Search results for "sputtering"
showing 10 items of 136 documents
Synthesis and characterization of cobalt silicide films on silicon
2006
Cobalt silicide has emerged as a leading contact material in silicon technology due to its low resistivity, high stability and small lattice mismatch. In this study, 0.2-0.4 mu m thick Co films were deposited on Si(100) wafers by RF magnetron sputtering at room temperature, and annealed at temperatures from 600 to 900 degrees C in vacuum. As-deposited and annealed samples were characterized by Rutherford backscattering spectrometry (RBS), nuclear reaction analysis (NRA), X-ray diffraction (XRD) and scanning electron microscopy (SEM). Although the Si substrates were sputter cleaned before the deposition, all the samples showed a thin oxide layer at the Si/Co interfaces. Annealing up to 700 d…
Corrosion processes and their inhibition as studied by Mössbauer conversion and other electron spectroscopies
1989
To study corrosion processes of iron and steel and measures of their inhibition, a detailed knowledge of the phase composition and of phase transformations in very thin layers close to the attacked surface of the material is necessary. The information depths of integral (ICEMS) and depth selective (DCEMS) conversion electron Mossbauer spectroscopy are well suited for such investigations, but some effort is necessary if technical samples, i.e. nonenriched in57Fe, are to be studied. In many cases of practical importance, full information on the corroded surfaces cannot be got from Mossbauer spectra only, and a combination with Auger and photoelectron spectroscopies, in-including scanning and …
Molecular dynamics simulation of the damage production in Al (110) surface with slow argon ions
1986
We have developed a molecular dynamics simulation program to gain more insight into the sputtering process, especially the damage produced by it. We have studied the sputtering of aluminium (110) surface with argon ions. The Morse pair potentail was used for Al−Al interaction, the Lennard-Jones potential for Ar−Ar interaction and both the Moliere potential and the universal potential of Ziegler et al. for Ar−Al interaction. An electronic friction term proportional to the particle velocities was also used. The studied incident argon ion energies and angles were 200 and 400 eV and 0° (normal), 25°, 45° and 75°, respectively. The calculated sputtering yield and the overall shape and the mean d…
Measuring the isotope effect on the gross beryllium erosion in JET
2022
Abstract The isotope effect, hydrogen (H) versus deuterium (D), on the gross beryllium (Be) erosion yield has been measured in ohmic limiter plasmas in JET tokamak by spectroscopic means. A simplified method to extract the effective sputtering yield from the quotient of the radiances of the D α or D γ and the Be II lines at 527 nm was applied. A clear isotope effect has been found, the erosion yield of D being about a factor of 2 larger compared to H in the whole explored plasma density range. This is in agreement with physical sputtering data obtained with H+ and D+ ion beams and also with material surface computer simulations. The already published contribution of chemically assisted phys…
Ion beam development for the needs of the JYFL nuclear physics programme
2008
The increased requirements towards the use of higher ion beam intensities motivated us to initiate the project to improve the overall transmission of the K130 cyclotron facility. With the facility the transport efficiency decreases rapidly as a function of total beam intensity extracted from the JYFL ECR ion sources. According to statistics, the total transmission efficiency is of the order of 10% for low beam intensities (I(total)or =0.7 mA) and only about 2% for high beam intensities (I(total)1.5 mA). Requirements towards the use of new metal ion beams for the nuclear physics experiments have also increased. The miniature oven used for the production of metal ion beams at the JYFL is not …
Versatile use of ion beams for diffusion studies by the modified radiotracer technique
2004
Abstract In the modified radiotracer technique ion beams within a broad energy range are employed. They include energetic light particles ensuring radioactive isotope production via nuclear reactions, keV-ion implantation of radiotracers and sputtering by low energy heavy ions for depth profiling. If the involved ion–solid interactions are properly taken into account, the technique provides an effective means for solid-state diffusion studies under demanding conditions. The various aspects related to the modified radiotracer technique are surveyed and discussed. The reliability of the procedure is demonstrated by comparisons with corresponding profiles obtained by secondary ion mass spectro…
Mechanical behavior and limits to the microhardness testing of hard multilayer coatings on soft substrates
2000
Multilayer coatings of (Ti, Al) N x , (Ti, C)N x and (Nb, C)N x with bilayer thickness of 0.8-8 nm have been deposited by reactive sputtering on stainless steel substrates. Vickers microhardness measurements in the load range of 3.10 -3 to 1 N were performed using a self-adjusting tester. It has been shown that in order to obtain the true hardness of multilayer coatings on a softer substrate, the indentation depth should not exceed about 10% of the coating thickness. Indentation criteria for polycrystalline, amorphous and nanostructured multilayer coatings are compared. The obtained criterion for multilayer coatings is close to that for amorphous films.
Sputtered cuprous oxide thin films and nitrogen doping by ion implantation
2016
Abstract The structural, optical and electrical properties of sputtered cuprous oxide thin films have been optimized through post-deposition thermal treatments. Moreover we have studied the effects of nitrogen doping introduced by ion implantation followed by the optimized oxidant thermal annealing. Three concentrations have been used, 0.6 N%, 1.2 N%, and 2.5 N%. Along with the preservation of the Cu 2 O phase, a slight optical band gap narrowing and a significant conductivity enhancement has been observed with respect to the undoped samples. These results can be justified by the absence of further oxygen vacancies promoted by dopant introduction and by the substitution of O atoms by N ones…
Formation and evolution of self-organized Au nanorings on indium-tin-oxide surface
2011
This work reports on the formation of Au nanoclusters and on their evolution in nanoring structures on indium-tin-oxide surface by sputtering deposition and annealing processes. The quantification of the characteristics of the nanorings (surface density, depth, height, and width) is performed by atomic force microscopy. The possibility to control these characteristics by tuning annealing temperature and time is demonstrated establishing relations which allow to set the process parameters to obtain nanostructures of desired morphological properties for various technological applications. © 2011 American Institute of Physics.
Étude par microscopie électronique et spectroscopie de films minces catalytiques pour micro piles à combustibles
2016
Předložená dizertační práce se zabývá studiem nových katalyzátorů na bázi kov-oxid vhodných pro použití v palivových článcích na straně anody. Platinou dopovaný oxid ceru připravený magnetronovým naprašováním ve formě tenkých vrstev na uhlíkových mezivrstvách nesených křemíkovým substrátem byl zkoumán prostřednictvím mikroskopických a spektroskopických metod. Vliv složení uhlíkového nosiče (a-C a CNx filmy), depozičního času CeOx vrstvy a dalších depozičních parametrů, např. depoziční rychlosti, složení pracovní atmosféry a Pt koncentrace na morfologii Pt-CeOx vrstev byl studován převážně pomocí transmisní elektronové mikroskopie (TEM). Získané výsledky ukazují, že vhodnou kombinací depozič…