Search results for "Toe"

showing 10 items of 3824 documents

Impact of pump wavelength on terahertz emission of a cavity-enhanced spintronic trilayer

2018

We systematically study the pump-wavelength dependence of terahertz pulse generation in thin-film spintronic THz emitters composed of a ferromagnetic Fe layer between adjacent nonmagnetic W and Pt layers. We find that the efficiency of THz generation is essentially at for excitation by 150 fs pulses with center wavelengths ranging from 900 to 1500 nm, demonstrating that the spin current does not depend strongly on the pump photon energy. We show that the inclusion of dielectric overlayers of TiO2 and SiO2, designed for a particular excitation wavelength, can enhance the terahertz emission by a factor of of up to two in field.

Materials scienceTerahertz radiationFOS: Physical sciencesPhysics::Opticsterahertz emission02 engineering and technologyDielectricpump wavelength01 natural sciences530Condensed Matter::Materials Science0103 physical sciencesStimulated emissionCommon emitter010302 applied physicsSpintronicsbusiness.industry021001 nanoscience & nanotechnologyspintronic trilayerWavelengthTransmission (telecommunications)Physics::Accelerator PhysicsOptoelectronics0210 nano-technologybusinessIntensity (heat transfer)Optics (physics.optics)Physics - Optics
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Tuning the Ultrafast Response of Fano Resonances in Halide Perovskite Nanoparticles

2020

International audience; The full control of the fundamental photophysics of nanosystems at frequencies as high as few THz is key for tunable and ultrafast nanophotonic devices and metamaterials. Here we combine geometrical and ultrafast control of the optical properties of halide perovskite nanoparticles, which constitute a prominent platform for nanophotonics. The pulsed photoinjection of free carriers across the semiconducting gap leads to a subpicosecond modification of the far-field electromagnetic properties that is fully controlled by the geometry of the system. When the nanoparticle size is tuned so as to achieve the overlap between the narrowband excitons and the geometry-controlled…

Materials scienceTerahertz radiationNanophotonicsFOS: Physical sciencesGeneral Physics and AstronomyPhysics::Optics02 engineering and technology010402 general chemistrySettore FIS/03 - FISICA DELLA MATERIA01 natural sciencesOptical switchhalide perovskites nanoparticles[SPI]Engineering Sciences [physics]Fano resonance; halide perovskites nanoparticles; ultrafast photophysics; nanophotonics; Mie resonancesPhysics::Atomic and Molecular Clusters[CHIM]Chemical SciencesGeneral Materials ScienceThin filmPhysics::Chemical PhysicsPerovskite (structure)[PHYS]Physics [physics]Condensed Matter - Materials Sciencebusiness.industryMie resonancesGeneral EngineeringMaterials Science (cond-mat.mtrl-sci)Fano resonanceMetamaterialSettore ING-INF/02 - Campi Elettromagnetici021001 nanoscience & nanotechnology0104 chemical sciencesOptoelectronicsFano resonancenanophotonics0210 nano-technologybusinessultrafast photophysicsUltrashort pulseOptics (physics.optics)Physics - Optics
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Transmission Attenuation Power Ratio Analysis of Flexible Electromagnetic Absorber Sheets Combined with a Metal Layer.

2018

Electromagnetic noise absorber sheets have become a solution for solving complex electromagnetic interference (EMI) problems due to their high magnetic losses. This contribution is focused on characterizing a novel structure that is based on an absorber film with a metal layer attached on its top side. Two different absorber compositions were combined with Al and Cu metal layers in order to study the improvement on the performance of these structures, depending on the complex permeability, absorber film thickness, and type of metal. The transmission attenuation power ratio of the absorber films is analyzed and compared to the performance of absorber and metal structures. The measurement pro…

Materials scienceTest fixture02 engineering and technologycomplex permeability01 natural scienceslcsh:TechnologyElectromagnetic interferenceMicrostripArticlelaw.inventioninsertion losslawTransmission line0103 physical sciences0202 electrical engineering electronic engineering information engineeringEddy currentInsertion lossGeneral Materials Sciencemicrostrip lineflexible electromagnetic absorber sheetlcsh:Microscopylcsh:QC120-168.85010302 applied physicslcsh:QH201-278.5power absorptionbusiness.industrylcsh:TAttenuation020206 networking & telecommunicationselectromagnetic interferenceMagnetic fieldlcsh:TA1-2040Optoelectronicsmagnetic materialslcsh:Descriptive and experimental mechanicslcsh:Electrical engineering. Electronics. Nuclear engineeringbusinesslcsh:Engineering (General). Civil engineering (General)lcsh:TK1-9971Materials (Basel, Switzerland)
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Unstable behaviour of normally-off GaN E-HEMT under short-circuit

