Search results for "molecular beam epitaxy"

showing 10 items of 73 documents

Structural and Electrical Transport Properties of Si doped GaN nanowires

2016

The control and assessment of doping in GaN nanostructures are crucial for the realization of GaN based nanodevices. In this study, we have investigated a series of Si-doped GaN nanowires (NWs) grown by molecular beam epitaxy (MBE) with a typical dimension of 2–3 µm in length, and 20–200 nm in radius. In particular, high resolution energy dispersive X-ray spectroscopy (EDX) has illustrated a higher Si incorporation in NWs than that in two-dimensional (2D) layers and Si segregation at the edge of the NW with the highest doping. Moreover, direct transport measurements on single NWs have revealed a controlled doping with resistivity from 2 × 10−2 to 10−3 Ω.cm for Si doped NWs. Field effect tra…

Materials scienceNanostructureSiliconbusiness.industryDopingNanowirechemistry.chemical_elementGallium nitridechemistry.chemical_compoundchemistryElectrical resistivity and conductivityOptoelectronicsField-effect transistorbusinessMolecular beam epitaxy2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)
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Growth of Fe nanostructures

2004

Abstract Highly ordered arrays of epitaxial iron thin film nanostructures were grown by molecular beam epitaxy techniques on m-plane sapphire α-Al2O3 (1 0 1 0) substrates. Iron was deposited by electron beam evaporation under shallow incidence onto faceted sapphire substrates held at elevated temperatures of 450°C. Scanning electron microscopy suggests the formation of morphologically and electrically isolated nanowire structures on the ridges of the facets. The topology of the structures depends strongly on the iron deposition angle.

Materials scienceNanostructurebusiness.industryScanning electron microscopeNanowireCondensed Matter PhysicsEpitaxyElectron beam physical vapor depositionElectronic Optical and Magnetic MaterialsSapphireOptoelectronicsThin filmbusinessMolecular beam epitaxyJournal of Magnetism and Magnetic Materials
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Size-filtering effects by stacking InAs/InP (001) self-assembled quantum wires into multilayers

2002

Multilayer structure containing vertically stacked InAs/InP self-assembled quantum wires have been successfully grown by molecular-beam epitaxy. The influence of the InP spacer layer thickness on the structural and optical properties of the wire superlattice has been studied by means of transmission electron microscopy and photoluminescence. The coherent propagation of the strain field in the sample with a 5-nm-thick spacer determines by a size filtering effect a good homogeneity and uniformity of the wire stacks, and hence a good optical quality. The exciton recombination dynamics in the wire superlattice cannot be related to thermal escape of carriers out to the barriers, as occurs in sin…

Materials sciencePhotoluminescenceCondensed matter physicsSuperlatticeExcitonQuantum wiresStackingPhysics::OpticsEpitaxyCondensed Matter::Mesoscopic Systems and Quantum Hall EffectCondensed Matter::Materials ScienceMolecular-beam epitaxyTransmission electron microscopyMultilayer structureHomogeneity (physics)ExcitonPhotoluminescenceMolecular beam epitaxy
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Size self-filtering effect in vertical stacks of InAs/InP self-assembled quantum wires

2003

3 páginas, 2 figuras.-- PACS: 73.21.Hb; 78.55.Cr; 78.67.Lt.-- Proceedings of the International Conference on Superlattices, Nano-structures and Nano-devices ICSNN 2002.

Materials sciencePhotoluminescenceCondensed matter physicsbusiness.industryQuantum wiresPhysics::OpticsCondensed Matter::Mesoscopic Systems and Quantum Hall EffectCondensed Matter PhysicsLayer thicknessAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic MaterialsSelf assembledCondensed Matter::Materials ScienceHomogeneity (physics)Physics::Accelerator PhysicsOptoelectronicsVertical stacksbusinessQuantumPhotoluminescenceMolecular beam epitaxy
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Growth, structural and optical properties of GaN/AlN and GaN/GaInN nanowire heterostructures

2012

Abstract After discussing the GaN NW nucleation issue, we will present the structural properties of axial and radial (i.e. core/shell) GaN/AlN NW heterostructures and adress the issue of critical thickness during the growth of such heterostructures. Next, we will present the growth of InGaN NWs on a GaN NW base. It will be shown that the morphology and structural properties of the InGaN NW sections depend on the In content: for high In content a flat top is observed and plastic relaxation is occuring, with mismatch dislocations formed at the InGaN/GaN interface. By contrast, for In content below 25% InGaN NWs exhibit a pencil-like shape assigned to a purely elastic strain relaxation process…

Materials sciencePhotoluminescencebusiness.industryRelaxation (NMR)NucleationNanowireShell (structure)HeterojunctionPhysics and Astronomy(all)Xrays diffractionsymbols.namesakenanowiresmolecular beam epitaxyRaman spectroscopysymbolsIII nitride wide gap semiconductorsOptoelectronicsphotoluminescencebusinessRaman spectroscopyhigh resolution electron microscopyMolecular beam epitaxyPhysics Procedia
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Microcavity Light Emitting Diodes Based on GaN membranes Grown by Molecular Beam Epitaxy on Silicon

2003

Resonant-cavity InGaN/GaN quantum well light emitting diodes have been fabricated. Nitride layers were grown by molecular beam epitaxy on Si (111). We fabricated the structures using a combination of Si substrate etching, GaN etching and dielectric (Ta2O5/SiO2) mirror deposition. The electroluminescence spectra show that the emission within the distributed Bragg reflector stop band is enhanced in the membrane microcavity. The cavity modes are broadened by some cavity length non-uniformity that is introduced when the GaN is back etched to adjust the cavity length. This process does not need any transfer on an intermediate host substrate and is fully compatible with large area semiconductor p…

