Search results for "Silicon Carbide"

showing 10 items of 75 documents

Proton irradiation-induced reliability degradation of SiC power MOSFET

2023

The effect of 53 MeV proton irradiation on the reliability of silicon carbide power MOSFETs was investigated. Post-irradiation gate voltage stress was applied and early failures in time-dependent dielectric breakdown (TDDB) test were observed for irradiated devices. The applied drain voltage during irradiation affects the degradation probability observed by TDDB tests. Proton-induced single event burnouts (SEB) were observed for devices which were biased close to their maximum rated voltage. The secondary particle production as a result of primary proton interaction with the device material was simulated with the Geant4-based toolkit. peerReviewed

Nuclear and High Energy Physicsprotonitreliabilityprotonsionisoiva säteilyelektroniikkakomponentitstressNuclear Energy and Engineeringsäteilyfysiikkasilicon carbidelogic gatesradiation effectstransistoritElectrical and Electronic Engineering
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Joint Spectral and Energy Efficiency Optimization for Downlink NOMA Networks

2020

Non-orthogonal multiple access (NOMA) holds the promise to be a key enabler of 5G communication. However, the existing design of NOMA systems must be optimized to achieve maximum rate while using minimum transmit power. To do so, this paper provides a novel technique based on multi-objective optimization to efficiently allocate resources in the multi-user NOMA systems supporting downlink transmission. Specifically, our unique optimization technique jointly improves spectrum and energy efficiency while satisfying the constraints on users quality of services (QoS) requirements, transmit power budget and successive interference cancellation. We first formulate a joint problem for spectrum and …

OptimizationMathematical optimizationComputer Networks and CommunicationsComputer scienceenergiatehokkuus5G-tekniikka02 engineering and technologySilicon carbideMulti-objective optimizationNomalangaton tiedonsiirto0203 mechanical engineeringoptimointiPower system managementQuality of serviceArtificial IntelligenceTelecommunications link0202 electrical engineering electronic engineering information engineeringmedicineSpectral efficiencyDownlinkResource managementNOMA020302 automobile design & engineering020206 networking & telecommunicationsSpectral efficiencyTransmitter power outputmedicine.diseaseMulti-objective optimizationEnergy efficiencySingle antenna interference cancellationHardware and ArchitectureNon-orthogonal multiple accessBenchmark (computing)QoS.Efficient energy use
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Estimating Terrestrial Neutron-Induced SEB Cross-Sections and FIT Rates for High-Voltage SiC Power MOSFETs

2019

Cross sections and failure in time rates for neutron-induced single-event burnout (SEB) are estimated for SiC power MOSFETs using a method based on combining results from heavy ion SEB experimental data, 3-D TCAD prediction of sensitive volumes, and Monte Carlo radiation transport simulations of secondary particle production. The results agree well with experimental data and are useful in understanding the mechanisms for neutron-induced SEB data.

Radiation transportSiCcross-sectionNuclear and High Energy PhysicsMaterials scienceMonte Carlo method01 natural sciencesIonpowerchemistry.chemical_compoundMOSFETneutronsilicon carbide0103 physical sciencesMOSFETSilicon carbideNeutronElectrical and Electronic EngineeringPower MOSFETMonte Carlosingle event burnoutta114ta213SEB010308 nuclear & particles physicsHigh voltageFITheavy ionComputational physicsNuclear Energy and Engineeringchemistrysäteilyfysiikkatransistoritfailure in timeMREDIEEE Transactions on Nuclear Science
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Nanocomposites of epoxy resin with graphene nanoplates and exfoliated graphite: Synthesis and electrical properties