2018

The short-circuit capability of power switching devices plays an important role in fault detection and the protection of power circuits. In this work, an experimental study on the short-circuit (SC) capability of commercial 600 V Gallium Nitride enhancement-mode high-electron-mobility transistors (E-HEMT) is presented. A different failure mechanism has been identified for commercial p-doped GaN gate (p-GaN) HEMT and metal-insulator-semiconductor (MIS) HEMT. In addition to the well known thermal breakdown, a premature breakdown is shown on both GaN HEMTs, triggered by hot electron trapping at the surface, which demonstrates that current commercial GaN HEMTs has requirements for improving the…

Materials scienceThermal breakdownGallium nitrideFailure mechanism02 engineering and technologyHigh-electron-mobility transistor01 natural sciencesFault detection and isolationlaw.inventionchemistry.chemical_compoundlaw0103 physical sciencesMaterials ChemistryElectrical and Electronic Engineering010302 applied physicsbusiness.industryTransistorNormally off021001 nanoscience & nanotechnologyCondensed Matter PhysicsElectronic Optical and Magnetic MaterialschemistryOptoelectronics0210 nano-technologybusinessShort circuitSemiconductor Science and Technology
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Wide Temperature Operation of 40-Gb/s 1550-nm Electroabsorption Modulated Lasers

2006

Electroabsorption modulated lasers (EMLs) exploiting the quantum confined Stark effect need thermoelectric coolers to achieve stable output power levels and dynamic extinction ratios. Temperature-independent operation is reported between 20/spl deg/C and 70/spl deg/C for InGaAlAs-InP-based monolithically integrated 1550-nm EMLs exploiting a shared active area at 40 Gb/s by actively controlling the electroabsorption modulator bias voltage. Dynamic extinction ratios of at least 8 dB and fiber-coupled mean modulated optical power of at least 0.85 mW are obtained over the mentioned temperature range.

Materials scienceThermoelectric coolingbusiness.industryQuantum-confined Stark effectOptical powerBiasingLaserAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic MaterialsSemiconductor laser theorylaw.inventionOpticsExtinction (optical mineralogy)ModulationlawOptoelectronicsElectrical and Electronic Engineeringbusiness
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Angle resolved X-ray photoemission spectroscopy double layer model for in situ characterization of metal organic chemical vapour deposition nanometri…

2007

International audience; In situ Angle Resolved X-ray Photoemission Spectroscopy (ARXPS) characterizations of TiO2 thin films grown on silicon by Metal Organic Chemical Vapour Deposition were performed in order to get information on interfacial reactions at the first stages of the growth, one of the aims being to understand the influence of deposition conditions. Thickness measurements were also carried out from ARXPS analyses. As the real structure of the films was shown to be a double layer system such as TiO2/SiO2/Si, an ARXPS model of thickness and surface coverage determination was applied to each layer independently. However, the application of this model to very thin films underestima…

Materials scienceThickness measurementSiliconPhotoemission spectroscopyAnalytical chemistrychemistry.chemical_elementARXPS02 engineering and technologySubstrate (electronics)Chemical vapor deposition01 natural sciences0103 physical sciencesMaterials ChemistryTiO2Metalorganic vapour phase epitaxyThin filmThin filmSilicon oxide010302 applied physicsMetals and AlloysSurfaces and InterfacesInterface021001 nanoscience & nanotechnologySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialschemistryMOCVD0210 nano-technologyLayer (electronics)
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Thickness-dependent properties of ultrathin bismuth and antimony chalcogenide films formed by physical vapor deposition and their application in ther…

2021

This work was supported by the European Regional Development Fund (ERDF) project No 1.1.1.1/16/A/257. J. A. acknowledges the ERDF project No. 1.1.1.2/1/16/037. Institute of Solid State Physics, University of Latvia, Latvia as the Center of Excellence has received funding from the European Union's Horizon 2020 Framework Programme H2020-WIDESPREAD-01-2016-2017 TeamingPhase2 under grant agreement No. 739508, project CAMART2 . The raw/processed data required to reproduce these findings cannot be shared at this time as the data also form a part of an ongoing study.

