Search results for "Wafer"

showing 10 items of 73 documents

Rear Side Diffractive Gratings for Silicon Wafer Solar Cells

2015

Materials scienceOpticsbusiness.industryOptoelectronicsWaferbusiness
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HCl gas gettering for crystalline silicon thin film solar cells

2011

Crystalline silicon thin film (cSiTF) solar cells could be an attractive alternative for standard silicon solar cells. Only a small amount of the expensive high purity silicon is needed for the epitaxial deposition on a low-cost silicon substrate made from e.g. metallurgical grade (MG) or upgraded metallurgical grade (UMG) silicon. The resulting product is called epitaxial wafer equivalent (EpiWE) because it can be processed in a standard wafer cell production. MG-Si and UMG-Si still contain a huge amount of metallic impurities. These impurities have to be removed by gettering methods in order to prevent diffusion into the highly pure active silicon layer during the high-temperature deposit…

Materials sciencePassivationSiliconbusiness.industryAnalytical chemistrychemistry.chemical_elementChemical vapor depositionSubstrate (electronics)law.inventionchemistrylawSolar cellOptoelectronicsWaferCrystalline siliconThin filmbusiness2011 37th IEEE Photovoltaic Specialists Conference
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Minority Carrier Lifetime Variations in Multicrystalline Silicon Wafers with Temperature and Ingot Position

2017

The minority carrier lifetimes of multicrystalline silicon wafers are mapped using microwave photoconductive decay for different temperatures and ingot positions. Wafers from the top of the ingot display larger areas with lower lifetimes compared to wafers from the bottom. The lifetimes of low-lifetime areas are found to increase with the temperature, while the lifetimes of some high-lifetime areas decrease or remain unchanged. The relative improvement of the low-lifetime areas is considerably larger than the relative change in the high-lifetime areas. We suggest that the above-mentioned observations explain, at least partially, why previous studies have found the relative temperature coeff…

Materials sciencePassivationSiliconbusiness.industrychemistry.chemical_elementCarrier lifetimePlasmachemistryPosition (vector)OptoelectronicsWaferIngotbusinessMicrowave2017 IEEE 44th Photovoltaic Specialist Conference (PVSC)
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Femtosecond laser fragmentation from water-dispersed microcolloids: toward fast controllable growth of ultrapure Si-based nanomaterials for biologica…

2020

International audience; An ultrashort laser-assisted method for fast production of concentrated aqueous solutions of ultrapure Si-based colloidal nanoparticles is reported. The method profits from the 3D geometry of femtosecond laser ablation of water-dispersed microscale colloids, prepared preliminarily by the mechanical milling of a Si wafer, in order to avoid strong concentration gradients in the ablated material and provide similar conditions of nanocluster growth within a relatively large laser caustics volume. We demonstrate the possibility for the fast synthesis of non-aggregated, low-size-dispersed, crystalline Si-based nanoparticles, whose size and surface oxidation can be controll…

Materials sciencePhotoluminescenceAqueous solutionBiomedical EngineeringNanoparticleNanotechnology02 engineering and technologyGeneral ChemistryGeneral Medicine010402 general chemistry021001 nanoscience & nanotechnologyLaser01 natural sciences7. Clean energy0104 chemical sciencesNanomaterialslaw.inventionlawFemtosecond[SPI.OPTI]Engineering Sciences [physics]/Optics / PhotonicGeneral Materials ScienceWafer0210 nano-technologyMicroscale chemistryJournal of Materials Chemistry B
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Photoluminescence Imaging and LBIC Characterization of Defects in mc-Si Solar Cells

2018

Today’s photovoltaic market is dominated by multicrystalline silicon (mc-Si) based solar cells with around 70% of worldwide production. In order to improve the quality of the Si material, a proper characterization of the electrical activity in mc-Si solar cells is essential. A full-wafer characterization technique such as photoluminescence imaging (PLi) provides a fast inspection of the wafer defects, though at the expense of the spatial resolution. On the other hand, a study of the defects at a microscopic scale can be achieved through the light-beam induced current technique. The combination of these macroscopic and microscopic resolution techniques allows a detailed study of the electric…

Materials sciencePhotoluminescenceSolid-state physicsSilicon020209 energychemistry.chemical_elementSolar cells multicrystalline silicon02 engineering and technologyMicroscopic scale0202 electrical engineering electronic engineering information engineeringMaterials ChemistryWaferElectrical and Electronic EngineeringImage resolutionbusiness.industryPhotovoltaic systemCiència dels materialsUMG siliconLBIC021001 nanoscience & nanotechnologyCondensed Matter PhysicsElectronic Optical and Magnetic MaterialsCharacterization (materials science)chemistrySemiconductorsOptoelectronics0210 nano-technologybusiness
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Silicon quantum point contact with aluminum gate

2000

Fabrication and electrical properties of silicon quantum point contacts are reported. The devices are fabricated on bonded silicon on insulator (SOI) wafers by combining CMOS process steps and e-beam lithography. Mobility of 9000 cm2 Vs−1 is measured for a 60 nm-thick SOI film at 10 K. Weak localization data is used to estimate the phase coherence length at 4.2 K The point contacts show step like behaviour in linear response conductance at 1.5 K. At 200 mK universal conductance fluctuations begin to dominate the conductance curve. The effective diameter of quantum point constrictions of the devices are estimated to be 30–40 nm. This estimate is based on TEM analysis of test structures and A…

