Search results for "Insula"

showing 10 items of 735 documents

Superconducting tantalum nitride-based normal metal-insulator-superconductor tunnel junctions

2014

We report the development of superconducting tantalum nitride (TaN$_{x} $) normal metal-insulator-superconductor (NIS) tunnel junctions. For the insulating barrier, we used both AlO$_{x}$ and TaO$_{x}$ (Cu-AlO$_{x}$-Al-TaN$_{x} $ and Cu-TaO$_{x}$-TaN$_{x} $), with both devices exhibiting temperature dependent current-voltage characteristics which follow the simple one-particle tunneling model. The superconducting gap follows a BCS type temperature dependence, rendering these devices suitable for sensitive thermometry and bolometry from the superconducting transition temperature $T_{\text{C}}$ of the TaN$_{x} $ film at $\sim 5$ K down to $\sim$ 0.5 K. Numerical simulations were also performe…

Materials sciencePhysics and Astronomy (miscellaneous)FOS: Physical sciences02 engineering and technologyType (model theory)01 natural sciencesSuperconductivity (cond-mat.supr-con)chemistry.chemical_compoundTantalum nitrideCondensed Matter::Superconductivity0103 physical sciencestan filmsMetal insulator010306 general physicsQuantum tunnellingSuperconductivityCondensed Matter::Quantum Gasesta114Condensed matter physicsCondensed Matter - Superconductivityjäähdytystransition021001 nanoscience & nanotechnologyjosephson-junctionslogic applicationschemistrytemperaturesSuperconducting transition temperature0210 nano-technology
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Dopant-controlled single-electron pumping through a metallic island

2016

We investigate a hybrid metallic island/single dopant electron pump based on fully depleted silicon-on-insulator technology. Electron transfer between the central metallic island and the leads is controlled by resonant tunneling through single phosphorus dopants in the barriers. Top gates above the barriers are used to control the resonance conditions. Applying radio frequency signals to the gates, non-adiabatic quantized electron pumping is achieved. A simple deterministic model is presented and confirmed by comparing measurements with simulations.

Materials sciencePhysics and Astronomy (miscellaneous)FOS: Physical sciencesSilicon on insulator02 engineering and technologyElectron01 natural sciences[PHYS] Physics [physics]MetalElectron transferMesoscale and Nanoscale Physics (cond-mat.mes-hall)0103 physical sciences[PHYS.COND]Physics [physics]/Condensed Matter [cond-mat]010306 general physicsComputingMilieux_MISCELLANEOUS[PHYS.COND.CM-MSQHE]Physics [physics]/Condensed Matter [cond-mat]/Mesoscopic Systems and Quantum Hall Effect [cond-mat.mes-hall]Quantum tunnelling[PHYS]Physics [physics]Condensed Matter - Mesoscale and Nanoscale PhysicsDopantbusiness.industryResonance021001 nanoscience & nanotechnology[PHYS.COND.CM-MSQHE] Physics [physics]/Condensed Matter [cond-mat]/Mesoscopic Systems and Quantum Hall Effect [cond-mat.mes-hall]visual_artvisual_art.visual_art_mediumOptoelectronicsRadio frequency0210 nano-technologybusiness[PHYS.COND] Physics [physics]/Condensed Matter [cond-mat]Applied Physics Letters
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Thermal characteristics of silicon nitride membranes at sub-Kelvin temperatures

1998

We have performed calorimetric measurements on 200 nm thin silicon nitride membranes at temperatures from 0.07 to 1 K. Besides full windows, membranes cut into a thermally isolating suspended bridge geometry were investigated. Based on dc and ac measurements employing normal-metal/insulator/superconductor (NIS) tunnel junctions both as a thermometer and a heater, we report on heat transport and thermal relaxation in silicon nitride films. The bridge structure improves thermal isolation and, consequently, energy sensitivity by two orders of magnitude over those of the full membrane with the same size, and makes such a structure very attractive for bolometric and microrefrigeration applicatio…

Materials sciencePhysics and Astronomy (miscellaneous)business.industryBolometerAnalytical chemistryInsulator (electricity)Cryogenicslaw.inventionchemistry.chemical_compoundMembraneThermal conductivitySilicon nitridechemistrylawOptoelectronicsThermal stabilitybusinessOrder of magnitudeApplied Physics Letters
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Memory effects in MOS capacitors with silicon quantum dots

2001

To form crystalline Si dots embedded in SiO2, we have deposited thin films of silicon-rich oxide (SRO) by plasma-enhanced chemical vapor deposition of SiH4 and O2. Then the materials have been annealed in N2 ambient at temperatures between 950°C and 1100°C. Under such processing, the supersaturation of Si in the amorphous SRO film produces the formation of crystalline Si dots embedded in SiO2. The narrow dot size distributions, analyzed by transmission electron microscopy, are characterized by average grain radii and standard deviations down to about 1 nm. The memory functions of such structures has been investigated in MOS capacitors with a SRO film sandwiched between two thin SiO2 layers …

Materials scienceSROOxideBioengineeringInsulator (electricity)Chemical vapor depositionengineering.materialSettore ING-INF/01 - Elettronicalaw.inventionBiomaterialschemistry.chemical_compoundlawThin filmNanocrystal memorybusiness.industrySilicon-rich oxideAmorphous solidCapacitorPolycrystalline siliconchemistryMechanics of MaterialsTransmission electron microscopySingle electron memoryengineeringOptoelectronicsbusiness
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Silicon quantum point contact with aluminum gate