Materials scienceThickness-dependent thermoelectric propertiesChalcogenideMaterials Science (miscellaneous)Energy Engineering and Power Technologychemistry.chemical_element02 engineering and technology010402 general chemistry7. Clean energy01 natural sciencesBismuthlaw.inventionchemistry.chemical_compoundUltrathin filmlawSeebeck coefficientBismuth chalcogenide:NATURAL SCIENCES:Physics [Research Subject Categories]Thin filmFused quartzAntimony tellurideRenewable Energy Sustainability and the Environmentbusiness.industryAntimony telluride021001 nanoscience & nanotechnology0104 chemical sciencesFuel TechnologyNuclear Energy and EngineeringchemistryPhysical vapor depositionOptoelectronics0210 nano-technologybusinessMolecular beam epitaxyNarrow band gap layered semiconductor
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Thin Film Organic Thermoelectric Generator Based on Tetrathiotetracene

2017

This is the peer reviewed version of the following article: K. Pudzs, A. Vembris, M. Rutkis, S. Woodward, Adv. Electron. Mater. 2017, 1600429, which has been published in final form at http://onlinelibrary.wi...002/aelm.201600429/full This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving.

Materials scienceThin films02 engineering and technology010402 general chemistry01 natural sciences7. Clean energyVacuum depositionSeebeck coefficientThermoelectric effectElectronic engineering:NATURAL SCIENCES:Physics [Research Subject Categories]DopingThin filmOrganic ElectronicsOrganic electronicsThin FilmsThermoelectricsbusiness.industryOrganic electronics021001 nanoscience & nanotechnologyThermoelectric materials0104 chemical sciencesElectronic Optical and Magnetic MaterialsOrganic semiconductorThermoelectric generatorOptoelectronics0210 nano-technologybusinessAdvanced Electronic Materials
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Structural and electrical properties of magnetron sputtered Ti(ON) thin films:The case of TiN doped in situ with oxygen.

2009

International audience; Incorporation of oxygen into TiN lattice results in formation of titanium oxynitrides, TiOxNy that have become particularly interesting for photocatalytic applications. Elaboration as well as characterization of TiN and in situ oxygen-doped thin films is the subject of this paper. Thin films, 250–320nm in thickness, have been deposited by dc-pulsed magnetron reactive sputtering from Ti target under controllable gas flows of Ar, N2 and O2. Optical monitoring of Ti plasma emission line at = 500nm has been implemented in order to stabilize the sputtering rate. Scanning electron microscopy (SEM), X-ray diffraction in grazing incidence (GIXRD), micro-Raman spectroscopy, X…

Materials scienceThin filmsAnalytical chemistryEnergy Engineering and Power Technologychemistry.chemical_element02 engineering and technology01 natural scienceschemistry.chemical_compoundLattice constantX-ray photoelectron spectroscopySputtering0103 physical sciencesElectrical and Electronic EngineeringPhysical and Theoretical ChemistryThin film010302 applied physics[PHYS]Physics [physics]Titanium oxynitrideOxygen dopingOptical propertiesRenewable Energy Sustainability and the EnvironmentSputter deposition021001 nanoscience & nanotechnologyTitanium nitridechemistry0210 nano-technologyTinMagnetron sputteringTitanium
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Pulsed Direct liquid Injection ALD of TiO2 Films Using Titanium Tetraisopropoxide Precursor

2013

Abstract TiO 2 thin films are grown by pulsed direct liquid injection atomic layer deposition with rapid thermal heating using titanium tetraisopropoxide and water vapor as precursors. The ALD growth rate is constant in the saturation zone range 35-47 ms at the temperature deposition of 280 °C. The TiO 2 growth rate of 0.018 nm/cycle was achieved in a self-limited ALD mode. SEM and AFM analysis showed the as-deposited films have a smooth surface with a low roughness. XPS analysis exhibited the stoichiometry of TiO 2 in the homogenous depth composition.

Materials scienceThin films.technology industry and agricultureTitanium oxidesSurface finishPhysics and Astronomy(all)Titanium tetraisopropoxide precursorAtomic layer depositionX-ray photoelectron spectroscopyChemical engineeringPulsed liquid injection ALDDeposition (phase transition)Thin filmSaturation (magnetic)Water vaporStoichiometryPhysics Procedia
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