Search results for "ELECTRONICS"

showing 10 items of 4340 documents

Unifying Concepts for Ion-Induced Leakage Current Degradation in Silicon Carbide Schottky Power Diodes

2020

The onset of ion-induced reverse leakage current in SiC Schottky diodes is shown to depend on material properties, ion linear energy transfer (LET), and bias during irradiation, but not the voltage rating of the parts. This is demonstrated experimentally for devices from multiple manufacturers with voltage ratings from 600 to 1700 V. Using a device with a higher breakdown voltage than required in the application does not provide increased robustness related to leakage current degradation, compared to using a device with a lower voltage rating.

Nuclear and High Energy PhysicsMaterials science010308 nuclear & particles physicsbusiness.industrySchottky diode01 natural sciencesIonchemistry.chemical_compoundReverse leakage currentNuclear Energy and Engineeringchemistry0103 physical sciencesSilicon carbideOptoelectronicsBreakdown voltageIrradiationElectrical and Electronic EngineeringbusinessDiodeVoltageIEEE Transactions on Nuclear Science
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Ion-Induced Energy Pulse Mechanism for Single-Event Burnout in High-Voltage SiC Power MOSFETs and Junction Barrier Schottky Diodes

2020

Heavy-ion data suggest that a common mechanism is responsible for single-event burnout (SEB) in 1200-V power MOSFETs and junction barrier Schottky (JBS) diodes. Similarly, heavy-ion data suggest a common mechanism is also responsible for leakage current degradation in both devices. This mechanism, based on ion-induced, highly localized energy pulses, is demonstrated in simulations and shown to be capable of causing degradation and SEB for both the MOSFETs and JBS diodes.

Nuclear and High Energy PhysicsMaterials science010308 nuclear & particles physicsbusiness.industrySchottky diodeHigh voltage01 natural sciencesIonchemistry.chemical_compoundNuclear Energy and EngineeringchemistryElectric field0103 physical sciencesMOSFETSilicon carbideOptoelectronicsElectrical and Electronic EngineeringPower MOSFETbusinessDiodeIEEE Transactions on Nuclear Science
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Ion irradiation of AZO thin films for flexible electronics

2017

Aluminum doped Zinc oxide (AZO) is a promising transparent conductor for solar cells, displays and touch-screen technologies. The resistivity of AZO is typically improved by thermal annealing at temperatures not suitable for plastic substrates. Here we present a non-thermal route to improve the electrical and structural properties of AZO by irradiating the TCO films with O+ or Ar+ ion beams (30–350 keV, 3 × 1015–3 × 1016 ions/cm2) after the deposition on glass and flexible polyethylene naphthalate (PEN). X-ray diffraction, optical absorption, electrical measurements, Rutherford Backscattering Spectrometry and Atomic Force Microscopy evidenced an increase of the crystalline grain size and a …

Nuclear and High Energy PhysicsMaterials science02 engineering and technology01 natural sciencesSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaOpticsTransparent conductive oxideElectrical resistivity and conductivity0103 physical sciencesAZO ; Transparent conductive oxide ; Ion implantationElectrical measurementsThin filmPolyethylene naphthalateFlexible and transparent electronicInstrumentationTransparent conducting filmNuclear and High Energy Physic010302 applied physicsbusiness.industryAZO021001 nanoscience & nanotechnologyRutherford backscattering spectrometryIon implantationIon implantationOptoelectronicsCrystallite0210 nano-technologybusinessPhotovoltaic
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Germanium Doped CHxMicroshells for LMJ Targets

2011

AbstractAt the CEA Laser “Megajoule” facility, amorphous hydrogenated carbon (a-C:H or CHx) is the nominal ablator used to achieve inertial confinement fusion experiments. These targets are filled with a fusible mixture of deuterium-tritium in order to perform ignition.Since the achievement of ignition greatly depends on the physical properties of the shell, there must be precise control of thicknesses, doping concentration, and roughness. Experimental devices associated with suitable characterizations are described in this paper. The tolerances and yields for each specification are also presented. Some specifications are largely reached; high-frequency surface roughness due to isolated sur…

