Search results for "rfa"

showing 10 items of 11106 documents

High-frequency electrodeless lamps in argon–mercury mixtures

2005

In this paper, numerical and experimental investigations of high-frequency (HF) electrodeless lamps in argon–mercury mixtures are performed. The intensities of the mercury spectral lines having wavelengths λ = 404.66, 435.83, 546.07 nm (7 3S1–6 3P0,1,2) and the resonance line λ = 253.7 nm (6 3 P1–6 1S0) are measured at a wide range of mercury pressures, varying the HF generator current and argon filling pressure. A stationary self-consistent model of HF electrodeless discharge lamp is developed including kinetics of the excited mercury and argon atomic states. Based on the developed model, the radiation characteristics of the discharge plasma are calculated. Numerical simulation of the line…

010302 applied physicsGas-discharge lampArgonAcoustics and Ultrasonics[SPI.PLASMA]Engineering Sciences [physics]/PlasmasAnalytical chemistrychemistry.chemical_elementPlasmaRadiationCondensed Matter Physics01 natural sciencesSpectral lineSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionMercury (element)010309 opticsWavelengthchemistrylawExcited state0103 physical sciences[SPI.OPTI]Engineering Sciences [physics]/Optics / PhotonicComputingMilieux_MISCELLANEOUS
researchProduct

Topological insulator nanoribbon Josephson junctions: Evidence for size effects in transport properties

2020

We have used Bi$_2$Se$_3$ nanoribbons, grown by catalyst-free Physical Vapor Deposition to fabricate high quality Josephson junctions with Al superconducting electrodes. In our devices we observe a pronounced reduction of the Josephson critical current density $J_c$ by reducing the width of the junction, which in our case corresponds to the width of the nanoribbon. Because the topological surface states extend over the entire circumference of the nanoribbon, the superconducting transport associated to them is carried by modes on both the top and bottom surfaces of the nanoribbon. We show that the $J_c$ reduction as a function of the nanoribbons width can be accounted for by assuming that on…

010302 applied physicsJosephson effectSurface (mathematics)SuperconductivityMaterials scienceSettore FIS/03Condensed matter physicsCondensed Matter - SuperconductivityGeneral Physics and AstronomyFOS: Physical sciences02 engineering and technology021001 nanoscience & nanotechnology01 natural sciencesSuperconductivity (cond-mat.supr-con)Topological insulatorPhysical vapor depositionCondensed Matter::Superconductivity0103 physical sciencesElectrodePhysics::Chemical Physics0210 nano-technologyQuantumSurface states
researchProduct

Determination of Contact Potential Difference by the Kelvin Probe (Part II) 2. Measurement System by Involving the Composite Bucking Voltage

2016

Abstract The present research is devoted to creation of a new low-cost miniaturised measurement system for determination of potential difference in real time and with high measurement resolution. Furthermore, using the electrode of the reference probe, Kelvin method leads to both an indirect measurement of electronic work function or contact potential of the sample and measurement of a surface potential for insulator type samples. The bucking voltage in this system is composite and comprises a periodically variable component. The necessary steps for development of signal processing and tracking are described in detail.

010302 applied physicsKelvin probe force microscopeMaterials sciencesurface potentialbusiness.industrySystem of measurementPhysicsQC1-999Composite numberGeneral EngineeringGeneral Physics and Astronomy02 engineering and technology021001 nanoscience & nanotechnology01 natural sciencesOpticscontact potential differencekelvin probe0103 physical sciences0210 nano-technologybusinessVolta potentialVoltageLatvian Journal of Physics and Technical Sciences
researchProduct

Determination of Contact Potential Difference by the Kelvin Probe (Part I) I. Basic Principles of Measurements

