0000000000008984

AUTHOR

Isodiana Crupi

showing 102 related works from this author

Reliability and Retention Study of Nanocrystal Cell Array

2002

We have studied nanocrystal memory arrays with 2.56 × 105 cells (256kb) in which Si nanocrystals have been obtained by CVD deposition on a 4nm tunnel oxide. The cells in the array are programmed and erased by electron tunneling through the SiO2 dielectric. We find that the threshold voltage distribution has little spread. In addition the arrays are also very robust with respect to drain stress and show good retention.

Reliability (semiconductor)Materials scienceCellular arrayNanocrystalNanotechnologyElectrical and Electronic EngineeringSafety Risk Reliability and QualitySettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materia
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Effect of high-k materials in the control dielectric stack of nanocrystal memories

2004

In this paper we studied program/erase characteristics by FN tunneling in Si nanocrystal memories. Starting from a very good agreement between experimental data and simulations in the case of a memory cell with a thin tunnel oxide, Silicon dots as medium for charge storage, and a CVD silicon dioxide used as control dielectric, we present estimated values of the charge trapping when a high-k material is present in the control dielectric. We then show preliminary results of nanocrystal memories with control dielectric containing high-k materials. ©2004 IEEE.

Materials scienceSiliconbusiness.industrySilicon dioxideGate dielectricchemistry.chemical_elementDielectricSettore ING-INF/01 - Elettronicachemistry.chemical_compoundEngineering (all)chemistryNanocrystalNanoelectronicsStack (abstract data type)Electronic engineeringOptoelectronicsbusinessHigh-κ dielectric
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Colloidal Self-assembled Nanosphere Arrays for Plasmon-enhanced Light Trapping in Thin Film Silicon Solar Cells

2014

To realize high-efficiency thin-film silicon solar cells it is crucial to develop light-trapping methods that can increase absorption of the near- bandgap light in the silicon material. That can be achieved using the far-field scattering properties of metal nanoparticles (MNP) sustaining surface plasmons. The MNPs should be inserted in the back of the cell, embedded in the transparent conductive oxide (TCO) layer which separates the rear mirror from the silicon layers. In this way, a plasmonic back reflector (PBR) is constructed that can redirect light at angles away from the incidence direction and thereby increase its path length in the cell material. In this work, a novel technique is pr…

Light trappingMaterials scienceSiliconScatteringSurface plasmonColloidal Metal Nanoparticlechemistry.chemical_elementNanotechnologyThin film solar cellsPlasmonicSettore ING-INF/01 - ElettronicaEnergy (all)chemistryEnergy(all)Colloidal Metal NanoparticlesColloidal goldPlasmonicsMie theoryPlasmonic solar cellThin filmPlasmonTransparent conducting filmThin film solar cellEnergy Procedia
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Compact instrumentation for radiation tolerance test of flash memories in space environment

2010

Aim of this work is the description of a test equipment, designed to be integrated on board of a microsatellite, able to investigate the radiation tolerance of non-volatile memory arrays in a real flight experiment. An FPGA-based design was adopted to preserve a high flexibility degree. Besides standard Program/Read/Erase functions, additional features such as failure data screening and latch-up protection have been implemented. The instrument development phase generated, as a by-product, a non-rad-hard version of the instrument that allowed performing in-situ experiments using 60Co and 10 MeV Boron irradiation facilities on Ground. Preliminary measurement results are reported to show the i…

EngineeringTolerance analysisbusiness.industrySystem testingSettore ING-INF/01 - ElettronicaFlash memorySpace equipmentNon-volatile memoryNon-volatile memoryFPGA-based instrumentationRadiation hardneInstrumentation (computer programming)businessField-programmable gate arrayRadiation hardeningInstrumentationComputer hardwareSpace environment
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Silicon-based light-emitting devices: Properties and applications of crystalline, amorphous and er-doped nanoclusters

2006

In this paper, we summarize the results of an extensive investigation on the properties of MOS-type light-emitting devices based on silicon nanostructures. The performances of crystalline, amorphous, and Er-doped Si nanostructures are presented and compared. We show that all devices are extremely stable and robust, resulting in an intense room temperature electroluminescence (EL) at around 900 nm or at 1.54 μm. Amorphous nanoclusters are more conductive than the crystalline counterpart. In contrast, nonradiative processes seem to be more efficient for amorphous clusters resulting in a lower quantum efficiency. Erbium doping results in the presence of an intense EL at 1.54 μm with a concomit…

Materials scienceSiliconElectroluminescent devicechemistry.chemical_elementNanocrystalQUANTUM DOTSElectroluminescenceSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaNanoclustersErbiumIntegrated optoelectronicElectroluminescence (EL)Light-emitting deviceOptical interconnectionElectrical and Electronic Engineeringbusiness.industryDopingOPTICAL-PROPERTIESAtomic and Molecular Physics and OpticsAmorphous solid1.54 MU-MchemistryNanocrystalOptoelectronicsQuantum efficiencySI NANOCRYSTALSENERGY-TRANSFERbusinessErbium
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Plasmonic nanostructures for light trapping in thin-film solar cells

2019

Abstract The optical properties of localized surface plasmon resonances (LSPR) sustained by self-assembled silver nanoparticles are of great interest for enhancing light trapping in thin film photovoltaics. First, we report on a systematic investigation of the structural and the optical properties of silver nanostructures fabricated by a solid-state dewetting process on various substrates. Our study allows to identify fabrication conditions in which circular, uniformly spaced nanoparticles are obtainable. The optimized NPs are then integrated into plasmonic back reflector (PBR) structures. Second, we demonstrate a novel procedure, involving a combination of opto-electronic spectroscopic tec…

Materials scienceCondensed Matter Physic02 engineering and technologySettore ING-INF/01 - Elettronica7. Clean energy01 natural sciencesSilver nanoparticlelaw.inventionNanoparticlelawPhotovoltaics0103 physical sciencesSolar cellMechanics of MaterialGeneral Materials Sciencesubwavelength nanostructuresDewettingThin filmSurface plasmon resonancePlasmonThin film solar cell010302 applied physicsthin film solar cellsbusiness.industryMechanical EngineeringSelf-assemblyself-assemblyLocalized surface plasmon resonance021001 nanoscience & nanotechnologyCondensed Matter PhysicsphotovoltaicsMechanics of MaterialsOptoelectronicsPlasmonic-enhanced light trappingSubwavelength nanostructurenanoparticlesMaterials Science (all)0210 nano-technologybusinessPhotovoltaicLocalized surface plasmon
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Growth kinetics of colloidal Ge nanocrystals for light harvesters

2016

Colloidal Ge nanocrystals (NCs) are gaining increased interest because of their potential application in low-cost optoelectronic and light harvesting devices. However, reliable control of colloidal NC synthesis is often an issue and a deeper understanding of the key-role parameters governing NC growth is highly required. Here we report an extended investigation on the growth of colloidal Ge NCs synthesized from a one-pot solution based approach. A systematic study of the effects of synthesis time, temperature and precursor concentration is elucidated in detail. X-ray diffraction (XRD) analysis reveals the presence of crystalline Ge NCs with a mean size (from 5 to 35 nm) decreasing with the …

Materials scienceScanning electron microscopePHOTODETECTORSGeneral Chemical EngineeringPhotodetectorNanotechnology02 engineering and technologyActivation energy010402 general chemistry01 natural sciencesSettore ING-INF/01 - ElettronicaColloidDynamic light scatteringPEDOT:PSSGermanium; Quantum dot; PHOTODETECTORSchemistry.chemical_classificationGermaniumQuantum dotGeneral ChemistryPolymer021001 nanoscience & nanotechnology0104 chemical scienceschemistryChemical engineeringNanocrystaloptoelectronic devices colloidal nanocrystals0210 nano-technology
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Low-cost high-haze films based on ZnO nanorods for light scattering in thin c-Si solar cells

2015

Light scattering from ZnO nanorods (NR) is investigated, modeled, and applied to a solar cell. ZnO NR (120-1300 nm long, 280-60 nm large), grown by low-cost chemical bath deposition at 90 degrees C, exhibit diffused-to-total transmitted light as high as 70% and 30% in the 400 and 1000 nm wavelength range, respectively. Data and scattering simulation show that ZnO NR length plays a crucial role in light diffusion effect. A transparent ZnO NR film grown on glass and placed on top of a 1 mu m thick c-Si solar cell is shown to enhance the light-current conversion efficiency for wavelengths longer than 600 nm. (C) 2015 AIP Publishing LLC.

SiliconMaterials sciencePhysics and Astronomy (miscellaneous)SiliconZnO nanorod Silicon solar cellschemistry.chemical_elementNanorodSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaLight scatteringlaw.inventionlawSolar cellZinc oxide C-Si solar cellChemical-bath depositionbusiness.industryScatteringSolar cellEnergy conversion efficiencyWide-bandgap semiconductorLight scatteringCurrent conversion efficiencychemistryLight diffusionScattering simulationOptoelectronicsNanorodTransmitted lightbusinessWavelength rangeChemical bath depositionApplied Physics Letters
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Broadband photocurrent enhancement in a-Si:H solar cells with plasmonic back reflectors

2014

The authors acknowledge Francesco Ruffino for the AFM measurements. This work was funded by the EU FP7 Marie Curie Action FP7-PEOPLE-2010-ITN through the PROPHET project (Grant No. 264687), the bilateral CNR/AVCR project "Photoresponse of nanostructures for advanced photovoltaic applications", the MIUR project Energetic (Grant no. PON02_00355_3391233) and by the Portuguese Science Foundation (FCT-MEC) through the Strategic Project PEst-C/CTM/LA0025/2013-14 and the research project PTDC/CTM-ENE/2514/2012. Plasmonic light trapping in thin film silicon solar cells is a promising route to achieve high efficiency with reduced volumes of semiconductor material. In this paper, we study the enhance…

SiliconMaterials scienceConformal growthSiliconchemistry.chemical_elementPlasmon02 engineering and technologyFILMS01 natural sciences7. Clean energySilver A-Si:H solar cellSettore ING-INF/01 - ElettronicaLight scatteringOptics0103 physical sciencesPhotocurrentFabrication parameterPlasmonic solar cellThin filmSILICONPhotocurrent enhancementPlasmon010302 applied physicsPhotocurrentbusiness.industryLight scattering021001 nanoscience & nanotechnologySolar energyScattering effectAtomic and Molecular Physics and OpticschemistryDiffuse reflectionOptoelectronicsDiffuse reflectionThin-film silicon solar cells Silicon solar cells0210 nano-technologybusinessSilver nanoparticle (NPs)Optics Express
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Nanocrystal metal-oxide-semiconductor memories obtained by chemical vapor deposition of Si nanocrystals