2000

Fabrication and electrical properties of silicon quantum point contacts are reported. The devices are fabricated on bonded silicon on insulator (SOI) wafers by combining CMOS process steps and e-beam lithography. Mobility of 9000 cm2 Vs−1 is measured for a 60 nm-thick SOI film at 10 K. Weak localization data is used to estimate the phase coherence length at 4.2 K The point contacts show step like behaviour in linear response conductance at 1.5 K. At 200 mK universal conductance fluctuations begin to dominate the conductance curve. The effective diameter of quantum point constrictions of the devices are estimated to be 30–40 nm. This estimate is based on TEM analysis of test structures and A…

Materials scienceSiliconCondensed matter physicsMechanical EngineeringQuantum point contactSilicon on insulatorchemistry.chemical_elementConductanceCondensed Matter PhysicsWeak localizationchemistryMechanics of MaterialsGeneral Materials ScienceWaferLithographyUniversal conductance fluctuationsMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
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Electron-phonon heat transport and electronic thermal conductivity in heavily doped silicon-on-insulator film

2003

Electron–phonon interaction and electronic thermal conductivity have been investigated in heavily doped silicon at subKelvin temperatures. The heat flow between electron and phonon systems is found to be proportional to T6. Utilization of a superconductor–semiconductor–superconductor thermometer enables a precise measurement of electron and substrate temperatures. The electronic thermal conductivity is consistent with the Wiedemann–Franz law. Peer reviewed

Materials scienceSiliconPhononphononsGeneral Physics and AstronomySilicon on insulatorchemistry.chemical_elementSubstrate (electronics)dopingsuperconductorsCondensed Matter::Materials ScienceThermal conductivityCondensed Matter::Superconductivitythermal conductivitySOICondensed matter physicsPhysicsDopingelectronsThermal conductionCondensed Matter::Mesoscopic Systems and Quantum Hall EffectWiedemann-Franz lawsilicon-on-insulatorchemistryelectron-phonon interactionssilicon dopingelemental semiconductorsWiedemann–Franz lawheat transportheavily doped semiconductors
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10 Gb/s transmission and thermo-optic resonance tuning in silicon-plasmonic waveguide platform

2011

The first system-level experimental results of hybrid Si-DLSPP structures incorporated into a SOI chip are reported. We demonstrate over 7nm thermo-optical tuning of a Si-Plasmonic racetrack-resonator and verify error-free 10Gb/s transmission through 60um Si-Plasmonic waveguide.

Materials scienceSiliconbusiness.industryPhotonic integrated circuitSilicon on insulatorchemistry.chemical_elementChiplaw.inventionOpticsTransmission (telecommunications)chemistrylawOptical cavityOptoelectronicsbusinessWaveguidePlasmon
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Silicon Single Electron Transistors with Single and Multi Dot Characteristics

2000

AbstractSilicon single electron transistors (SET) with side gate have been fabricated on a heavily doped silicon-on-insulator (SOI) substrate. Samples demonstrate two types of characteristics: some of them demonstrate multiple dot behavior and one demonstrates single dot behavior in a wide temperature range. SETs demonstrate oscillations of drain-source current and changes in the width of the Coulomb blockade region with change of gate voltage at least up to 100 K. At temperature below 20 K long-term oscillations (relaxation) of source-drain current after switching the gate voltage has been observed in both multiple dot and single dot samples. Illumination affects both the characteristics o…

Materials scienceSiliconbusiness.industryTransistorCoulomb blockadechemistry.chemical_elementSilicon on insulatorSubstrate (electronics)Condensed Matter::Mesoscopic Systems and Quantum Hall EffectNoise (electronics)law.inventionchemistrylawOptoelectronicsbusinessAND gateVoltageMRS Proceedings
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Single electron transistor fabricated on heavily doped silicon-on-insulator substrate

2001

Experiments on side-gated silicon single electron transistors (SET) fabricated on a heavily doped thin silicon-on-insulator substrate are reported. Some of the devices showed single-island-like and some multi-island-like behaviour, but the properties of individual samples changed with time. Single-electron gate modulation was observable up to T=100 K, at least. A slow response of SET current to a large change in gate voltage was observed, but the process speeded up under illumination.

Materials scienceSiliconbusiness.industryTransistorDopingGeneral EngineeringGeneral Physics and AstronomySilicon on insulatorCoulomb blockadechemistry.chemical_elementNanotechnologySubstrate (electronics)Hardware_PERFORMANCEANDRELIABILITYGate voltagelaw.inventionchemistryModulationlawHardware_INTEGRATEDCIRCUITSOptoelectronicsbusinessHardware_LOGICDESIGNJapanese Journal of Applied Physics
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SiC-based sandwich material for Flow Channel Inserts in DCLL blankets: Manufacturing, characterization, corrosion tests

2017

This work has been carried out within the framework of the EUROfusion Consortium and has received funding from the Euratom research and training programme 2014–2018 under grant agreement No 633053. The views and opinions expressed herein do not necessarily reflect those of the European Commission.

Materials scienceSintering02 engineering and technologyengineering.materialBlanket7. Clean energy01 natural sciences010305 fluids & plasmasCorrosionFlexural strengthThermal conductivityFlexural strengthCoatingThermal insulationCorrosion by PbLi0103 physical sciences:NATURAL SCIENCES:Physics [Research Subject Categories]General Materials ScienceComposite materialCivil and Structural Engineeringbusiness.industryMechanical EngineeringFCI021001 nanoscience & nanotechnologyMicrostructurePorous SiCCVD-SiC coatingDCLL blanketNuclear Energy and EngineeringThermal conductivityengineering0210 nano-technologybusinessFusion Engineering and Design
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