Search results for " Phase"

showing 10 items of 1862 documents

Alumina particle reinforced TiO2 composite films grown by direct liquid injection MOCVD

2014

Abstract The use of a liquid injection delivery system to form composite films containing nanoparticles was investigated. Al 2 O 3 –TiO 2 films were grown on silicon substrates by direct liquid injection MOCVD (DLI-MOCVD) at 400 °C. The α-Al 2 O 3 nanoparticles (α-Al 2 O 3 NPs) dispersed in TiO 2 films resulted from co-deposition using colloidal α-Al 2 O 3 solution and titanium tetraisopropoxide as titanium precursor. Scanning electron microscopy coupled with EDS as well as Raman spectroscopy confirmed the presence of α-Al 2 O 3 NPs aggregates embedded in the TiO 2 matrix. The liquid injection system coupled with CVD technique can be promising to form composite films containing preformed na…

Materials scienceSiliconScanning electron microscopeComposite numberNanoparticlechemistry.chemical_elementNanotechnologyCondensed Matter PhysicsSurfaces Coatings and Filmssymbols.namesakeChemical engineeringchemistrysymbolsParticleMetalorganic vapour phase epitaxyRaman spectroscopyInstrumentationTitaniumVacuum
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Correlation Between the Electrical Properties and the Morphology of Low-Pressure MOCVD Titanium Oxynitride Thin Films Grown at Various Temperatures

2000

Titanium oxynitride (TiN x O y ) thin films were deposited by low-pressure metal-organic CVD (LP-MOCVD) on (100) silicon, sapphire, and polycrystalline alumina substrates. Titanium isopropoxide (TIP) and ammonia were used as precursors. The influence of the growth temperature, ranking from 450°C to 750°C, was investigated by scanning electron microscopy (SEM), and electrical DC measurements. Rutherford back-scattering (RBS) measurements were used to determine the N/O ratio in the films. The surface observations of the deposited films showed two morphological transitions. The resistivity decreased with the growth temperature, while the nitrogen content increased. Moreover, for the highest de…

Materials scienceSiliconScanning electron microscopeProcess Chemistry and TechnologyAnalytical chemistrychemistry.chemical_elementMineralogySurfaces and InterfacesGeneral Chemistryequipment and supplieschemistry.chemical_compoundchemistryElectrical resistivity and conductivitySapphireMetalorganic vapour phase epitaxyTitanium isopropoxideThin filmTitaniumChemical Vapor Deposition
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First InGaN/GaN thin Film LED using SiCOI engineered substrate

2006

InGaN / GaN multiple quantum well (MQW) light emitting diodes (LEDs) were deposited by metal-organic chemical vapor deposition (MOCVD) onto SiCOI engineered substrates. SiCOI substrates are composed of SiC thin film transferred on a silicon substrate through silicon oxide layer by the Smart Cut™ technology. LEDs structures grown on SiCOI were characterized, then transferred onto Si substrates via a metallic bonding process and SiCOI substrates were removed. Three different metallic stacks were used for metallic bonding, including mirror and barrier diffusion. Vertical thin film LED obtained were characterized and showed a 2 to 3 times increase of external quantum efficiency. These results d…

Materials scienceSiliconbusiness.industrychemistry.chemical_elementChemical vapor depositionGallium nitrideCondensed Matter PhysicsSettore ING-INF/01 - ElettronicaLight emitting diodeslaw.inventionchemistrylawOptoelectronicsQuantum efficiencyInGaN/GaN LEDs SiCOI technologyMetalorganic vapour phase epitaxyThin filmbusinessSilicon oxideLight-emitting diodeMetallic bondingefficiency LEE
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Initial stages of TiO2 thin films MOCVD growth studied by in situ surface analyses

2005

Abstract In situ chemical surface analyses using X-ray photoelectron spectroscopy (XPS) were performed to understand the initial stages of TiO 2 thin-film MOCVD growth. Deposits on Si (1 0 0), a few nanometres thick, were obtained at a fixed temperature of 650 °C and for two different pressures, 2.9 and 0.05 mbar, using titanium tetraisopropoxide (TTIP) as precursor. Pressure lowering led to a higher deposit growth rate. Reduction of titanium with respect to stoichiometric titanium dioxide and oxidation of the wet-cleaned silicon substrate are observed from decomposition of the Ti 2p and Si 2p peaks. The formation of a TiSi x O y mixed oxide is also pointed out and confirmed by the presence…

