Search results for "microfabric"

showing 10 items of 67 documents

Design and fabrication of an acoustic micromixer for biological media activation

2014

International audience; The bioassay of infinitesimal quantities of protein markers in biological samples is the way to early cancer detection. However, this detection can be limited by the diffusion of these macromolecules (analytes) from the bulk to the sensor chip (surface of ligands). Here, we propose a new method to overcome this drawback by the activation of the biological media during the detection step. The principle consists in using ultrasonic vibrations in order to disrupt the equilibrium states of such biomolecular reactions and performing simultaneous detection inside an acoustic micromixer. Technological realization and initial characterizations of the device have been perform…

FabricationMaterials scienceSilicon[SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsFlow (psychology)microfluidicMixing (process engineering)Micromixerchemistry.chemical_element02 engineering and technology01 natural sciencesElectronic engineering[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsmicrofabricationEngineering(all)business.industryAcoustic mixing010401 analytical chemistryGeneral Medicine021001 nanoscience & nanotechnologyChipPiezoelectricity0104 chemical sciencesVibrationchemistryOptoelectronics[ SPI.NANO ] Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsPiezoelectric0210 nano-technologybusiness
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Nonstoichiometric silica mask to fabricate reverse proton-exchange waveguides in lithium niobate crystals

2004

Producing channel waveguides requires a photolithographic mask, but the standard technique of using thermally evaporated metal films for proton exchange has proved to be unsuitable for withstanding the rather aggressive process of reverse proton exchange. We report the fabrication of a nonstoichiometric silica mask by ion-plating plasma-assisted deposition. This mask is strong enough to resist both direct and reverse proton exchange and is also compatible with anisotropic dry etching for patterning the mask and with electric field poling. Our technique is a practical alternative to the use of SiO2 sputtered masks.

FabricationMaterials sciencebusiness.industryMaterials Science (miscellaneous)PolingLithium niobateIndustrial and Manufacturing Engineeringlaw.inventionchemistry.chemical_compoundOpticsResistchemistryEtching (microfabrication)lawOptoelectronicsDry etchingBusiness and International ManagementThin filmPhotolithographybusiness
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Plasma Etching and Integration with Nanoprocessing

2009

This chapter introduces plasma etching—an extensive and perhaps the most widely used micro- and nanoprocessing method both in industry and in research and development laboratories worldwide. The emphasis is on the practical methods in plasma etching and reactive ion etching when used for submicron and nanoscale device fabrication. The principles of plasma etching and reactive ion etching equipment for sample fabrication will be introduced.

Glow dischargeMaterials scienceFabricationPlasma etchingfungitechnology industry and agricultureNanotechnologymacromolecular substancesPlasmastomatognathic systemEtching (microfabrication)parasitic diseasesDry etchingReactive-ion etchingPlasma processing
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Microfabrication of hybrid fluid membrane for microengines

2015

International audience; This paper describes the microfabrication and dynamic characterization of thick membranes providing a technological solution for microengines. The studied membranes are called hybrid fluid-membrane (HFM) and consist of two thin membranes that encapsulate an incompressible fluid. This work details the microelectromechanical system (MEMS) scalable fabrication and characterization of HFMs. The membranes are composite structures based on Silicon spiral springs embedded in a polymer (RTV silicone). The anodic bonding of multiple stacks of Si/glass structures, the fluid filling and the sealing have been demonstrated. Various HFMs were successfully fabricated and their dyna…

HistoryMaterials scienceFabrication020209 energyComposite number02 engineering and technologyEducation[SPI.AUTO]Engineering Sciences [physics]/Automatic[SPI.MAT]Engineering Sciences [physics]/Materials0202 electrical engineering electronic engineering information engineering[PHYS.MECA.MEFL]Physics [physics]/Mechanics [physics]/Fluid mechanics [physics.class-ph]Composite material[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsRTV siliconeComputingMilieux_MISCELLANEOUSchemistry.chemical_classificationMicroelectromechanical systems[SPI.ACOU]Engineering Sciences [physics]/Acoustics [physics.class-ph][SPI.NRJ]Engineering Sciences [physics]/Electric powerPolymer021001 nanoscience & nanotechnologyComputer Science ApplicationsMembranechemistryAnodic bonding[PHYS.MECA.THER]Physics [physics]/Mechanics [physics]/Thermics [physics.class-ph]0210 nano-technologyMicrofabrication
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Anomalous behaviour of periodic domain structure in Gd-doped LiNbO3single crystals

2007

Atomic force microscopy studies of etching patterns, stability of regular domain structure, and anomalies of electrical characteristics in the 300 - 385 K range of a series of Gddoped lithium niobate single crystals grown under equal conditions are reported.

HistoryRange (particle radiation)Materials scienceCondensed matter physicsAtomic force microscopyLithium niobateDopingStructure (category theory)Computer Science ApplicationsEducationchemistry.chemical_compoundCrystallographychemistryEtching (microfabrication)Domain (ring theory)Journal of Physics: Conference Series
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ChemInform Abstract: Photoelectrochemical Study of Electrochemically Formed Semiconducting Yttrium Hydride (YH3-x).

