Search results for "Vapo"

showing 10 items of 1217 documents

Lipid hydrophobicity and physical state effects on the properties of bilayer edible films

2000

Abstract Edible bilayer films based on methylcellulose, used as the film-forming substance, and lipid mixtures, as barriers against moisture transfers, were prepared. The thickness of the lipid layer had little influence on film mechanical properties, regardless of the nature and the solid content of the fat layer. Mechanical resistance was mainly attributed to the methylcellulose matrix. The water vapor transfer rate (WVTR) decreased substantially when film thickness increased up to 100 μm. Upwards, transfer seemed to be independent of thickness. The WVTR was 1.5 up to 2.5 higher for triglyceride lipid layers than alkane lipid layers. Also, WVTR increased by a factor of 25–75 when the liqu…

Alkanechemistry.chemical_classificationChromatographyMaterials scienceMoistureBilayerFiltration and SeparationBiochemistryMembranechemistryChemical engineeringPhase (matter)General Materials SciencePhysical and Theoretical ChemistryLipid bilayerLayer (electronics)Water vaporJournal of Membrane Science
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Improving the local vertex invariants in alkane graphs through a standard molecular orbital approach

2007

Abstract In this work, novel topological indices are introduced by the application of algorithms based on molecular orbital theory. Actually, the novel indices are obtained by computing new values of the local vertex invariants (LOVIs) in alkane graphs. The most significant result is the dramatic increase in the predictive capability achieved with the topological charge indices weighted according the new LOVIs’ values in the prediction of four key properties in the set of octane isomers, namely heat of atomization, molar refraction, heat of vaporization and boiling point.

Alkanechemistry.chemical_classificationVertex (graph theory)Pure mathematicsChemistryGeneral Physics and AstronomyMolecular orbital theoryEnthalpy of vaporizationchemistry.chemical_compoundEnthalpy of atomizationComputational chemistryMolecular orbitalPhysics::Chemical PhysicsPhysical and Theoretical ChemistryTopological quantum numberOctaneChemical Physics Letters
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Templated growth of smart coatings: Hybrid chemical vapour deposition of vanadyl acetylacetonate with tetraoctyl ammonium bromide

2009

Hybrid aerosol assisted and atmospheric pressure chemical vapour deposition methodology has been utilised to produce thin films of vanadium dioxide from vanadyl acetylacetonate. Tetraoctyl ammonium bromide (TOAB) was used in the aerosol precursor solution. The films were analysed by X-ray diffraction, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy. Their optical and thermochromic behaviour was also determined. It was found that the use of TOAB had a templating effect that led to a halving in the particle size and that this consequently led to a significant decrease in the thermochromic transition temperature of the films to 34 8C.

Ammonium bromideMaterials scienceScanning electron microscopeInorganic chemistryGeneral Physics and AstronomyVanadiumchemistry.chemical_elementSurfaces and InterfacesGeneral ChemistryChemical vapor depositionCondensed Matter PhysicsSurfaces Coatings and FilmsThermochromic thin film Chemical vapor deposition CVDchemistry.chemical_compoundchemistryTransition metalX-ray photoelectron spectroscopyVanadyl acetylacetonateThin filmApplied Surface Science
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Templated growth of smart nanocomposite thin films: Hybrid aerosol assisted and atmospheric pressure chemical vapour deposition of vanadyl acetylacet…

2009

Hybrid aerosol assisted and atmospheric pressure chemical vapour deposition methodology has been utilised to produce nanocomposite thin films of gold nanoparticles and vanadium dioxide from vanadyl acetylacetonate and auric acid. The addition of tetraoctyl ammonium bromide (TOAB) to the precursor Solution gave control of the size and distribution of gold nanoparticles in the vanadium oxide matrix. These reactions led to vanadium dioxide films with reduced crystallite sizes and enhanced thermochromic properties. The films were analysed by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy. Their optical and thermochromic behaviour was also determined, This h…