Nuclear and High Energy PhysicsMaterials science020209 energychemistry.chemical_elementNanotechnologyGermanium02 engineering and technologySurface finish01 natural sciences010305 fluids & plasmas0103 physical sciences0202 electrical engineering electronic engineering information engineeringSurface roughnessGeneral Materials ScienceThin filmInertial confinement fusionCivil and Structural Engineeringbusiness.industryMechanical EngineeringDopingFusible alloyAmorphous solidNuclear Energy and EngineeringchemistryOptoelectronicsbusinessFusion Science and Technology
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Thin film growth into the ion track structures in polyimide by atomic layer deposition

2017

Abstract High-aspect ratio porous structures with controllable pore diameters and without a stiff substrate can be fabricated using the ion track technique. Atomic layer deposition is an ideal technique for depositing thin films and functional surfaces on complicated 3D structures due to the high conformality of the films. In this work, we studied Al2O3 and TiO2 films grown by ALD on pristine polyimide (Kapton HN) membranes as well as polyimide membranes etched in sodium hypochlorite (NaOCl) and boric acid (BO3) solution by means of RBS, PIXE, SEM-EDX and helium ion microcopy (HIM). The focus was on the first ALD growth cycles. The areal density of Al2O3 film in the 400 cycle sample was det…

Nuclear and High Energy PhysicsMaterials scienceAnalytical chemistry02 engineering and technologySubstrate (electronics)ion trackpolyimide01 natural sciencesAtomic layer depositionEtching (microfabrication)0103 physical sciencesetchingComposite materialThin filmInstrumentation010302 applied physicsIon beam analysista114broad ion beam cuttingIon trackion beam analysis021001 nanoscience & nanotechnologyKaptonatomic layer depositionhelium ion microscopy0210 nano-technologyPolyimideNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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Heavy Ion Induced Degradation in SiC Schottky Diodes : Bias and Energy Deposition Dependence

2017

Experimental results on ion-induced leakage current increase in 4H-SiC Schottky power diodes are presented. Monte Carlo and TCAD simulations show that degradation is due to the synergy between applied bias and ion energy deposition. This degradation is possibly related to thermal spot annealing at the metal semiconductor interface. This thermal annealing leads to an inhomogeneity of the Schottky barrier that could be responsible for the increase leakage current as a function of fluence. peerReviewed

Nuclear and High Energy PhysicsMaterials scienceAnnealing (metallurgy)Schottky barrierschottky diodes01 natural sciencesFluenceIonpower semiconductor deviceschemistry.chemical_compoundsilicon carbide0103 physical sciencesSilicon carbidecurrent-voltage characteristicsElectrical and Electronic EngineeringLeakage (electronics)Diode010302 applied physicsta114ta213010308 nuclear & particles physicsbusiness.industrySchottky diodemodelingNuclear Energy and EngineeringchemistryOptoelectronicsbusinession radiation effectsIEEE Transactions on Nuclear Science
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MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks

2015

Parylenes are poly(p-xylylene) polymers that are widely used as moisture barriers and in biomedicine because of their good biocompatibility. We have investigated MeV ion beam lithography using 16O+ ions for writing defined patterns in Parylene-C, which is evaluated as a coating material for the Cochlear Implant (CI) electrode array, a neuroprosthesis to treat some forms of deafness. Parylene-C and -F on silicon and glass substrates as well as 50 μm thick PTFE were irradiated to different fluences (1×1013-1×10161×1013-1×1016 1 MeV 16O+ ions cm−2) through aperture masks under high vacuum and a low pressure (<10−3 mbar) oxygen atmosphere. Biocompatibility of the irradiated and unirradiated …

Nuclear and High Energy PhysicsMaterials scienceBiocompatibilitySiliconParylene-CUltra-high vacuumchemistry.chemical_elementParylene-FNanotechnologyengineering.materialIon beam lithographyIonchemistry.chemical_compoundCoatingParyleneIrradiation610 Medicine & healthInstrumentationta217ta114business.industryMurine spiral ganglion cellsMeV ion beam lithographyddc:616.8chemistryengineeringOptoelectronicsBiocompatibilitybusiness
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A study of solar thermal absorber stack based on CrAlSiNx/CrAlSiNxOy structure by ion beams

2019

Renewable energies are foreseen as a major energy resource for next generations. Among several energy sources and technologies available, Concentrated Solar Power (CSP) technology has a great potential, but it needs to be optimised, in particular to reduce the costs, with an increase of the operating temperature and long term stability. This goal can be achieved by tailoring the composition and multilayer structure of films. In this work we present and discuss the results obtained from solar absorber coatings based on nitride/oxynitride structures. A four-layer film structure, W/CrAlSiNx(HA)/CrAlSiNxOy(LA)/SiAlOx, was deposited on stainless steel substrates using magnetron sputtering deposi…

