Search results for "Thin-Films"

showing 10 items of 27 documents

Influence of applied strain on the microstructural corrosion of AlMg2 as-cast aluminium alloy in sodium chloride solution

2012

International audience; The corrosion behavior of ISO AlMg2 (AA5052) was studied at the microscale using the Electrochemical Microcell Technique. The influence of plastic deformation on the corrosion resistance of this alloy was also examined. After polishing, pitting at small copper-enriched precipitates and structural etching were observed. After deformation, numerous slip bands were found in grains. After 5.5% plastic strain, the global electrochemical behavior of samples was significantly affected. Pitting potential was decreased in sites containing slip bands or in sites with large strain gradients (measured using microgauges deposited by lithography).

Materials science020209 energyGeneral Chemical EngineeringAlloyPolishing02 engineering and technologyPlasticityengineering.materialAL-CUCorrosionTHIN-FILMS0202 electrical engineering electronic engineering information engineeringAluminium alloyPitting corrosionPARTICLESGeneral Materials ScienceLASER-SCANNING MICROSCOPYLOCALIZED CORROSIONMetallurgyLüders bandtechnology industry and agriculture2024-T3General Chemistry021001 nanoscience & nanotechnologyELECTROCHEMICAL-BEHAVIORvisual_artPITTING CORROSIONvisual_art.visual_art_mediumengineeringINTERMETALLIC PHASESDeformation (engineering)0210 nano-technologyPIT INITIATION
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Light absorption and electrical transport in Si:O alloys for photovoltaics

2010

Thin films (100-500 nm) of the Si:O alloy have been systematically characterized in the optical absorption and electrical transport behavior, by varying the Si content from 43 up to 100 at. %. Magnetron sputtering or plasma enhanced chemical vapor deposition have been used for the Si:O alloy deposition, followed by annealing up to 1250 °C. Boron implantation (30 keV, 3-30× 1014 B/cm2) on selected samples was performed to vary the electrical sheet resistance measured by the four-point collinear probe method. Transmittance and reflectance spectra have been extracted and combined to estimate the absorption spectra and the optical band gap, by means of the Tauc analysis. Raman spectroscopy was …

Materials scienceAbsorption spectroscopyFour-pointAnalytical chemistryGeneral Physics and AstronomyAbsorption coefficientChemical vapor depositionBoron implantationSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materiasymbols.namesakeElectrical resistivity and conductivityPlasma-enhanced chemical vapor depositionThin filmAbsorption (electromagnetic radiation)Electrical sheet resistanceSi contentSEMIINSULATING POLYCRYSTALLINE SILICON; SOLAR-CELLS; 3RD-GENERATION PHOTOVOLTAICS; OPTICAL-PROPERTIES; AMORPHOUS-SILICON; THIN-FILMS; CRYSTALLINEOptical absorptionProbe methodElectrical resistivityAlloy depositionSputter depositionElectrical transportsymbolsOxygen-rich siliconRaman spectroscopyOptical gapReflectance spectrumPhotovoltaic
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Graded Carrier Concentration Absorber Profile for High Efficiency CIGS Solar Cells

2015

We demonstrate an innovative CIGS-based solar cells model with a graded doping concentration absorber profile, capable of achieving high efficiency values. In detail, we start with an in-depth discussion concerning the parametrical study of conventional CIGS solar cells structures. We have used the wxAMPS software in order to numerically simulate cell electrical behaviour. By means of simulations, we have studied the variation of relevant physical and chemical parameters-characteristic of such devices-with changing energy gap and doping density of the absorber layer. Our results show that, in uniform CIGS cell, the efficiency, the open circuit voltage, and short circuit current heavily depe…

Materials scienceArticle SubjectBand gaplcsh:TJ807-830lcsh:Renewable energy sourceschemistry.chemical_elementSettore ING-IND/32 - Convertitori Macchine E Azionamenti ElettriciSettore ING-INF/01 - ElettronicaTHIN-FILMSOpticsGeneral Materials ScienceCU(INGA)SE-2Renewable Energy Sustainability and the Environmentbusiness.industryOpen-circuit voltageDopingSettore ING-INF/02 - Campi ElettromagneticiGeneral ChemistryCopper indium gallium selenide solar cellsAtomic and Molecular Physics and OpticschemistryLAYERMolybdenumOptoelectronicsbusinessPhotovoltaicShort circuitLayer (electronics)International Journal of Photoenergy
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Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant

