6533b82efe1ef96bd1293498

RESEARCH PRODUCT

Characterization of a pulsed injection-locked Ti:sapphire laser and its application to high resolution resonance ionization spectroscopy of copper

M. ReponenIain MooreHideki TomitaSebastian RaederKlaus WendtVolker Sonnenschein

subject

Materials sciencespektroskopiaHigh resolutionchemistry.chemical_elementPhysics::Optics01 natural sciencesInjection lockedIndustrial and Manufacturing EngineeringNuclear magnetic resonance0103 physical sciencessapphire laser [Ti]Physics::Atomic Physics010306 general physicsSpectroscopyInstrumentation010308 nuclear & particles physicsbusiness.industryTi:sapphire laserCondensed Matter PhysicsCopperAtomic and Molecular Physics and OpticsCharacterization (materials science)laseritchemistryResonance ionizationresonance ionization spectroscopyOptoelectronicsbusiness

description

A high repetition rate pulsed Ti:sapphire laser injection-locked to a continuous wave seed source is presented. A spectral linewidth of 20 MHz at an average output power of 4W is demonstrated. An enhanced tuning range from 710-920 nm with a single broadband mirror set is realized by the inclusion of a single thin birefringent quartz plate for suppression of unseeded emission. The spectral properties have been analyzed using both a scanning Fabry-P´erot interferometer as well as crossed beam resonance ionization spectroscopy of the hyperfine levels of natural copper. Delayed ionization of the long-lived excited state is demonstrated for increased resolution. For the excited state hyperfine coupling constant of the 244 nm 4s 2S1/2 → 4s4p4P ◦ 1/2 ground-state transition in 63Cu, a factor of ten reduction in error compared to previous literature was achieved. The described laser system has been in operation at several radioactive ion beam facilities. peerReviewed

10.1088/1555-6611/aa7834http://dx.doi.org/10.1088/1555-6611/aa7834