2002

We have realized nanocrystal memories by using silicon quantum dots embedded in silicon dioxide. The Si dots with the size of few nanometers have been obtained by chemical vapor deposition on very thin tunnel oxides and subsequently coated with a deposited SiO2 control dielectric. A range of temperatures in which we can adequately control a nucleation process, that gives rise to nanocrystal densities of ∼3×1011 cm−2 with good uniformity on the wafer, has been defined. The memory effects are observed in metal-oxide-semiconductor capacitors or field effect transistors by significant and reversible flat band or threshold voltage shifts between written and erased states that can be achieved by …

Materials scienceSiliconPhysics and Astronomy (miscellaneous)business.industryGeneral EngineeringOxidechemistry.chemical_elementNanotechnologyChemical vapor depositionSettore ING-INF/01 - ElettronicaThreshold voltagechemistry.chemical_compoundchemistryNanocrystalMOSFETOptoelectronicsWaferField-effect transistorElectrical and Electronic EngineeringbusinessSurfaces and Interface
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Custom measurement system for memristor characterisation

2021

Abstract A cheap, compact and customisable characterisation system for memristor devices, working between ± 10 V, is presented. SPICE (Simulation Program with Integrated Circuit Emphasis) simulations are performed to verify the circuit feasibility and a proper software is developed to drive the system. The potentiality of the realised system is tested by performing several electrical measurements on both Cu/HfO2/Pt memristors and two-terminals commercial devices.

010302 applied physicsComputer sciencebusiness.industrySystem of measurementSpiceEmphasis (telecommunications)02 engineering and technologyMemristorIntegrated circuit021001 nanoscience & nanotechnologyCondensed Matter PhysicsSettore ING-INF/01 - Elettronica01 natural sciencesElectronic Optical and Magnetic Materialslaw.inventionSoftwarelaw0103 physical sciencesMaterials ChemistryElectronic engineeringElectrical measurementsElectrical and Electronic EngineeringMemristor ReRAM electrical characterization system current compliance endurance retention0210 nano-technologybusinessSolid-State Electronics
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Nanocrystal MOS with silicon-rich oxide

2001

By electrical measurements we investigate the charge trapping and the charge transport in MOS capacitors in which the gate oxide has been replaced with a silicon rich oxide (SRO) film sandwiched between two thin SiO2 layers.

Materials scienceSiliconSROPhysics and Astronomy (miscellaneous)MOS memoryOxideQuantum dotchemistry.chemical_elementNanotechnologyCondensed Matter PhysicCondensed Matter PhysicsSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic Materialschemistry.chemical_compoundchemistryNanocrystalGeneral Materials ScienceMaterials Science (all)
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Nanocrystal memories for FLASH device applications

2004

Nanocrystals memory cells, in which the conventional polysilicon floating gate is replaced by an array of silicon nanocrystals, have been fabricated and characterized. Single cells and cell arrays of 1 Mb and 10 k have been realized by using a conventional 0.15 μm FLASH technology. Si nanocrystals are deposited on top of tunnel oxide by chemical vapor deposition. Properties of the memory cell have been investigated both for NAND and NOR applications in terms of program/erase window and programming times. Suitable program/erase threshold voltage window can be achieved with fast voltage pulses by adequate choice of tunnel and control dielectric. The feasibility of dual bit storage is also pro…

Materials sciencebusiness.industryElectronic Optical and Magnetic MaterialNAND gateNanotechnologyChemical vapor depositionNanocrystalReliabilityCondensed Matter PhysicsFlash memorySettore ING-INF/01 - ElettronicaFlash memoryElectronic Optical and Magnetic MaterialsThreshold voltageFlash (photography)NanocrystalMemory cellHardware_GENERALCharge trap flashMaterials ChemistryHardware_INTEGRATEDCIRCUITSOptoelectronicsElectrical and Electronic Engineeringbusiness
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Light absorption and electrical transport in Si:O alloys for photovoltaics

2010

Thin films (100-500 nm) of the Si:O alloy have been systematically characterized in the optical absorption and electrical transport behavior, by varying the Si content from 43 up to 100 at. %. Magnetron sputtering or plasma enhanced chemical vapor deposition have been used for the Si:O alloy deposition, followed by annealing up to 1250 °C. Boron implantation (30 keV, 3-30× 1014 B/cm2) on selected samples was performed to vary the electrical sheet resistance measured by the four-point collinear probe method. Transmittance and reflectance spectra have been extracted and combined to estimate the absorption spectra and the optical band gap, by means of the Tauc analysis. Raman spectroscopy was …

Materials scienceAbsorption spectroscopyFour-pointAnalytical chemistryGeneral Physics and AstronomyAbsorption coefficientChemical vapor depositionBoron implantationSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materiasymbols.namesakeElectrical resistivity and conductivityPlasma-enhanced chemical vapor depositionThin filmAbsorption (electromagnetic radiation)Electrical sheet resistanceSi contentSEMIINSULATING POLYCRYSTALLINE SILICON; SOLAR-CELLS; 3RD-GENERATION PHOTOVOLTAICS; OPTICAL-PROPERTIES; AMORPHOUS-SILICON; THIN-FILMS; CRYSTALLINEOptical absorptionProbe methodElectrical resistivityAlloy depositionSputter depositionElectrical transportsymbolsOxygen-rich siliconRaman spectroscopyOptical gapReflectance spectrumPhotovoltaic
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Distribution and generation of traps in SiO2/Al2O3 gate stacks

2007

In this work we combine charge-pumping measurements with positive constant voltage stress to investigate trap generation in SiO2/ Al2O3 n-MOSFET. Trap density has been scanned either in energy or in position based on charge-pumping (CP) measurements performed under different operating conditions in terms of amplitude and frequency of the gate pulse. Our results have revealed that the traps are meanly localized shallow in energy level, deeper in spatial position and they are mostly generated near the Si/SiO2 interface. (C) 2007 Elsevier Ltd. All rights reserved.

interface trapsWork (thermodynamics)Materials sciencecharge pumping (CP)Settore ING-INF/01 - ElettronicaTrap (computing)Stress (mechanics)Position (vector)Electrical and Electronic EngineeringSafety Risk Reliability and QualityBulk trapsbusiness.industryElectrical engineeringCondensed Matter PhysicsAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsPulse (physics)AmplitudeDistribution (mathematics)Control and Systems Engineeringenergy distributionAtomic physicsbusinesshigh-k dielectricsEnergy (signal processing)
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Rayleigh-instability-driven dewetting of thin Au and Ag films on indium-tin-oxide surface under nanosecond laser irradiations

2013

Investigations have been carried out on laser-beam-induced nanoparticle (NP) formation in thin (5 nm) Au and Ag films on indium-tin-oxide substrate. After the irradiation the films were observed to break-up into NPs through a dewetting mechanism. This mechanism was investigated as a Rayleigh-instability- driven process. In fact, for each used laser fluence, the resulting Au and Ag NPs' mean size and surface-to-surface mean distance were quantified and correlated between them in the framework of the Rayleigh-instability theory showing an excellent agreement. © The Institution of Engineering and Technology 2013.

quantitative analysiAnalytical chemistrymetallic thin filmsNanoparticleAg filmSubstrate (electronics)IndiumSettore ING-INF/01 - Elettronicaindium tin oxidePhysics::Fluid DynamicsGeneral Materials Sciencesilver nanoparticle articleDewettingRayleigh–Taylor instabilityOxide filmNuclear Experimentdegradationparticle sizeCondensed Matter PhysicsIndium tin oxideNanolithographydewettingnanomaterialIndium-tin-oxide substratechemical reactionMaterials sciencesurface propertyBiomedical EngineeringBioengineeringMean size GoldFluencenanoanalysiCondensed Matter::Materials ScienceOpticsMean distanceIrradiationtheoryLaser theorymetal nanoparticlerayleigh instability theorybusiness.industrylaser beam effectsLaser fluencelasernanofilmTin Silver gold nanoparticlenanofabricationnanoparticlesDe-wettingbusiness
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Hybrid Inorganic‐Organic White Light Emitting Diodes

2020

This chapter reviews the state of the art of materials, technologies, characterizations, process and challenges concerning hybrid white light‐emitting diodes (LEDs). Here, for a “hybrid LED” we mean a device based on a layer of organic phosphors (or a mix of inorganic and organic ones) pumped by a high‐energy inorganic LED. Light is emitted by a frequency down‐conversion (sometimes simply named color‐conversion) process. Benefits and weak spots of this technology are investigated with a special attention for the materials involved into the process of frequency down‐conversion, in order to envisage the future impact of the hybrid lighting technology among the well‐established inorganic ones.

Materials sciencebusiness.industryWhite lightOptoelectronicsMetal-organic frameworkInorganic organicbusinessHybrid Inorganic-Organic White Light Emitting Diodes (HWLEDs) Frequency-down conversion Luminescent polymers and molecular dyes Biomaterials and biomolecules Metal-Organic Frameworks Carbon dots Color tuning and rendering of HWLEDs Stability of HWLEDsSettore ING-INF/01 - ElettronicaDiode
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Memory effects in MOS capacitors with silicon rich oxide insulators

2000

ABSTRACTTo form crystalline Si dots embedded in SiO2, we have deposited thin films of silicon rich oxide (SRO) by plasma-enhanced chemical vapor deposition of SiH4 and O2. Then the materials wereannealed in N2 ambient at temperatures between 950 and 1100 °C. Under such processing, the supersaturation of Si in the amorphous SRO film produces the formation of crystalline Si dots embedded in SiO2. The narrow dot size distributions, analyzed by transmission electron microscopy, are characterized by average grain radii and standard deviations down to about 1 nm. The memory function of such structures has been investigated in metal-oxidesemiconductor (MOS) capacitors with a SRO film sandwiched be…

Materials scienceSiliconbusiness.industryOxidechemistry.chemical_elementNanotechnologyChemical vapor depositionengineering.materialSettore ING-INF/01 - ElettronicaElectronic Optical and Magnetic MaterialsAmorphous solidlaw.inventionCapacitorchemistry.chemical_compoundPolycrystalline siliconchemistryTransmission electron microscopylawengineeringOptoelectronicsThin filmbusiness
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Improved Cu2O/AZO Heterojunction by Inserting a Thin ZnO Interlayer Grown by Pulsed Laser Deposition

