Search results for "Applied Physics"

showing 10 items of 1226 documents

On the high-pressure phase stability and elastic properties ofβ-titanium alloys

2017

We have studied the compressibility and stability of different β-titanium alloys at high pressure, including binary Ti–Mo, Ti–24Nb–4Zr–8Sn (Ti2448) and Ti–36Nb–2Ta–0.3O (gum metal). We observed stability of the β phase in these alloys to 40 GPa, well into the ω phase region in the P–T diagram of pure titanium. Gum metal was pressurised above 70 GPa and forms a phase with a crystal structure similar to the η phase of pure Ti. The bulk moduli determined for the different alloys range from 97  ±  3 GPa (Ti2448) to 124  ±  6 GPa (Ti–16.8Mo–0.13O).

phase stabilityMECHANISMMaterials scienceFluids & Plasmas0204 Condensed Matter PhysicsThermodynamicschemistry.chemical_element02 engineering and technologyCrystal structure01 natural sciencestitanium alloysPhase (matter)0103 physical sciencesGeneral Materials Sciencetitanium0912 Materials EngineeringSUPERELASTICITY010302 applied physicsScience & Technology1007 NanotechnologyPhase stabilityPhysicsDiagramMetallurgyGum metal021001 nanoscience & nanotechnologyCondensed Matter PhysicsTI-24NB-4ZR-8SNSTATEMARTENSITIC-TRANSFORMATIONPhysics Condensed Matterdiamond anvil cellchemistryMETALHigh pressurePhysical SciencesCompressibilityTI0210 nano-technologybiomaterialsTitaniumJournal of Physics: Condensed Matter
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Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

2016

The scratch test method is widely used for adhesion evaluation of thin films and coatings. Usual critical load criteria designed for scratch testing of coatings were not applicable to thin atomic layer deposition (ALD) films on silicon wafers. Thus, the bases for critical load evaluation were established and the critical loads suitable for ALD coating adhesion evaluation on silicon wafers were determined in this paper as LCSi1, LCSi2, LCALD1, and LCALD2, representing the failure points of the silicon substrate and the coating delamination points of the ALD coating. The adhesion performance of the ALD Al2O3, TiO2, TiN, and TaCN+Ru coatings with a thickness range between 20 and 600 nm and dep…

piiMaterials scienceSiliconAnnealing (metallurgy)ta221chemistry.chemical_element02 engineering and technologyengineering.material01 natural sciencesAtomic layer depositionCoatingadheesio0103 physical sciencesWaferThin filmta216computer.programming_language010302 applied physicsta114MetallurgysiliconSurfaces and Interfacesatomikerroskasvatus021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and Filmsadhesionthin filmschemistryscratch testScratchatomic layer depositionengineeringohutkalvot0210 nano-technologyTincomputerJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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VUV emission spectroscopy combined with H- density measurements in the ion source Prometheus I

2016

“Prometheus I” is a volume H− negative ion source, driven by a network of dipolar electron cyclotron resonance (ECR; 2.45 GHz) modules. The vacuum-ultraviolet (VUV) emission spectrum of low-temperature hydrogen plasmas may be related to molecular and atomic processes involved directly or indirectly in the production of negative ions. In this work, VUV spectroscopy has been performed in the above source, Prometheus I, both in the ECR zones and the bulk (far from ECR zones and surfaces) plasma. The acquired VUV spectra are correlated with the negative ion densities, as measured by means of laser photodetachment, and the possible mechanisms of negative ion production are considered. The well-e…

plasmatekniikka01 natural sciences7. Clean energySpectral lineElectron cyclotron resonance010305 fluids & plasmasIonPhysics::Plasma Physics[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph]0103 physical sciencesPhysics::Atomic and Molecular ClustersultraviolettisäteilyEmission spectrumvacuum-ultraviolet emissionSpectroscopy010302 applied physicsplasma sourcesta114ChemistrysyklotronitPlasmaIon sourceECR ion sourcesExcited stateAtomic physicsemissio (fysiikka)
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Effects of pyrolysis temperature on the hydrologically relevant porosity of willow biochar