2010

Abstract The first photoelectrochemical study of semiconducting YH 3− x films formed by etching bulk Y metal in 0.5 M H 2 SO 4 solution is reported. The formation of semiconducting hydride having an indirect optical band gap, E g opt , of about 2.35 eV is confirmed by in situ photocurrent spectroscopy. The photoelectrochemical behaviour of such a phase was investigated both in alkaline and in acidic solutions. The flat band potential was estimated to be U fb =−1.25 V/NHE, independent of pH.

In situMetalPhotocurrentHydrideBand gapEtching (microfabrication)Chemistryvisual_artPhase (matter)visual_art.visual_art_mediumAnalytical chemistryGeneral MedicineSpectroscopyChemInform
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Anisotropic chemical etching of semipolar \{10\bar {1}\bar {1}\}\mbox {/} \{10\bar {1}{+}1\} ZnO crystallographic planes: polarity versus dangling bo…

2009

ZnO thin films grown by metal?organic vapor phase epitaxy along the nonpolar direction and exhibiting semipolar facets have been chemically etched with HCl. In order to get an insight into the influence of the ZnO wurtzite structure in the chemical reactivity of the material, Kelvin probe microscopy and convergent beam electron diffraction have been employed to unambiguously determine the absolute polarity of the facets, showing that facets are unstable upon etching in an HCl solution and transform into planes. In contrast, facets undergo homogeneous chemical etching perpendicular to the initial crystallographic plane. The observed etching behavior has been explained in terms of surface oxy…

Kelvin probe force microscopeMaterials scienceMechanical EngineeringDangling bondBioengineeringGeneral ChemistryEpitaxyIsotropic etchingCrystallographyElectron diffractionMechanics of MaterialsEtching (microfabrication)General Materials ScienceElectrical and Electronic EngineeringThin filmWurtzite crystal structureNanotechnology
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Electrochemically etched sharp aluminium probes with nanoporous aluminium oxide coatings: demonstration of addressed DNA delivery

2014

Electrochemical etching of metal wires is widely used to fabricate sharp probes for use in scanning tunnelling microscopy. In this work an electrochemical fabrication method for sharp aluminium probes coated with nanoporous anodised aluminium oxide (AAO) layer is described. The method presented here involves simultaneous anodisation and etching of aluminium wires. The probe apex radius as well as the nanopore length and diameter depend on the etching mode, which could be direct current (DC), alternating current (AC), or pulsed voltage mode (PVM). The probes, coated with a nanoporous AAO layer, were used to demonstrate addressed DNA delivery.

Materials science:NATURAL SCIENCES::Chemistry [Research Subject Categories]AnodizingNanoporousGeneral Chemical EngineeringOxidechemistry.chemical_elementNanotechnologyGeneral ChemistryNanoporechemistry.chemical_compoundchemistryEtching (microfabrication)AluminiumAluminium oxideLayer (electronics)RSC Adv.
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Ru-Based Thin Film Temperature Sensor for Space Environments: Microfabrication and Characterization under Total Ionizing Dose

2016

The paper shows the microfabrication processes of a Ruthenium-based resistance temperature detector and its behavior in response to irradiation at ambient temperature. The radiation test was done in a public hospital facility and followed the procedures based on the ESA specification ESCC 22900. The instrumentation system used for the test is detailed in the work describing the sensors resistance evolution before, during, and after the exposure. A total irradiation dose of 43 krad with 36 krad/h dose rate was applied and a subsequent characterization was performed once the Ru sensors were submitted to an 80°C annealing process during a period of 168 h. The experimental measurements have sho…

Materials scienceArticle SubjectAnnealing (metallurgy)Analytical chemistry02 engineering and technologyRadiation021001 nanoscience & nanotechnology01 natural sciences010309 opticsControl and Systems EngineeringAbsorbed doselcsh:Technology (General)0103 physical scienceslcsh:T1-995Resistance thermometerIrradiationElectrical and Electronic EngineeringThin film0210 nano-technologyDose rateInstrumentationMicrofabricationJournal of Sensors
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Reconstitution of a protein monolayer on thiolates functionalized gaas surface

2012

International audience; In the aim to realize an efficient resonant biosensor, gallium arsenide (GaAs) presents many advantages. In addition to its properties of transduction, GaAs is a crystal for which microfabrication processes were developed, conferring the possibility to miniaturize the device and integrate electronic circuit. Moreover, the biofunctionalization could be realized on the crystalline surface without layer deposition, constituting a real advantage to perform reusable sensor. The functionalization of GaAs surface was engaged in order to immobilize a protein monolayer on this substrate. Functionalization was done using a mixed self assembled monolayer of thiolate molecules. …

Materials scienceBioengineeringNanotechnology02 engineering and technologySubstrate (electronics)010402 general chemistry01 natural sciences[SPI.AUTO]Engineering Sciences [physics]/AutomaticGallium arsenidechemistry.chemical_compound[ SPI.AUTO ] Engineering Sciences [physics]/AutomaticMonolayerGeneral Materials ScienceElectrical and Electronic EngineeringSelf-assembled monolayer021001 nanoscience & nanotechnologyCondensed Matter Physics0104 chemical sciencesComputer Science ApplicationschemistrySurface modification0210 nano-technologyBiosensorLayer (electronics)BiotechnologyMicrofabrication
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