Search results for "GALLIUM NITRIDE"

showing 10 items of 38 documents

Microcavity Light Emitting Diodes Based on GaN membranes Grown by Molecular Beam Epitaxy on Silicon

2003

Resonant-cavity InGaN/GaN quantum well light emitting diodes have been fabricated. Nitride layers were grown by molecular beam epitaxy on Si (111). We fabricated the structures using a combination of Si substrate etching, GaN etching and dielectric (Ta2O5/SiO2) mirror deposition. The electroluminescence spectra show that the emission within the distributed Bragg reflector stop band is enhanced in the membrane microcavity. The cavity modes are broadened by some cavity length non-uniformity that is introduced when the GaN is back etched to adjust the cavity length. This process does not need any transfer on an intermediate host substrate and is fully compatible with large area semiconductor p…

Materials sciencePhysics and Astronomy (miscellaneous)Physics::Instrumentation and DetectorsGeneral Physics and AstronomyPhysics::OpticsGallium nitrideSubstrate (electronics)Light emitting diodeFILMSSettore ING-INF/01 - Elettronicalaw.inventionchemistry.chemical_compoundCondensed Matter::Materials ScienceOpticsEtching (microfabrication)lawDielectric mirrorDielectric mirrorQuantum wellbusiness.industryGeneral EngineeringMembraneGallium nitrideDistributed Bragg reflectorlight emitting diodesComputer Science::OtherchemistryOptoelectronicsWAVELASERbusinessMicrocavityMolecular beam epitaxyLight-emitting diodeMolecular beam epitaxySAPPHIRE
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A Test Circuit for GaN HEMTs Dynamic Ron Characterization in Power Electronics Applications

2019

Wide bandgap devices such as GaN HEMTs are a promising technology in the field of Power Electronics. Due to the physical properties of the Gallium nitride and the device design, they can outperform their Silicon counterparts for the design of highly efficient power switching converters. However, its design should face certain effects that can diminish its performance. One of such effect is the degradation mechanism known as dynamic onresistance (dynamic RON,), being its mitigation one of the main objectives in the design of the device. In this paper, a circuit is proposed for assessing if this effect is present in GaN transistors in power electronics applications. The circuit allows testing…

Materials scienceSiliconHEMTsbusiness.industryBand gapTransistorEnergy Engineering and Power Technologychemistry.chemical_elementGallium nitrideConvertersSemiconductor device reliabilitylaw.inventionchemistry.chemical_compoundchemistrylawDuty cyclePower electronicsOptoelectronicsElectrical and Electronic EngineeringbusinessVoltage
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Phonon-plasmon coupling in Si doped GaN nanowires

2016

Abstract The vibrational properties of silicon doped GaN nanowires with diameters comprised between 40 and 100 nm are studied by Raman spectroscopy through excitation with two different wavelengths: 532 and 405 nm. Excitation at 532 nm does not allow the observation of the coupled phonon–plasmon upper mode for the intentionally doped samples. Yet, excitation at 405 nm results in the appearance of a narrow peak at frequencies close to that of the uncoupled A 1 (LO) mode for all samples. This behavior points to phonon–plasmon scattering mediated by large phonon wave-vector in these thin and highly doped nanowires.

Materials scienceSiliconPhononNanowirechemistry.chemical_elementPhysics::OpticsGallium nitride02 engineering and technology01 natural scienceschemistry.chemical_compoundsymbols.namesakeCondensed Matter::Materials ScienceOpticsCondensed Matter::Superconductivity0103 physical sciencesGeneral Materials ScienceComputingMilieux_MISCELLANEOUS010302 applied physics[PHYS]Physics [physics]business.industryNanotecnologiaMechanical EngineeringDopingCiència dels materials021001 nanoscience & nanotechnologyCondensed Matter PhysicsEspectroscòpia RamanchemistryMechanics of MaterialssymbolsOptoelectronicsCondensed Matter::Strongly Correlated Electrons0210 nano-technologybusinessRaman spectroscopyExcitationRaman scattering
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First InGaN/GaN thin Film LED using SiCOI engineered substrate