2014

Nanocomposites are nowadays one of the most promising materials. Among different fillers, e.g. carbon nanotubes and silicon carbide nanowires (NWSiC), already used with epoxy resin matrices, graphene exfoliated graphite (EG) and graphene nanoplates have some characteristics that make them unique for electromagnetic shielding materials. However, there is still an unresolved problem of proper dispersion that will ensure the homogeneity of samples. To overcome this drawback, inorganic fibres were proposed. An amount of 0.25 phr (parts per hundred; filler content presented as wt.% of the whole polymeric matrix) NWSiC, added to the EG 1 phr/epoxy resin sample, efficiently prevents filler agglome…

Settore ING-IND/22 - Scienza E Tecnologia Dei Materialinanocompositeexfoliated graphitecombustion synthesisilicon carbide nanowiresSettore CHIM/02 - Chimica Fisica
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Pd/Au/SiC Nanostructured Diodes for Nanoelectronics: Room Temperature Electrical Properties

2010

Pd/Au/SiC nanostructured Schottky diodes were fabricated embedding Au nanoparticles (NPs) at the metalsemiconductor interface of macroscopic Pd/SiC contacts. The Au NPs mean size was varied controlling the temperature and time of opportune annealing processes. The electrical characteristics of the nanostructured diodes were studied as a function of the NPs mean size. In particular, using the standard theory of thermoionic emission, we obtained the effective Schottky barrier height (SBH) and the effective ideality factor observing their dependence on the annealing time and temperature being the signature of their dependence on the mean NP size. Furthermore, plotting the effective SBH as a fu…

SiCMaterials scienceAnnealing (metallurgy)Schottky barrierNanoparticleSettore ING-INF/01 - Elettronicabarrier heightSettore FIS/03 - Fisica Della Materiachemistry.chemical_compoundSilicon carbidePdSchottky diodeAuAu nanoparticles (NPs)Electrical and Electronic EngineeringDiodeNanoscale diodebusiness.industrySchottky diodeNanoscale diode; Au; SiCComputer Science Applications1707 Computer Vision and Pattern RecognitionElectrical contactsComputer Science ApplicationschemistryNanoelectronicsOptoelectronicsbusiness
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Seed‐Layer‐Free Atomic Layer Deposition of Highly Uniform Al 2 O 3 Thin Films onto Monolayer Epitaxial Graphene on Silicon Carbide

2019

Atomic layer deposition (ALD) is the method of choice to obtain uniform insulating films on graphene for device applications. Owing to the lack of out-of-plane bonds in the sp(2) lattice of graphene, nucleation of ALD layers is typically promoted by functionalization treatments or predeposition of a seed layer, which, in turn, can adversely affect graphene electrical properties. Hence, ALD of dielectrics on graphene without prefunctionalization and seed layers would be highly desirable. In this work, uniform Al2O3 films are obtained by seed-layer-free thermal ALD at 250 degrees C on highly homogeneous monolayer (1L) epitaxial graphene (EG) (amp;gt;98% 1L coverage) grown on on-axis 4H-SiC(00…

SiCMaterials sciencePhysics::Opticslaw.inventionchemistry.chemical_compoundAtomic layer depositionlawLattice (order)MonolayerPhysics::Atomic and Molecular ClustersSilicon carbidePhysics::Chemical PhysicsThin filmCondensed Matter::Quantum Gasesatomic force microscopybusiness.industryAtomic force microscopyGrapheneMechanical EngineeringCondensed Matter Physicsepitaxial graphenechemistryMechanics of Materialsatomic layer depositionOptoelectronicsatomic force microscopy; atomic layer deposition; epitaxial graphene; SiCEpitaxial graphenebusinessDen kondenserade materiens fysikAdvanced Materials Interfaces
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Estimating Terrestrial Neutron-Induced SEB Cross-Sections and FIT Rates for High-Voltage SiC Power MOSFETs

2019

Cross sections and failure in time rates for neutron-induced single-event burnout (SEB) are estimated for SiC power MOSFETs using a method based on combining results from heavy ion SEB experimental data, 3-D TCAD prediction of sensitive volumes, and Monte Carlo radiation transport simulations of secondary particle production. The results agree well with experimental data and are useful in understanding the mechanisms for neutron-induced SEB data. peerReviewed

