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RESEARCH PRODUCT
High-efficiency silicon-compatible photodetectors based on Ge quantum dots
Alexander ZaslavskyAntonio TerrasiSon T. LeMaria MiritelloPei LiuDavid C. PaineSalvatore CosentinoSalvo MirabellaIsodiana CrupiDomenico PacificiSunghwan Leesubject
Amorphous siliconMaterials scienceThermal budgetPhysics and Astronomy (miscellaneous)SiliconSilicon TechnologieResponsivitychemistry.chemical_elementSettore ING-INF/01 - Elettronicachemistry.chemical_compoundResponsivityMetal/insulator/semiconductorGe quantum dotWavelength ranges Amorphous siliconPhotocurrent generationPhotodetectorOptoelectronic devicePhotocurrentGermaniumbusiness.industrySemiconductor quantum dotInternal quantum efficiencymatrixTRANSPORTSemiconductorNANOCRYSTALSSilica Quantum efficiencychemistryQuantum dot laserQuantum dotOptoelectronicsQuantum efficiencyTransport mechanismGAINbusinessNANOCRYSTALS TRANSPORT GAINFully compatibleHigh efficiencydescription
We report on high responsivity, broadband metal/insulator/semiconductor photodetectors with amorphous Ge quantum dots (a-Ge QDs) as the active absorbers embedded in a silicon dioxide matrix. Spectral responsivities between 1-4 A/W are achieved in the 500-900 nm wavelength range with internal quantum efficiencies (IQEs) as high as ∼700%. We investigate the role of a-Ge QDs in the photocurrent generation and explain the high IQE as a result of transport mechanisms via photoexcited QDs. These results suggest that a-Ge QDs are promising for high-performance integrated optoelectronic devices that are fully compatible with silicon technology in terms of fabrication and thermal budget. © 2011 American Institute of Physics.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2011-05-30 |