2019

Cu2O/ZnO:Al (AZO) and Cu2O/ZnO/AZO heterojunctions have been deposited on glass substrates by a unique three-step pulsed laser deposition process. The structural, optical, and electrical properties of the oxide films were investigated before their implementation in the final device. X-ray diffraction analysis indicated that the materials were highly crystallized along the c-axis. All films were highly transparent in the visible region with enhanced electrical properties. Atomic force and scanning electron microscopies showed that the insertion of a ZnO layer between the Cu2O and AZO films in the heterojunction enhanced the average grain size and surface roughness. The heterojunctions exhibi…

Materials scienceScanning electron microscopeOxideCu2O02 engineering and technology01 natural sciencesPulsed laser depositionchemistry.chemical_compoundElectronic Electrical and Electronic Engineering0103 physical sciencesMaterials ChemistrySurface roughnessElectrical and Electronic EngineeringElectronic band structurepulsed laser depositionLeakage (electronics)010302 applied physicsbusiness.industryOptical and Magnetic MaterialAZOHeterojunction021001 nanoscience & nanotechnologyCondensed Matter PhysicsGrain sizeElectronic Optical and Magnetic Materialssolar cellchemistryZnOOptoelectronicsHeterojunction0210 nano-technologybusinessJournal of Electronic Materials
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Carrier-induced quenching processes on the erbium luminescence in silicon nanocluster devices

2006

The luminescence-quenching processes limiting quantum efficiency in Er-doped silicon nanocluster light-emitting devices are investigated and identified. It is found that carrier injection, while needed to excite Er ions through electron-hole recombination, at the same time produces an efficient nonradiative Auger deexcitation with trapped carriers. This phenomenon is studied in detail and, on the basis of its understanding, we propose device structures in which sequential injection of electrons and holes can improve quantum efficiency by avoiding Auger processes. © 2006 The American Physical Society.

Materials scienceSiliconAstrophysics::High Energy Astrophysical Phenomenalight-emitting deviceschemistry.chemical_elementElectronElectroluminescenceSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaAugerErbiumCondensed Matter::Materials ScienceELECTROLUMINESCENCEPhysics::Atomic and Molecular ClustersPhysics::Atomic PhysicsQuenchingOPTICAL GAINbusiness.industryCondensed Matter PhysicsElectronic Optical and Magnetic Materials1.54 MU-MchemistryOptoelectronicsQuantum efficiencySI NANOCRYSTALSENERGY-TRANSFERLuminescencebusinessPhysical Review B
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Improvement of the P/E window in nanocrystal memories by the use of high-k materials in the control dielectric

2005

Abstract In this paper nanocrystals memories program curves are shown and their saturation points (steady state condition) can be observed. We present a model that relates the voltage shift at the steady state ( Δ V T ss ) to the gate program voltage (VG). Starting from a good agreement between experimental data and simulations for nanocrystals memory cells with a conventional dielectric structure (SiO2), we present the estimated values of the Δ V T ss vs VG for different control stacks. Our investigation shows an improvement if a material with a high dielectric constant and a small conduction band-offset with respect to the SiO2, is placed between two SiO2 layers when the first of them is …

PermittivityMaterials scienceCondensed matter physicsbusiness.industryElectrical engineeringDielectricCondensed Matter PhysicsThermal conductionSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsBand offsetSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsNanocrystalControl and Systems EngineeringElectrical and Electronic EngineeringSafety Risk Reliability and QualitybusinessSaturation (magnetic)High-κ dielectricVoltage
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Memory effects in MOS capacitors with silicon quantum dots

2001

To form crystalline Si dots embedded in SiO2, we have deposited thin films of silicon-rich oxide (SRO) by plasma-enhanced chemical vapor deposition of SiH4 and O2. Then the materials have been annealed in N2 ambient at temperatures between 950°C and 1100°C. Under such processing, the supersaturation of Si in the amorphous SRO film produces the formation of crystalline Si dots embedded in SiO2. The narrow dot size distributions, analyzed by transmission electron microscopy, are characterized by average grain radii and standard deviations down to about 1 nm. The memory functions of such structures has been investigated in MOS capacitors with a SRO film sandwiched between two thin SiO2 layers …

Materials scienceSROOxideBioengineeringInsulator (electricity)Chemical vapor depositionengineering.materialSettore ING-INF/01 - Elettronicalaw.inventionBiomaterialschemistry.chemical_compoundlawThin filmNanocrystal memorybusiness.industrySilicon-rich oxideAmorphous solidCapacitorPolycrystalline siliconchemistryMechanics of MaterialsTransmission electron microscopySingle electron memoryengineeringOptoelectronicsbusiness
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Electrical and structural characterization of metal-oxide-semiconductor capacitors with silicon rich oxide

2001

Metal-oxide-semiconductor capacitors in which the gate oxide has been replaced with a silicon rich oxide (SRO) film sandwiched between two thin SiO2 layers are presented and investigated by transmission electron microscopy and electrical measurements. The grain size distribution and the amount of crystallized silicon remaining in SRO after annealing have been studied by transmission electron microscopy, whereas the charge trapping and the charge transport through the dots in the SRO layer have been extensively investigated by electrical measurements. Furthermore, a model, which explains the electrical behavior of such SRO capacitors, is presented and discussed. © 2001 American Institute of …

Materials scienceSiliconbusiness.industryAnnealing (metallurgy)OxideGeneral Physics and Astronomychemistry.chemical_elementMineralogycapacitors electrical measurementsSettore ING-INF/01 - ElettronicaGrain sizeSettore FIS/03 - Fisica Della Materialaw.inventionchemistry.chemical_compoundCapacitorchemistryGate oxideTransmission electron microscopylawOptoelectronicsElectrical measurementsbusiness
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Hot carrier effects in n-MOSFETs with SiO2/HfO2/HfSiO gate stack and TaN metal gate

2009

Charge trapping and trap generation in field-effect transistors with SiO2/HfO2/HfSiO gate stack and TaN metal gate electrode are investigated under uniform and non-uniform charge injection along the channel. Compared to constant voltage stress (CVS), hot carrier stress (HCS) exhibits more severe degradation in transconductance and subthreshold swing. By applying a detrapping bias, it is demonstrated that charge trapping induced degradation is reversible during CVS, while the damage is permanent for hot carrier injection case. © 2008 Elsevier B.V. All rights reserved.

Materials sciencebusiness.industryTransconductanceTransistorTrappingCondensed Matter PhysicsSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionStress (mechanics)lawElectrodeOptoelectronicsDegradation (geology)High-k dielectrics Hot carrier stress Constant voltage stressElectrical and Electronic EngineeringMetal gatebusinessHot-carrier injection
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Photocurrent enhancement in thin a-Si:H solar cells via plasmonic light trapping

2014

Photocurrent enhancement in thin a-Si:H solar cells due to the plasmonic light trapping is investigated, and correlated with the morphology and the optical properties of the selfassembled silver nanoparticles incorporated in the cells' back reflector. © 2014 OSA.

Photocurrentanimal structuresMaterials sciencegenetic structuresbusiness.industryScanning electron microscopeTrappingSolar energySettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsSettore FIS/03 - Fisica Della Materiaeye diseasesSilver nanoparticleSolar cell efficiencyOptoelectronicssense organsPlasmonic solar cellbusinessInstrumentationPlasmon
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Origin of the substrate current after soft-breakdown in thin oxide n-MOSFETs

1999

In this paper is presented an experimental investigation on the origin of the substrate current after soft-breakdown in n-MOSFETs with 4.5 nm-thick oxide. At lower voltages this current shows a plateau that can be explained with the generation of hole-electron pairs in the space charge region and at the Si-SiO2 interface, and to carrier diffusion between the channel and the substrate. At higher voltages the substrate current steeply increases with voltage, due to trap-assisted tunneling from the substrate valence band to the gate conduction band, which becomes possible for gate voltages higher than the threshold voltage. Measurements on several devices at dark and in the presence of light, …

Materials sciencebusiness.industryAnalytical chemistryTime-dependent gate oxide breakdownSubstrate (electronics)Condensed Matter::Mesoscopic Systems and Quantum Hall EffectSpace chargeSettore ING-INF/01 - ElettronicaThreshold voltageEngineering (all)Depletion regionMOSFETOptoelectronicsElectric currentbusinessVoltage
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Role of Ge nanoclusters in the performance of photodetectors compatible with Si technology

2013

In this work, we investigate the spectral response of metal-oxide- semiconductor photodetectors based on Ge nanoclusters (NCs) embedded in a silicon dioxide (SiO2) matrix. The role of Ge NC size and density on the spectral response was evaluated by comparing the performance of PDs based on either densely packed arrays of 2 nm-diameter NCs or a more sparse array of 8 nm-diameter Ge NCs. Our Ge NC photodetectors exhibit a high spectral responsivity in the 500-1000 nm range with internal quantum efficiency of ~ 700% at - 10 V, and with NC array parameters such as NC density and size playing a crucial role in the photoconductive gain and response time. We find that the configuration with a more…

NanoclusterMaterials sciencechemistry.chemical_elementPhotodetectorGermaniumPhotoconductive gainSettore ING-INF/01 - ElettronicaNanoclustersResponse time (computer systems) GermaniumHigh-efficiency photodetectorGermanium; Nanocluster; High-efficiency photodetectorsSparse arrayHigh-efficiencyResponse timeMaterials ChemistryGainPhotodetectorbusiness.industryGermaniumPhotoconductivityInternal quantum efficiencyMetals and AlloysResponse timeSurfaces and InterfacesPhotonSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsRecombination centerchemistrySemiconductor photodetectorHigh-efficiency photodetectorsOptoelectronicsSpectral responseQuantum efficiencybusinessExcitationSpectral responsivity Nanocluster
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Colloidal plasmonic back reflectors for light trapping in solar cells.

