Search results for "21"

showing 10 items of 34876 documents

Reactive Sintering of molybdenum disilicide by Spark Plasma Sintering from mechanically activated powder mixtures: Processing parameters and properti…

2008

Abstract Dense molybdenum disilicide with a nano-organized microstructure was synthesized by mechanical activation, by producing nanostructured agglomerates of a 1:2 mixture of Mo and Si, followed by the synthesis/consolidation in one step using SPS technology. In order to synthesize a dense molybdenum disilicide with a perfectly controlled microstructure, an investigation of the influence of Spark Plasma Sintering processing parameters (temperature, heating rate, mechanical pressure and holding time) on the chemical composition and the microstructure characteristics has been performed. The present work shows also that the so-obtained materials present better oxidation resistance in compari…

010302 applied physicsMaterials scienceScanning electron microscopeMechanical EngineeringMetallurgyMetals and AlloysMolybdenum disilicideSpark plasma sinteringSintering02 engineering and technology[CHIM.MATE]Chemical Sciences/Material chemistry021001 nanoscience & nanotechnologyMicrostructure01 natural scienceschemistry.chemical_compoundchemistryMechanics of MaterialsAgglomerate[ CHIM.MATE ] Chemical Sciences/Material chemistry0103 physical sciencesOxidizing agentVickers hardness testMaterials Chemistry0210 nano-technologyComputingMilieux_MISCELLANEOUS
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Nucleation of GaN nanowires grown by plasma-assisted molecular beam epitaxy: The effect of temperature

2011

Abstract The growth of GaN nanowires by means of plasma assisted molecular beam epitaxy directly on Si(1 1 1) has been investigated as a function of temperature. Statistical analysis of scanning electron microscopy pictures taken for different growth temperatures has revealed that density, diameter, length and length dispersion of nanowires were strongly dependent on temperature. Length dispersion, in particular, was found to be significant at high temperature. These features have been assigned to the different duration of the nucleation process with temperature, namely to the dependence with temperature of the time necessary for the size increase of the three-dimensional precursors up to a…

010302 applied physicsMaterials scienceScanning electron microscopeNucleationNanowireAnalytical chemistry02 engineering and technologyPlasma021001 nanoscience & nanotechnologyCondensed Matter PhysicsCritical value01 natural sciencesSize increaseInorganic ChemistryCondensed Matter::Materials ScienceCrystallography0103 physical sciencesMaterials Chemistry[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]0210 nano-technologyDispersion (chemistry)ComputingMilieux_MISCELLANEOUSMolecular beam epitaxy
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Enhancement of the dielectric response through Al-substitution in La1.6Sr0.4NiO4 nickelates

2016

The structures and dielectric properties of La1.6Sr0.4Ni1−xAlxO4 (x = 0, 0.2 and 0.4) ceramics elaborated using the Pechini method were studied for the first time. The same unique tetragonal phase was found in all compounds. The lattice parameters were found using Rietveld refinement. The surface morphology characterization and elemental analysis of these samples were respectively carried out using scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDS). A giant dielectric response was observed in these ceramics, and one dielectric relaxation was found. The substitution of nickel with aluminum results in a colossal dielectric constant value (>106). The dielectric l…

010302 applied physicsMaterials scienceScanning electron microscopeRietveld refinementGeneral Chemical EngineeringAnalytical chemistrychemistry.chemical_elementMineralogy02 engineering and technologyGeneral ChemistryDielectric021001 nanoscience & nanotechnology01 natural sciencesTetragonal crystal systemNickelchemistryvisual_art0103 physical sciencesvisual_art.visual_art_mediumDielectric lossCeramic0210 nano-technologySpectroscopyRSC Advances
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Fluence effect on ion-implanted As diffusion in relaxed SiGe

2005

A systematic study on the fluence (5 × 108 − 4 × 1014 cm−2) dependence of ion-implanted As diffusion in relaxed Si1 − xGex alloys (with x = 0.2, 0.35 and 0.5) and silicon has been performed by the modified radiotracer and secondary ion mass spectrometry techniques. With fluences above 4 × 1011 cm−2 a clear fluence-dependent enhancement in arsenic diffusion was noted for Si1 − xGex. In case of arsenic-implanted silicon such fluence dependency was not observed. This can be assigned to enhanced implantation-induced damage formation and more deficient radiation damage recovery of SiGe.

010302 applied physicsMaterials scienceSiliconAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_element02 engineering and technology021001 nanoscience & nanotechnology01 natural sciencesFluenceIonSecondary ion mass spectrometrychemistry0103 physical sciencesRadiation damageDiffusion (business)0210 nano-technologyArsenicEurophysics Letters
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HCl gas gettering of low-cost silicon

2013

HCl gas gettering is a cheap and simple technique to reduce transition metal concentrations in silicon. It is attractive especially for low-cost silicon materials like upgraded metallurgical grade (UMG) silicon, which usually contain 3d transition metals in high concentrations. Etching of silicon by HCl gas occurs during HCl gas gettering above a certain onset temperature. The etching rate as well as the gettering efficiency was experimentally determined as a function of the gettering temperature, using UMG silicon wafers. The activation energy of the etching reaction by HCl gas was calculated from the obtained data. The gettering efficiency was determined by analyzing Ni as a representativ…

