Search results for "Lithography"
showing 10 items of 242 documents
Biotemplated Lithography of Inorganic Nanostructures (BLIN) for Versatile Patterning of Functional Materials
2020
Here, we present a highly parallel fabrication method dubbed biotemplated lithography of inorganic nanostructures (BLIN) that enables large-scale versatile substrate patterning of metallic and semi...
ZnO Thin films doped with Erbium: Elaboration, Characterization and nonlinear optical properties measurements
2011
In this paper, we investigate NLO properties of ZnO nanostructures for optoelectronics applications. It is shown that carefully designed and fabricated nanostructured ZnO films posses some advantageous for practical use and to generate more and short wavelengths and, when combined with TiO , produce a core–shell structure that 2 reduces the combination rate. The limitations of ZnO-based DSCs are also discussed and several possible methods are suggested in order to expand the basic knowledge of ZnO to TiO , motivating further improvement 2 in the power-conversion efficiency of third harmonic generation THG.
Fabrication of a gap structure for near-field heat transfer
2016
Tutkimuksessa kehitettiin kahden vaiheen valmistusprosessi rakorakenteen valmistamiseen, jossa on metallista valmistetut johdot. Tämä rakorakenne on tarkoitettu lähikentän lämmönsiirtymisen mittaamiseen. Valmistus tehtiin pääasiassa 3D-litografialla käyttämällä Nanoscribe Photonic Professional -järjestelmää. Valmistukseen sisältyi myös ALD (Atomic Layer Deposition), metallipäällystys höyrystämällä, lift-off ja ionisuihkujyrsintä. Valmistettu rakenne koostuu kahdesta suorakulmaisesta särmiöstä lähellä toisiaan, jotka muodostavat ripustetun yhdensuuntaisten tasojen geometrian. Särmiöiden päälle tehdyt metalloinnit koostuivat ohuesta kultalangasta, joka voi toimia resistiivisenä lämpömittarina…
Development of an MeV ion beam lithography system in Jyväskylä
2007
Abstract A lithographic facility for writing patterns with ion beams from cyclotron beams is under development for the Jyvaskyla cyclotron. Instead of focusing and deflecting the beam with electrostatic and magnetic fields a different approach is used. Here a small rectangular beam spot is defined by the shadow of a computer-controlled variable aperture in close proximity to the sample. This allows parallel exposure of rectangular pattern elements of 5–500 μm side with protons up to 6 MeV and heavy ions (20Ne, 85Kr) up to few 100 MeV. Here we present a short overview of the system under construction and development of the aperture design, which is a critical aspect for all ion beam lithogra…
Aperture edge scattering in focused MeV ion beam lithography and nuclear microscopy: An application for the GEANT4 toolkit
2009
Collimators are widely used to define MeV ion beams. Recent studies have shown the capability of combinations of collimators and lenses to define beams of MeV ions with sub-100 nanometre dimensions. Such nanometre beams have potential applications in MeV ion beam lithography, which is the only maskless technique capable of producing extremely high aspect ratio micro- and nano-structrures, as well as in high resolution MeV ion beam based imaging. The ion scattering from the collimator-edges can be a resolution restricting factor in these applications. Scattering processes at edges are difficult to study using conventional simulation codes because of the complicated geometry. In this work we …
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
2012
Abstract In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1–1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chi…
Development of micro-contact printing of osteosarcoma cells using MeV ion beam lithography
2009
Abstract For investigation of spatial effects in signalling between cells and also signal substances that trigger cell proliferation and behaviour we are developing a micro Contact Printing process ( μ CP ) . In order to allow printing of cells stamps with high aspect ratio are required and these have been fabricated using Programmed Proximity Aperture Lithography (PPAL) with 3 MeV 4 He 2 + ions to produce PMMA masters for casting the stamps in PDMS. A simple printing device was developed and the first results using this to print human osteosarcoma cells is demonstrated.
Growth of osteoblasts on lithographically modified surfaces
2007
Here we report about preliminary investigations on developing substrates for culturing osteoblasts, the cells responsible for production of mineralised bone, by lithographically modifying the surfaces of several materials. The proton beam writing system at the National University of Singapore was used to fabricate high aspect ratio structures in PMMA, while two-dimensional low aspect ratio structures were fabricated using conventional electron beam lithography (EBL) and UV lithography (UVL) in SU-8. It was found that oxygen plasma treatment of structured SU-8 surfaces changed the surface layer and significantly improved cell attachment and proliferation. Cells grown on patterned thick PMMA …
MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks
2015
Parylenes are poly(p-xylylene) polymers that are widely used as moisture barriers and in biomedicine because of their good biocompatibility. We have investigated MeV ion beam lithography using 16O+ ions for writing defined patterns in Parylene-C, which is evaluated as a coating material for the Cochlear Implant (CI) electrode array, a neuroprosthesis to treat some forms of deafness. Parylene-C and -F on silicon and glass substrates as well as 50 μm thick PTFE were irradiated to different fluences (1×1013-1×10161×1013-1×1016 1 MeV 16O+ ions cm−2) through aperture masks under high vacuum and a low pressure (<10−3 mbar) oxygen atmosphere. Biocompatibility of the irradiated and unirradiated …
Development of elastomeric lab-on-a-chip devices through Proton Beam Writing (PBW) based fabrication strategies
2009
Abstract In recent years, one of the most exciting developments in fluidic device applications is the rapid evolution of miniaturized micro- and nanofluidic systems, the so called “lab-on-a-chip” devices. These devices integrate laboratory functions into a single chip, and are capable of various biochemical analysis and synthesis, such as sample injection and preparation, single cell/molecule observation, bioparticle sequencing and sorting etc. The evolvement of lab-on-a-chip concept implies the use of novel fabrication techniques for the construction of versatile analytical components in a fast and reproducible manner. Endowed with unique three-dimensional fabrication abilities, Proton Bea…