Search results for "ICO"

showing 10 items of 30544 documents

Parasitic Bipolar Action in SiC Power MOSFETs Demonstrated by Two-Photon Laser Experiment

2018

A two-photon absorption technique is explored for Silicon carbide power MOSFETs and power junction barrier Schottky diodes using a pulsed laser. The similarities in design between the specific MOSFETs and diodes tested permit using mechanisms existing in the different structures as explanation for observed current variation with laser position. The diode shows variation in average current with change in laser depth only, whereas the MOSFET shows variation both with shifts in depth and shifts in position across the striped geometry of the device. The variation is explained to be due to bipolar amplification of the charge carriers generated in the MOSFET when a pulse focus includes a channel …

010302 applied physicsMaterials science010308 nuclear & particles physicsbusiness.industrySchottky diodeLaser01 natural scienceslaw.inventionchemistry.chemical_compoundchemistrylawLogic gate0103 physical sciencesMOSFETSilicon carbideOptoelectronicsCharge carrierPower MOSFETbusinessDiode2018 18th European Conference on Radiation and Its Effects on Components and Systems (RADECS)
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Structural and morphological characterization of the Cd-rich region in Cd1-xZnxO thin films grown by atmospheric pressure metal organic chemical vapo…

2019

Abstract We have analysed the growth, morphological and structural characterization of Cd1-xZnxO thin films grown on r-sapphire substrates by atmospheric pressure metal organic chemical vapour deposition, mainly focusing on the Cd-rich rock-salt phase for its promising optical and technological applications. The evolution of the surface morphology and crystalline properties as a function of Zn content has been studied by means of high resolution x-ray diffraction and electron microscopy techniques. Monocrystalline (002) single-phase cubic films were obtained with Zn contents up to 10.4%, and with a low density of dislocations as a consequence of the optimized crystal growth process. Particu…

010302 applied physicsMaterials scienceAtmospheric pressureAlloyMetals and AlloysCrystal growth02 engineering and technologySurfaces and InterfacesChemical vapor depositionengineering.material021001 nanoscience & nanotechnology01 natural sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsMonocrystalline siliconChemical engineeringPhase (matter)0103 physical sciencesMaterials ChemistryengineeringThin film0210 nano-technologyWurtzite crystal structureThin Solid Films
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High-pressure study of the infrared active modes in wurtzite and rocksalt ZnO

2011

International audience; We present a high-pressure study of ZnO carried out in the mid- to far-infrared frequency domain with the aim of characterizing the optic modes of wurtzite and rocksalt ZnO. We obtained the pressure coefficients of the E1(TO), E1(LO), A1(TO), and A1(LO) modes of the low-pressure wurtzite phase and compare them with previous Raman measurements. The optical modes of the high-pressure rocksalt phase are infrared active, so we were able to determine their wave numbers and pressure dependencies. In the wurtzite phase, high pressure induces a slight decrease in both longitudinal and transverse effective charges. The decrease is more pronounced in the rocksalt phase.

010302 applied physicsMaterials scienceCondensed matter physicsInfraredbusiness.industry02 engineering and technology021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesElectronic Optical and Magnetic MaterialsTransverse planesymbols.namesakeSemiconductorOpticsFrequency domainPhase (matter)[PHYS.COND.CM-GEN]Physics [physics]/Condensed Matter [cond-mat]/Other [cond-mat.other]0103 physical sciencessymbolsPACS : 78.30.Fs 64.70.kgWavenumber0210 nano-technologyRaman spectroscopybusinessWurtzite crystal structure
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Optimization of physicochemical and optical properties of nanocrystalline TiO 2 deposited on porous silicon by metal-organic chemical vapor depositio…

2020

International audience; Titanium dioxide (TiO2) is very employed in solar cells due to its interesting physicochemical and optical properties allowing high device performances. Considering the extension of applications in nanotechnologies, nanocrystalline TiO2 is very promising for nanoscale components. In this work, nanocrystalline TiO2 thin films were successfully deposited on porous silicon (PSi) by metal organic chemical vapor deposition (MOCVD) technique at temperature of 550°C for different periods of times: 5, 10 and 15 min. The objective was to optimize the physicochemical and optical properties of the TiO2/PSi films dedicated for photovoltaic application. The structural, morphologi…

010302 applied physicsMaterials sciencePolymers and PlasticsMetals and Alloys02 engineering and technologyChemical vapor deposition021001 nanoscience & nanotechnologyPorous silicon01 natural sciences7. Clean energyNanocrystalline materialSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsBiomaterialsMetalChemical engineeringvisual_art0103 physical sciencesvisual_art.visual_art_medium[INFO]Computer Science [cs]Metalorganic vapour phase epitaxy0210 nano-technology[CHIM.CHEM]Chemical Sciences/Cheminformatics
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Corrosion of Welded Metal Structures of Mining Equipment

2018

Mining equipment made of welded metal structures is strongly affected by the corrosion phenomenon due to the working conditions. Initial research has shown that the corrosion phenomenon is most pronounced in the area of cross-welded joints and welded T-shaped joints. In the researches, there was made a chemical analysis of the welded construction material used respectively of the new material and it was observed a reduction in carbon concentration in the material used, but also a substantial increase in the sulfur concentration compared to the new material. The pronounced corrosion of the metallic structure is influenced by the chemical composition change because the sulfur is a grafitizin…