010302 applied physicsMaterials scienceSiliconEtching rateInorganic chemistrychemistry.chemical_element02 engineering and technologySurfaces and InterfacesActivation energy021001 nanoscience & nanotechnologyCondensed Matter Physics7. Clean energy01 natural sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialschemistryTransition metalGetterEtching (microfabrication)0103 physical sciencesMaterials ChemistryWaferElectrical and Electronic Engineering0210 nano-technologyInductively coupled plasma mass spectrometryphysica status solidi (a)
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Modelling of thermal field and point defect dynamics during silicon single crystal growth using CZ technique

2018

Abstract Silicon single crystal growth by the Czochralski (CZ) technique is studied numerically using non-stationary mathematical models which allow to predict the evolution of the CZ system in time, including Dash neck, cone and cylindrical growth stages. The focus is on the point defect dynamics, also considering the effect of the thermal stresses. During the cylindrical stage, the crystal pull rate is temporarily reduced as in experiments by Abe et al. The crystal radius and heater power change is explicitly considered in the calculations for crystal diameters of 50, 100 and 200 mm and the agreement with experiments is discussed.

010302 applied physicsMaterials scienceSiliconField (physics)Mathematical modelchemistry.chemical_element02 engineering and technologyRadiusMechanics021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesInorganic ChemistryCrystalchemistry0103 physical sciencesThermalMaterials ChemistryPoint (geometry)0210 nano-technologyFocus (optics)Journal of Crystal Growth
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3D modeling of growth ridge and edge facet formation in 〈100〉 floating zone silicon crystal growth process

2019

Abstract A 3D quasi-stationary model for crystal ridge formation in FZ crystal growth systems for silicon is presented. Heat transfer equations for the melt and crystal are solved, and an anisotropic crystal growth model together with a free surface shape solver is used to model the facet growth and ridge formation. The simulation results for 4″ and 5″ crystals are presented and compared to experimental ridge shape data.

010302 applied physicsMaterials scienceSiliconPhysics::Opticschemistry.chemical_elementCrystal growthGeometry02 engineering and technologyEdge (geometry)021001 nanoscience & nanotechnologyCondensed Matter PhysicsRidge (differential geometry)01 natural sciencesInorganic ChemistryMonocrystalline siliconCrystalchemistryCondensed Matter::SuperconductivityFree surface0103 physical sciencesMaterials ChemistryFacet0210 nano-technologyJournal of Crystal Growth
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Effect of process parameters and crystal orientation on 3D anisotropic stress during CZ and FZ growth of silicon

2017

Abstract Simulations of 3D anisotropic stress are carried out in and oriented Si crystals grown by FZ and CZ processes for different diameters, growth rates and process stages. Temperature dependent elastic constants and thermal expansion coefficients are used in the FE simulations. The von Mises stress at the triple point line is ~5–11% higher in crystals compared to crystals. The process parameters have a larger effect on the von Mises stress than the crystal orientation. Generally, the crystal has a higher azimuthal variation of stress along the triple point line (~8%) than the crystal (~2%). The presence of a crystal ridge increases the stress beside the ridge and decreases it on the ri…

010302 applied physicsMaterials scienceSiliconTriple pointPhysics::Opticschemistry.chemical_element02 engineering and technology021001 nanoscience & nanotechnologyCondensed Matter PhysicsRidge (differential geometry)01 natural sciencesThermal expansionInorganic ChemistryStress (mechanics)CrystalCrystallographychemistryCondensed Matter::Superconductivity0103 physical sciencesMaterials Chemistryvon Mises yield criterionComposite material0210 nano-technologyLine (formation)Journal of Crystal Growth
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Validation of a 3D mathematical model for feed rod melting during floating zone Si crystal growth

2019

Abstract A mathematical model of global 3D heat transfer in floating zone silicon single crystal growth process is used to predict the shape of the open melting front of the feed rod. The model is validated using measurement data from research-scale growth experiments. Shape profiles of the open melting front are obtained from the feed rod leftover using a movable dial gauge. Azimuthal asymmetry of the rim of the open melting front is revealed in both simulations and measurements, quantitatively indicating the influence of the main slit of the inductor.

010302 applied physicsMaterials scienceSilicondigestive oral and skin physiologyProcess (computing)chemistry.chemical_elementCrystal growth02 engineering and technologyMechanicsGauge (firearms)021001 nanoscience & nanotechnologyCondensed Matter PhysicsInductor01 natural sciencesInorganic ChemistryDialAzimuthal asymmetrychemistry0103 physical sciencesHeat transferMaterials Chemistrysense organs0210 nano-technologyJournal of Crystal Growth
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Thermal stability of magnetic characteristics of Co/Ag/Fe and Co/Ag/Fe20Ni80 spin-valve structures

2017

Abstract We investigated the thermal stability of magnetic characteristics of Co/Ag/Fe and Co/Ag/Fe 20 Ni 80 spin-valve structures. Thin film systems were obtained with the help of sputtering method. For the first type of systems two particular thicknesses ( d ML  = 3 and 20 nm) and different disposition of magnetic layers (ML) were used. For the second type different thickness of Ag ( d NML ) spacer layer was used. The research of the crystal structure was performed with the transmission electron microscope. The results demonstrate that every investigated as-deposited sample does not include solid solutions, intermetallic compounds or impurities. It has been found that among the spin-valve…

010302 applied physicsMaterials scienceSpin valveIntermetallicAnalytical chemistry02 engineering and technologyCoercivity021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesSurfaces Coatings and FilmsNuclear magnetic resonanceImpuritySputtering0103 physical sciencesThermal stabilityThin film0210 nano-technologyInstrumentationSolid solutionVacuum
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