Nuclear and High Energy PhysicsMaterials scienceCrAlSiNx /CrAlSiNxOy02 engineering and technologyaurinkoenergia010402 general chemistry01 natural sciences7. Clean energyRutherford Backscattering Spectrometry (RBS)time of flight elastic recoil detection analysis (TOF-ERDA)Operating temperatureSputteringConcentrated solar power:Engenharia dos Materiais [Engenharia e Tecnologia]Thermal stabilityCrAlSiN /CrAlSiN O x x yInstrumentationpinnoitteetTime of flight Elastic Recoil Detection Analysis (TOF-ERDA)CrAlSiNx/CrAlSiNxOyScience & TechnologySolar selective absorberbusiness.industrySputteringSolar selective absorber ; Rutherford Backscattering Spectrometry (RBS) ; Time of flight Elastic Recoil Detection Analysis (TOF-ERDA) ; CrAlSiNx/CrAlSiNxOySputteringSputter deposition021001 nanoscience & nanotechnologyRutherford backscattering spectrometry0104 chemical sciencesElastic recoil detectionsolar selective absorberspektrometriaEngenharia e Tecnologia::Engenharia dos MateriaisOptoelectronicssputteringohutkalvot0210 nano-technologybusinessEnergy source
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Performance of Dye and Ti:sapphire laser systems for laser ionization and spectroscopy studies at S3

2020

The novel and sensitive In-Gas Laser Ionization Spectroscopy (IGLIS) technique enables high-precision laser spectroscopy of the heaviest elements and isotopes very far from stability that are produced in fusion-evaporation reactions at in-flight separators. Powerful and dedicated laser systems are required in these facilities to realize in-gas jet laser spectroscopy with optimal spectral resolution and efficiency. The performance with respect to the requirements for IGLIS studies at the low energy front-end of the Super Separator Spectrometer (S3) at GANIL, France, of Dye and Ti:sapphire laser systems is investigated. In addition, a number of specific experimental cases on key isotopes of t…

Nuclear and High Energy PhysicsMaterials scienceIn flight separatorsPhysics::Optics[PHYS.NEXP]Physics [physics]/Nuclear Experiment [nucl-ex]Dye laser7. Clean energy01 natural sciencesResonance ionization spectroscopylaw.inventionlawIonizationIn gas laser ionization and spectroscopy0103 physical sciencessapphire laser [Ti]ddc:530Physics::Atomic PhysicsSpectral resolutionNuclear Experiment010306 general physicsSpectroscopyInstrumentationDye laserSpectrometer010308 nuclear & particles physicsbusiness.industryTi:sapphire laserLaserSapphireOptoelectronicsbusinessNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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Microbeam SEE Analysis of MIM Capacitors for GaN Amplifiers

2018

Broad-beam and microbeam single-event effect tests were performed on metal–insulator–metal capacitors with three different thicknesses of silicon nitride (Si3N4) dielectric insulator: 250, 500, and 750 nm. The broad-beam tests indicated that the devices with the thicker, 500- and 750-nm dielectric did not have a greater breakdown voltage. The surrounding structures of the capacitor were suspected to be a possible cause. Microbeam techniques made it possible to localize the failure location for the 500- and 750-nm devices. The failure occurs in the air bridge structure connected to the top capacitor plate, which can therefore be considered as an edge effect, while for the 250-nm devices, the…

Nuclear and High Energy PhysicsMaterials scienceInsulator (electricity)Dielectrickondensaattorit01 natural sciencesmetal–insulator–semiconductor (MIS) deviceslaw.inventionelektroniikkakomponentitchemistry.chemical_compoundlaw0103 physical sciencesBreakdown voltageElectrical and Electronic EngineeringMetal–insulator–metal (MIM) devicessingle event effects (SEEs)ta114ta213010308 nuclear & particles physicsbusiness.industryAmplifierMicrobeamsingle event gate ruptureCapacitorNuclear Energy and EngineeringSilicon nitridechemistrysäteilyfysiikkaElectrodeOptoelectronicsbusinessIEEE Transactions on Nuclear Science
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