Search results for "ALLOYS"

showing 10 items of 1689 documents

Biomimetic chitosan-mediated synthesis in heterogeneous phase of bulk and mesoporous silica nanoparticles

2009

Both bulk and mesoporous silica nanoparticles can be obtained in the form of granular aggregates using chitosan flakes as additive under very soft biomimetic reaction conditions. Puchol Estors, Victoria, Victoria.Puchol@uv.es ; El Haskouri, Jamal, Jamal.Haskouri@uv.es ; Latorre Saborit, Julio, Julio.Latorre@uv.es ; Beltran Porter, Aurelio, Aurelio.Beltran@uv.es ; Beltran Porter, Daniel, Daniel.Beltran@uv.es ; Amoros del Toro, Pedro Jose, Pedro.Amoros@uv.es

Materials scienceSilicon dioxideUNESCO::QUÍMICANanoparticleNanotechnologyBulk:QUÍMICA [UNESCO]CatalysisChitosanchemistry.chemical_compoundMicroscopy Electron TransmissionBiomimeticsPhase (matter)Materials ChemistryReaction conditionsChitosanUNESCO::QUÍMICA::Química inorgánicaMesoporus silicaMetals and AlloysGeneral ChemistryMesoporous silica:QUÍMICA::Química inorgánica [UNESCO]Silicon DioxideSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialschemistryMicroscopy Electron ScanningCeramics and CompositesNanoparticlesBiomimeticBulk ; Mesoporus silica ; Biomimetic ; Nanoparticles ; ChitosanChemical Communications
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Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

2012

Abstract Ru thin films were grown on hydrogen terminated Si, SiO 2 , Al 2 O 3 , HfO 2 , and TiO 2 surfaces by atomic layer deposition from bis(2,5-dimethylpyrrolyl)ruthenium precursor and oxygen. The 4–20 nm thick films on these surfaces consisted of nanocrystalline hexagonal metallic ruthenium, regardless of the deposition temperature. At the lowest temperatures examined, 250–255 °C, the growth of the Ru films was favored on silicon, compared to the growth on Al 2 O 3 , TiO 2 and HfO 2 . At higher temperatures the nucleation and growth of Ru became enhanced in particular on HfO 2 , compared to the process on silicon. At 320–325 °C, no growth occurred on Si–H and SiO 2 -covered silicon. Res…

Materials scienceSiliconHydrogenNucleationchemistry.chemical_elementNanotechnology02 engineering and technology01 natural sciencesMetalAtomic layer deposition0103 physical sciencesMaterials ChemistryThin filmta116010302 applied physicsta114Metals and AlloysSurfaces and Interfaces021001 nanoscience & nanotechnologyNanocrystalline materialSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsRutheniumchemistryChemical engineeringvisual_artvisual_art.visual_art_medium0210 nano-technologyThin Solid Films
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Electronic structure of poly(p-(disilanylene)phenylene)

1996

Abstract We present the geometrical and electronic structures of several isomers of poly(p-(disilanylene)phenylene), The structural analysis, performed at the 3-21G* level, shows that the isomers with the phenylene group perpendicular to the silicon backbone are the more stable conformations, displaying almost the same energy. The electronic properties, as obtained from the valence-effective Hamiltonian (VEH) band structure calculations, strongly depend on the disposition of the phenylene group into the polymeric backbone. The VEH predicts a wide and asymmetric absorption band in excellent agreement with UV experimental data.

Materials scienceSiliconMechanical EngineeringMetals and Alloyschemistry.chemical_elementElectronic structureCondensed Matter PhysicsElectronic Optical and Magnetic Materialssymbols.namesakeCrystallographychemistryMechanics of MaterialsAbsorption bandPhenylenePolymer chemistryPhysics::Atomic and Molecular ClustersMaterials ChemistrysymbolsElectronic band structureHamiltonian (quantum mechanics)Electronic propertiesSynthetic Metals
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Detection and quantification of lung cancer biomarkers by a micro-analytical device using a single metal oxide-based gas sensor