2014

A novel type of plasmonic light trapping structure is presented in this paper, composed of metal nanoparticles synthesized in colloidal solution and self-assembled in uniform long-range arrays using a wet-coating method. The high monodispersion in size and spherical shape of the gold colloids used in this work allows a precise match between their measured optical properties and electromagnetic simulations performed with Mie theory, and enables the full exploitation of their collective resonant plasmonic behavior for light-scattering applications. The colloidal arrays are integrated in plasmonic back reflector (PBR) structures aimed for light trapping in thin film solar cells. The PBRs exhib…

Materials scienceMie scatteringPhysics::OpticsReflectionTrapping7. Clean energyThin film devices Colloidal arraySettore ING-INF/01 - ElettronicaColloidal solutionColloidOpticsElectromagnetic simulationThin film solar cells PlasmonsLow temperatureGeneral Materials SciencePlasmonic solar cellThin filmPlasmonPhotocurrentNear infrared spectrabusiness.industrySolar cellCondensed Matter::Soft Condensed MatterSynthesis (chemical)Light trapping structureOptoelectronicsDiffuse reflectanceDiffuse reflectionbusinessNanoscale
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Structural, electronic, and electrical properties of an Undoped n-Type CdO thin film with high electron concentration

2014

Transparent conducting metal oxides (TCOs) combine the properties of optical transparency in the visible region with a high electrical conductivity. They are a critical component as the window electrode in liquid crystal and electroluminescent display devices, as well as in many designs of solar cells now under development. Sn-doped In2O3 is currently the most important TCO, but it suffers from some drawbacks. These include the high cost of indium, weak optical absorption in the blue-green region, as well as chemical instability that leads to corrosion phenomena in organic light-emitting devices. Indium tin oxide (ITO) films are also brittle and of relatively low durability. A number of oth…

Organic light-emitting devices Optical propertiesMaterials scienceDisplay deviceElectroluminescent display deviceHigh electron concentrationCdO; semiconductor; TCOchemistry.chemical_elementChemical vapor depositionAtomic force microscopyElectric conductivityElectrical resistivity and conductivityChemical vapor depositionLight absorptionThin filmPhysical and Theoretical ChemistryThin filmCdOHigh electrical conductivitybusiness.industryDegenerate semiconductorFree electron concentrationsemiconductorSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsIndium tin oxideElectroluminescent displayPhotoelectron spectroscopyGeneral EnergychemistryLiquid crystalTCOTinElectrodeOptoelectronicsX ray diffraction Conducting metal oxidebusinessTinLuminescence measurementIndium
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High-efficiency silicon-compatible photodetectors based on Ge quantum dots

2011

We report on high responsivity, broadband metal/insulator/semiconductor photodetectors with amorphous Ge quantum dots (a-Ge QDs) as the active absorbers embedded in a silicon dioxide matrix. Spectral responsivities between 1-4 A/W are achieved in the 500-900 nm wavelength range with internal quantum efficiencies (IQEs) as high as ∼700%. We investigate the role of a-Ge QDs in the photocurrent generation and explain the high IQE as a result of transport mechanisms via photoexcited QDs. These results suggest that a-Ge QDs are promising for high-performance integrated optoelectronic devices that are fully compatible with silicon technology in terms of fabrication and thermal budget. © 2011 Amer…

Amorphous siliconMaterials scienceThermal budgetPhysics and Astronomy (miscellaneous)SiliconSilicon TechnologieResponsivitychemistry.chemical_elementSettore ING-INF/01 - Elettronicachemistry.chemical_compoundResponsivityMetal/insulator/semiconductorGe quantum dotWavelength ranges Amorphous siliconPhotocurrent generationPhotodetectorOptoelectronic devicePhotocurrentGermaniumbusiness.industrySemiconductor quantum dotInternal quantum efficiencymatrixTRANSPORTSemiconductorNANOCRYSTALSSilica Quantum efficiencychemistryQuantum dot laserQuantum dotOptoelectronicsQuantum efficiencyTransport mechanismGAINbusinessNANOCRYSTALS TRANSPORT GAINFully compatibleHigh efficiency
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Quantifying the trade-off between useful and parasitic absorption of light for plasmonic light trapping in thin silicon films

2016

We apply a combination of photocurrent and photothermal spectroscopic techniques to experimentally quantify the trade-off between useful and parasitic absorption of light in thin hydrogenated microcrystalline silicon (?c-Si:H) films incorporating self-assembled silver nanoparticle arrays, located at the rear side, for improved light trapping via resonant plasmonic scattering. The photothermal technique is used to measure the total absorptance while the photocurrent spectroscopy accounts only for the photons absorbed in the ?c-Si:H layer (useful absorptance); therefore, the method allows for independent quantification of the useful and parasitic absorptance of the plasmonic (or any other) li…

Settore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaLight trapping localized surface plasmon resonance self-assembled nanoparticles photovoltaics
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Location of holes in silicon-rich oxide as memory states

2002

The induced changes of the flatband voltage by the location of holes in a silicon-rich oxide (SRO) film sandwiched between two thin SiO 2 layers [used as gate dielectric in a metal-oxide-semiconductor (MOS) capacitor] can be used as the two states of a memory cell. The principle of operation is based on holes permanently trapped in the SRO layer and reversibly moved up and down, close to the metal and the semiconductor, in order to obtain the two logic states of the memory. The concept has been verified by suitable experiments on MOS structures. The device exhibits an excellent endurance behavior and, due to the low mobility of the holes at low field in the SRO layer, a much longer refresh …

Electron mobilityDynamic random-access memoryMaterials scienceSROPhysics and Astronomy (miscellaneous)Siliconbusiness.industryGate dielectricchemistry.chemical_elementsemiconductor memorySettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materialaw.inventionLocalized trapsCapacitorElectrical transportSemiconductorchemistryMemory celllawnanocristalliComputer data storageOptoelectronicsMemory devicebusinessApplied Physics Letters
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Profiling of traps in SiO2/Al2O3 gate stack by the charge pumping technique

2006

In this paper, we present our results on the distribution and generation of traps in a SiO 2 /A1 2 O 3 transistor. The investigation has been carried out by using charge pumping measurements, both variable voltage and frequency techniques, and constant voltage stress. By increasing the amplitude of the gate pulse we observe an increase of the charge recombined per cycle closely related to the contribution of shallow traps near the SiO 2 /Al 2 O 3 interface. By reducing the pulse frequency we measure an increase in the charge pumping current due to traps located deeper in the Al 2 O 3 . By combining charge pumping and constant voltage stress measurements, we found that the traps are mostly g…

Materials sciencePhysics::OpticsSettore ING-INF/01 - Elettronicalaw.inventionStress (mechanics)Condensed Matter::Materials ScienceCharge pumpinglawhigh-k materials; charge pumping; traps distribution; traps generationGeneral Materials ScienceTraps generationElectrical and Electronic Engineeringbusiness.industryMechanical EngineeringTransistorCharge (physics)Traps distributionCondensed Matter PhysicsComputer Science::OtherPulse (physics)Electronic Optical and Magnetic MaterialsCharge pumpingAmplitudeMechanics of MaterialsOptoelectronicsHigh-k materialCurrent (fluid)businessVoltage
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Size dependent light absorption modulation and enhanced carrier transport in germanium quantum dots devices

2015

Quantum confinement in closely packed arrays of Ge quantum dots (QDs) was studied for energy applications. In this work, we report an efficient tuning mechanism of the light harvesting and detection of Ge QDs. Thin films of SiGeO alloys, produced by rf-magnetron sputtering, were annealed at 600 degrees C in N-2 to induce precipitation of small amorphous Ge QDs into the oxide matrix. Varying the Ge content, the QD size was tailored between 2 and 4 nm, as measured by high resolution transmission electron microscopy. X-ray photoelectron spectroscopy (XPS) measurements indicate the formation of pure SiO2, as well as the presence of a sub-stoichiometric Ge oxide shell at the QD interface. Light …

Precipitation (chemical)Materials scienceAmorphous alloyBand gapchemistry.chemical_elementHigh resolution transmission electron microscopyPhotoconductive gainGermaniumNanocrystalMetal-insulator semiconductor deviceSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaAbsorption spectroscopyQuantum confinement effectQuantum confinementElectromagnetic wave absorptionLight absorptionThin filmGermanium oxideOxide filmHigh-resolution transmission electron microscopyGermanium quantum dotPotential wellMIS deviceAmorphous filmGermaniumQuantum dotsRenewable Energy Sustainability and the Environmentbusiness.industryPhotoconductivitySolar cellPreferential trappingMIM deviceSemiconductor deviceSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsPhotovoltaicschemistryMetal insulator boundarieQuantum dotrf-Magnetron sputtering Semiconductor quantum dotOptoelectronicsCharge carrierX ray photoelectron spectroscopy Effective mass approximationbusinessQuantum chemistryPhotovoltaicMagnetron sputteringSolar Energy Materials and Solar Cells
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Plasmonic nanostructures for light trapping in photovoltaic

Metallic nanoparticles (NPs), sustaining localized surface plasmon resonances, are currently of great interest for enhancing light trapping in thin film solar cells. To be directly applicable in the photovoltaic industry, the NPs fabrication needs to be simple, reliable, low-cost and scalable. As such, self-assembly processes are most commonly used, and Ag is the preferred material, due to its high radiative efficiency and low imaginary permittivity⁠. After exploring the correlation between structural and optical properties of Ag NPs fabricated by solid- state dewetting process on various substrates, we identified the fabrication conditions in which desirable NPs are obtained, but we also e…

Plasmonic-enhanced light trapping Localized surface plasmon resonance Self-assembly nanoparticles PhotovoltaicsSettore ING-INF/01 - Elettronica
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Characterization of the defect density states in MoOx for c-Si solar cell applications

2021

Thin layers of MoOx have been deposited by thermal evaporation followed by post-deposition annealing. The density of states distributions of the MoOx films were extracted deconvoluting the absorption spectra, measured by a photothermal deflection spectroscopy setup, including the small polaron contribution. Results revealed a sub-band defect distribution centered 1.1 eV below the conduction band; the amplitude of this distribution was found to increase with post-deposition annealing temperature and film thickness.