SiCcross-sectionSEBFITheavy ionpowerMOSFETneutronsäteilyfysiikkasilicon carbidetransistoritfailure in timeMREDMonte Carlosingle event burnout
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Ion-Induced Energy Pulse Mechanism for Single-Event Burnout in High-Voltage SiC Power MOSFETs and Junction Barrier Schottky Diodes

2020

Heavy ion data suggest that a common mechanism is responsible for single-event burnout in 1200 V power MOSFETs and junction barrier Schottky diodes. Similarly, heavy ion data suggest a common mechanism is also responsible for leakage current degradation in both devices. This mechanism, based on ion-induced, highlylocalized energy pulses, is demonstrated in simulations and shown to be capable of causing degradation and singleevent burnout for both the MOSFETs and JBS diodes. peerReviewed

SiCpowerMOSFETdiodeSEBsäteilyfysiikkasilicon carbidepuolijohteetsingle-event burnoutionisoiva säteilydioditheavy iondegradation
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Preliminary studies on nanocomposite based on high quality Silicon Carbide nanofibers

2012

Nanocomposites are nowadays the most promising new materials due to their unique properties (such as high mechanical strength, chemical and thermal resistance). The nanocomposite matrix is blended with a nanostructured filler. In this study, Silicon Carbide nanofibers (NFSiC) and their bundles were tested as a reinforcement of two epoxy resins: EPIKOTE 828 and EL 20. PAP-4 (33 phr) and P-900 (40 phr) were used as hardeners in the two cases, respectively. Several samples were prepared in the range between 0.1 and 5 % wt for both types of resins and fillers (NFSiC and NFSiC bundles). Mechanical and electrical properties were tested. The fillers were obtained using a new simple, fast, low-cost…

Silicon Carbide nanofiberNanocompositeMaterials scienceNanocompositeScanning electron microscopeEpoxyCondensed Matter PhysicMechanicallaw.inventionNanomaterialsElectronic Optical and Magnetic Materialschemistry.chemical_compoundchemistrylawvisual_artNanofiberpropertievisual_art.visual_art_mediumSilicon carbideCeramicElectron microscopeComposite materialElectrical and Electronic EngineeringSettore CHIM/02 - Chimica Fisica
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Boron doping of silicon rich carbides: Electrical properties

2013

Boron doped multilayers based on silicon carbide/silicon rich carbide, aimed at the formation of silicon nanodots for photovoltaic applications, are studied. X-ray diffraction confirms the formation of crystallized Si and 3C-SiC nanodomains. Fourier Transform Infrared spectroscopy indicates the occurrence of remarkable interdiffusion between adjacent layers. However, the investigated material retains memory of the initial dopant distribution. Electrical measurements suggest the presence of an unintentional dopant impurity in the intrinsic SiC matrix. The overall volume concentration of nanodots is determined by optical simulation and is shown not to contribute to lateral conduction. Remarka…

Silicon nanodotMaterials scienceSiliconSilicon dioxideBoron dopingInorganic chemistrychemistry.chemical_elementSilicon carbide02 engineering and technologySettore ING-INF/01 - Elettronica7. Clean energy01 natural sciencesSettore FIS/03 - Fisica Della MateriaCarbidechemistry.chemical_compoundUV-vis reflection and transmittanceMultilayer0103 physical sciencesSilicon carbideGeneral Materials ScienceElectrical measurementsSilicon rich carbide010302 applied physicsDopantbusiness.industryMechanical EngineeringDopingFourier transform infrared spectroscopySilica021001 nanoscience & nanotechnologyCondensed Matter PhysicsSilicon richOptical propertieElectrical transportchemistryMechanics of MaterialsUV-vis reflection and transmittance Doping (additives)Boron-dopingOptoelectronicsElectric propertieNanodot0210 nano-technologybusinessX ray diffraction Boron carbideMaterials Science and Engineering: B
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