2018

International audience; The analysis of exhaled volatile organic compounds (VOCs) related to lung cancer is a very promising wayin medical diagnosis because it is non-invasive and much less expensive than traditional medical analysisused so far. In that sense, a silicon micro-analytical platform consisting of a micro-preconcentrator cou-pled to a silicon spiral gas chromatographic micro-column was built, and a metal oxide-based gas sensorwas used as a miniaturized gas detector. This micro-fabricated device was successfully tested to selec-tively detect low concentrations of VOCs considered as lung cancer biomarkers, within a few minuteseven in presence of high concentrations of water vapor …

Materials scienceSiliconOxidechemistry.chemical_element02 engineering and technology01 natural sciences[SPI.MAT]Engineering Sciences [physics]/MaterialsMetalchemistry.chemical_compoundMaterials ChemistrymedicineGas detectorElectrical and Electronic Engineering[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsLung cancerInstrumentationVolume concentration[SPI.ACOU]Engineering Sciences [physics]/Acoustics [physics.class-ph]Chromatography010401 analytical chemistrytechnology industry and agricultureMetals and Alloys021001 nanoscience & nanotechnologyCondensed Matter Physicsmedicine.disease0104 chemical sciences3. Good healthSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialschemistryvisual_artCarbon dioxidevisual_art.visual_art_medium0210 nano-technologyWater vapor
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Effect of germanium addition on the properties of reactively sputtered ZrN films

2005

For the first time, Zr-Ge-N films were deposited on silicon and steel substrates by sputtering a Zr-Ge composite target in reactive Ar-N2 mixture. The films were characterised by electron probe microanalysis, X-ray diffraction, micro-Raman spectroscopy and depth-sensing indentation. The effects of the Ge content and substrate bias voltage on the films' structure, internal stress, hardness and oxidation resistance were investigated. Substrate bias strongly influenced the chemical composition of the films being observed by means of a steep decrease in the Ge content for negative bias voltages higher than -80 V. In these cases, a significant hardness improvement was registered. For -100 V bias…

Materials scienceSiliconReactive sputteringMetals and Alloyschemistry.chemical_elementMineralogyGermaniumSurfaces and InterfacesSubstrate (electronics)Surfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAmorphous solidTetragonal crystal systemchemistryHardnessSputteringOxidationCavity magnetronMaterials ChemistryCubic zirconiaComposite materialThin Solid Films
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Nanostructural depth-profile and field-effect properties of poly(alkoxyphenylene-thienylene) Langmuir-Schäfer thin-films

2008

The correlations between morphological features and field-effect properties of poly(alkoxyphenylene-thiophene) thin Langmuir–Schafer film deposited on differently terminated gate dielectric surfaces, namely bare and methyl functionalized thermal silicon dioxide (t-SiO2), have been systematically studied. The film morphology has been investigated at different film thickness by Scanning Force Microscopy. Films thicker than a few layers show comparable morphology on both dielectric surfaces while differences are seen for the ultra-thin polymer deposit in close proximity to the substrate. Such deposit is notably more heterogeneous on bare t-SiO2, while a more compact and uniform nanogranular st…

Materials scienceSiliconSilicon dioxideGate dielectricField effectchemistry.chemical_elementConducting polymersNanotechnologySubstrate (electronics)Dielectricchemistry.chemical_compoundMaterials ChemistryComposite materialThin filmConductive polymerLangmuir-Schäfer organic thin-filmsOrganic–inorganic interfaceConducting polymers; Langmuir-Schäfer organic thin-films; Organic field effect transistors; Organic-inorganic interfaceOrganic-inorganic interfaceConducting polymerLangmuir–Schäfer filmMetals and AlloysSurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialstransistors thin films nanotechnology Langmuir-ShaeferchemistryOrganic field effect transistorsOrganic field effect transistor
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Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