Materials scienceAbsorption spectroscopyc-Si solar cell photovoltaic transition metal oxide molybdenum oxide density of states small polaronAnnealing (metallurgy)02 engineering and technologyPolaron01 natural sciencesMolecular physicsSettore ING-INF/01 - Elettronicalaw.inventionlaw0103 physical sciencesSolar cellMaterials ChemistryElectrical and Electronic EngineeringSpectroscopy010302 applied physicsThin layersDensity of statesPhotothermal therapy021001 nanoscience & nanotechnologyCondensed Matter Physicsc-Si solar cellMolybdenum oxideElectronic Optical and Magnetic MaterialsSmall polaronTransition metal oxideDensity of states0210 nano-technologyPhotovoltaicDensity of state
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Experimental quantification of useful and parasitic absorption of light in plasmon-enhanced thin silicon films for solar cells application

2016

AbstractA combination of photocurrent and photothermal spectroscopic techniques is applied to experimentally quantify the useful and parasitic absorption of light in thin hydrogenated microcrystalline silicon (μc-Si:H) films incorporating optimized metal nanoparticle arrays, located at the rear surface, for improved light trapping via resonant plasmonic scattering. The photothermal technique accounts for the total absorptance and the photocurrent signal accounts only for the photons absorbed in the μc-Si:H layer (useful absorptance); therefore, the method allows for independent quantification of the useful and parasitic absorptance of the plasmonic (or any other) light trapping structure. W…

PHOTOCURRENT SPECTROSCOPY BACK REFLECTORS NANOSTRUCTURES NANOPARTICLES DESIGN ROUGH.Materials scienceSiliconchemistry.chemical_element02 engineering and technologyNANOSTRUCTURES7. Clean energy01 natural sciencesSettore ING-INF/01 - ElettronicaArticleSettore FIS/03 - Fisica Della MateriaDESIGNPHOTOCURRENT SPECTROSCOPY0103 physical sciencesNANOPARTICLESPlasmonic solar cellAbsorption (electromagnetic radiation)Plasmon010302 applied physicsPhotocurrentMultidisciplinarybusiness.industryROUGHPhotothermal therapy021001 nanoscience & nanotechnologyWavelengthchemistryAbsorptanceOptoelectronicsBACK REFLECTORS0210 nano-technologybusiness
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Enhanced light scattering in Si nanostructures produced by pulsed laser irradiation

2013

An innovative method for Si nanostructures (NS) fabrication is proposed, through nanosecond laser irradiation (lambda = 532 nm) of thin Si film (120 nm) on quartz. Varying the laser energy fluences (425-1130 mJ/cm(2)) distinct morphologies of Si NS appear, going from interconnected structures to isolated clusters. Film breaking occurs through a laser-induced dewetting process. Raman scattering is enhanced in all the obtained Si NS, with the largest enhancement in interconnected Si structures, pointing out an increased trapping of light due to multiple scattering. The reported method is fast, scalable and cheap, and can be applied for light management in photovoltaics. (C) 2013 AIP Publishin…

Innovative methodMaterials sciencePhysics and Astronomy (miscellaneous)Settore ING-INF/01 - ElettronicaLight scatteringQuartz SiliconSettore FIS/03 - Fisica Della Materialaw.inventionsymbols.namesakeLight managementSi nanostructures NanostructurelawDewetting proceLaser energieDewettingThin filmbusiness.industryScatteringIsolated clusterLaserInterconnected structureSemiconductorsymbolsOptoelectronicsbusinessRaman spectroscopyPhotovoltaicRaman scattering
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Peculiar aspects of nanocrystal memory cells: Data and extrapolations

2003

Nanocrystal memory cell are a promising candidate for the scaling of nonvolatile memories in which the conventional floating gate is replaced by an array of nanocrystals. The aim of this paper is to present the results of a thorough investigation of the possibilities and the limitations of such new memory cell. In particular, we focus on devices characterized by a very thin tunnel oxide layer and by silicon nanocrystals formed by chemical vapor deposition. The direct tunneling of the electrons through the tunnel oxide, their storage into the silicon nanocrystals, and furthermore, retention, endurance, and drain turn-on effects, well-known issues for nonvolatile memories, are all investigate…

Materials scienceSiliconQuantum dotchemistry.chemical_elementNanotechnologyChemical vapor depositionSettore ING-INF/01 - ElettronicaComputer Science ApplicationsNon-volatile memorySemiconductor memorieTunnel effectEngineering (all)chemistryNanocrystalMemory cellHardware and ArchitectureNanotechnologyElectrical and Electronic EngineeringThin filmHot-carrier injection
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Analysis of Transition Metal Oxides based Heterojunction Solar Cells with S-shaped J-V curves

2020

The use of transition metal oxides for the selective carrier contact in the crystalline silicon solar cells technology is rising to interest for the excellent optoelectrical properties of these materials whose implementation, however, can result in lousy performing cells due to an S-shaped electrical characteristic. In this paper, we fabricated solar cells showing S-shaped J-V curve and carried out an analysis of the reasons of such behavior using a model involving the series of a standard cell equivalent circuit with a Schottky junction in order to explain these atypical performances. A good matching between the experimental measurements and the adopted theoretical model was obtained. The …

Standard cellMaterials scienceheterojunctionbusiness.industry020209 energySchottky barrier020208 electrical & electronic engineeringHeterojunction02 engineering and technologySettore ING-INF/01 - ElettronicaPulsed laser depositions-shapeTransition metalSolar cells heterojunction transition metal oxides pulsed laser deposition s-shapesolar cells0202 electrical engineering electronic engineering information engineeringEquivalent circuitOptoelectronicsCrystalline silicontransition metal oxidesbusinesspulsed laser deposition
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Reduction of thermal damage in ultrathin gate oxides after intrinsic dielectric breakdown

2001

We have compared the thermal damage in ultrathin gate SiO2 layers of 5.6 and 3 nm thickness after intrinsic dielectric breakdown due to constant voltage Fowler-Nordheim stress. The power dissipated through the metal-oxide-semiconductor capacitor during the breakdown transient, measured with high time resolution, strongly decreases with oxide thickness. This is reflected in a noticeable reduction of the thermal damage found in the structure after breakdown. The effect can be explained as the consequence of the lower amount of defects present in the oxide at the breakdown instant and of the occurrence of a softer breakdown in the initial spot. The present data allow us to estimate the power t…

Materials scienceDielectric strengthPhysics and Astronomy (miscellaneous)OxideTime-dependent gate oxide breakdownSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materialaw.inventionStress (mechanics)Capacitorchemistry.chemical_compoundchemistrylawThermal damageTransient (oscillation)Composite materialReduction (mathematics)
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Anomalous and normal Hall effect in hydrogenated amorphous Si prepared by plasma enhanced chemical vapor deposition

2010

The double sign anomaly of the Hall coefficient has been studied in p -doped and n -doped hydrogenated amorphous silicon grown by plasma enhanced chemical vapor deposition and annealed up to 500 °C. Dark conductivity as a function of temperature has been measured, pointing out a conduction mechanism mostly through the extended states. Anomalous Hall effect has been observed only in the as-deposited n -doped film, disappearing after annealing at 500 °C, while p -doped samples exhibit normal Hall effect. When Hall anomaly is present, a larger optical band gap and a greater Raman peak associated with Si-H bond are measured in comparison with the cases of normal Hall effect. The Hall anomaly wi…

inorganic chemicalsAmorphous siliconMaterials scienceSiliconAnnealing (metallurgy)Band gapeducationGeneral Physics and Astronomychemistry.chemical_elementSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaCondensed Matter::Materials Sciencechemistry.chemical_compoundsymbols.namesakePlasma-enhanced chemical vapor depositionHall effectSi-H bondingElectrical measurementsCondensed matter physicsHall effecttechnology industry and agricultureoptical gapCondensed Matter::Mesoscopic Systems and Quantum Hall EffectAmorphous solidchemistryHydrogenated amorphous siliconsymbolsdark conductivityRaman spectroscopypsychological phenomena and processes
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Role of the strain in the epitaxial regrowth rate of heavily doped amorphous Si films

2008

Solid phase epitaxial regrowth (SPER) of p -doped preamorphized Si was studied by time resolved reflectivity. Strain and dopant concentration were opportunely varied by implanting neutral (Ge) and isovalent (B, Ga) impurities in order to disentangle the two different effects on SPER. Larger SPER rate variations occurred in strained doped Si with respect to undoped samples. The generalized Fermi level shifting model was implemented to include the role of the strain and to fit the experimental data over a large range of temperature for p - and n -type doping. We introduced a charged defect, whose energy level is independent of the dopant species. © 2008 American Institute of Physics.

SiliconMaterials scienceSTRESSPhysics and Astronomy (miscellaneous)SiliconAnalytical chemistrychemistry.chemical_elementGalliumEpitaxySettore FIS/03 - Fisica Della MateriaLAYERSsymbols.namesakeImpurityDOPANTPhase (matter)Semiconductor dopingKINETICSSemiconducting silicon compoundDopantAmorphous filmGermaniumSettore ING-INF/03 - TelecomunicazioniFermi levelDopingAmorphous siliconPhosphoruEpitaxial filmAmorphous solidchemistrysymbolsSOLID-PHASE EPITAXY
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TCO/Ag/TCO transparent electrodes for solar cells application

2014

Among transparent electrodes, transparent conductive oxides (TCO)/metal/TCO structures can achieve optical and electrical performances comparable to, or better than, single TCO layers and very thin metallic films. In this work, we report on thin multilayers based on aluminum zinc oxide (AZO), indium tin oxide (ITO) and Ag deposited by RF magnetron sputtering on soda lime glass at room temperature. The TCO/Ag/TCO structures with thicknesses of about 50/10/50 nm were deposited with all combinations of AZO and ITO as top and bottom layers. While the electrical conductivity is dominated by the Ag intralayer irrespective of the TCO nature, the optical transmissions show a dependence on the natur…

Soda-lime glassMaterials scienceTransparent electrode Electrodeschemistry.chemical_elementPhotovoltaic applicationrf-Magnetron sputteringMetalTransparent conductive oxideElectrical resistivity and conductivityAluminiumElectrical conductivityGeneral Materials ScienceElectrical performanceElectrical conductorbusiness.industryGeneral ChemistrySputter depositionElectrical and optical propertieITO glaIndium tin oxidechemistryvisual_artElectrodevisual_art.visual_art_mediumOptoelectronicsbusinessSilver Aluminum zinc oxideAluminum coatingMagnetron sputtering
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Polymer/metal hybrid multilayers modified Schottky devices

2013

Insulating, polymethylmethacrylate (PMMA), and semiconducting, poly(3-hexylthiophene) (P3HT), nanometer thick polymers/Au nanoparticles based hybrid multilayers (HyMLs) were fabricated on p-Si single-crystal substrate. An iterative method, which involves, respectively, spin-coating (PMMA and P3HT deposition) and sputtering (Au nanoparticles deposition) techniques to prepare Au/HyMLs/p-Si Schottky device, was used. The barrier height and the ideality factor of the Au/HyMLs/p-Si Schottky devices were investigated by current-voltage measurements in the thickness range of 1-5 bilayers. It was observed that the barrier height of such hybrid layered systems can be tuned as a function of bilayers …

