Search results for "Epitaxy"

showing 10 items of 287 documents

Fast-Response Single-Nanowire Photodetector Based on ZnO/WS 2 Core/Shell Heterostructures

2018

This work was supported by the Latvian National Research Program IMIS2 and ISSP project for Students and Young Researchers Nr. SJZ/2016/6. S.P. is grateful to the ERA.Net RUS Plus WATERSPLIT project no. 237 for the financial support. S.V. is grateful for partial support by the Estonian Science Foundation grant PUT1689.

Materials scienceNanostructureScanning electron microscopeNanowirePhotodetector02 engineering and technology010402 general chemistry01 natural sciences7. Clean energysymbols.namesake:NATURAL SCIENCES:Physics [Research Subject Categories]General Materials Sciencecore/shell nanowirestransitional metal chalcogenidesvan der Waals epitaxybusiness.industryHeterojunction021001 nanoscience & nanotechnology0104 chemical sciencesTransmission electron microscopy1D/1D heterostructuressymbolsphotodetectorsOptoelectronicsCharge carrier0210 nano-technologybusinessRaman spectroscopyACS Applied Materials & Interfaces
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Structural and Electrical Transport Properties of Si doped GaN nanowires

2016

The control and assessment of doping in GaN nanostructures are crucial for the realization of GaN based nanodevices. In this study, we have investigated a series of Si-doped GaN nanowires (NWs) grown by molecular beam epitaxy (MBE) with a typical dimension of 2–3 µm in length, and 20–200 nm in radius. In particular, high resolution energy dispersive X-ray spectroscopy (EDX) has illustrated a higher Si incorporation in NWs than that in two-dimensional (2D) layers and Si segregation at the edge of the NW with the highest doping. Moreover, direct transport measurements on single NWs have revealed a controlled doping with resistivity from 2 × 10−2 to 10−3 Ω.cm for Si doped NWs. Field effect tra…

Materials scienceNanostructureSiliconbusiness.industryDopingNanowirechemistry.chemical_elementGallium nitridechemistry.chemical_compoundchemistryElectrical resistivity and conductivityOptoelectronicsField-effect transistorbusinessMolecular beam epitaxy2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)
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Growth of Fe nanostructures

2004

Abstract Highly ordered arrays of epitaxial iron thin film nanostructures were grown by molecular beam epitaxy techniques on m-plane sapphire α-Al2O3 (1 0 1 0) substrates. Iron was deposited by electron beam evaporation under shallow incidence onto faceted sapphire substrates held at elevated temperatures of 450°C. Scanning electron microscopy suggests the formation of morphologically and electrically isolated nanowire structures on the ridges of the facets. The topology of the structures depends strongly on the iron deposition angle.

Materials scienceNanostructurebusiness.industryScanning electron microscopeNanowireCondensed Matter PhysicsEpitaxyElectron beam physical vapor depositionElectronic Optical and Magnetic MaterialsSapphireOptoelectronicsThin filmbusinessMolecular beam epitaxyJournal of Magnetism and Magnetic Materials
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Merging models of biomineralisation with concepts of nonclassical crystallisation: is a liquid amorphous precursor involved in the formation of the p…

2012

16 pages; International audience; The calcitic prisms of Pinna nobilis (Pinnidae, Linnaeus 1758) are shown to be perfect examples of a mesocrystalline material. Based on their ultrastructure and on the occurrence of an amorphous transient precursor during the early stages of prism formation, we provide evidence for the pathway of mesocrystallisation proposed by Seto et al. (2012), which proceeds not by self-organized oriented attachment of crystalline nano-bricks but by aggregation of initially amorphous nanogranules which later transform by epitaxial nucleation to a threedimensional array of well aligned nanocrystals. We further fathom the role of a liquid amorphous calcium carbonate in bi…

Materials scienceNucleation02 engineering and technology010402 general chemistryEpitaxy01 natural scienceslaw.inventionchemistry.chemical_compoundlawPhysical and Theoretical ChemistryCrystallization[SDV.IB.BIO]Life Sciences [q-bio]/Bioengineering/Biomaterialsbiology021001 nanoscience & nanotechnologybiology.organism_classification[ SDV.IB.BIO ] Life Sciences [q-bio]/Bioengineering/BiomaterialsAmorphous calcium carbonate0104 chemical sciencesAmorphous solidCrystallographychemistryNanocrystalChemical engineeringPrism0210 nano-technologyPinna nobilis
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Facet-Independent Electric-Field-Induced Volume Metallization of Tungsten Trioxide Films.

2015

Reversible metallization of band and Mott insulators by ionic-liquid gating is accompanied by significant structural changes. A change in conductivity of seven orders of magnitude at room temperature is found in epitaxial films of WO3 with an associated monoclinic-to-cubic structural reorganization. The migration of oxygen ions along open volume channels is the underlying mechanism.