2014

In this paper, we report ALD deposition of silicon dioxide using either thermal or plasma enhanced atomic layer deposition (PEALD). Several aminosilanes with differing structures and reactivity were used as silicon precursors in R&D single wafer ALD tools. One of the precursors was also tested on pilot scale batch ALD using O3 as oxidant and with substrates measuring 150 × 400 mm. The SiO2 film deposition rate was greatly dependent on the precursors used, highest values being 1.5-2.0 Å/cycle at 30-200°C for one precursor with an O2 plasma. According to time-of-flight-elastic recoil detection analysis measurements carbon and nitrogen impurities were relatively low, but hydrogen content i…

Materials scienceSiliconSilicon dioxideta221Conformal coatingAnalytical chemistrychemistry.chemical_elementchemistry.chemical_compoundAtomic layer depositionMaterials ChemistryAtomic layer epitaxySilicon dioxideta318Thin filmta216ta116Plasma processingplasma-enhanced atomic layer depositionPlasma-enhanced atomic layer depositionsilicon dioxideconformal coatingta213ta114Atomic layer depositionbatch depositionIon platingMetals and AlloysPrecursorsSurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialschemistryatomic layer depositionprecursorsBatch depositionDeposition (chemistry)
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Design of siliceous lignins – Novel organic/inorganic hybrid sorbent materials

2009

Novel nanoporous lignin(lignocellulose)/SiO2 hybrid materials were designed using the sol–gel process. X-ray photoelectronic spectroscopy, Fourier transform infrared spectroscopy and 29Si and 13C nuclear magnetic resonance spectroscopy were applied to characterize the hybrids’ surface and bulk structure. Nitrogen and water vapor sorption were used for assessment of porous structure parameters and hydrophobization of matrices, respectively. The efficiency of the hybrid materials obtained was proved by adsorption tests with potential inorganic (Cu2+) and organic (2,4-dichlorophenoxyacetic acid) pollutants.

Materials scienceSorbentNanoporousMechanical EngineeringInorganic chemistryMetals and AlloysSorptionCondensed Matter PhysicsAdsorptionMechanics of MaterialsSurface modificationGeneral Materials ScienceFourier transform infrared spectroscopySpectroscopyHybrid materialScripta Materialia
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Preparation of Heusler thin films: The quaternary alloy CO2Fe0.5Mn0.5Si

2008

In this work the basic strategies for the preparation of CO2Mn0.5Fe0.5Si as an example for Heusler alloy thin films will be described. Texture and magnetic properties of these films will be discussed, especially with regard to different buffer layers and annealing temperatures. Finally, we will show the integration of Heusler thin films into magnetic tunnel junctions (MTJs) and calculate the effective spin polarization. (c) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

Materials scienceSpin polarizationCondensed matter physicsAnnealing (metallurgy)MetallurgyAlloyIron alloysSurfaces and Interfacesengineering.materialCondensed Matter PhysicsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsTunnel junctionMaterials ChemistryengineeringQuaternary alloyCathode sputteringElectrical and Electronic EngineeringThin film
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Influence of iron non-stoichiometry on spinel zinc ferrite gas sensing properties

2012

Abstract It is demonstrated for the first time that the gas sensing properties of a spinel ferrite complex metal oxide semiconductor can be improved by controlling iron stoichiometry. Conductivity and sensitivity was analyzed for ZnFe2+zO4± spinel type ferrite with z from −0.01 to 0.15. By increasing iron content from z = −0.01 to z = 0.1, sensitivity increases up to 3 times but for samples with z > 0.1 sensitivity drops. It was observed from impedance spectroscopy measurements that resistance decreases with an increase of the iron content. Complex impedance spectra reveal two phases with different resistance attributed to depletion layer (Rd) and bulk (Rb). With increasing iron content inc…

Materials scienceSpinelMetals and AlloysAnalytical chemistrychemistry.chemical_elementMineralogyengineering.materialCondensed Matter PhysicsOxygenSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsDielectric spectroscopyMetalZinc ferritechemistryDepletion regionvisual_artFerrite (iron)Materials Chemistryvisual_art.visual_art_mediumengineeringElectrical and Electronic EngineeringInstrumentationStoichiometrySensors and Actuators B: Chemical
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