Search results for "Applied Physics"

showing 10 items of 1226 documents

HCl gas gettering of low-cost silicon

2013

HCl gas gettering is a cheap and simple technique to reduce transition metal concentrations in silicon. It is attractive especially for low-cost silicon materials like upgraded metallurgical grade (UMG) silicon, which usually contain 3d transition metals in high concentrations. Etching of silicon by HCl gas occurs during HCl gas gettering above a certain onset temperature. The etching rate as well as the gettering efficiency was experimentally determined as a function of the gettering temperature, using UMG silicon wafers. The activation energy of the etching reaction by HCl gas was calculated from the obtained data. The gettering efficiency was determined by analyzing Ni as a representativ…

010302 applied physicsMaterials scienceSiliconEtching rateInorganic chemistrychemistry.chemical_element02 engineering and technologySurfaces and InterfacesActivation energy021001 nanoscience & nanotechnologyCondensed Matter Physics7. Clean energy01 natural sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialschemistryTransition metalGetterEtching (microfabrication)0103 physical sciencesMaterials ChemistryWaferElectrical and Electronic Engineering0210 nano-technologyInductively coupled plasma mass spectrometryphysica status solidi (a)
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Modelling of thermal field and point defect dynamics during silicon single crystal growth using CZ technique

2018

Abstract Silicon single crystal growth by the Czochralski (CZ) technique is studied numerically using non-stationary mathematical models which allow to predict the evolution of the CZ system in time, including Dash neck, cone and cylindrical growth stages. The focus is on the point defect dynamics, also considering the effect of the thermal stresses. During the cylindrical stage, the crystal pull rate is temporarily reduced as in experiments by Abe et al. The crystal radius and heater power change is explicitly considered in the calculations for crystal diameters of 50, 100 and 200 mm and the agreement with experiments is discussed.

010302 applied physicsMaterials scienceSiliconField (physics)Mathematical modelchemistry.chemical_element02 engineering and technologyRadiusMechanics021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesInorganic ChemistryCrystalchemistry0103 physical sciencesThermalMaterials ChemistryPoint (geometry)0210 nano-technologyFocus (optics)Journal of Crystal Growth
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3D modeling of growth ridge and edge facet formation in 〈100〉 floating zone silicon crystal growth process

2019

Abstract A 3D quasi-stationary model for crystal ridge formation in FZ crystal growth systems for silicon is presented. Heat transfer equations for the melt and crystal are solved, and an anisotropic crystal growth model together with a free surface shape solver is used to model the facet growth and ridge formation. The simulation results for 4″ and 5″ crystals are presented and compared to experimental ridge shape data.

010302 applied physicsMaterials scienceSiliconPhysics::Opticschemistry.chemical_elementCrystal growthGeometry02 engineering and technologyEdge (geometry)021001 nanoscience & nanotechnologyCondensed Matter PhysicsRidge (differential geometry)01 natural sciencesInorganic ChemistryMonocrystalline siliconCrystalchemistryCondensed Matter::SuperconductivityFree surface0103 physical sciencesMaterials ChemistryFacet0210 nano-technologyJournal of Crystal Growth
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Effect of process parameters and crystal orientation on 3D anisotropic stress during CZ and FZ growth of silicon

2017

Abstract Simulations of 3D anisotropic stress are carried out in and oriented Si crystals grown by FZ and CZ processes for different diameters, growth rates and process stages. Temperature dependent elastic constants and thermal expansion coefficients are used in the FE simulations. The von Mises stress at the triple point line is ~5–11% higher in crystals compared to crystals. The process parameters have a larger effect on the von Mises stress than the crystal orientation. Generally, the crystal has a higher azimuthal variation of stress along the triple point line (~8%) than the crystal (~2%). The presence of a crystal ridge increases the stress beside the ridge and decreases it on the ri…

010302 applied physicsMaterials scienceSiliconTriple pointPhysics::Opticschemistry.chemical_element02 engineering and technology021001 nanoscience & nanotechnologyCondensed Matter PhysicsRidge (differential geometry)01 natural sciencesThermal expansionInorganic ChemistryStress (mechanics)CrystalCrystallographychemistryCondensed Matter::Superconductivity0103 physical sciencesMaterials Chemistryvon Mises yield criterionComposite material0210 nano-technologyLine (formation)Journal of Crystal Growth
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Temperature Dependent Suns-V<inf>oc</inf> of Multicrystalline Silicon Solar Cells from Different Ingot Positions

2018

This paper presents temperature dependent Suns- Voc measurements on multicrystalline silicon cells originating from different ingot positions. The effective lifetime is found to increase for all cells when the temperature is increased from 25°C to 6°C. However, cells from the top of the ingot show a considerably larger increas 40–50% for illumination conditions of 0.1-1 Sun, compared to an increase of 20-30% observed for cells from the bottom. The decrease in Voc with increasing temperature is found to be lower for cells from the top of the ingot compared to cells from the bottom. The temperature coefficient of the Voc is found to vary 5% along the ingot at 1 Sun, highlighting the influence…

010302 applied physicsMaterials scienceSiliconbusiness.industry020209 energyPhotovoltaic systemchemistry.chemical_element02 engineering and technologySuns in alchemy01 natural sciencesTemperature measurementchemistry0103 physical sciences0202 electrical engineering electronic engineering information engineeringOptoelectronicsIngotbusinessTemperature coefficientSensitivity (electronics)2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC)
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Mathematical modelling of the feed rod shape in floating zone silicon crystal growth