Materials sciencePhysics and Astronomy (miscellaneous)Physics::Instrumentation and DetectorsGeneral Physics and AstronomyPhysics::OpticsGallium nitrideSubstrate (electronics)Light emitting diodeFILMSSettore ING-INF/01 - Elettronicalaw.inventionchemistry.chemical_compoundCondensed Matter::Materials ScienceOpticsEtching (microfabrication)lawDielectric mirrorDielectric mirrorQuantum wellbusiness.industryGeneral EngineeringMembraneGallium nitrideDistributed Bragg reflectorlight emitting diodesComputer Science::OtherchemistryOptoelectronicsWAVELASERbusinessMicrocavityMolecular beam epitaxyLight-emitting diodeMolecular beam epitaxySAPPHIRE
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Growth, structural and optical properties of AlGaN nanowires in the whole composition range.

2013

International audience; We report on the growth of AlxGa1-xN nanowires by plasma-assisted molecular beam epitaxy for x in the 0.3-0.8 range. Based on a combination of macro- and micro-photoluminescence, Raman spectroscopy, x-ray diffraction and scanning electron microscopy experiments, it is shown that the structural and optical properties of AlGaN NWs are governed by the presence of compositional fluctuations associated with strongly localized electronic states. A growth model is proposed, which suggests that, depending on growth temperature and metal adatom density, macroscopic composition fluctuations are mostly of kinetic origin and are directly related to the nucleation of the AlGaN na…

Materials scienceScanning electron microscopeNanowireNucleationBioengineering02 engineering and technologySubstrate (electronics)Epitaxy01 natural sciencessymbols.namesake0103 physical sciencesMicroscopyGeneral Materials ScienceElectrical and Electronic Engineering010302 applied physicsMechanical EngineeringGeneral Chemistry021001 nanoscience & nanotechnologyCrystallographyMechanics of MaterialsChemical physicssymbols[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]0210 nano-technologyRaman spectroscopyMolecular beam epitaxyNanotechnology
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Thickness-dependent properties of ultrathin bismuth and antimony chalcogenide films formed by physical vapor deposition and their application in ther…

2021

This work was supported by the European Regional Development Fund (ERDF) project No 1.1.1.1/16/A/257. J. A. acknowledges the ERDF project No. 1.1.1.2/1/16/037. Institute of Solid State Physics, University of Latvia, Latvia as the Center of Excellence has received funding from the European Union's Horizon 2020 Framework Programme H2020-WIDESPREAD-01-2016-2017 TeamingPhase2 under grant agreement No. 739508, project CAMART2 . The raw/processed data required to reproduce these findings cannot be shared at this time as the data also form a part of an ongoing study.

Materials scienceThickness-dependent thermoelectric propertiesChalcogenideMaterials Science (miscellaneous)Energy Engineering and Power Technologychemistry.chemical_element02 engineering and technology010402 general chemistry7. Clean energy01 natural sciencesBismuthlaw.inventionchemistry.chemical_compoundUltrathin filmlawSeebeck coefficientBismuth chalcogenide:NATURAL SCIENCES:Physics [Research Subject Categories]Thin filmFused quartzAntimony tellurideRenewable Energy Sustainability and the Environmentbusiness.industryAntimony telluride021001 nanoscience & nanotechnology0104 chemical sciencesFuel TechnologyNuclear Energy and EngineeringchemistryPhysical vapor depositionOptoelectronics0210 nano-technologybusinessMolecular beam epitaxyNarrow band gap layered semiconductor
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High Performance Solar Blind Detectors based on AlGaN grown by MBE and MOCVD

2004

ABSTRACTSolar blind detectors based on AlGaN grown by Molecular Beam Epitaxy and Metal Organic Vapor Phase Epitaxy have been fabricated and characterized. Metal Semiconductor Metal (MSM) detectors and vertical Schottky detectors have been realized, with a design that allows back side illumination. The growth was optimized in order to improve the layer quality, avoid crack formation, and provide the best detector performance. The technological process was also optimized in order to reduce the dark currents and improve the spectral rejection ratio, which is a key factor for solar blind detection. As a result, a rejection ratio of 5 decades between the UV (below 300 nm) and 400 nm, and a steep…

Materials sciencebusiness.industryAlloyDetectorPhase (waves)Schottky diodeengineering.materialEpitaxySettore ING-INF/01 - ElettronicaGanCondensed Matter::Materials ScienceOpticsSolar-blind detectors MBE MOCVD AlGaNengineeringOptoelectronicsMetalorganic vapour phase epitaxybusinessNoise-equivalent powerMolecular beam epitaxyMRS Proceedings
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Epitaxial thin films of intermetallic compounds

2002

Publisher Summary The potential of epitaxial thin films of intermetallic compounds in basic and applied research is emerging. Although the growth of semiconductor heterostructures and compounds based on molecular beam epitaxy (MBE) and related methods has come through a 30-year history of ongoing refinement and sophistication, still much has to be learned concerning the growth and characterization of even moderately complex metallic thin film structures. MBE represents a well-defined crystallization technique based on the reactions among molecular or atomic beams of the constituent elements on a substrate or template at elevated temperatures in an ultrahigh vacuum (UHV) environment. Owing t…

Materials sciencebusiness.industryAlloyIntermetallicNanotechnologySubstrate (electronics)engineering.materialEpitaxySemiconductorElectron diffractionengineeringOptoelectronicsThin filmbusinessMolecular beam epitaxy
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