Ammonium bromideNanocompositeInorganic chemistryOxideSettore ICAR/10 - Architettura TecnicaChemical vapor depositionVanadium oxideInorganic Chemistrychemistry.chemical_compoundCVD Nanocomposite Thermochromism Aerosol HybridSettore ING-IND/22 - Scienza E Tecnologia Dei MaterialichemistryX-ray photoelectron spectroscopyChemical engineeringColloidal goldMaterials ChemistryChemical Vapor Deposition CVD Vanadium dioxide thermochromic coatingsPhysical and Theoretical ChemistryVanadyl acetylacetonate
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Influence of the electro-optical properties of an a-Si:H single layer on the performances of a pin solar cell

2012

We analyze the results of an extensive characterization study involving electrical and optical measurements carried out on hydrogenated amorphous silicon (α-Si:H) thin film materials fabricated under a wide range of deposition conditions. By adjusting the synthesis parameters, we evidenced how conductivity, activation energy, electrical transport and optical absorption of an α-Si:H layer can be modified and optimized. We analyzed the activation energy and the pre-exponential factor of the dark conductivity by varying the dopant-to-silane gas flow ratio. Optical measurements allowed to extract the absorption spectra and the optical bandgap. Additionally, we report on the temperature dependen…

Amorphous siliconThin film materialThin film solar cell Activation energySingle junctionConductivitySettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materialaw.inventionchemistry.chemical_compoundElectric conductivitylawMaterials ChemistryThin filmAbsorption (electromagnetic radiation)Preexponential factorGas-flow ratioMetals and AlloysSurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsTemperature dependenceHydrogenated amorphous siliconOptoelectronicsElectric propertieQuantum efficiencyHydrogenationOptical data processingDeposition conditionSiliconMaterials scienceActivation energyQuantum efficiencySynthesis conditionVapor deposition SiliconOpticsSolar cellActivation energyDark conductivityCharacterization studieElectromagnetic wave absorptionThin filmDepositionElectrooptical propertieThin film solar cellConductivitybusiness.industryEnergy conversion efficiencySolar cellAmorphous siliconMeyer-Neldel ruleOptical propertieOptical measurementelectro-optical propertiesNanostructured materialSilicon; Solar cell; electro-optical propertiesElectrical transportchemistrySynthesis parameterOptical variables measurementSingle layerConversion efficiencybusinessOptical gap
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Electroluminescence and transport properties in amorphous silicon nanostructures

2006

We report the results of a detailed study on the structural, electrical and optical properties of light emitting devices based on amorphous Si nanostructures. Amorphous nanostructures may constitute an interesting system for the monolithic integration of optical and electrical functions in Si ULSI technology. In fact, they exhibit an intense room temperature electroluminescence (EL), with the advantage of being formed at a temperature of 900 °C, while at least 1100 °C is needed for the formation of Si nanocrystals. Optical and electrical properties of amorphous Si nanocluster devices have been studied in the temperature range between 30 and 300 K. The EL is seen to have a bell-shaped trend …

Amorphous siliconVISIBLE ELECTROLUMINESCENCEMaterials sciencePhysics and Astronomy (miscellaneous)nanostructures; silicon; elecroluminescenceExcitonBioengineeringElectronQUANTUM DOTSElectroluminescenceSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materiachemistry.chemical_compoundnanostructuresGeneral Materials ScienceSI-RICH SIO2Electrical and Electronic EngineeringLIGHT-EMITTING DEVICESEngineering (miscellaneous)business.industryMechanical EngineeringsiliconGeneral ChemistryAtmospheric temperature rangeAmorphous solidCHEMICAL-VAPOR-DEPOSITIONelecroluminescenceNanocrystalchemistryMechanics of MaterialsOptoelectronicsMaterials Science (all)businessLuminescenceNanotechnology
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Two-Dimensional Indium Selenide for Sulphur Vapour Sensing Applications

2020

Surface-to-volume ratio in two-dimensional (2D) materials highlights among their characteristics as an inherent and intrinsic advantage taking into account their strong sensitivity to surface effects. For this reason, we have proposed in this work micromechanically exfoliated 2D nanosheets of InSe as an optical vapour sensor. As a proof of concept, we used 2-mercaptoethanol as the chemical analyte in vapour phase to monitor the change of the InSe photoluminescence (PL) before and after exposure to the analyte. For short vapour exposure times (at low analyte concentration), we found a PL enhancement of InSe nanosheets attributed to the surface localization of Se defects. For long vapour expo…