2017

Abstract A three-dimensional (3D) transient multi-physical model of the feed rod melting in the floating zone (FZ) silicon single-crystal growth process is presented. Coupled temperature, electromagnetic (EM), and melt film simulations are performed for a 4 inch FZ system, and the time evolution of the open melting front is studied. The 3D model uses phase boundaries and parameters from a converged solution of a quasi-stationary axisymmetric (2D) model of the FZ system as initial conditions for the time dependent simulations. A parameter study with different feed rod rotation, crystal pull rates and widths of the inductor main slit is carried out to analyse their influence on the evolution …

010302 applied physicsMaterials scienceSiliconbusiness.industryRotational symmetryTime evolutionPhase (waves)chemistry.chemical_element010103 numerical & computational mathematicsMechanicsCondensed Matter PhysicsRotation01 natural sciencesCondensed Matter::Soft Condensed MatterInorganic ChemistryMonocrystalline siliconCrystalOpticschemistry0103 physical sciencesMaterials ChemistryTransient (oscillation)0101 mathematicsbusinessJournal of Crystal Growth
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Validation of a 3D mathematical model for feed rod melting during floating zone Si crystal growth

2019

Abstract A mathematical model of global 3D heat transfer in floating zone silicon single crystal growth process is used to predict the shape of the open melting front of the feed rod. The model is validated using measurement data from research-scale growth experiments. Shape profiles of the open melting front are obtained from the feed rod leftover using a movable dial gauge. Azimuthal asymmetry of the rim of the open melting front is revealed in both simulations and measurements, quantitatively indicating the influence of the main slit of the inductor.

010302 applied physicsMaterials scienceSilicondigestive oral and skin physiologyProcess (computing)chemistry.chemical_elementCrystal growth02 engineering and technologyMechanicsGauge (firearms)021001 nanoscience & nanotechnologyCondensed Matter PhysicsInductor01 natural sciencesInorganic ChemistryDialAzimuthal asymmetrychemistry0103 physical sciencesHeat transferMaterials Chemistrysense organs0210 nano-technologyJournal of Crystal Growth
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XUV diagnostic to monitor H-like emission from B, C, N, and O for the W7-X stellarator

2019

The “C/O Monitor” system for the Wendelstein 7-X (W7-X) stellarator is a dedicated spectrometer with high throughput and high time resolution (order of 1 ms) for fast monitoring of content of low-Z impurities in the plasma. The observed spectral lines are fixed to Lyman-α lines of H-like atoms of carbon (3.4 nm), oxygen (1.9 nm), nitrogen (2.5 nm), and boron (4.9 nm). The quality of the wall condition will be monitored by the measurements of oxygen being released from the walls during the experiments. The strong presence of carbon is an indication for enhanced plasma-wall interaction or overload of plasma facing components. The presence of nitrogen (together with oxygen) may indicate a poss…

010302 applied physicsMaterials scienceSpectrometerAnalytical chemistrychemistry.chemical_element01 natural sciencesNitrogenOxygenSpectral line010305 fluids & plasmaslaw.inventionchemistryImpuritylaw0103 physical sciencesPlasma diagnosticsBoronInstrumentationStellarator
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Choice of the detectors for light impurities plasma studies at W7-X using ‘CO Monitor’ system

2019

Abstarct The ‘CO Monitor’ is a new spectrometer system dedicated for the continuous measurements of line intensities of carbon, oxygen, boron and nitrogen at the fusion plasma experiment Wendelstein 7-X (W7-X). Its main purpose is to deliver constant information about indicated elements with high time resolution (better than 1 ms), but low spatial resolution since the line shapes are not going to be investigated. The system consists of four independent channels, each equipped with dispersive element dedicated for measurement of selected line of interest. In order to perform the highest efficiency of the ‘CO Monitor’ system, it is essential to choose the proper detector type for this task. T…

010302 applied physicsMaterials scienceSpectrometerbusiness.industryMechanical EngineeringDetectorPhase (waves)PlasmaElectronXUVDetectorsWendelstein 7-XStellarator01 natural sciencesLine (electrical engineering)010305 fluids & plasmasOpticsNuclear Energy and Engineering0103 physical sciencesGeneral Materials SciencebusinessSensitivity (electronics)Image resolutionCivil and Structural EngineeringFusion Engineering and Design
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Thermal stability of magnetic characteristics of Co/Ag/Fe and Co/Ag/Fe20Ni80 spin-valve structures

2017

Abstract We investigated the thermal stability of magnetic characteristics of Co/Ag/Fe and Co/Ag/Fe 20 Ni 80 spin-valve structures. Thin film systems were obtained with the help of sputtering method. For the first type of systems two particular thicknesses ( d ML  = 3 and 20 nm) and different disposition of magnetic layers (ML) were used. For the second type different thickness of Ag ( d NML ) spacer layer was used. The research of the crystal structure was performed with the transmission electron microscope. The results demonstrate that every investigated as-deposited sample does not include solid solutions, intermetallic compounds or impurities. It has been found that among the spin-valve…

010302 applied physicsMaterials scienceSpin valveIntermetallicAnalytical chemistry02 engineering and technologyCoercivity021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesSurfaces Coatings and FilmsNuclear magnetic resonanceImpuritySputtering0103 physical sciencesThermal stabilityThin film0210 nano-technologyInstrumentationSolid solutionVacuum
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