Search results for "lithography"
showing 10 items of 242 documents
<title>Application of amorphous chalcogenide thin films in optical recording technologies</title>
2005
A review of the recent advances and developments in the practical application of amorphous chalcogenide materials is presented, focusing special attention to holography and lithography. The main functional principles and practical application of amorphous chalcogenide photoresists for production of the embossed rainbow holograms and holographic optical elements are discussed. The laser interference lithography can be used as a low-cost method for the exposure of large surfaces with regular patterns like subwavelength-gratings and microsieves. The surface-relief and reftactive-index modulated gratings with a period of about 50 nm and less can be fabricated by immersion holographic method. Th…
Optical grating recording in ChG thin film by electron beam
2013
Abstract Recording capabilities of As Se S chalcogenide (ChG) glasses using electron beam (EB) lithography have been investigated in this study. After exposure with EB the thin films of these inorganic glasses can be etched in alkaline amine solvent with high selectivity. High resolution, smooth shaped structures have been fabricated using ChG thin films. Height of developed pattern can be controlled through changing applied electron dose.
MATERIALS AND PROCESSING ISSUES FOR THE MANUFACTURING OF INTEGRATED PASSIVE AND ACTIVE DEVICES ON FLEXIBLE SUBSTRATES
2008
Plast_ICs is a Public/Private Laboratory funded by Italian Government aimed to build a novel technological platform for the development of flexible electronics, mainly, but not solely, based on thin inorganic films. Integration of different functions, on single and/or multiple plastic foils, to generate a smart system is the final goal of the project. The building blocks of the platform will be presented, starting from the different plastic substrates characterization, going through the development of active devices, such as thin-film- transistors, and passive devices, like thin-film- resistors, capacitors, inductors. Fully inorganic elementary devices, based on optical patterning and in va…
<title>Advances in silica-based glasses for UV and vacuum UV laser optics</title>
2003
The origins of pre-existing and laser-induced ultraviolet (UV) and vacuum ultraviolet (VUV) optical absorption in state-of-the-art glassy silicon dioxide and the ways to improve it are reviewed. The main causes of pre-existing absorption in UV/VUV are oxygen vacancies, hydroxyl (silanol) groups, and strained bonds/localized states due to glassy disorder. The main absorption bands induced by UV/VUV excimer lasers are due to oxygen vacancies and due to silicon and oxygen dangling bonds (E'-centers and non-bridging oxygen hole centers, respectively). The optimized glasses are achieved via an intricate balance between a good stoichiometry, use of network modifiers (F or OH) to reduce the number…
Biomineral Amorphous Lasers through Light-Scattering Surfaces Assembled by Electrospun Fiber Templates
2018
New materials aim at exploiting the great control of living organisms over molecular architectures and minerals. Optical biomimetics has been widely developed by microengineering, leading to photonic components with order resembling those found in plants and animals. These systems, however, are realized by complicated and adverse processes. Here we show how biomineralization might enable the one-step generation of components for amorphous photonics, in which light is made to travel through disordered scattering systems, and particularly of active devices such as random lasers, by using electrospun fiber templates. The amount of bio-enzymatically produced silica is related to light-scatterin…
Fabrication and characterization of chromium based single-electron transistors with evaporated chromium oxide barrier tunnel junctions
1999
We fabricated chromium based single-electron transistors comprising small-area Cr/CrOx/Cr tunnel junctions with an evaporated chromium oxide barrier. The transistors are fabricated using e-beam lithography with a bilayer resist and two-angle shadow evaporation. We describe the fabrication process and discuss the device characteristics.
Fabrication and Characterization of Double- and Single-Clamped CuO Nanowire Based Nanoelectromechanical Switches
2021
Electrostatically actuated nanoelectromechanical (NEM) switches hold promise for operation with sharply defined ON/OFF states, high ON/OFF current ratio, low OFF state power consumption, and a compact design. The present challenge for the development of nanoelectromechanical system (NEMS) technology is fabrication of single nanowire based NEM switches. In this work, we demonstrate the first application of CuO nanowires as NEM switch active elements. We develop bottom-up and top-down approaches for NEM switch fabrication, such as CuO nanowire synthesis, lithography, etching, dielectrophoretic alignment of nanowires on electrodes, and nanomanipulations for building devices that are suitable f…
Fabrication and characterization of small tunnel junctions through a thin dielectric membrane
1998
We show that a small tapered hole through a thin silicon nitride membrane provides a mask for tunnel junction structures. Our experiments imply, unlike in the conventional planar electron beam lithography, that tunnel junctions are well voltage biased in this structure with vanishingly small on-chip impedance. Our technique allows fabrication of double junctions, and even multijunction linear arrays, with small metallic islands in between.
Transport of Water and Particles in Microfluidics Devices Lithographically Fabricated Using Proton Beam Writing (PBW)
2009
Proton beam writing (PBW) is a MeV ion beam lithography technique that has gained interest in many biological applications such as fabricating microfluidic devices for Lab-On-a-Chip (LOC) applications where capillary forces are important for fluid flow. PBW has a unique capability of being able to direct-write patterns in thick (1-30µm) polymer resist layers with straight vertical sidewalls. It can be used to prepare master stamps and moulds for mass production in polymeric materials. A recent development, where the direct writing of an entire pattern element is carried out in parallel makes PBW especially well suited for Bio-MEMS LOC applications. In this study we have examined the flow dy…
Technologies for the fabrication of cylindrical fine line devices
1997
Abstract A microlithographic process suited for metal patterning on cylindrical substrates has been developed. This includes all steps from metal coating to final etching, with resolution in the 5 μm range.