Materials scienceSiliconCondensed matter physicsMechanical EngineeringQuantum point contactSilicon on insulatorchemistry.chemical_elementConductanceCondensed Matter PhysicsWeak localizationchemistryMechanics of MaterialsGeneral Materials ScienceWaferLithographyUniversal conductance fluctuationsMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
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Kinetics of Bulk Lifetime Degradation in Float‐Zone (FZ) Silico n : Fast Activation and Annihilation of Grown‐In Defects and the Role of Hydrogen vs …

2020

Float-zone (FZ) silicon often has grown-in defects that are thermally activated in a broad temperature window (≈300–800 °C). These defects cause efficient electron-hole pair recombination, which deteriorates the bulk minority carrier lifetime and thereby possible photovoltaic conversion efficiencies. Little is known so far about these defects which are possibly Si-vacancy/nitrogen-related (VxNy). Herein, it is shown that the defect activation takes place on sub-second timescales, as does the destruction of the defects at higher temperatures. Complete defect annihilation, however, is not achieved until nitrogen impurities are effused from the wafer, as confirmed by secondary ion mass spectro…

Materials scienceSiliconPassivationfloat-zone siliconResearchInstitutes_Networks_Beacons/photon_science_instituteTKchemistry.chemical_elementnitrogen vacancy centers02 engineering and technologyPhoton Science Institute01 natural scienceslaw.inventionlaw0103 physical sciencesSolar cellMaterials ChemistryWaferElectrical and Electronic Engineeringdefects010302 applied physicsDangling bondSurfaces and InterfacesCarrier lifetimeFloat-zone silicon021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsSecondary ion mass spectrometryfloat‐zone siliconphotovoltaicschemistryChemical physicsbulk lifetime0210 nano-technology
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Nanocrystal metal-oxide-semiconductor memories obtained by chemical vapor deposition of Si nanocrystals

2002

We have realized nanocrystal memories by using silicon quantum dots embedded in silicon dioxide. The Si dots with the size of few nanometers have been obtained by chemical vapor deposition on very thin tunnel oxides and subsequently coated with a deposited SiO2 control dielectric. A range of temperatures in which we can adequately control a nucleation process, that gives rise to nanocrystal densities of ∼3×1011 cm−2 with good uniformity on the wafer, has been defined. The memory effects are observed in metal-oxide-semiconductor capacitors or field effect transistors by significant and reversible flat band or threshold voltage shifts between written and erased states that can be achieved by …

Materials scienceSiliconPhysics and Astronomy (miscellaneous)business.industryGeneral EngineeringOxidechemistry.chemical_elementNanotechnologyChemical vapor depositionSettore ING-INF/01 - ElettronicaThreshold voltagechemistry.chemical_compoundchemistryNanocrystalMOSFETOptoelectronicsWaferField-effect transistorElectrical and Electronic EngineeringbusinessSurfaces and Interface
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Simulated and measured temperature coefficients in compensated silicon wafers and solar cells

2019

Abstract In this paper we perform a thorough investigation of the temperature coefficients of c-Si solar cells and wafers, based on both experimental data and device simulations. Groups of neighboring wafers were selected from different heights of four high performance multicrystalline silicon ingots cast using different dopants concentrations and Si feedstocks; Three different target resistivities of compensated silicon ingots based on Elkem Solar Silicon (ESS®), which are purified through a metallurgical route, and one non-compensated reference ingot. The wafers were processed into Al-BSF and PERCT type solar cells, as well as into lifetime samples subjected to selected solar cell process…

Materials scienceSiliconRenewable Energy Sustainability and the EnvironmentOpen-circuit voltageDopingAnalytical chemistrychemistry.chemical_element02 engineering and technologyCarrier lifetime010402 general chemistry021001 nanoscience & nanotechnology01 natural sciences0104 chemical sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionchemistrylawSolar cellWaferIngot0210 nano-technologyTemperature coefficientSolar Energy Materials and Solar Cells
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In situ measurement of the kinetic friction of ZnO nanowires inside a scanning electron microscope

2012

Abstract A novel method for measuring the kinetic friction force in situ was developed for zinc oxide nanowires on highly oriented pyrolytic graphite and oxidised silicon wafers. The experiments were performed inside a scanning electron microscope and used a nanomanipulation device as an actuator, which also had an atomic force microscope tip attached to it as a probe. A simple model based on the Timoshenko elastic beam theory was applied to interpret the elastic deformation of a sliding nanowire (NW) and to determine the distributed kinetic friction force.

Materials scienceSiliconScanning electron microscopeNanowireGeneral Physics and Astronomychemistry.chemical_elementNanotechnologySurfaces and InterfacesGeneral ChemistryCondensed Matter PhysicsSurfaces Coatings and FilmsCondensed Matter::Materials ScienceHighly oriented pyrolytic graphitechemistryNanotribologyWaferGraphiteComposite materialActuatorApplied Surface Science
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