2016

Abstract Determination of electric potential difference using the Kelvin probe, i.e. vibrating capacitor technique, is one of the most sensitive measuring procedures in surface physics. Periodic modulation of distance between electrodes leads to changes in capacitance, thereby causing current to flow through the external circuit. The procedure of contactless, non-destructive determination of contact potential difference between an electrically conductive vibrating reference electrode and an electrically conductive sample is based on precise control measurement of Kelvin current flowing through a capacitor. The present research is devoted to creation of a new low-cost miniaturised measuremen…

010302 applied physicsKelvin probe force microscopesurface potentialMaterials scienceCondensed matter physicsPhysicsQC1-999General EngineeringGeneral Physics and Astronomy01 natural sciencescontact potential differencekelvin probe0103 physical sciences010306 general physicsVolta potentialLatvian Journal of Physics and Technical Sciences
researchProduct

Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films

2006

Atomic layer deposition (ALD) of lanthanum oxide on glass and silicon substrates was examined using lanthanum silylamide, La[N(SiMe 3 ) 2 ] 3 , and water as precursors in the substrate temperature range of 150-250 °C. The effect of pulse times and precursor evaporation temperature on the growth rate and refractive index was investigated. The films remained amorphous regardless of the deposition conditions. The resulting La 2 O 3 films contained noticeable amounts of hydrogen and silicon and were chemically unstable while stored in ambient air. Lanthanum aluminum oxide films were achieved with stoichiometry close to that of LaAlO 3 at 225°C from La[N(SiMe 3 ) 2 ] 3 , Al(CH 3 ) 3 , and H 2 O.…

010302 applied physicsLanthanideSiliconProcess Chemistry and TechnologyInorganic chemistrychemistry.chemical_element02 engineering and technologySurfaces and InterfacesGeneral ChemistrySubstrate (electronics)021001 nanoscience & nanotechnology01 natural sciencesEvaporation (deposition)Amorphous solidAtomic layer depositionchemistry.chemical_compoundchemistryLanthanum oxide0103 physical sciencesLanthanum0210 nano-technologyChemical Vapor Deposition
researchProduct

2018

CrN thin films with an N/Cr ratio of 95% were deposited by reactive magnetron sputtering onto (0 0 0 1) sapphire substrates. X-ray diffraction and pole figure texture analysis show CrN (1 1 1) epitaxial growth in a twin domain fashion. By changing the nitrogen versus argon gas flow mixture and the deposition temperature, thin films with different surface morphologies ranging from grainy rough textures to flat and smooth films were prepared. These parameters can also affect the CrN x system, with the film compound changing between semiconducting CrN and metallic Cr2N through the regulation of the nitrogen content of the gas flow and the deposition temperature at a constant deposition pressur…

010302 applied physicsMaterials scienceAcoustics and Ultrasonics02 engineering and technologyPole figure021001 nanoscience & nanotechnologyCondensed Matter PhysicsMicrostructure01 natural sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsElectrical resistivity and conductivitySputteringSeebeck coefficient0103 physical sciencesThermoelectric effectsense organsTexture (crystalline)Thin filmComposite material0210 nano-technologyJournal of Physics D: Applied Physics
researchProduct

The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges

2017

Two distinguishable plasma modes in the O2–N2 radio frequency capacitively coupled plasma (CCP) used in remote plasma-enhanced atomic layer deposition (PEALD) were observed. Optical emission spectroscopy and spectra interpretation with rate coefficient analysis of the relevant processes were used to connect the detected modes to the α and γ modes of the CCP discharge. To investigate the effect of the plasma modes on the PEALD film growth, ZnO and TiO2 films were deposited using both modes and compared to the films deposited using direct plasma. The growth rate, thickness uniformity, elemental composition, and crystallinity of the films were found to correlate with the deposition mode. In re…

010302 applied physicsMaterials scienceAcoustics and UltrasonicsCapacitive sensingAnalytical chemistry02 engineering and technologyPlasma021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesSpectral lineSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAtomic layer depositionCrystallinity0103 physical sciencesDeposition (phase transition)plasma modesCapacitively coupled plasmaRadio frequency0210 nano-technologyplasma-enhanced atomic layer deposition
researchProduct