Ideality factorMaterials sciencePhysics and Astronomy (miscellaneous)Layered systemNanoparticleSilicon GoldNanotechnologySingle-crystal substrates DepositionSubstrate (electronics)Poly-3-hexylthiopheneSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaNanoparticleSputteringPolymer; Au nanoparticles; Schottky devicePolymerHybrid multilayerConductive polymerSpin coatingbusiness.industryBarrier heightSchottky diodeSputter depositionCurrent-voltage measurementSemiconducting siliconSchottky deviceOptoelectronicsSelf-assemblybusinessAu nanoparticles
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Influence of the electro-optical properties of an a-Si:H single layer on the performances of a pin solar cell

2012

We analyze the results of an extensive characterization study involving electrical and optical measurements carried out on hydrogenated amorphous silicon (α-Si:H) thin film materials fabricated under a wide range of deposition conditions. By adjusting the synthesis parameters, we evidenced how conductivity, activation energy, electrical transport and optical absorption of an α-Si:H layer can be modified and optimized. We analyzed the activation energy and the pre-exponential factor of the dark conductivity by varying the dopant-to-silane gas flow ratio. Optical measurements allowed to extract the absorption spectra and the optical bandgap. Additionally, we report on the temperature dependen…

Amorphous siliconThin film materialThin film solar cell Activation energySingle junctionConductivitySettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materialaw.inventionchemistry.chemical_compoundElectric conductivitylawMaterials ChemistryThin filmAbsorption (electromagnetic radiation)Preexponential factorGas-flow ratioMetals and AlloysSurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsTemperature dependenceHydrogenated amorphous siliconOptoelectronicsElectric propertieQuantum efficiencyHydrogenationOptical data processingDeposition conditionSiliconMaterials scienceActivation energyQuantum efficiencySynthesis conditionVapor deposition SiliconOpticsSolar cellActivation energyDark conductivityCharacterization studieElectromagnetic wave absorptionThin filmDepositionElectrooptical propertieThin film solar cellConductivitybusiness.industryEnergy conversion efficiencySolar cellAmorphous siliconMeyer-Neldel ruleOptical propertieOptical measurementelectro-optical propertiesNanostructured materialSilicon; Solar cell; electro-optical propertiesElectrical transportchemistrySynthesis parameterOptical variables measurementSingle layerConversion efficiencybusinessOptical gap
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Progress in Violet Light-Emitting Diodes Based on ZnO/GaN Heterojunction

2020

Progress in light-emitting diodes (LEDs) based on ZnO/GaN heterojunctions has run into several obstacles during the last twenty years. While both the energy bandgap and lattice parameter of the two semiconductors are favorable to the development of such devices, other features related to the electrical and structural properties of the GaN layer prevent an efficient radiative recombination. This work illustrates some advances made on ZnO/GaN-based LEDs, by using high-thickness GaN layers for the p-region of the device and an ad hoc device topology. Heterojunction LEDs consist of a quasicoalesced non-intentionally doped ZnO nanorod layer deposited by chemical bath deposition onto a metal&ndash

Materials scienceComputer Networks and CommunicationsBand gapgrowthlcsh:TK7800-836002 engineering and technologyfabricationElectroluminescence01 natural sciencesSettore ING-INF/01 - Elettronicaganlaw.inventionelectroluminescencelawleds0103 physical sciencesmorphologyzno/gan heterojunction ledsSpontaneous emissionElectrical and Electronic Engineeringepitaxial p-gan layers010302 applied physicsZnO nanorodbusiness.industryzno nanorodszno/gan heterostructurelcsh:Electronicsepitaxial p-GaN layerHeterojunctiondependence021001 nanoscience & nanotechnologyoptical-propertieschemical bath depositionSemiconductorHardware and ArchitectureControl and Systems EngineeringZnO/GaN heterojunction LEDSignal ProcessingznoOptoelectronicsNanorod0210 nano-technologybusinessnanorodsChemical bath depositionLight-emitting diode
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Density of States evaluation of Molybdenum Oxide for c-Si solar cell

Silicon-based heterojunction technology (HJT) is one of the most promising candidates for high performance and low cost solar cells with world-record efficiency close to 27% in IBC architecture. The HJT exploits the excellent passivation properties of hydrogenated amorphous silicon (a-Si:H); although, the use of doped a-Si:H has drawbacks such as parasitic absorption and low-thermal budget to cope with back-end metallization. Replacing the p-type a-Si:H with molybdenum oxide (MoOx) is a viable alternative. Optimizing this hole-selective layer is needed; however information on the defect density of states (DOS), linked to oxygen vacancies is still lacking.

solar cellphotovoltaicmolybdenum oxidepolaronc-Sidensity of statetransition metal oxideSettore ING-INF/01 - Elettronica
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Photonic-crystal silicon-nanocluster light-emitting device

2006

We report on enhanced light extraction from a light-emitting device based on amorphous silicon nanoclusters, suitable for very-large-scale integration, and operating at room temperature. Standard low-cost optical lithography is employed to fabricate a two-dimensional photonic crystal onto the device. We measured a vertical emission with the extracted radiation enhanced by over a factor of 4, without the aid of any buried reflector. These achievements demonstrate that a cost-effective exploitation of photonic crystals is indeed within the reach of semiconductor industry and open the way to a new generation of nanostructured silicon devices in which photonic and electronic functions are integ…

Amorphous siliconMaterials sciencePhysics and Astronomy (miscellaneous)Siliconbusiness.industryHybrid silicon laserPhotonic integrated circuitchemistry.chemical_elementNanotechnologySettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaNanoclusterslaw.inventionchemistry.chemical_compoundNANOCRYSTALSchemistrylawELECTROLUMINESCENCEOptoelectronicslight-emitting devicePhotolithographyPhotonicsbusinessPhotonic crystal
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Effect of ion irradiation on the stability of amorphous Ge2Sb2Te5 thin films

2008

The archival life of phase-change memories (PCM) is determined by the thermal stability of amorphous phase in a crystalline matrix. In this paper, we report the effect of ion beam irradiation on the crystallization kinetics of amorphous Ge2Sb2Te5 alloy (GST). The transition rate of amorphous GST films was measured by in situ time resolved reflectivity (TRR). The amorphous to crystal transformation time decreases considerably in irradiated amorphous GST samples when ion fluence increases. The stability of amorphous Ge2Sb2Te5 thin films subjected to ion irradiation is discussed in terms of the free energy variation of the amorphous state because of damage accumulation. © 2008 Elsevier B.V. Al…

Nuclear and High Energy PhysicsMaterials scienceAlloyAnalytical chemistrySurfaces Coatings and FilmReflectivityengineering.materialSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaIonMatrix (chemical analysis)PHASE-CHANGE MATERIALSThermal stabilityIrradiationThin filmSILICONInstrumentationRBSChalcogenideMEMORYSurfaces and InterfacesReflectivityAmorphous solidIon irradiationengineeringDefectStability
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Sb-implanted ZnO ultra-thin films

2017

Mild heating of the Zn(C5F6HO2)(2)center dot 2H(2)O center dot CH3(OCH2CH2)(2)OCH3 precursor allowed MOCVD deposition of ZnO films, in a low-pressure horizontal hot-wall reactor, on ITO substrates. The ZnO films were subsequently implanted with Sb ions. XRD measurements provided evidence that they consist of hexagonal, (002) and (101) oriented, crystals. UV-vis spectra showed that the transmittance of these films in the visible region is about 90%. The Sb implanted ZnO film showed a current-voltage characteristic that resembles that of a rectifying diode. This study represents the first example of Sb-implantation in ZnO films obtained by MOCVD.

AntimonyMaterials scienceCondensed Matter Physic02 engineering and technology010402 general chemistrySettore ING-INF/01 - Elettronica01 natural sciencesSettore FIS/03 - Fisica Della MateriaSpectral lineIonTransmittanceZnO filmDeposition (phase transition)Mechanics of MaterialGeneral Materials ScienceMetalorganic vapour phase epitaxyThin filmFilmDiodeDiodeHexagonal crystal systembusiness.industryMechanical Engineering021001 nanoscience & nanotechnologyCondensed Matter Physics0104 chemical sciencesMechanics of MaterialsMOCVDZnOZnO film; antimony; diodeOptoelectronicsMaterials Science (all)0210 nano-technologybusinessMaterials Science in Semiconductor Processing
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Self-assembled silver nanoparticles for plasmon-enhanced solar cell back reflectors: correlation between structural and optical properties

2013

The spectra of localized surface plasmon resonances (LSPRs) in self-assembled silver nanoparticles (NPs), prepared by solid-state dewetting of thin films, are discussed in terms of their structural properties. We summarize the dependences of size and shape of NPs on the fabrication conditions with a proposed structural-phase diagram. It was found that the surface coverage distribution and the mean surface coverage (SC) size were the most appropriate statistical parameters to describe the correlation between the morphology and the optical properties of the nanostructures. The results are interpreted with theoretical predictions based on Mie theory. The broadband scattering efficiency of LSPR…

Materials scienceMie scatteringSilver nanoparticlePhysics::OpticsPlasmonBioengineeringNanotechnologyScattering efficiency02 engineering and technologyStatistical parameterSettore ING-INF/01 - Elettronica01 natural sciences7. Clean energySilver nanoparticlelaw.inventionlawSurface coverage0103 physical sciencesSolar cellGeneral Materials ScienceDewettingElectrical and Electronic EngineeringThin filmPlasmon010302 applied physicsScatteringSurface plasmon resonance SilverMechanical EngineeringSolar cellStructural and optical propertieGeneral ChemistryLocalized surface plasmon resonance021001 nanoscience & nanotechnologyOptical propertiePhase diagramMechanics of MaterialsThin-film solar cells Nanoparticle0210 nano-technologySilver nanoparticle (NPs)Localized surface plasmon
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Multi-bit storage through Si nanocrystals embedded in SiO2

2004

We have realized Si nanocrystal memory cells in which the Si dots have been deposited by CVD on SiO2 and then covered by a CVD control oxide. In this paper, we report a study on the potential of these cells for dual bit storage. © 2004 Elsevier B.V. All rights reserved.

