Search results for "Surfaces"

showing 10 items of 2837 documents

Temperature and substrate influence on the structure of TiN O thin films grown by low pressure metal organic chemical vapour deposition

2000

Abstract This paper presents the growth and characterization of titanium oxinitride (TiN x O y ) films grown by low pressure metal organic chemical vapour deposition (LP-MOCVD). The film nitrogen content, obtained by Rutherford backscattering spectroscopy (RBS), increases as the growth temperature increases (from 23 at.% at 450°C to 46 at.% at 750°C). Below 550°C, the films do not show any X-ray diffraction pattern. Above 550°C, the deposited films present the (111) and (200) TiN textures. Films deposited on (100) Si exhibit a 2 θ shift to higher Bragg angles, depending on the N/O ratio. These shifts are explained by using a substitutional oxygen model. Moreover, the atomic structure of suc…

Materials scienceAnalytical chemistrychemistry.chemical_elementSurfaces and InterfacesGeneral ChemistryChemical vapor depositionCondensed Matter PhysicsSurfaces Coatings and FilmschemistryX-ray photoelectron spectroscopyX-ray crystallographyMaterials ChemistryMetalorganic vapour phase epitaxyThin filmSpectroscopyTinTitaniumSurface and Coatings Technology
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Effectiveness of some protective and self-cleaning treatments: a challenge for the conservation of temple G stone in Selinunte

2021

Abstract The Temple G of the Archaeological Park of Selinunte (Italy), the largest in Europe, is one of the most impressive temples in the Magna Grecia. Today, it is completely destroyed due to a strong earthquake occurred in the Middle Ages. The used stone is a calcarenite coming from the ancient and renowned quarries of Cusa near the acropolis. This work comes from the today’s proposal of Temple G anastylosis. The goal of the work is to provide the results relating the protective effectiveness of three polymer formulations, appropriately selected, on stone samples taken from the “Capitello” quarry, part of “Cusa quarries”. The formulations functionality was deployed by adding TiO2 nanopar…

Materials scienceAnastylosisGeneral Chemical Engineering202 engineering and technology010402 general chemistry01 natural sciencesStone breathabilityTempleSelf cleaningTiOAlkylalkoxysilaneMaterials ChemistrymedicineWater-repellenceStone protectionConservation treatmentbiologyPhoto-oxidative degradation.AcropolisOrganic ChemistryTio2 nanoparticlesSelf-cleaning properties021001 nanoscience & nanotechnologybiology.organism_classificationArchaeology0104 chemical sciencesSurfaces Coatings and FilmsCalcarenitemedicine.anatomical_structurenanoparticles0210 nano-technology
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Redox reactions in the Pt/TiO2–WO3/SiO2 planar system

2014

Abstract The thermal behavior of the titanium–tungsten adhesive layer (30–70 at.%) deposited on a SiO2 substrate followed by a thicker Pt layer was investigated. The resulting Pt/TiW/SiO2 planar system was annealed under air or vacuum. Morphological and chemical characterizations at different stages of the annealing, as a function of several parameters such as treatment atmosphere, annealing temperature and thickness of the Pt film were performed through surface science analyses. When annealing under air, even at mild temperature (773 K), the whole interlayer oxidizes while a low amount of tungsten diffuses through platinum film. This phenomenon is related to tungsten oxidation which acts a…

Materials scienceAnnealing (metallurgy)Analytical chemistrychemistry.chemical_elementTungstenCondensed Matter PhysicsRedoxSurfaces Coatings and FilmsOverlayerBarrier layerchemistryThermalAdhesivePlatinumInstrumentationVacuum
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Ordering and dewetting in spin-coated films of a liquid crystalline main chain polymer

2006

Abstract The ordering of spin-coated films of a main-chain smectic liquid crystalline polymer with an azobenzene group connected by flexible spacers to a phenyl malonate unit has been studied as a function of film thickness using scanning force microscopy and UV/Vis spectroscopy. Already the as-prepared films are characterized by a significant out-of-plane orientation of the azobenzene groups. Annealing of films thicker than 7 nm results in aggregation and homeotropical alignment of azobenzene groups forming smectic layers parallel to the substrate. An optically isotropic mesophase was found upon annealing in the temperature range of smectic mesophase. Films thinner than the bilayer thickne…

Materials scienceAnnealing (metallurgy)BilayerHomeotropic alignmentMetals and AlloysMesophaseSurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialschemistry.chemical_compoundCrystallographyAzobenzenechemistryMonolayerMaterials ChemistryOrganic chemistryDewettingThin filmThin Solid Films
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Atomic layer deposition and characterization of biocompatible hydroxyapatite thin films

2009

Abstract Atomic layer deposition (ALD) was used to produce hydroxyapatite from Ca(thd) 2 (thd = 2,2,6,6-tetramethyl-3,5-heptanedionato) and (CH 3 O) 3 PO onto Si(100) and Corning (0211). Film crystallinity, stoichiometry, possible impurities and surface morphology were determined. The as-deposited films contained significant amounts of carbonate impurities however, annealing at moist N 2 flow reduced the carbonate content even at 400 °C. The as-deposited Ca–P–O films were amorphous but rapid thermal annealing promoted the formation of the hydroxyapatite phase. Mouse MC 3T3-E1 cells were used for the cell culture experiments. According to the bioactivity studies cell proliferation was enhanc…

Materials scienceAnnealing (metallurgy)Borosilicate glassMetals and AlloysMineralogySurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAmorphous solidchemistry.chemical_compoundAtomic layer depositionCrystallinitychemistryChemical engineeringImpurityMaterials ChemistryPolystyreneThin film
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Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films