2022

In this work, the use of ruthenium tetroxide (RuO4) as a co-reactant for atomic layer deposition (ALD) is reported. The role of RuO4 as a co-reactant is twofold: it acts both as an oxidizing agent and as a Ru source. It is demonstrated that ALD of a ternary Ru-containing metal oxide (i.e. a metal ruthenate) can be achieved by combining a metalorganic precursor with RuO4 in a two-step process. RuO4 is proposed to combust the organic ligands of the adsorbed precursor molecules while also binding RuO2 to the surface. As a proof of concept two metal ruthenate processes are developed: one for aluminum ruthenate, by combining trimethylaluminum (TMA) with RuO4; and one for platinum ruthenate, by c…

Materials scienceHydrogenRUTHENIUMOXIDE THIN-FILMSDIFFUSION BARRIERInorganic chemistryOxidechemistry.chemical_elementAmorphous solidInorganic ChemistryChemistryAtomic layer depositionchemistry.chemical_compoundPhysics and AstronomychemistryALUMINUM-OXIDEOxidizing agentThin filmPlatinumTernary operationDalton Transactions
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Optical modeling of nickel-base alloys oxidized in pressurized water reactor

2012

International audience; The knowledge of the aging process involved in the primary water of pressurized water reactor entails investigating a mixed growth mechanism in the corrosion of nickel-base alloys. A mixed growth induces an anionic inner oxide and a cationic diffusion parallel to a dissolution-precipitation process forms the outer zone. The in situ monitoring of the oxidation kinetics requires the modeling of the oxide layer stratification with the full knowledge of the optical constants related to each component. Here, we report the dielectric constants of the alloys 600 and 690 measured by spectroscopic ellipsometry and fitted to a Drude-Lorentz model. A robust optical stratificati…

Materials sciencePASSIVE FILMSCORROSION BEHAVIOROxidechemistry.chemical_elementDIFFUSE REFLECTION SPECTROSCOPY02 engineering and technologyDielectric01 natural sciencesFocused ion beamCorrosionchemistry.chemical_compoundTHIN-FILMSX-ray photoelectron spectroscopy0103 physical sciencesMaterials ChemistryXPSThin film010302 applied physicsHIGH-TEMPERATURE WATERMetallurgyMetals and AlloysSurfaces and InterfacesOXIDE-FILMS021001 nanoscience & nanotechnologySTAINLESS-STEELSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsNickelchemistryChemical engineeringTransmission electron microscopyHYDROGENATED WATERGROWTH0210 nano-technology
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Photoconductive properties of Bi2S3nanowires

2015

The photoconductive properties of Bi2S3 nanowires synthesized inside anodized alumina (AAO) membrane have been characterized as a function of illuminating photon energy between the wavelengths of 500 to 900 nm and at constant illumination intensity of 1–4 μW·cm−2. Photoconductivity spectra, photocurrent values, photocurrent onset/decay times of individual Bi2S3 nanowires liberated from the AAO membrane were determined and compared with those of arrays of as-produced Bi2S3 nanowires templated inside pores of AAO membrane. The alumina membrane was found to significantly influence the photoconductive properties of the AAO-hosted Bi2S3 nanowires, when compared to liberated from the AAO membrane…

Materials sciencePhotoconductivityPHOTODETECTORSThin filmsPhotoconductivity spectrumAluminaNanowireGeneral Physics and AstronomyNanotechnologySemiconductor growth02 engineering and technology010402 general chemistryNanofabrication01 natural sciencesSemiconductor materialsTHIN-FILMSThin filmONE-DIMENSIONAL NANOSTRUCTURESArraysPhotocurrentOne-dimensional nanostructuresMembranesNanowire surfaceNanowiresbusiness.industryAnodizingPhotoconductivityPhotodetectors021001 nanoscience & nanotechnologyCharge carrier trappingARRAYS0104 chemical sciencesMembraneNanolithographyIllumination intensityAnodized aluminaPhotoconductive propertiesSemiconductor quantum wiresOptoelectronicsAlumina membranesCharge carrierElectron trapsPhoton energy0210 nano-technologybusinessBismuth compoundsJournal of Applied Physics
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Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films

2017

Blistering of protective, structural, and functional coatings is a reliability risk pestering films ranging from elemental to ceramic ones. The driving force behind blistering comes from either excess hydrogen at the film-substrate interface or stress-driven buckling. Contrary to the stress-driven mechanism, the hydrogen-initiated one is poorly understood. Recently, it was shown that in the bulk Al-Al2O3 system, the blistering is preceded by the formation of nano-sized cavities on the substrate. The stress-and hydrogen-driven mechanisms in atomic-layer-deposited (ALD) films are explored here. We clarify issues in the hydrogen-related mechanism via high-resolution microscopy and show that at…