Materials scienceElectronic Optical and Magnetic MaterialOxideSurfaces Coatings and FilmNanotechnologyCondensed Matter PhysicsSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsBit (horse)chemistry.chemical_compoundchemistryNanocrystalcardiovascular diseasesElectrical and Electronic Engineering
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Memory effects in MOS devices based on Si quantum dots

2003

Silicon quantum dots have been deposited on top of a 3-nm tunnel oxide by Low Pressure Chemical Vapour Deposition (LPCVD) and coated with a 7-nm Chemical Vapour Deposited (CVD) oxide. This stack was then incorporated in Metal-Oxide-Semiconductor structure and used as floating gate of a memory cell. The presence of 3 nm of tunnel oxides allows the injection of the charge by direct tunnel (DT) using low voltages for both program and erase operations. The charge stored in the quantum dots is able to produce a well-detectable flat band shift in the capacitors or, equivalently, a threshold voltage shift in the transistors. Furthermore, due to the presence of SiO 2 between the grains, the lateral…

Nanocrystal memoryMaterials scienceSiliconbusiness.industryQuantum dotOxidechemistry.chemical_elementBioengineeringNanotechnologyChemical vapor depositionSemiconductor deviceSettore ING-INF/01 - Elettronicalaw.inventionThreshold voltageBiomaterialsSurface coatingCapacitorchemistry.chemical_compoundchemistryMechanics of MaterialslawQuantum dotOptoelectronicsbusinessSingle electronMaterials Science and Engineering: C
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Effect of the Si doping on the properties of AZO/SiC/Si heterojunctions grown by low temperature pulsed laser deposition

2020

Abstract The structural and photoelectrical properties of Al-doped ZnO (AZO)/SiC/p-Si and AZO/SiC/n-Si heterojunctions, fabricated at low temperature by pulsed laser deposition, were investigated by means of a number of techniques. Raman analysis indicates that SiC layers have the cubic 3C-SiC phase, whilst X-ray diffraction measurements show that AZO films exhibit a hexagonal wurtzite structure, highly textured along the c-axis, with average crystallites size of 35.1 nm and lattice parameter c of 0.518 nm. The homogeneous and dense surface morphology observed by scanning electron microscopy was confirmed by atomic force microscopy images. Moreover, UV–Vis-NIR spectra indicated a high trans…

silicon carbide zinc oxide AZO heterojunction pulsed laser depositionMaterials sciencebusiness.industryDopingHeterojunctionCondensed Matter PhysicsSettore ING-INF/01 - ElettronicaElectronic Optical and Magnetic MaterialsPulsed laser depositionSettore ING-IND/22 - Scienza E Tecnologia Dei MaterialiMaterials ChemistryOptoelectronicsElectrical and Electronic EngineeringbusinessSemiconductor Science and Technology
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Metallization of Si heterojunction solar cell by Cu electroplating

2018

In response to recent climate change, many renewable energy solutions have acquired great importance; in fact, the need of sustainable development is increasing and the use of renewable energy, such as solar energy, can be applied to many industrial and consumer applications. Photovoltaic systems, which are made up of solar cells, are used for electrical vehicle charging stations and to supply remote areas not connected to the power distribution network; moreover, solar energy is widely used as a primary or secondary source of domestic electric power. In this scenario, the increasing in efficiency, and the cost reduction of solar cells, becomes a priority in the diffusion of PV systems for …

Heterojunction solar cell photovoltaic electroplating metallizationSettore ING-INF/01 - Elettronica
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Ion irradiation of AZO thin films for flexible electronics

2017

Aluminum doped Zinc oxide (AZO) is a promising transparent conductor for solar cells, displays and touch-screen technologies. The resistivity of AZO is typically improved by thermal annealing at temperatures not suitable for plastic substrates. Here we present a non-thermal route to improve the electrical and structural properties of AZO by irradiating the TCO films with O+ or Ar+ ion beams (30–350 keV, 3 × 1015–3 × 1016 ions/cm2) after the deposition on glass and flexible polyethylene naphthalate (PEN). X-ray diffraction, optical absorption, electrical measurements, Rutherford Backscattering Spectrometry and Atomic Force Microscopy evidenced an increase of the crystalline grain size and a …

Nuclear and High Energy PhysicsMaterials science02 engineering and technology01 natural sciencesSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaOpticsTransparent conductive oxideElectrical resistivity and conductivity0103 physical sciencesAZO ; Transparent conductive oxide ; Ion implantationElectrical measurementsThin filmPolyethylene naphthalateFlexible and transparent electronicInstrumentationTransparent conducting filmNuclear and High Energy Physic010302 applied physicsbusiness.industryAZO021001 nanoscience & nanotechnologyRutherford backscattering spectrometryIon implantationIon implantationOptoelectronicsCrystallite0210 nano-technologybusinessPhotovoltaic
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Formation and evolution of self-organized Au nanorings on indium-tin-oxide surface

2011

This work reports on the formation of Au nanoclusters and on their evolution in nanoring structures on indium-tin-oxide surface by sputtering deposition and annealing processes. The quantification of the characteristics of the nanorings (surface density, depth, height, and width) is performed by atomic force microscopy. The possibility to control these characteristics by tuning annealing temperature and time is demonstrated establishing relations which allow to set the process parameters to obtain nanostructures of desired morphological properties for various technological applications. © 2011 American Institute of Physics.

PLASMON RESONANCEMaterials scienceNanostructureNanoringPhysics and Astronomy (miscellaneous)Annealing (metallurgy)NanotechnologySputter depositionAu; Nanoring; Atomic force microscopySettore ING-INF/01 - ElettronicaIndium tin oxideNanoclustersAtomic force microscopyNanolithographyITO THIN-FILMSSputteringGOLD NANOPARTICLESAuNanoring
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How far will Silicon nanocrystals push the scaling limits of NVMs technologies?

2004

For the first time, memory devices with optimized high density (2E12#/cm/sup 2/) LPCVD Si nanocrystals have been reproducibly achieved and studied on an extensive statistical basis (from single cell up to 1 Mb test-array) under different programming conditions. An original experimental and theoretical analysis of the threshold voltage shift distribution shows that Si nanocrystals have serious potential to push the scaling of NOR and NAND flash at least to the 35 nm and 65 nm nodes, respectively.

Materials sciencesezeleSiliconbusiness.industryNAND gatechemistry.chemical_elementNanotechnologyChemical vapor depositionSettore ING-INF/01 - ElettronicaThreshold voltageNanocrystalNanoelectronicschemistryOptoelectronicsElectrical and Electronic EngineeringbusinessScience technology and societyScaling
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Memory effects in single-electron nanostructures

2001

We investigate the memory function at room temperature in devices based on quantum dots. By Low Pressure Chemical Vapour Deposition (LPCVD) we deposited Si dots embedded in SiO2. On these devices flat band voltage shifts were well detected at low write voltages for write times of the order of milliseconds, and furthermore, a plateau in the flat band voltage shift, maybe consequence of Coulomb blockdale, was observed.

Coulomb blockadeMaterials scienceNanostructurePhysics and Astronomy (miscellaneous)Condensed matter physicsQuantum dotCoulomb blockadeCondensed Matter PhysicCondensed Matter PhysicsSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic MaterialsSingle electronMemorySingle-electronGeneral Materials ScienceMaterials Science (all)
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Light absorption and conversion in solar cell based on Si:O alloy

2013

Thin film Si:O alloys have been grown by plasma enhanced chemical vapor deposition, as intrinsic or highly doped (1 to 5 at. % of B or P dopant) layers. UV-visible/near-infrared spectroscopy revealed a great dependence of the absorption coefficient and of the optical gap (Eg) on the dopant type and concentration, as Eg decreases from 2.1 to 1.9 eV, for the intrinsic or highly p-doped sample, respectively. Thermal annealing up to 400 °C induces a huge H out-diffusion which causes a dramatic absorption increase and a reduction of Eg, down to less than 1.8 eV. A prototypal solar cell has been fabricated using a 400 nm thick, p-i-n structure made of Si:O alloy embedded within flat transparent c…

Open circuit voltageSiliconAbsorption co-efficientMaterials scienceAnnealing (metallurgy)Analytical chemistryGeneral Physics and AstronomyPhotovoltaic effectChemical vapor depositionSettore ING-INF/01 - Elettronicalaw.inventionPlasma enhanced chemical vapor depositionOut-diffusionPlasma-enhanced chemical vapor depositionlawSolar cellDoping (additives)Thin filmAbsorption (electromagnetic radiation)Infrared spectroscopyElectrical analysiDopantDopingP-i-n structureDevice fabricationThermal-annealingSolar cells Silicon alloysPhotovoltaicTransparent conductive oxides Cerium alloyJournal of Applied Physics
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Effects of partial self-ordering of Si dots formed by chemical vapor deposition on the threshold voltage window distribution of Si nanocrystal memori…

2006

We study the role that the denuded zone around Si nanocrystals obtained by chemical vapor deposition plays on the fluctuations of the dot surface coverage. In fact, the capture mechanism of the silicon adatoms in the proximity of existing dots restricts the number of possible nucleation sites, the final dot size, and the dot position, thus driving the process toward partial self-order. We numerically evaluate the relative dispersion of surface coverage for several gate areas and compare the results to the fully random case. The coverage dispersion is related to the fluctuations from bit to bit of the threshold voltage window (Δ Vth) distribution of nanocrystal memories. The evaluations, com…

Materials scienceSiliconQuantum dotsbusiness.industryNucleationGeneral Physics and Astronomychemistry.chemical_elementWindow (computing)NanotechnologyChemical vapor depositionCondensed Matter::Mesoscopic Systems and Quantum Hall EffectSettore ING-INF/01 - Elettronicanon volatile memoriesSettore FIS/03 - Fisica Della Materiachemical vapor depositionThreshold voltageDistribution (mathematics)chemistryNanocrystalnanoelectronic devicesscaling lawsDispersion (optics)OptoelectronicsbusinessJournal of Applied Physics
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Density of States characterization of TiO2 films deposited by Pulsed Laser Deposition for Heterojunction solar cells

2021

The application of titanium dioxide (TiO2) in the photovoltaic field is gaining traction as this material can be deployed in doping-free heterojunction solar cells with the role of electron selective contact. For modeling-based optimization of such contact, knowledge of the titanium oxide defect density of states is crucial. In this paper, we report a method to extract the defect density through nondestructive optical measures, including the contribution given by small polaron optical transitions. The presence of both related to oxygen-vacancy defects and polarons is supported by the results of optical characterizations and the evaluation of previous observations resulting in a defect band …

Solar cell heterojunction photovoltaic defect density small polaron Pulsed Laser Deposition titanium dioxide defectsGeneral Materials ScienceElectrical and Electronic EngineeringCondensed Matter PhysicsSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and Optics
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Nanostructuring thin Au films on transparent conductive oxide substrates