AnalyteMaterials sciencePhotoluminescencePassivationGeneral Chemical EngineeringDiffusionAnalytical chemistrychemistry.chemical_elementIII-VI semiconductors02 engineering and technology010402 general chemistry01 natural sciencesArticlelcsh:Chemistrychemistry.chemical_compoundPhase (matter)Selenidevapour sensingGeneral Materials ScienceNanosheet021001 nanoscience & nanotechnologytwo-dimensional semiconductors0104 chemical scienceschemistrylcsh:QD1-999InSephotoluminescence0210 nano-technologyIndiumchemical sensorNanomaterials
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Amorphous TiO2 in LP-OMCVD TiNxOy thin films revealed by XPS

2001

Abstract TiN(O)–TiO 2 thin films were prepared on Si(1 0 0) by the low pressure organo metallic chemical vapor deposition (LP-OMCVD) method, using ammonia and titanium isopropoxide as precursors. In order to complete previous characterizations, an Ar + bombardment/XPS coupled study was carried out. This method is based on the fact that the behavior of a compound towards an ion bombardment is a function of its composition. In particular, Ar + bombardment of TiO 2 (whatever its form) leads to a preferential sputtering of oxygen atoms with subsequent reduction of titanium and formation of Ti 3+ and Ti 2+ easily detectable by XPS from a significant broadening of the Ti 2p lines. In the opposite…

Analytical chemistryGeneral Physics and Astronomychemistry.chemical_elementMineralogySurfaces and InterfacesGeneral ChemistryChemical vapor depositionCondensed Matter PhysicsSurfaces Coatings and FilmsAmorphous solidchemistry.chemical_compoundchemistryX-ray photoelectron spectroscopySputteringThin filmTitanium isopropoxideTinTitaniumApplied Surface Science
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Structure and properties of GaNxOy films grown by nitridation of GaAs (100) substrates

2004

GaAs (100) substrates have been heat-treated in a metal-organic chemical vapor deposition reactor under flows of NH 3 and an oxygen organo-metallic precursor at temperatures between 650°C and 750°C. Yellowish films formed at the surface of all the samples. Gallium, nitrogen and oxygen were detected by EDX analysis of the films. The oxygen content was estimated in the range of at 5-10 at% depending on the heat-treatment temperature. X-ray diffraction and HRTEM results indicate that the structure of the films corresponds to the hexagonal wurtzite phase of GaN with an expanded unit cell. Raman spectra show hands corresponding to the Raman active GaN modes as well as disorder-activated broad ba…

Analytical chemistrychemistry.chemical_elementChemical vapor depositionCondensed Matter PhysicsOxygenInorganic Chemistrysymbols.namesakeCrystallographychemistryMaterials ChemistrysymbolsMetalorganic vapour phase epitaxyThin filmGalliumHigh-resolution transmission electron microscopyRaman spectroscopyWurtzite crystal structureJournal of Crystal Growth
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Reactive direct current magnetron sputtered TiO2 thin films with amorphous to crystalline structures.

2008

International audience; TiO2 thin films were deposited on soda–lime glass substrates by reactive direct current magnetron sputtering in a mixture of pure argon and oxygen. The influence of both the deposition time, td, and the post-annealing treatments on the films morphology, composition and structure was analyzed by scanning electron microscopy, ellipsometry, X-ray photoelectrons spectroscopy, X-ray diffraction (XRD) and Raman spectroscopy. Amorphous TiO2 was obtained for the shortest deposition time, td=15 min. Increasing td up to 30 min, poorly crystallized anatase and rutile phases were formed together with amorphous TiO2, as was revealed by complementary XRD patterns and Raman spectra…

AnataseMaterials scienceAnalytical chemistry02 engineering and technology01 natural scienceschemistry.chemical_compoundsymbols.namesakeEllipsometry0103 physical sciencesMaterials ChemistryThin filmMicrostructure010302 applied physicsMetals and AlloysSurfaces and Interfaces021001 nanoscience & nanotechnologySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAmorphous solidX-ray diffractionCarbon filmchemistryPhysical vapor depositionTitanium dioxideRaman spectroscopysymbolsTitanium dioxide0210 nano-technologyRaman spectroscopyDC magnetron sputtering
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