2010

ZrO 2 films doped with Er 2 O 3 were grown by atomic layer deposition from tris(2,2,6,6-tetramethyl-3,5-heptanedionato)erbium, bis(methylcyclopentadienyl)methoxymethylzirconium, and ozone as precursors at 350°C. The erbium content was 1―5 cation %. The films were uniform in thickness. The ZrO 2 :Er 2 O 3 films were crystallized already in the as-deposited state. Upon annealing at 650°C, they were stabilized in the form of cubic or tetragonal polymorph of ZrO 2 . Enhancement in capacitance required intense crystallization that was observed when the film thickness exceeded 4.4 nm. The permittivity of the ZrO 2 :Er 2 O 3 films could reach 31. The capacitors based on the doped ZrO 2 possessed l…

Materials scienceAnnealing (metallurgy)Inorganic chemistryOxideAnalytical chemistrychemistry.chemical_elementEquivalent oxide thickness02 engineering and technology01 natural scienceslaw.inventionErbiumchemistry.chemical_compoundAtomic layer depositionlaw0103 physical sciencesMaterials ChemistryElectrochemistryThin filmCrystallization010302 applied physicsRenewable Energy Sustainability and the EnvironmentDoping021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialschemistry0210 nano-technologyJournal of The Electrochemical Society
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Photoemission study of the reactivity of barium towards SiOx thermal films

2011

Abstract Barium was deposited at room temperature on a thermal silicon oxide layer and the interfacial reaction was monitored by synchrotron induced photoemission (both core level and valence band). The first step of the growth consists of an interfacial reaction which leads to the formation of an interfacial silicate layer. The next step consists in formation of barium oxide while metallic barium occurs subsequently. The deposit can be also homogenized by annealing above 575 K. This results in the formation of several layers of silicate by consumption of silicon oxide. In the case of fractional coverage, subsequent annealing at 975 K induces the decomposition of barium silicate. However, s…

Materials scienceAnnealing (metallurgy)Inorganic chemistrychemistry.chemical_element02 engineering and technology01 natural scienceslaw.inventionMetalchemistry.chemical_compoundlaw0103 physical sciencesMaterials ChemistrySilicon oxide010302 applied physicsBarium oxideChemical process of decompositionBariumSurfaces and Interfaces021001 nanoscience & nanotechnologyCondensed Matter PhysicsSynchrotronSilicateSurfaces Coatings and FilmschemistryChemical engineeringvisual_artvisual_art.visual_art_medium0210 nano-technologySurface Science
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Photocatalytic printing of inorganic nanopatterns via poly(styrene-block-carbosilane) copolymer thin films on titania substrates.

2009

Well-defined, ordered arrays of nanoscale depressions were obtained in linear-brush-type polystyrene-block-polycarbosilane (PS-b-PCS) diblock copolymer thin films by acetone vapor annealing and silica nanodot arrays were directly obtained from such thin films deposited on a titania substrate by one-step exposure to UV light as a result of transformation of the PCS units to silica, driven by the photocatalytic activity of titania concurrent with removal of the organic matrix.

Materials scienceAnnealing (metallurgy)Metals and AlloysGeneral ChemistryCatalysisSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsStyrenechemistry.chemical_compoundChemical engineeringchemistryMaterials ChemistryCeramics and CompositesPhotocatalysisCopolymerAcetoneOrganic chemistryNanodotThin filmNanoscopic scaleChemical communications (Cambridge, England)
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Highly textured Gd2Zr2O7 films grown on textured Ni-5at.%W substrates by solution deposition route: Growth, texture evolution, and microstructure dep…

2012

Abstract Growth, texture evolution and microstructure dependency of solution derived Gd 2 Zr 2 O 7 films deposited on textured Ni-5 at.%W substrates have been extensively studied. Influence of processing parameters, in particular annealing temperature and dwell time, as well as thickness effect on film texture and morphology are investigated in details. It is found that a rotated cube-on-cube epitaxy of Gd 2 Zr 2 O 7 //NiW in-plane texture forms as soon as the (004) out-plane texture appears, implying that epitaxial growth dominates the crystallization processes. Thermal energy plays an important role in minimizing the difference of interfacial energy along two directions in the anisotropic…

Materials scienceAnnealing (metallurgy)Metals and AlloysSurfaces and InterfacesRutherford backscattering spectrometryMicrostructureSurface energySurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionCrystallographylawMaterials ChemistrySurface layerCrystalliteComposite materialCrystallizationThin filmThin Solid Films
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Low-temperature atomic layer deposition of ZnO thin films: Control of crystallinity and orientation

2011

Abstract Low-temperature atomic layer deposition (ALD) processes are intensely looked for to extend the usability of the technique to applications where sensitive substrates such as polymers or biological materials need to be coated by high-quality thin films. A preferred film orientation, on the other hand, is often required to enhance the desired film properties. Here we demonstrate that smooth, crystalline ZnO thin films can be deposited from diethylzinc and water by ALD even at room temperature. The depositions were carried out on Si(100) substrates in the temperature range from 23 to 140 °C. Highly c-axis-oriented films were realized at temperatures below ~ 80 °C. The film crystallinit…

Materials scienceAnnealing (metallurgy)Mineralogy02 engineering and technology01 natural sciencesAtomic layer depositionchemistry.chemical_compoundCrystallinity0103 physical sciencesMaterials ChemistryThin filmta116010302 applied physicschemistry.chemical_classificationta114Metals and AlloysSurfaces and InterfacesPolymerDiethylzincAtmospheric temperature range021001 nanoscience & nanotechnologySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCarbon filmchemistryChemical engineering0210 nano-technologyTHIN SOLID FILMS
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