2018

Biochar pore space consists of porosity of multiple length scales. In direct water holding applications like water storage for plant water uptake, the main interest is in micrometre-range porosity since these pores are able to store water that is easily available for plants. Gas adsorption measurements which are commonly used to characterize the physical pore structure of biochars are not able to quantify this pore-size range. While pyrogenetic porosity (i.e. pores formed during pyrolysis process) tends to increase with elevated process temperature, it is uncertain whether this change affects the pore space capable to store plant available water. In this study, we characterized biochar poro…

porosityMaterials scienceFOS: Physical sciencesApplied Physics (physics.app-ph)010501 environmental sciencesRaw materialkuivatislaus01 natural sciencesAnalytical ChemistryhuokoisuusAdsorptionimage analysisBiocharmedicinebiocharta216CharcoalPorosityta2180105 earth and related environmental sciencesCondensed Matter - Materials Sciencex-ray tomographybiohiilita114Materials Science (cond-mat.mtrl-sci)Physics - Applied Physics04 agricultural and veterinary sciencesAtmospheric temperature rangeslow pyrolysisWater retentionFuel TechnologykuvantaminenChemical engineeringvisual_artkuva-analyysi040103 agronomy & agriculturevisual_art.visual_art_medium0401 agriculture forestry and fisheriesmedicine.symptomPyrolysis
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Effect of Hot Dip Galvanized Steel Surface Chemistry and Morphology on Titanium Hexafluoride Pretreatment

2017

Titanium hexafluoride pretreatments are known to improve paint adhesion and function as a barrier between the coating and the hot dip galvanized (HDG) steel surface. Interactions at the zinc/pretreatment interface are of utmost importance for the formation of pretreatment layers and the corrosion resistance of color coated hot dip galvanized steels. Removal rate of inert aluminum oxide from HDG steel samples by chemical dissolution was studied. XPS measurements showed that the surface Al2O3 layer thickness decreased rapidly already at mild alkaline cleaning, while complete removal of Al required severe etching. Low reactivity of an Al2O3-rich surface was confirmed by impaired formation of a…

pretreatment surface morphologyMaterials sciencechemistry.chemical_elementalumiinioksidi02 engineering and technologyElectron microprobe01 natural sciencesCorrosionaluminum oxidechemistry.chemical_compoundsymbols.namesakeHexafluorideX-ray photoelectron spectroscopy0103 physical sciencessurface morphology010302 applied physicsta114Precipitation (chemistry)Metallurgytechnology industry and agricultureGeneral Engineeringpretreatment021001 nanoscience & nanotechnologyGalvanizationhot dip galvanized steelchemistryhelium ion microscopysymbolsGrain boundary0210 nano-technologyTitaniumAdvances in Materials Physics and Chemistry
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Single Event Upsets Induced by Direct Ionization from Low-Energy Protons in Floating Gate Cells

2017

Floating gate cells in advanced NAND Flash memories, with single-level and multi-level cell architecture, were exposed to low-energy proton beams. The first experimental evidence of single event upsets by proton direct ionization in floating gate cells is reported. The dependence of the error rate versus proton energy is analyzed in a wide energy range. Proton direct ionization events are studied and energy loss in the overlayers is discussed. The threshold LET for floating gate errors in multi-level and single-level cell devices is modeled and technology scaling trends are analyzed, also discussing the impact of the particle track size. peerReviewed

protonitNuclear and High Energy PhysicsProtonfloating gate devicesNAND gateFlash memories01 natural sciencesComputer Science::Hardware ArchitectureIonizationFlash memories; floating gate devices; protons; single event effects; Nuclear and High Energy Physics; Nuclear Energy and Engineering; Electrical and Electronic Engineering0103 physical sciencesHardware_ARITHMETICANDLOGICSTRUCTURESElectrical and Electronic Engineeringflash-muistit010302 applied physicsPhysicsRange (particle radiation)ta114ta213protons010308 nuclear & particles physicsbusiness.industryElectrical engineeringsingle event effectsNon-volatile memoryNuclear Energy and EngineeringLogic gateAtomic physicsbusinessEvent (particle physics)Energy (signal processing)IEEE Transactions on Nuclear Science
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Strongly Coupled Coherent Phonons in Single-Layer MoS 2

