Search results for "sputtering"
showing 10 items of 136 documents
Manufacturing and testing of a metal supported Ni-YSZ/YSZ/La2NiO4 IT-SOFC synthesized by physical surface deposition processes
2017
International audience; The manufacture of the last generation metal supported IT-SOFC complete cell by dry surface deposition pro-cesses is really challenging. Atmospheric Plasma Spraying (APS) and Reactive Magnetron Sputtering (RMS) processes are respectively adapted to deposit Ni-YSZ anode and YSZ electrolyte layers. RMS is also used to coat a thin and dense La2NiO4 (LNO) cathode layer. In this work, we have realized a complete cell on metallic support (ITM) produced by PLANSEE SE. The innovative LNO cathode layer was compared with screen-printed LNO layers, with and without RMS bonding layer. Electrochemical and Voltammetry tests were performed on these samples. It reveals lower perform…
Porous inorganic–organic hybrid material by oxygen plasma treatment
2011
In this paper, we present the pore formation on inorganic–organic hybrid material, ORMOCER©, by reactive ion etching. ORMOCERs are composed of inorganic backbone where organic side groups are attached by cross-linking. Etching of ORMOCER in oxygen plasma generates porous materials with different pore sizes depending on the etching parameters. In addition to planar films, this pore formation process is applicable to micro and nanostructures. Characteristics of porous materials are evaluated by contact angle measurement, scanning electron microscopy, Fourier transform infrared-attenuated total reflectance spectroscopy, time-of-flight elastic recoil detection analysis and Rutherford backscatte…
Reactive sputtering of nanostructured multilayer coatings and their tribological properties
1999
Abstract The present study describes and reports on reactive sputtering of nanostructured multilayer coatings. A 3 μm coating for instance may contain up to a few thousand bilayers of two different film materials, and in order to achieve this, a substrate holder rotates through two different sputtering zones in an Alcatel SC 650 sputtering equipment with metal and carbon cathodes operating concurrently in the so-called side-by-side configuration. In reactive sputtering of nitrides, reactive nitrogen was controlled very accurately in order to establish controllable points on a total sputtering pressure versus nitrogen flow curve. Nanostructured multilayer coatings of the type MeN/C–N were de…
<title>Micromechanical properties of AIN, TiN, and AIN/TiN nanostructured multilayer coatings</title>
2003
Coatings of AlN, TiN and nanostructured multilayer AlN/TiN have been deposited by reactive sputtering on sapphire, tungsten carbide (WC) and stainless steel substrates. The microhardness, adhesion and formation of cracks under indentation tests, were investigated. It was found that the adhesion of coatings on steel was higher, than on WC for all investigated samples. Nanostructured multilayer AlN/TiN films have the best adhesion and fracture toughness both on the hard (WC) and on the soft (stainless steel) substrates if compared with that for AlN and TiN "single layer" coatings. The effect of γ-radiation on mechanical properties of transparent AlN films was investigated. After the exposure …
WC-based thin films obtained by reactive radio-frequency magnetron sputtering using W target and methane gas
2015
Abstract Deposition of tungsten carbide (WC) films was investigated by radio-frequency reactive sputtering using a tungsten target and methane gas. The effect of some processing parameters (pressure, power, CH 4 -to-Ar gas flow ratio) upon the chemical and structural properties of the films has been investigated. The evolution of the chemical composition has been analyzed by photoemission, the microstructure has been studied through electron microscopy techniques and the crystallographic structure was investigated by X-ray diffraction as well as Raman spectroscopy. This study demonstrates that the formation of tungsten carbide is highly dependent on the deposition conditions: thin films are…
Investigation of ISIS and Brookhaven National Laboratory ion source electrodes after extended operation.
2012
Linac4 accelerator of Centre Européen de Recherches Nucléaires is under construction and a RFdriven H− ion source is being developed. The beam current requirement for Linac4 is very challenging: 80 mA must be provided. Cesiated plasma discharge ion sources such as Penning or magnetron sources are also potential candidates. Accelerator ion sources must achieve typical reliability figures of 95% and above. Investigating and understanding the underlying mechanisms involved with source failure or ageing is critical when selecting the ion source technology. Plasma discharge driven surface ion sources rely on molybdenum cathodes. Deformation of the cathode surfaces is visible after extended opera…
Structure and chemical bonds in reactively sputtered black Ti–C–N–O thin films
2011
The evolution of the nanoscale structure and the chemical bonds formed in Ti–C–N–O films grown by reactive sputtering were studied as a function of the composition of the reactive atmosphere by increasing the partial pressure of an O2+N2 gas mixture from 0 up to 0.4 Pa, while that of acetylene (carbon source) was constant. The amorphisation of the films observed by transmission electron microscopy was confirmed by micro- Raman spectroscopy, but it was not the only effect associated to the increase of the O2+N2 partial pressure. The chemical environment of titanium and carbon, analysed by X-ray photoemission spectroscopy, also changes due to the higher affinity of Ti towards oxygen and nitro…
Phase mixture in MOCVD and reactive sputtering TiOxNy thin films revealed and quantified by XPS factorial analysis.
2006
Abstract Titanium oxynitride thin films have been deposited by low-pressure metalorganic chemical vapour deposition and reactive sputtering. The growth temperature for chemical vapour-deposited films and water vapour partial pressure for sputter-deposited films have been used to modulate the chemical composition. Both series have been analysed using X-ray photoelectron spectroscopy (XPS) in order to describe the structure of the materials using a factorial analysis approach. Titanium and metalloid concentrations have also been determined and compared to an elemental analysis performed using Rutherford backscattering spectroscopy and nuclear reaction analysis. The two deposition methods led …
High power impulse magnetron sputtering of Zn/Al target in an Ar and Ar/O2 atmosphere: The study of sputtering process and AZO films
2019
Financial support provided by Scientific Research Project for Students and Young Researchers Nr. SJZ/2017/4 realised at the Institute of Solid State Physics, University of Latvia is greatly acknowledged.
Nucleant layer effect on nanocolumnar ZnO films grown by electrodeposition
2013
Different ZnO nanostructured films were electrochemically grown, using an aqueous solution based on ZnCl2, on three types of transparent conductive oxides grow on commercial ITO (In2O3:Sn)-covered glass substrates: (1) ZnO prepared by spin coating, (2) ZnO prepared by direct current magnetron sputtering, and (3) commercial ITO-covered glass substrates. Although thin, these primary oxide layers play an important role on the properties of the nanostructured films grown on top of them. Additionally, these primary oxide layers prevent direct hole combination when used in optoelectronic devices. Structural and optical characterizations were carried out by scanning electron microscopy, atomic for…