Materials sciencePhysics and Astronomy (miscellaneous)Siliconchemistry.chemical_element02 engineering and technologySubstrate (electronics)ceramicsmikroskopia01 natural sciencespiezoelectric filmskeramiikkaStress (mechanics)Atomic layer depositionTHIN-FILMSALUMINUM-OXIDE0103 physical sciencesWATERCRYSTAL-STRUCTURECeramicThin filmComposite materialSILICON010302 applied physicsta213ta114HYDROGEN021001 nanoscience & nanotechnologyDIFFUSIONdermatologychemistrythin filmsTransmission electron microscopyvisual_artvisual_art.visual_art_mediummicroscopyGROWTHihotautioppiohutkalvot0210 nano-technologyLayer (electronics)
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Growth, Structure, and Stability of KxWO3 Nanorods on Mica Substrate

2012

International audience; KxWO3 nanorods, interesting as gas sensors, were elaborated on mica muscovite substrate and characterized by atomic force microscopy, scanning electron microscopy, X-ray photoelectron spectroscopy, and mainly transmission electron microscopy. A combination of structural analyses allowed determining the morphology of these rods, and selected area electron diffraction experiments pointed out the simultaneous presence of the exotic hexagonal and stable monoclinic phases. Moreover, the presence of potassium inside the nanorods, coming from the mica substrate, was revealed. By combining all the observations, a growth model is proposed, consisting of the stacking of two di…

Materials scienceScanning electron microscopePHASE02 engineering and technology010402 general chemistryEpitaxy01 natural sciencesPARAMETERSTHIN-FILMSCHEMISTRYSENSORSPhysical and Theoretical ChemistryTEMPERATURESPECTROSCOPYHexagonal phase[CHIM.MATE]Chemical Sciences/Material chemistry021001 nanoscience & nanotechnology0104 chemical sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsOXIDE NANORODSCrystallographyGeneral EnergyTransmission electron microscopyHEXAGONAL TUNGSTEN TRIOXIDE[ CHIM.MATE ] Chemical Sciences/Material chemistryNanorodMicaSelected area diffractionNANOCRYSTALLINE WO3 FILMS0210 nano-technologyMonoclinic crystal system
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Properties of atomic layer deposited nanolaminates of zirconium and cobalt oxides

2018

Producción Científica

Materials scienceSilicon116 Chemical sciencesta221chemistry.chemical_element02 engineering and technologyDielectricChemical vapor deposition7. Clean energy01 natural sciencesSpray pyrolysisThermal barrier coatingÓxidos metálicosSPRAY-PYROLYSISDIELECTRICSnanorakenteetmagnetoelectrics0103 physical sciencesNanolaminatesnanolaminatesSILICON010302 applied physicsZirconiumta114ZRO2 THIN-FILMSCO3O4 FILMSBUFFER LAYERatomikerroskasvatus021001 nanoscience & nanotechnologyElectronic Optical and Magnetic MaterialsTHERMAL BARRIER COATINGSCHEMICAL-VAPOR-DEPOSITIONchemistryChemical engineeringLASER DEPOSITIONNanoláminasatomic layer depositionMetal oxides221 Nano-technologyohutkalvot0210 nano-technologyLayer (electronics)CobaltGAS SENSORS
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Residual crystalline silicon phase in silicon-rich-oxide films subjected to high temperature annealing

2002

Structural properties of silicon rich oxide films (SRO) have been investigated by means of micro-Raman spectroscopy and transmission electron microscopy (TEM). The layers were deposited by plasma enhanced chemical vapor deposition using different SiH4/O2 gas mixtures. The Raman spectra of the as-deposited SRO films are dominated by a broad band in the region 400-500 cm-1 typical of a highly disordered silicon network. After annealing at temperatures above 1000°C in N2, the formation of silicon nanocrystals is observed both in the Raman spectra and in the TEM images. However, most of the precipitated silicon does not crystallize and assumes an amorphous microstructure. © 2002 The Electrochem…

Materials scienceSiliconNanocrystal RamanAnnealing (metallurgy)Analytical chemistrychemistry.chemical_elementMineralogySurfaces Coatings and FilmSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materiasymbols.namesakePlasma-enhanced chemical vapor depositionMaterials ChemistryElectrochemistryCrystalline siliconRAMAN-SPECTROSCOPY; MICROCRYSTALLINE SILICON; THIN-FILMS; SCATTERING; SPECTRA; SUPERLATTICES; NANOCRYSTALS; SIO2-FILMS; SIZERenewable Energy Sustainability and the EnvironmentNanocrystalline siliconSurfaces and InterfacesCondensed Matter PhysicsCrystallographic defectSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAmorphous solidchemistrysymbolsRaman spectroscopy
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