Materials scienceOrders of magnitude (temperature)Inorganic chemistry02 engineering and technologyGatingConductivityEpitaxy01 natural sciencesCondensed Matter::Materials Sciencechemistry.chemical_compoundElectric field0103 physical sciencesGeneral Materials Scienceskin and connective tissue diseases010306 general physicsCondensed matter physicsMechanical EngineeringMott insulator021001 nanoscience & nanotechnologyTungsten trioxideVolume (thermodynamics)chemistryMechanics of MaterialsCondensed Matter::Strongly Correlated Electronssense organs0210 nano-technologyAdvanced materials (Deerfield Beach, Fla.)
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Size-filtering effects by stacking InAs/InP (001) self-assembled quantum wires into multilayers

2002

Multilayer structure containing vertically stacked InAs/InP self-assembled quantum wires have been successfully grown by molecular-beam epitaxy. The influence of the InP spacer layer thickness on the structural and optical properties of the wire superlattice has been studied by means of transmission electron microscopy and photoluminescence. The coherent propagation of the strain field in the sample with a 5-nm-thick spacer determines by a size filtering effect a good homogeneity and uniformity of the wire stacks, and hence a good optical quality. The exciton recombination dynamics in the wire superlattice cannot be related to thermal escape of carriers out to the barriers, as occurs in sin…

Materials sciencePhotoluminescenceCondensed matter physicsSuperlatticeExcitonQuantum wiresStackingPhysics::OpticsEpitaxyCondensed Matter::Mesoscopic Systems and Quantum Hall EffectCondensed Matter::Materials ScienceMolecular-beam epitaxyTransmission electron microscopyMultilayer structureHomogeneity (physics)ExcitonPhotoluminescenceMolecular beam epitaxy
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Size self-filtering effect in vertical stacks of InAs/InP self-assembled quantum wires

2003

3 páginas, 2 figuras.-- PACS: 73.21.Hb; 78.55.Cr; 78.67.Lt.-- Proceedings of the International Conference on Superlattices, Nano-structures and Nano-devices ICSNN 2002.

Materials sciencePhotoluminescenceCondensed matter physicsbusiness.industryQuantum wiresPhysics::OpticsCondensed Matter::Mesoscopic Systems and Quantum Hall EffectCondensed Matter PhysicsLayer thicknessAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic MaterialsSelf assembledCondensed Matter::Materials ScienceHomogeneity (physics)Physics::Accelerator PhysicsOptoelectronicsVertical stacksbusinessQuantumPhotoluminescenceMolecular beam epitaxy
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Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers

2008

http://link.aip.org/link/?JAPIAU/103/056108/1

Materials sciencePhotoluminescenceSapphireSpectral line intensityCadmium compoundsIon platingAnalytical chemistryUNESCO::FÍSICASemiconductor epitaxial layersGeneral Physics and AstronomyII-VI semiconductorsEpitaxyAcceptorVapour phase epitaxial growthEtchingEtching (microfabrication):FÍSICA [UNESCO]Ion beam assisted depositionMOCVDSapphireCadmium compounds ; Etching ; II-VI semiconductors ; Impurities ; Ion beam assisted deposition ; MOCVD ; Photoluminescence ; Sapphire ; Semiconductor epitaxial layers ; Spectral line intensity ; Vapour phase epitaxial growthMetalorganic vapour phase epitaxyIon beam-assisted depositionPhotoluminescenceImpurities
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The controlled growth of GaN microrods on Si(111) substrates by MOCVD

2015

Abstract In this paper, a selective area growth (SAG) approach for growing GaN microrods on patterned SiN x /Si(111) substrates by metal-organic chemical vapor deposition (MOCVD) is studied. The surface morphology, optical and structural properties of vertical GaN microrods terminated by pyramidal shaped facets (six { 10 1 ¯ 1 } planes) were characterized using scanning electron microscopy (SEM), room temperature photoluminescence (PL) and Raman spectroscopy, respectively. Measurements revealed high-quality GaN microcolumns grown with silane support. Characterized structures were grown nearly strain-free (central frequency of Raman peak of 567±1 cm −1 ) with crystal quality comparable to bu…

Materials sciencePhotoluminescenceScanning electron microscopebusiness.industryNanotechnologyChemical vapor depositionCondensed Matter PhysicsSilaneInorganic ChemistryCrystalFull width at half maximumsymbols.namesakechemistry.chemical_compoundchemistryMaterials ChemistrysymbolsOptoelectronicsMetalorganic vapour phase epitaxybusinessRaman spectroscopyJournal of Crystal Growth
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Optical, structural, and morphological characterisation of epitaxial ZnO films grown by pulsed-laser deposition

2013

We report on ZnO epitaxial growth by pulsed-laser deposition (PLD) on different substrates, such as quartz, sapphire, and GaN template. Approximately 1 mu m-thick films were grown under different substrate temperatures and background oxygen conditions. X-ray diffraction analysis indicated preferential growth along the c-axis direction with a full-width at half maximum(FWHM) of the rocking curve as narrow as 230 arcs in the case of the GaN template. Low-temperature photoluminescence showed A-excitonic emission near 3.36 eV and a FWHM of (DXA)-X-0 emission as small as 2.89 meV at 9 K. Atomic force microscope measurements showed that roughness as low as 18 nm could be obtained. These results p…

Materials sciencePhotoluminescenceStructural propertiesbusiness.industryMetals and AlloysPulsed laser depositionSurfaces and InterfacesSubstrate (electronics)EpitaxySettore ING-INF/01 - ElettronicaSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsPulsed laser depositionFull width at half maximumCrystallinityOpticsSurface roughnessZinc oxidePulsed laser deposition Zinc oxide Photoluminescence Structural properties Surface roughness.Materials ChemistrySapphireOptoelectronicsLuminescencebusinessPhotoluminescence
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