010302 applied physicsMaterials scienceProcess equipmentMaterials Science (miscellaneous)Process Chemistry and TechnologyMetallurgyGeneral Engineering02 engineering and technologyGeneral ChemistryGeneral MedicineWelding021001 nanoscience & nanotechnology01 natural sciencesGeneral Biochemistry Genetics and Molecular BiologyCorrosionlaw.inventionMetalPetrochemistrylawvisual_art0103 physical sciencesMaterials Chemistryvisual_art.visual_art_mediumGeneral Pharmacology Toxicology and Pharmaceutics0210 nano-technologyRevista de Chimie
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Validation of mathematical model for CZ process using small-scale laboratory crystal growth furnace

2018

The present material is focused on the modelling of small-scale laboratory NaCl-RbCl crystal growth furnace. First steps towards fully transient simulations are taken in the form of stationary simulations that deal with the optimization of material properties to match the model to experimental conditions. For this purpose, simulation software primarily used for the modelling of industrial-scale silicon crystal growth process was successfully applied. Finally, transient simulations of the crystal growth are presented, giving a sufficient agreement to experimental results.

010302 applied physicsMaterials scienceScale (ratio)Mechanical engineeringCrystal growth02 engineering and technology021001 nanoscience & nanotechnologycomputer.software_genre01 natural sciencesSimulation softwareMonocrystalline siliconScientific method0103 physical sciencesTransient (oscillation)0210 nano-technologyMaterial propertiescomputerIOP Conference Series: Materials Science and Engineering
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Fluence effect on ion-implanted As diffusion in relaxed SiGe

2005

A systematic study on the fluence (5 × 108 − 4 × 1014 cm−2) dependence of ion-implanted As diffusion in relaxed Si1 − xGex alloys (with x = 0.2, 0.35 and 0.5) and silicon has been performed by the modified radiotracer and secondary ion mass spectrometry techniques. With fluences above 4 × 1011 cm−2 a clear fluence-dependent enhancement in arsenic diffusion was noted for Si1 − xGex. In case of arsenic-implanted silicon such fluence dependency was not observed. This can be assigned to enhanced implantation-induced damage formation and more deficient radiation damage recovery of SiGe.

010302 applied physicsMaterials scienceSiliconAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_element02 engineering and technology021001 nanoscience & nanotechnology01 natural sciencesFluenceIonSecondary ion mass spectrometrychemistry0103 physical sciencesRadiation damageDiffusion (business)0210 nano-technologyArsenicEurophysics Letters
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HCl gas gettering of low-cost silicon

2013

HCl gas gettering is a cheap and simple technique to reduce transition metal concentrations in silicon. It is attractive especially for low-cost silicon materials like upgraded metallurgical grade (UMG) silicon, which usually contain 3d transition metals in high concentrations. Etching of silicon by HCl gas occurs during HCl gas gettering above a certain onset temperature. The etching rate as well as the gettering efficiency was experimentally determined as a function of the gettering temperature, using UMG silicon wafers. The activation energy of the etching reaction by HCl gas was calculated from the obtained data. The gettering efficiency was determined by analyzing Ni as a representativ…

010302 applied physicsMaterials scienceSiliconEtching rateInorganic chemistrychemistry.chemical_element02 engineering and technologySurfaces and InterfacesActivation energy021001 nanoscience & nanotechnologyCondensed Matter Physics7. Clean energy01 natural sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialschemistryTransition metalGetterEtching (microfabrication)0103 physical sciencesMaterials ChemistryWaferElectrical and Electronic Engineering0210 nano-technologyInductively coupled plasma mass spectrometryphysica status solidi (a)
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Modelling of thermal field and point defect dynamics during silicon single crystal growth using CZ technique

2018

Abstract Silicon single crystal growth by the Czochralski (CZ) technique is studied numerically using non-stationary mathematical models which allow to predict the evolution of the CZ system in time, including Dash neck, cone and cylindrical growth stages. The focus is on the point defect dynamics, also considering the effect of the thermal stresses. During the cylindrical stage, the crystal pull rate is temporarily reduced as in experiments by Abe et al. The crystal radius and heater power change is explicitly considered in the calculations for crystal diameters of 50, 100 and 200 mm and the agreement with experiments is discussed.

010302 applied physicsMaterials scienceSiliconField (physics)Mathematical modelchemistry.chemical_element02 engineering and technologyRadiusMechanics021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesInorganic ChemistryCrystalchemistry0103 physical sciencesThermalMaterials ChemistryPoint (geometry)0210 nano-technologyFocus (optics)Journal of Crystal Growth
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3D modeling of growth ridge and edge facet formation in 〈100〉 floating zone silicon crystal growth process

2019

Abstract A 3D quasi-stationary model for crystal ridge formation in FZ crystal growth systems for silicon is presented. Heat transfer equations for the melt and crystal are solved, and an anisotropic crystal growth model together with a free surface shape solver is used to model the facet growth and ridge formation. The simulation results for 4″ and 5″ crystals are presented and compared to experimental ridge shape data.

010302 applied physicsMaterials scienceSiliconPhysics::Opticschemistry.chemical_elementCrystal growthGeometry02 engineering and technologyEdge (geometry)021001 nanoscience & nanotechnologyCondensed Matter PhysicsRidge (differential geometry)01 natural sciencesInorganic ChemistryMonocrystalline siliconCrystalchemistryCondensed Matter::SuperconductivityFree surface0103 physical sciencesMaterials ChemistryFacet0210 nano-technologyJournal of Crystal Growth
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