Search results for "Silicon"
showing 10 items of 1391 documents
Wettability and compositional analysis of hydroxyapatite films modified by low and high energy ion irradiation
2008
Abstract Hydroxyapatite-like thin films on silicon substrate were deposited using atomic layer deposition and were subjected to irradiation with Ar ions accelerated through 0.6–1.2 kV as well as 2 MeV 16 O + ions. After low energy Ar irradiation a significant reduction in contact angle was observed. However, the Ca/P atomic ratio remained unchanged. No reduction in contact angle was seen for high energy 16 O + irradiation. Atomic force microscopy showed the enhancement of floral-like pattern after low energy Ar bombardment while high energy oxygen irradiation lead to raised islands on as-deposited films.
First principles defect energetics for simulations of silicon carbide under irradiation: Kinetic mechanisms of silicon di-interstitials
2014
Understanding the modification of the properties of silicon carbide under irradiation from the very fundamental point of view of atomic bonds and electronic structure can become possible in the next few years, thanks to the effort made in the last two decades to understand point defects from first principles calculations, but also thanks to the coupling of these results with simulation tools designed to describe larger spatial (and temporal) scales. We discuss some of the missing tiles that would allow to advance in this direction, in particular the incomplete data on defect clusters, and we present some first principles results for small silicon aggregates. We examine the stability, migrat…
Comparison Between Point Defect Generation by $\gamma$-rays in Bulk and Fibre Samples of High Purity Amorphous ${\hbox {SiO}}_{2}$
2008
We compare the E', H(I) and Si-ODC(II) contents in a low-OH high-purity a-SiO2 either in bulk or fibre forms. We found that the H(I) centre appears during irradiation and tend to increase with the dose if the fibre contains hydrogen excess. This behaviour is believed to be one the possible reason to explain the apparent radiation-sensitivity enhancement in the blue-UV spectrum when the fibre is hydrogenated and irradiated at high dose. However for the hydrogen-treated fibres, no experimental repeatability could be evidenced in the measurements of E' and Si-ODC(II) although an acceptable agreement was still found in normal samples. This suggests a possible complex reactional mechanisms in pr…
Synthesis and characterization of cobalt silicide films on silicon
2006
Cobalt silicide has emerged as a leading contact material in silicon technology due to its low resistivity, high stability and small lattice mismatch. In this study, 0.2-0.4 mu m thick Co films were deposited on Si(100) wafers by RF magnetron sputtering at room temperature, and annealed at temperatures from 600 to 900 degrees C in vacuum. As-deposited and annealed samples were characterized by Rutherford backscattering spectrometry (RBS), nuclear reaction analysis (NRA), X-ray diffraction (XRD) and scanning electron microscopy (SEM). Although the Si substrates were sputter cleaned before the deposition, all the samples showed a thin oxide layer at the Si/Co interfaces. Annealing up to 700 d…
Quantitative determination of fayalite layers on iron by CEMS
1990
In the processing of silicon iron (Fe-3%) Si), so-called ‘fayalite layers’ are formed. By CEMS, they were found to consist of an outer Fe3+-oxide layer and an inner Fe2SiO4 (fayalite) layer. Sometimes an additional wustite contribution was found. Thef-factor of fayalite was determined experimentally (ffayalite/fα-Fe=0.47±0.04) and, by use of it, the thicknesses of the layers on some silicon iron samples could be calculated from CEMS data.
Heavy-Ion Microbeam Studies of Single-Event Leakage Current Mechanism in SiC VD-MOSFETs
2020
Heavy-ion microbeams are employed for probing the radiation-sensitive regions in commercial silicon carbide (SiC) vertical double-diffused power (VD)-MOSFETs with micrometer accuracy. By scanning the beam spot over the die, a spatial periodicity was observed in the leakage current degradation, reflecting the striped structure of the power MOSFET investigated. Two different mechanisms were observed for degradation. At low drain bias (gate and source grounded), only the gate-oxide (at the JFET or neck region) is contributing in the ion-induced leakage current. For exposures at drain–source bias voltages higher than a specific threshold, additional higher drain leakage current is observed in t…
Impact of Terrestrial Neutrons on the Reliability of SiC VD-MOSFET Technologies
2021
Accelerated terrestrial neutron irradiations were performed on different commercial SiC power MOSFETs with planar, trench and double-trench architectures. The results were used to calculate the failure cross-sections and the failure in time (FIT) rates at sea level. Enhanced gate and drain leakage were observed in some devices which did not exhibit a destructive failure during the exposure. In particular, a different mechanism was observed for planar and trench gate MOSFETs, the first showing a partial gate rupture with a leakage path mostly between drain and gate, similar to what was previously observed with heavy-ions, while the second exhibiting a complete gate rupture. The observed fail…
Single-Event Burnout Mechanisms in SiC Power MOSFETs
2018
Heavy ion-induced single-event burnout (SEB) is investigated in high-voltage silicon carbide power MOSFETs. Experimental data for 1200-V SiC power MOSFETs show a significant decrease in SEB onset voltage for particle linear energy transfers greater than 10 MeV/cm 2 /mg, above which the SEB threshold voltage is nearly constant at half of the rated maximum operating voltage for these devices. TCAD simulations show a parasitic bipolar junction transistor turn-on mechanism, which drives the avalanching of carriers and leads to runaway drain current, resulting in SEB. peerReviewed
Enhanced Charge Collection in SiC Power MOSFETs Demonstrated by Pulse-Laser Two-Photon Absorption SEE Experiments
2019
A two-photon absorption technique is used to understand the mechanisms of single-event effects (SEEs) in silicon carbide power metal–oxide–field-effect transistors (MOSFETs) and power junction barrier Schottky diodes. The MOSFETs and diodes have similar structures enabling the identification of effects associated specifically with the parasitic bipolar structure that is present in the MOSFETs, but not the diodes. The collected charge in the diodes varies only with laser depth, whereas it varies with depth and lateral position in the MOSFETs. Optical simulations demonstrate that the variations in collected charge observed are from the semiconductor device structure and not from metal/passiva…
Crystallographic analysis of extended defects in diamond-type crystals
2005
Abstract To investigate irradiation-induced Si amorphization during its initial stages, we have performed a classical molecular-dynamics (MD) calculation for the case of self-irradiation by 5 keV ions at a low temperature of 100 K. We examined the geometry of self-interstitial atom (SIA) clusters using the pixel mapping (PM) method, on the output data of MD calculations. Perfect crystalline silicon (c-Si) is amorphized by self-irradiation, and we observe that many SIA are produced. During sequential self-irradiation, the most frequently observed species were isolated SIA, i.e. I1 (monomer). The fractions of SIA clusters decreased as I2 (dimer), I3 (trimer), and I4 (tetramer) clusters, respe…