2006

InGaN / GaN multiple quantum well (MQW) light emitting diodes (LEDs) were deposited by metal-organic chemical vapor deposition (MOCVD) onto SiCOI engineered substrates. SiCOI substrates are composed of SiC thin film transferred on a silicon substrate through silicon oxide layer by the Smart Cut™ technology. LEDs structures grown on SiCOI were characterized, then transferred onto Si substrates via a metallic bonding process and SiCOI substrates were removed. Three different metallic stacks were used for metallic bonding, including mirror and barrier diffusion. Vertical thin film LED obtained were characterized and showed a 2 to 3 times increase of external quantum efficiency. These results d…

Materials scienceSiliconbusiness.industrychemistry.chemical_elementChemical vapor depositionGallium nitrideCondensed Matter PhysicsSettore ING-INF/01 - ElettronicaLight emitting diodeslaw.inventionchemistrylawOptoelectronicsQuantum efficiencyInGaN/GaN LEDs SiCOI technologyMetalorganic vapour phase epitaxyThin filmbusinessSilicon oxideLight-emitting diodeMetallic bondingefficiency LEE
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Unstable behaviour of normally-off GaN E-HEMT under short-circuit

2018

The short-circuit capability of power switching devices plays an important role in fault detection and the protection of power circuits. In this work, an experimental study on the short-circuit (SC) capability of commercial 600 V Gallium Nitride enhancement-mode high-electron-mobility transistors (E-HEMT) is presented. A different failure mechanism has been identified for commercial p-doped GaN gate (p-GaN) HEMT and metal-insulator-semiconductor (MIS) HEMT. In addition to the well known thermal breakdown, a premature breakdown is shown on both GaN HEMTs, triggered by hot electron trapping at the surface, which demonstrates that current commercial GaN HEMTs has requirements for improving the…

Materials scienceThermal breakdownGallium nitrideFailure mechanism02 engineering and technologyHigh-electron-mobility transistor01 natural sciencesFault detection and isolationlaw.inventionchemistry.chemical_compoundlaw0103 physical sciencesMaterials ChemistryElectrical and Electronic Engineering010302 applied physicsbusiness.industryTransistorNormally off021001 nanoscience & nanotechnologyCondensed Matter PhysicsElectronic Optical and Magnetic MaterialschemistryOptoelectronics0210 nano-technologybusinessShort circuitSemiconductor Science and Technology
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Impact of Gamma Radiation on Dynamic RDSON Characteristics in AlGaN/GaN Power HEMTs

2019

GaN high-electron-mobility transistors (HEMTs) are promising next-generation devices in the power electronics field which can coexist with silicon semiconductors, mainly in some radiation-intensive environments, such as power space converters, where high frequencies and voltages are also needed. Its wide band gap (WBG), large breakdown electric field, and thermal stability improve actual silicon performances. However, at the moment, GaN HEMT technology suffers from some reliability issues, one of the more relevant of which is the dynamic on-state resistance (R) regarding power switching converter applications. In this study, we focused on the drain-to-source on-resistance (R) characteristic…

Materials scienceassurance testingRadiation effects02 engineering and technologyHigh-electron-mobility transistorradiation hardness01 natural scienceslcsh:Technologylaw.inventiontotal ionizing dose (TID)lawPower electronics0103 physical sciencesGeneral Materials Sciencelcsh:MicroscopyHigh-electron-mobility transistor (HEMT)Radiation hardeningLeakage (electronics)lcsh:QC120-168.85010302 applied physicsRadiation hardnessAssurance testinghigh-electron-mobility transistor (HEMT)lcsh:QH201-278.5business.industrylcsh:TTransistorWide-bandgap semiconductor021001 nanoscience & nanotechnologyThreshold voltageSemiconductorlcsh:TA1-2040Gallium nitride (GaN)adiation effectsradiation effectsOptoelectronicslcsh:Descriptive and experimental mechanicslcsh:Electrical engineering. Electronics. Nuclear engineeringTotal ionizing dosegallium nitride (GaN)0210 nano-technologybusinesslcsh:Engineering (General). Civil engineering (General)lcsh:TK1-9971Materials
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Evaluation of Gallium Nitride Transistors in Electronic Power Conditioners for TWTAs

