Search results for " Writing"
showing 10 items of 305 documents
Development of micro-contact printing of osteosarcoma cells using MeV ion beam lithography
2009
Abstract For investigation of spatial effects in signalling between cells and also signal substances that trigger cell proliferation and behaviour we are developing a micro Contact Printing process ( μ CP ) . In order to allow printing of cells stamps with high aspect ratio are required and these have been fabricated using Programmed Proximity Aperture Lithography (PPAL) with 3 MeV 4 He 2 + ions to produce PMMA masters for casting the stamps in PDMS. A simple printing device was developed and the first results using this to print human osteosarcoma cells is demonstrated.
Growth of osteoblasts on lithographically modified surfaces
2007
Here we report about preliminary investigations on developing substrates for culturing osteoblasts, the cells responsible for production of mineralised bone, by lithographically modifying the surfaces of several materials. The proton beam writing system at the National University of Singapore was used to fabricate high aspect ratio structures in PMMA, while two-dimensional low aspect ratio structures were fabricated using conventional electron beam lithography (EBL) and UV lithography (UVL) in SU-8. It was found that oxygen plasma treatment of structured SU-8 surfaces changed the surface layer and significantly improved cell attachment and proliferation. Cells grown on patterned thick PMMA …
Development of elastomeric lab-on-a-chip devices through Proton Beam Writing (PBW) based fabrication strategies
2009
Abstract In recent years, one of the most exciting developments in fluidic device applications is the rapid evolution of miniaturized micro- and nanofluidic systems, the so called “lab-on-a-chip” devices. These devices integrate laboratory functions into a single chip, and are capable of various biochemical analysis and synthesis, such as sample injection and preparation, single cell/molecule observation, bioparticle sequencing and sorting etc. The evolvement of lab-on-a-chip concept implies the use of novel fabrication techniques for the construction of versatile analytical components in a fast and reproducible manner. Endowed with unique three-dimensional fabrication abilities, Proton Bea…
Nano-imaging of single cells using STIM
2007
Scanning transmission ion microscopy (STIM) is a technique which utilizes the energy loss of high energy (MeV) ions passing through a sample to provide structural images. In this paper, we have successfully demonstrated STIM imaging of single cells at the nano-level using the high resolution capability of the proton beam writing facility at the Centre for Ion Beam Applications, National University of Singapore. MCF-7 breast cancer cells (American Type Culture Collection [ATCC]) were seeded on to silicon nitride windows, backed by a Hamamatsu pin diode acting as a particle detector. A reasonable contrast was obtained using 1 MeV protons and excellent contrast obtained using 1 MeV alpha parti…
Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions
2012
Abstract Poly(methyl methacrylate) is a common polymer used as a lithographic resist for all forms of particle (photon, ion and electron) beam writing. Faithful lithographic reproduction requires that the exposure dose, Θ, lies in the window Θ 0 ⩽ Θ Θ × 0 , where Θ 0 and Θ × 0 represent the clearing and cross-linking onset doses, respectively. In this work we have used the programmable proximity aperture ion beam lithography systems in Chiang Mai and Jyvaskyla to determine the exposure characteristics in terms of fluence for 2 MeV protons, 3 MeV 4 He 2 + and 6 MeV 12 C 3 + ions, respectively. After exposure the samples were developed in 7:3 by volume propan-2-ol:de-ionised water mixture. At…
Adhesion of proton beam written high aspect ratio hydrogen silsesquioxane (HSQ) nanostructures on different metallic substrates
2009
Abstract Hydrogen silsesquioxane (HSQ) behaves as a negative resist under MeV proton beam exposure. HSQ is a high-resolution resist suitable for production of tall (
Proton beam written hydrogen silsesquioxane (HSQ) nanostructures for Nickel electroplating
2009
Abstract Hydrogen silsesquioxane (HSQ) behaves as a negative resist under MeV proton beam exposure. HSQ is a high-resolution resist suitable for production of tall ( 1.5 μ m ) high-aspect-ratio nanostructures with dimensions down to 22 nm. High-aspect-ratio HSQ structures are required in many applications, e.g. nanofluidics, biomedical research, etc. Since P-beam writing is a direct and hence slow process, it is beneficiary to fabricate a reverse image of the patterns in a metallic stamp, e.g. by Ni electroplating. The Ni stamp can then be used to produce multiple copies of the same pattern. In this study we investigate the possibility to produce Ni stamps from p-beam written HSQ samples. H…
Democratic Dialogue and Development: An Intellectual Obituary of Björn Gustavsen
2018
Abstract Bjorn Gustavsen, with an original professional background as a lawyer and judge in his native Norway, had a formative role in organisational development processes in Norway, Sweden, Scandinavia and the European Union over four decades. Following in the tradition of Norwegian working life research by Trist and Thorsrud, he provided the conceptual framework and practical case studies which have driven major national and international programmes. He learned from different experience of organisational change in, for example, the USA and Japan, but he identified a distinctive way forward for the European Union, where he acted as a senior adviser. In contrast to conventional Taylorist to…
“Le voci dell’Africa nelle lettere italiane”
2007
By referring to the postcolonial and diaspora studies, the essay analyzes the rise of a multicultural literature in Italy where Africa's literary voices contribute to a transformation of the national canon, opening it up to the contemporary notion of a transnational literature that crosses languages, territories and cultures.
Solution of the Lindblad equation in Kraus representation
2006
The so-called Lindblad equation, a typical master equation describing the dissipative quantum dynamics, is shown to be solvable for finite-level systems in a compact form without resort to writing it down as a set of equations among matrix elements. The solution is then naturally given in an operator form, known as the Kraus representation. Following a few simple examples, the general applicability of the method is clarified.