Tuning of interfacial perpendicular magnetic anisotropy and domain structures in magnetic thin film multilayers

2019

We investigate the magnetic domain structures and the perpendicular magnetic anisotropy (PMA) arising in CoFeB films interfaced with selected heavy metal (HM) layers with large spin Hall angles in HM/CoFeB/MgO (HM = W, Pt, Pd, W x Ta1−x ) stacks as a function of CoFeB thickness and composition for both as-deposited and annealed materials stacks. The coercivity and the anisotropy fields of annealed material stacks are higher than for the as-deposited stacks due to crystallisation of the ferromagnetic layer. Generally a critical thickness of MgO > 1 nm provides adequate oxide formation at the top interface as a requirement for the generation of PMA. We demonstrate that in stacks with Pt as th…

010302 applied physicsMaterials scienceAcoustics and UltrasonicsCondensed matter physicsMagnetic domainAnnealing (metallurgy)02 engineering and technologyCoercivity021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsTransition metalFerromagnetismHall effect0103 physical sciencesThin film0210 nano-technologyAnisotropyJournal of Physics D: Applied Physics
researchProduct

Quantitative analysis of magnetization reversal in Ni thin films on unpoled and poled (0 1 1) [PbMg1/3Nb2/3O3]0.68–[PbTiO3]0.32piezoelectric substrat…

2016

The field angle dependence of the magnetization reversal in 20 nm thick polycrystalline Ni films grown on piezoelectric (0 1 1) [PbMg1/3Nb2/3O3](0.68)-[PbTiO3](0.32) (PMN-PT) substrates is analysed quantitatively to study the magnetic anisotropy induced in the film by poling the piezosubstrate. While the PMN-PT is in the unpoled state, the magnetization reversal is almost isotropic as expected from the polycrystalline nature of the film and corresponding to an orientation ratio (OR) of 1.2. The orientation ratio is obtained by fitting the angular dependence of normalized remanent magnetization to an adapted Stoner-Wohlfarth relation. Upon poling the piezosubstrate, a strong uniaxial anisotr…

010302 applied physicsMaterials scienceAcoustics and UltrasonicsCondensed matter physicsMagnetic momentbusiness.industryIsotropyPoling02 engineering and technologyCoercivity021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesPiezoelectricitySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsMagnetic anisotropyOpticsRemanence0103 physical sciencesddc:530FIELD0210 nano-technologyAnisotropybusinessJournal of Physics D: Applied Physics
researchProduct

The effects of thermal treatment on structural, morphological and optical properties of electrochemically deposited Bi2S3 thin films

2017

Abstract Thin films of bismuth sulfide (Bi 2 S 3 ) have been electrochemically deposited on indium–doped tin oxide substrates from aqueous solutions of Bi(NO 3 ) 3 , ethylene diamine tetraacetic acid (EDTA) and Na 2 S 2 O 3 . The structural properties of the films were characterized using X–ray diffraction and high–resolution transmission electron microscopy analyses. The film crystallizes in an orthorhombic structure of Bi 2 S 3 along with metallic bismuth. Thermal annealing of the prepared film in sulfur atmosphere improves its crystallinity and cohesion. The band gap values of the deposited film before and after annealing at 400 °C were found to be 1.28 and 1.33 eV, respectively.

010302 applied physicsMaterials scienceAnnealing (metallurgy)Band gapInorganic chemistryMetals and Alloyschemistry.chemical_element02 engineering and technologySurfaces and InterfacesThermal treatment021001 nanoscience & nanotechnologyTin oxide01 natural sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsBismuthCrystallinitychemistryChemical engineeringTransmission electron microscopy0103 physical sciencesMaterials ChemistryThin film0210 nano-technologyThin Solid Films
researchProduct