2019

We present a transient absorption setup combining broadband detection over the visible-UV range with high temporal resolution ($\sim$20fs) which is ideally suited to trigger and detect vibrational coherences in different classes of materials. We generate and detect coherent phonons (CPs) in single layer (1L) MoS$_2$, as a representative semiconducting 1L-transition metal dichalcogenide (TMD), where the confined dynamical interaction between excitons and phonons is unexplored. The coherent oscillatory motion of the out-of-plane $A'_{1}$ phonons, triggered by the ultrashort laser pulses, dynamically modulates the excitonic resonances on a timescale of few tens fs. We observe an enhancement by…

ramanspectroscopyPhononExcitonGeneral Physics and AstronomyFOS: Physical sciences02 engineering and technologyApplied Physics (physics.app-ph)thz phonons010402 general chemistry01 natural sciencesMolecular physicssymbols.namesakephotoinduced bandgap renormalizationtransient absorption spectroscopyUltrafast laser spectroscopyMesoscale and Nanoscale Physics (cond-mat.mes-hall)General Materials Sciencepulsesexciton−phonon interactionPhysicsab initio calculationCondensed Matter - Materials ScienceCondensed Matter - Mesoscale and Nanoscale Physicstransition metal dichalcogenidesgrapheneGeneral Engineeringmonolayer mos2ResonanceMaterials Science (cond-mat.mtrl-sci)excitationmonodynamicsPhysics - Applied Physics021001 nanoscience & nanotechnology0104 chemical sciencesAmplitudeOrders of magnitude (time)coherent phononsexciton-phonon interactionsymbols0210 nano-technologyRaman spectroscopyExcitationACS Nano
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Review article: recommended reading list of early publications on atomic layer deposition - outcome of the "virtual Project on the History of ALD"

2017

Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual proj…

semiconductor manufacturingThin filmsPatent literature2015 Nano TechnologyHOL - HolstLibrary scienceNanotechnology02 engineering and technologydeposition01 natural sciencesPoster presentationsAtomic layer deposition0103 physical sciencesAtomic layer epitaxy[CHIM]Chemical SciencesReading listPatentsComputingMilieux_MISCELLANEOUSgas-solid reaction010302 applied physicsTS - Technical SciencesIndustrial Innovationinorganic materialPhysicsAtomic layer depositionSilicaSurfaces and InterfacesatomikerroskasvatusAtomic layer021001 nanoscience & nanotechnologyCondensed Matter Physicshistory of technologySurfaces Coatings and FilmsALD0210 nano-technologySoviet unionAtomic layer epitaxial growthEpitaxyJournal of Vacuum Science and Technology A
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Charge Transport Mechanisms in Heavy-Ion Driven Leakage Current in Silicon Carbide Schottky Power Diodes

2016

Under heavy-ion exposure at sufficiently high reverse bias voltages silicon carbide (SiC) Schottky diodes are observed to exhibit gradual increases in leakage current with increasing ion fluence. Heavy-ion exposure alters the overall reverse current-voltage characteristics of these diodes, leaving the forward characteristics practically unchanged. This paper discusses the charge transport mechanisms in the heavy-ion damaged SiC Schottky diodes. A macro model, describing the reverse current-voltage characteristics in the degraded SiC Schottky diodes is proposed. peerReviewed

silicon carbide (SiC)Materials scienceAnnealing (metallurgy)Schottky barrierSchottky diodesMetal–semiconductor junction01 natural sciencesTemperature measurementpower semiconductor deviceschemistry.chemical_compoundstomatognathic system0103 physical sciencesSilicon carbidecurrent-voltage characteristicsElectrical and Electronic EngineeringSafety Risk Reliability and QualityDiode010302 applied physicsta114ta213010308 nuclear & particles physicsbusiness.industrySchottky diodemodelingElectronic Optical and Magnetic MaterialschemistryOptoelectronicsbusinession radiation effectsVoltageIEEE Transactions on Device and Materials Reliability
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Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering

2020

The suitability of Ti as a band gap modifier for &alpha

solar-blind detectionlaajakaistaiset puolijohteetalloyingBand gaplcsh:Mechanical engineering and machineryAnalytical chemistryCorundum02 engineering and technologyengineering.material7. Clean energy01 natural sciencesArticlegallium oxideCrystallinityAtomic layer depositionpuolijohteet0103 physical scienceslcsh:TJ1-1570Electrical and Electronic EngineeringThin filmQCgallium010302 applied physicsCondensed Matter - Materials Sciencewide band gap semiconductorsMechanical EngineeringWide-bandgap semiconductorPhysics - Applied Physicsatomikerroskasvatus021001 nanoscience & nanotechnologybandgapAmorphous solidthin filmstitaaniControl and Systems Engineeringatomic layer depositiongalliumoksidiengineeringSapphireohutkalvotddc:6200210 nano-technology
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