2015

The aim of this paper is to evaluate the benefits of replacing Si Mosfets transistors with enhancement mode GaN transistors in a Half-Bridge Zero Voltage and Zero Current Switching Power Switching Converter (ZVZCPS). This converter is usually used as power supply of the travelling-wave tube amplifiers (TWTAs) in aerospace applications. In this paper, firstly the converter is theoretically analyzed, obtaining its operation, losses and efficiency equations, these equations are used to obtain optimizations maps based on the main system parameters. In this way, the ideal design parameters can be visually obtained. These optimization maps are the key to quantify the potential benefits of GaN tra…

Materials sciencebusiness.industryAmplifierTransistorElectrical engineeringGallium nitrideConverterslaw.inventionPower (physics)Reduction (complexity)chemistry.chemical_compoundchemistrylawElectronic engineeringConditionersbusinessAerospace2015 IEEE Aerospace Conference
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Raman measurements on GaN thin films for PV - purposes

2012

Raman scattering (RS) is a very important experimental tool to characterize the optical modes and another elementary excitations of materials. Among other issues it can determine for example the degree of crystalline quality and point defects like local modes. Therefore GaN - thin films and related compounds for photovoltaic purposes and as processed by several systems have been measured by this technique. The films were grown by Molecular Beam Epitaxy (MBE), Close Spaced Vapor Transport (CSVT) and Laser Ablation (LA) with the use of optimal growth parameters and substrates. Gallium nitride crystallizes in the wurtzite structure with 4 atoms in the unit cell and presents 7 allowed Raman mod…

Materials sciencebusiness.industryWide-bandgap semiconductorGallium nitridePulsed laser depositionsymbols.namesakechemistry.chemical_compoundchemistrysymbolsOptoelectronicsThin filmbusinessRaman spectroscopyRaman scatteringMolecular beam epitaxyWurtzite crystal structure2012 38th IEEE Photovoltaic Specialists Conference
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Novel GaN Based Solid State Power Amplifiers, Results, Advances and Comparison with Vacuum Tubes Based Microwave Power Modules

2018

Power amplifiers based on vacuum tubes or solid state are key items in a number of systems. Solid state technology is growing up for some applications and it may be complementary to the vacuum technology. This paperwork presents SSPA operational principles and performance. The GaN technology available in the market, the technology roadmap, a comparison with the vacuum tubes are introduced

Microwave Power modulesMaterials scienceComputingMilieux_THECOMPUTINGPROFESSIONAmplifierVacuum tubeGallium nitrideSettore ING-INF/01 - ElettronicaEngineering physicsGeneralLiterature_MISCELLANEOUSlaw.inventionPower (physics)chemistry.chemical_compoundElectricity generationchemistrylawInsertion lossPower Amplifier: Solid state circuitTechnology roadmapRadio frequencyMicrowave TubeComputingMethodologies_COMPUTERGRAPHICS2018 IEEE 4th International Forum on Research and Technology for Society and Industry (RTSI)
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Current status of AlInN layers lattice-matched to GaN for photonics and electronics

2007

We report on the current properties of Al1-x InxN (x approximate to 0.18) layers lattice- matched ( LM) to GaN and their specific use to realize nearly strain- free structures for photonic and electronic applications. Following a literature survey of the general properties of AlInN layers, structural and optical properties of thin state- of- the- art AlInN layers LM to GaN are described showing that despite improved structural properties these layers are still characterized by a typical background donor concentration of ( 1 - 5) x 10(18) cm(-3) and a large Stokes shift (similar to 800 meV) between luminescence and absorption edge. The use of these AlInN layers LM to GaN is then exemplified …

PhotoluminescenceMaterials scienceAcoustics and UltrasonicsGallium nitrideSettore ING-INF/01 - ElettronicaVertical-cavity surface-emitting laserchemistry.chemical_compoundMOLECULAR-BEAM EPITAXYALGAN/GAN QUANTUM-WELLSIII-VDISTRIBUTED BRAGG REFLECTORSCRYSTALSURFACE-EMITTING LASERSbusiness.industryREFLECTORSHeterojunctionOPTICAL-PROPERTIESCondensed Matter PhysicsAL1-XINXN THIN-FILMSSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsDISTRIBUTED BRAGGAbsorption edgechemistryOptoelectronicsVAPOR-PHASE EPITAXYIII-V NITRIDESFIELD-EFFECT TRANSISTORSNITRIDESbusinessLiterature surveyCRYSTAL GALLIUM NITRIDELasing thresholdGALLIUM NITRIDEMolecular beam epitaxyJournal of Physics D: Applied Physics
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