Materials scienceSilicontechnology industry and agricultureAnalytical chemistrychemistry.chemical_elementSubstrate (electronics)Condensed Matter PhysicsInorganic Chemistrychemistry.chemical_compoundchemistryX-ray photoelectron spectroscopyTitanium dioxideMaterials ChemistryMixed oxideMetalorganic vapour phase epitaxyThin filmTitaniumJournal of Crystal Growth
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EPR study of Ce3+ luminescent centers in the Y2SiO5 single crystalline films

2017

Abstract The work reports results of EPR investigation of the Ce3+ incorporation in the Y2SiO5 and (Y,La)2SiO5 single crystalline films (SCFs), grown by liquid phase epitaxy method. The Ce3+ content determined from EPR spectra varied between 0.49 and 0.65 at. % in Y2SiO5 SCFs and strongly increased up to 1.9 at. % in (Y,La)2SiO5 SCF, suggesting a positive role of the La dopant in the incorporation of the Ce3+ ions into Y2SiO5 host. The EPR study showed the presence of only one type of Ce3+ centers (Ce1) corresponding to the localization of Ce3+ ions in the seven–fold coordinated positions of the Y2SiO5 host. No Ce2 center spectra (six-fold coordinated Ce3+ positions) were detected in films …

Materials scienceSingle crystalline filmsAnalytical chemistryLiquid phase02 engineering and technologyEpitaxy01 natural sciencesSpectral linelaw.inventionIonInorganic Chemistrylaw0103 physical sciencesElectrical and Electronic EngineeringPhysical and Theoretical ChemistryElectron paramagnetic resonanceSpectroscopy010302 applied physicsOrthosilicatesLiquid phase epitaxyDopantCe3+ dopantOrganic Chemistry021001 nanoscience & nanotechnologyAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic MaterialsCrystallographyEPR0210 nano-technologyLuminescenceOptical Materials
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Lattice-Site-Specific Spin Dynamics in Double PerovskiteSr2CoOsO6

2014

Magnetic properties and spin dynamics have been studied for the structurally ordered double perovskite Sr2CoOsO6. Neutron diffraction, muon-spin relaxation, and ac-susceptibility measurements reveal two antiferromagnetic (AFM) phases on cooling from room temperature down to 2 K. In the first AFM phase, with transition temperature TN1=108  K, cobalt (3d7, S=3/2) and osmium (5d2, S=1) moments fluctuate dynamically, while their average effective moments undergo long-range order. In the second AFM phase below TN2=67  K, cobalt moments first become frozen and induce a noncollinear spin-canted AFM state, while dynamically fluctuating osmium moments are later frozen into a randomly canted state at…

Materials scienceSpin dynamicsCondensed matter physicsTransition temperatureNeutron diffractionGeneral Physics and Astronomychemistry.chemical_element02 engineering and technology021001 nanoscience & nanotechnology01 natural sciencesCondensed Matter::Materials Sciencechemistry.chemical_compoundchemistryLattice (order)0103 physical sciencesAntiferromagnetismCondensed Matter::Strongly Correlated ElectronsOsmium010306 general physics0210 nano-technologyCobaltAFm phasePhysical Review Letters
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Angle resolved X-ray photoemission spectroscopy double layer model for in situ characterization of metal organic chemical vapour deposition nanometri…

2007

International audience; In situ Angle Resolved X-ray Photoemission Spectroscopy (ARXPS) characterizations of TiO2 thin films grown on silicon by Metal Organic Chemical Vapour Deposition were performed in order to get information on interfacial reactions at the first stages of the growth, one of the aims being to understand the influence of deposition conditions. Thickness measurements were also carried out from ARXPS analyses. As the real structure of the films was shown to be a double layer system such as TiO2/SiO2/Si, an ARXPS model of thickness and surface coverage determination was applied to each layer independently. However, the application of this model to very thin films underestima…

