oxide, and Ce dioxide were produced by reactive dc magnetron sputtering. Electrochemical lithiation was probed by chronopotentiometry, cyclic voltammetry together with optical transmittance recording, and impedance spectroscopy. Evidence was found for inserted electrons being accommodated in Ce 4f states; this contention was supported by preliminary results from x-ray absorption fine-structure spectroscopy. These electrons do not produce luminous electrochromism. The variation of the chemical diffusion coefficient of Li, with film composition and Li content, was also studied.
Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers
2013
International audience; Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the innovative technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Transmission Electron Microscopy (TEM) and Energy-dispersive X-ray (EDX) spectroscopy techniques. Moreover, electrical properties were also studied by the Van der Pauw technique.
Structural and electrical properties in tungsten/tungsten oxide multilayers
2014
International audience; Tungsten and tungsten oxide periodic nanometric multilayers have been deposited by DC reactive sputtering using the reactive gas pulsing process. Different pulsing periods have been used for each deposition to produce metal-oxide periodic alternations ranging from 3.3 to 71.5 nm. The morphology, crystallinity and chemical composition of these films have been investigated by transmission electron microscopy and energy-dispersive X-ray spectroscopy techniques. The produced multilayers exhibited an amorphous structure and the composition stability of WO3 sub-layers has been pointed out. Moreover, electrical properties have also been studied by the van der Pauw technique…
Phonon Bridge Effect in Superlattices of Thermoelectric TiNiSn/HfNiSn With Controlled Interface Intermixing
2020
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Structural analysis of W3O/WO3 and TiO/TiO2 periodic multilayer thin films sputter deposited by the reactive gas pulsing process
2012
International audience; DC reactive sputtering was used to deposit titanium and tungsten-based metal/oxide periodic nanometric multilayers using pure metallic targets and Ar + O-2 gas mixture as reactive atmosphere. The innovative technique namely, the reactive gas pulsing process allows switching between the metal and oxide to prepare a periodic multilayered structure with various metalloid concentrations and nanometric dimensions. The same pulsing period was used for each deposition to produce metal-oxide periodic alternations close to 10 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Raman spectroscopy, X-ray diffraction and Energ…
Porous structure of Purevision™ versus Focus® Night&Day™ and conventional hydrogel contact lenses
2002
The surface and bulk structures of hydrogel contact lenses that contain siloxane moieties, Purevision™ (balafilcon A) and Focus®Night&Day™ (lotrafilcon A), were investigated. Standard hydrogel lenses of low (Seequence®), medium (Acuvue®), and high water content (Precision UV®) were used as controls. All the lenses were dehydrated in a series of ethanol solutions of increased concentration, critical-point dried in CO2, and sputter coated with gold/palladium before they were examined by scanning electron microscopy. Of all lenses examined, only the balafilcon lenses presented, in addition to the polymer network porosity characteristic of all hydrogels, a macroporous structure that was observe…
Growth mechanism and transport properties of thin La0.67Ca0.33MnO3 films
1999
Abstract We prepared thin films of La 0.67 Ca 0.33 MnO 3 on different substrates with DC sputtering. The measured transport and magnetic properties could be explained by a lattice mismatch induced by the substrate. Hall effect measurements showed a holelike charge carrier density n * h = 1.3 per unit cell below T C . The magnetoresistance results from an increase of the mobility of the charge carriers in magnetic field.