Search results for "sputtering"

Platinum-doped CeO2 thin film catalysts prepared by magnetron sputtering.

2010

The interaction of Pt with CeO(2) layers was investigated by using photoelectron spectroscopy. The 30 nm thick Pt doped CeO(2) layers were deposited simultaneously by rf-magnetron sputtering on a Si(001) substrate, multiwall carbon nanotubes (CNTs) supported by a carbon diffusion layer of a polymer membrane fuel cell and on CNTs grown on the silicon wafer by the CVD technique. The synchrotron radiation X-ray photoelectron spectra showed the formation of cerium oxide with completely ionized Pt(2+,4+) species, and with the Pt(2+)/Pt(4+) ratio strongly dependent on the substrate. The TEM and XRD study showed the Pt(2+)/Pt(4+) ratio is dependent on the film structure.

2018

CrN thin films with an N/Cr ratio of 95% were deposited by reactive magnetron sputtering onto (0 0 0 1) sapphire substrates. X-ray diffraction and pole figure texture analysis show CrN (1 1 1) epitaxial growth in a twin domain fashion. By changing the nitrogen versus argon gas flow mixture and the deposition temperature, thin films with different surface morphologies ranging from grainy rough textures to flat and smooth films were prepared. These parameters can also affect the CrN x system, with the film compound changing between semiconducting CrN and metallic Cr2N through the regulation of the nitrogen content of the gas flow and the deposition temperature at a constant deposition pressur…

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

2018

A comparative study of mechanical properties and elemental and structural composition was made for aluminum nitride thin films deposited with reactive magnetron sputtering and plasma enhanced atomic layer deposition (PEALD). The sputtered films were deposited on Si (100), Mo (110), and Al (111) oriented substrates to study the effect of substrate texture on film properties. For the PEALD trimethylaluminum–ammonia films, the effects of process parameters, such as temperature, bias voltage, and plasma gas (ammonia versus N2/H2), on the AlN properties were studied. All the AlN films had a nominal thickness of 100 nm. Time-of-flight elastic recoil detection analysis showed the sputtered films t…

Retention of Pb isotopes in glass surfaces for retrospective assessment of radon exposure

2006

Abstract In recent years there has been increasing interest in radio-epidemiological techniques to retrospectively measure the radon dose exposure by determining the activity of 210Pb, the longest-lived 222Rn progeny, in glass surface layers. In this study the diffusion of 39 keV 209Pb+ ions implanted into glass using the IGISOL facility has been studied under conditions that mimic the recoil implantation of 210Pb from 222Rn. The resulting depth distributions of 209Pb were then measured after heat treatment in vacuum at different temperatures by a sputter erosion technique. The diffusion coefficient could be described by an Arrhenius equation D = D0exp(−H/kT) where D 0 = 0.30 - 0.24 + 1.14 …

Stabilisation of tetragonal zirconia in oxidised ZrSiN nanocomposite coatings

2004

Abstract ZrSiN coatings were deposited on steel and silicon substrates by reactive sputtering of a composite ZrSi target. The coatings were oxidised in air in the 600–750 °C temperature range. As-deposited and oxidised films were characterised by X-ray diffraction, micro-Raman spectroscopy, X-ray photoemission spectroscopy and glow discharge optical emission spectroscopy. The oxidation behaviour of ZrSiN coatings was compared to that of ZrN ones. It was demonstrated that addition of silicon in the 3–5 at.% range into ZrN-based coatings promotes the onset of oxidation by nearly 100 °C. The structure of the oxide layer was strongly dependent on the film’s silicon content: monoclinic zirc…

Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers

2013

International audience; Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the innovative technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Transmission Electron Microscopy (TEM) and Energy-dispersive X-ray (EDX) spectroscopy techniques. Moreover, electrical properties were also studied by the Van der Pauw technique.

A pulsed laser technique for an evaluation of the spall resistance of sputtered oxide films: diagnostic by interferometric probing

1998

Abstract A pulsed laser technique, based on conventional laser acoustics testing, has been developed to define the spall resistance of sputtered oxide films on a metallic target. Direct irradiation of the coated side of the sample generates an acoustic source at the inner film–metal interface. A model of the laser-induced epicentral displacements at the opposite side that takes into account the confining effect of the coating has been proposed to evaluate the critical laser irradiance corresponding to progressive damages at the inner film–metal interface, i.e. interface delamination, film spallation and film expulsion, respectively. The behavior of Al 2 O 3 and ZrO 2 films deposited by PVD …

Structural, electrical and optical characteristics of Al-doped zinc oxide thin films deposited by reactive magnetron sputtering

2013

ZnO:Al (AZO) thin films on glass were deposited by DC reactive magnetron sputtering at approximately 300°C substrate temperature. Structural, electrical and optical properties were investigated as a function of oxygen flow. XRD data shows that AZO thin films are polycrystalline with pronounced c-axis orientation and the grain size increasing with the oxygen flow. The lowest achieved resistivity within the deposited set of samples was 7.6·10 -4 Ωcm. The transmittance of AZO films was above 80 % at 550 nm with the optical band gap between 3.4 and 3.8 eV.

Single-Crystal vs Polycrystalline Gold: A Non-linear-Optics Analysis

2017

Standard gold in the field of plasmonics is obtained by evaporation or sputtering and therefore is polycrystalline. Yet, this gold presents numbers of drawbacks such as roughness, grains and ill-defined electronic band diagrams in addition to the lack of reproducibility from one instrument to another. It is, thus, beneficial to turn to a metal production that can enable well-defined and controlled gold parameters. To that end, we have explored the wet synthesis of gold nanoplates which represents a simple and robust means of obtaining single-crystal gold (Guo Z, Zhang Y, DuanMu Y, Xu L, Xie S, Gu N, Colloids Surf A 278:33–38, 2006). The synthesized nanoplates are from 50 to less than 100 nm…

Characterization of structural, optical and electric properties of TiO2 thin films prepared by reactive DC magnetron sputtering.

2007

International audience