Materials scienceThickness measurementSiliconPhotoemission spectroscopyAnalytical chemistrychemistry.chemical_elementARXPS02 engineering and technologySubstrate (electronics)Chemical vapor deposition01 natural sciences0103 physical sciencesMaterials ChemistryTiO2Metalorganic vapour phase epitaxyThin filmThin filmSilicon oxide010302 applied physicsMetals and AlloysSurfaces and InterfacesInterface021001 nanoscience & nanotechnologySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialschemistryMOCVD0210 nano-technologyLayer (electronics)
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Anisotropic and non-heterogeneous continuum percolation in titanium oxynitride thin columnar films

2002

International audience; We report the percolation behaviour of the conductivity of titanium oxynitride films grown by low-pressure metal-organic chemical vapour deposition, composed of TiNxOy mixed with TiO2. The usual DC parameters (t, s and Φc), obtained from the effective media theory equations, are compared to the universal values (s = sun while t < tun because of the film anisotropy). This is the first example of an electrical continuum percolation applied to columnar films with chemically similar conducting and insulating units (non-heterogeneous percolation) whose mixing is based upon the growth temperature during the film growth.

Materials scienceThin filmsMineralogychemistry.chemical_element02 engineering and technologyChemical vapor depositionConductivityNitride01 natural sciencesOxynitrideCondensed Matter::Materials ScienceElectrical resistivity and conductivityCondensed Matter::Superconductivity0103 physical sciencesChemical vapor depositionGeneral Materials ScienceMetalorganic vapour phase epitaxyThin film010306 general physicsAnisotropyTitaniumConductivityLow pressureCondensed matter physicsPercolation[CHIM.MATE]Chemical Sciences/Material chemistry021001 nanoscience & nanotechnologyCondensed Matter Physicschemistry[ CHIM.MATE ] Chemical Sciences/Material chemistry0210 nano-technologyTitanium
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Prediction of phase transformation of Ti-6Al-4V titanium alloy during hot-forging processes using a numerical model

2013

In this article numerical model for prediction of phase evolution of Ti-6Al-4V titanium alloy was presented. In particular, attention was focused on alpha to beta and beta to alpha+beta phase transformations. The analysis was conducted using a commercial implicit finite element method code, considering the data and the parameters of a real case study to check the quality of the numerical model. The alpha to beta transformation was developed using the simplified form of the Avrami model and the beta to alpha+beta transformation was controlled through the generalized Avrami model. The model so-thought has been used to conduct a 2D simulation of a forging process. A comparison between the num…

Materials scienceTransformation (function)Mechanical EngineeringBeta phasePhase (matter)MetallurgyTitanium alloyTitanium alloys DEFORM2D Ti-6Al-4V phase transformationGeneral Materials ScienceBeta (velocity)Ti 6al 4vPhase evolutionForging
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Supramolecular self-assembling in mesostructured materials through charge tuning in the inorganic phase

1998

Supramolecular self-assembling of organic CTA+ micelles and inorganic [VO(H2O)PO4]n^q-2 2D-anions for the isolation of hexagonal mesostructured materials can be reached by charge tuning in the inorganic phase through the adjustment of the vanadium mean oxidation state. El Haskouri, Jamal, Jamal.Haskouri@uv.es ; Cabrera Medina, Saul, Saul.Cabrera@uv.es ; Beltran Porter, Aurelio, Aurelio.Beltran@uv.es ; Alamo Serrano, Jaime, Jaime.Alamo@uv.es ; Beltran Porter, Daniel, Daniel.Beltran@uv.es ; Amoros del Toro, Pedro Jose, Pedro.Amoros@uv.es

Materials scienceUNESCO::QUÍMICASupramolecular chemistryInorganic PhaseVanadiumchemistry.chemical_elementSupramolecular ; Self-assemblig ; Mesostructured ; Inorganic Phase ; Oxidation:QUÍMICA [UNESCO]MicelleCatalysisOxidation statePhase (matter)SupramolecularSelf-assembligMesostructuredOxidationSelf assemblingMaterials ChemistryHexagonal crystal systemMetals and AlloysCharge (physics)General ChemistryUNESCO::QUÍMICA::Química macromolecularSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCrystallographyChemical engineeringchemistryCeramics and Composites:QUÍMICA::Química macromolecular [UNESCO]
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