2013

Fabrication processes of Au nanostructures on indium-tin-oxide (ITO) surface by simple, versatile, and low-cost bottom-up methodologies are investigated in this work. A first methodology exploits the patterning effects induced by nanosecond laser irradiations on thin Au films deposited on ITO surface. We show that after the laser irradiations, the Au film break-up into nanoclusters whose mean size and surface density are tunable by the laser fluence. A second methodology exploits, instead, the patterning effects of standard furnace thermal processes on the Au film deposited on the ITO. We observe, in this case, a peculiar shape evolution from pre-formed nanoclusters during the Au deposition…

NanoclusterLaser annealingMaterials scienceNanostructureFabricationNanoringPatterning effectGold depositAnnealing (metallurgy)NanotechnologyFluenceSettore ING-INF/01 - Elettronicalaw.inventionNanoclusterslawThermalDeposition stageAuGeneral Materials ScienceNanostructuringTransparent conducting filmDepositMechanical EngineeringNanoringsTransparent conductive oxides Conductive filmAnnealing temperatureCondensed Matter PhysicsLaserAu; ITO; NanostructuringFurnace annealingNanostructuresNanostructured materialFabrication proceMechanics of MaterialsOxide films GoldITO
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Transient photoresponse and incident power dependence of high-efficiency germanium quantum dot photodetectors

2012

We report a systematic study of time-resolved and power-dependent photoresponse in high-efficiency germanium quantum dot photodetectors (Ge-QD PDs), with internal quantum efficiencies greater than 100 over a broad wavelength, reverse bias, and incident power range. Turn-on and turn-off response times (τ on and τ off) are shown to depend on series resistance, bias, optical power, and thickness (W QD) of the Ge-QD layer, with measured τ off values down to ∼40 ns. Two different photoconduction regimes are observed at low and high reverse bias, with a transition around -3 V. A transient current overshoot phenomenon is also observed, which depends on bias and illumination power. © 2012 American …

Materials sciencePhotoresponseReverse biaGeneral Physics and Astronomychemistry.chemical_elementPhotodetectorGermaniumOptical powerPhotoconductionTime-resolvedSettore ING-INF/01 - ElettronicaSeries resistanceOpticsElectrical resistance and conductancePhotodetectorOptical powerEquivalent series resistanceSystematic studybusiness.industryPhotoconductivityInternal quantum efficiencyQuantum-dot photodetectorPhotonWavelengthSemiconductor quantum dots GermaniumchemistryQuantum dotTransient current Electric resistanceOptoelectronicsIncident powerbusiness
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Electroluminescence and transport properties in amorphous silicon nanostructures

2006

We report the results of a detailed study on the structural, electrical and optical properties of light emitting devices based on amorphous Si nanostructures. Amorphous nanostructures may constitute an interesting system for the monolithic integration of optical and electrical functions in Si ULSI technology. In fact, they exhibit an intense room temperature electroluminescence (EL), with the advantage of being formed at a temperature of 900 °C, while at least 1100 °C is needed for the formation of Si nanocrystals. Optical and electrical properties of amorphous Si nanocluster devices have been studied in the temperature range between 30 and 300 K. The EL is seen to have a bell-shaped trend …

Amorphous siliconVISIBLE ELECTROLUMINESCENCEMaterials sciencePhysics and Astronomy (miscellaneous)nanostructures; silicon; elecroluminescenceExcitonBioengineeringElectronQUANTUM DOTSElectroluminescenceSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materiachemistry.chemical_compoundnanostructuresGeneral Materials ScienceSI-RICH SIO2Electrical and Electronic EngineeringLIGHT-EMITTING DEVICESEngineering (miscellaneous)business.industryMechanical EngineeringsiliconGeneral ChemistryAtmospheric temperature rangeAmorphous solidCHEMICAL-VAPOR-DEPOSITIONelecroluminescenceNanocrystalchemistryMechanics of MaterialsOptoelectronicsMaterials Science (all)businessLuminescenceNanotechnology
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Sputtered cuprous oxide thin films and nitrogen doping by ion implantation

2016

Abstract The structural, optical and electrical properties of sputtered cuprous oxide thin films have been optimized through post-deposition thermal treatments. Moreover we have studied the effects of nitrogen doping introduced by ion implantation followed by the optimized oxidant thermal annealing. Three concentrations have been used, 0.6 N%, 1.2 N%, and 2.5 N%. Along with the preservation of the Cu 2 O phase, a slight optical band gap narrowing and a significant conductivity enhancement has been observed with respect to the undoped samples. These results can be justified by the absence of further oxygen vacancies promoted by dopant introduction and by the substitution of O atoms by N ones…

OxidantPostimplantation annealingLattice configurationMaterials scienceBand gapAnnealing (metallurgy)NitrogenInorganic chemistryOxidePhotovoltaic application02 engineering and technology01 natural sciencesOxygen vacancieSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materiachemistry.chemical_compoundSputtering0103 physical sciencesMaterials ChemistryDopingSemiconductor dopingConductivity enhancementDoping (additives)Thin filmIonDepositionOxide film010302 applied physicsDopantDopingMetals and AlloysSputteringSurfaces and Interfaces021001 nanoscience & nanotechnologyOut of equilibriumSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsEnergy gapOptical and electrical propertieIon implantationchemistryIon implantationThermal-annealing0210 nano-technologyCopperCuprous oxide
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Localized charge storage in nanocrystal memories: Feasibility of a multi-bit cell

2004

We have realized Si nanocrystal memory cells in which the Si dots have been deposited by chemical vapor deposition (CVD) on the tunnel oxide and then covered by a CVD control oxide. In this paper we report a study on the potential of this type of cells for multi-bit storage. In particular, the possibilities offered by these devices from the point of view of program/erase mechanisms, endurance, and charge retention are shown and discussed.

Bit cellMaterials scienceSiliconOxidechemistry.chemical_elementNanotechnologyCharge (physics)Chemical vapor depositionSettore ING-INF/01 - Elettronicachemistry.chemical_compoundNanoelectronicsNanocrystalchemistryElectrical and Electronic EngineeringSafety Risk Reliability and QualityCharge retention
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Schottky barrier height tuning by Hybrid organic-inorganic multilayers

2014

ABSTRACTSemiconducting and insulating polymers and copolymers/Au nanograins based hybrid multilayers (HyMLs) were fabricated on p-Si single-crystal substrate by an iterative method that involves, respectively, Langmuir-Blodgett and spin-coating techniques (for the deposition of organic film) and sputtering technique (for the deposition of metal nanograins) to prepare Au/HyMLs/p-Si Schottky device. The electrical properties of the Au/HyMLs/p-Si Schottky device were investigated by current-voltage (I–V) measurements in the thickness range of 1-5 bilayers (BL).At different number of layers, current-voltage (I–V) measurements were performed. Results showed a rectifying behavior. Junction parame…

Materials sciencebusiness.industrySchottky barrierMechanical EngineeringSchottky diodeSchottkySubstrate (electronics)Condensed Matter PhysicMultilayer; Schottky; HybridHybridSemiconductorSputteringMechanics of MaterialsMultilayerOptoelectronicsRectangular potential barrierMaterials Science (all)businessDeposition (law)Diode
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Empowering Photovoltaics with Smart Light Management Technologies

2021

The daily Sun supplies the continents of the Earth with four times more energy than humanity consumes in a year. This enormous potential of solar energy to generate clean energy is therefore driving great efforts to replace conventional and unsustainable fossil fuel consumption that damages our climate and our environment. Solar photovoltaic (PV) is emerging as the fastest growing renewable energy technology in the world, yet its share to the electricity production currently is less than 3%. While coal and gas remain key to electricity production, the climate crisis demands a fast transition to a carbon-neutral energy system. In the year 2019, the PV industry produced solar panels with a ca…

Solar energyLight-trappingFlexible PVDielectric structureTandem solar cellsDiffractive structureThin-film PVPhotovoltaicPlasmonic
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Robustness and electrical reliability of AZO/Ag/AZO thin film after bending stress

2017

Abstract The increasing interest in thin flexible and bendable devices has led to a strong demand for mechanically robust and electrically reliable transparent electrodes. Indium doped Tin Oxide (ITO) and Aluminium doped Zinc Oxide (AZO) are among the most employed transparent conductive oxides (TCO) and their reliability on flexible substrates have thus received a great attention. However, a high flexibility is usually achieved at very low thickness, which, unfortunately, compromises the electrical conductivity. Here we report the effects of mechanical bending cycles on the electrical and optical properties of ultra thin AZO/Ag/AZO multilayers (45 nm/10 nm/45 nm) and, for comparison, of AZ…

Materials scienceScanning electron microscopeThin filmschemistry.chemical_element02 engineering and technologySettore ING-INF/01 - Elettronica01 natural sciencesSettore FIS/03 - Fisica Della MateriaTransparent conductive oxideElectrical resistance and conductance0103 physical sciencesThin filmThin filmComposite materialPolyethylene naphthalateElectrical conductor010302 applied physicsRenewable Energy Sustainability and the EnvironmentElectronic Optical and Magnetic MaterialTransparent conductive oxide; Thin films; PhotovoltaicsSputtering021001 nanoscience & nanotechnologyTin oxideSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsPhotovoltaicschemistryElectrode0210 nano-technologyPhotovoltaicFlexibleIndiumSolar Energy Materials and Solar Cells
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Chemical Bath Deposition as a Simple Way to Grow Isolated and Coalesced ZnO Nanorods for Light-Emitting Diodes Fabrication

2018

A way to grow and characterize isolated and coalesced ZnO nanorods on $p$ -GaN/sapphire structure is presented. Chemical bath deposition can be used to grow ZnO nanorods of device-quality, simply controlling the duration time of the growth process and the concentration of the nutrient solution in the bath. Increasing the duration of the process, as well as the concentration of the solution, leads to compact and sound layers instead of separated nanorods. However, too high concentrations stop the growth process. Light-emitting diodes fabricated on these ZnO-p-GaN heterostructure have a peak of electroluminescence at 400 nm and exhibit interesting electrical and optical properties. Optical po…

ZnO nanorodMaterials scienceFabricationRenewable Energy Sustainability and the Environmentbusiness.industryEnergy Engineering and Power TechnologyZnO-p-GaN heterojunction-based LEDComputer Science Applications1707 Computer Vision and Pattern RecognitionHeterojunctionElectroluminescenceSettore ING-INF/01 - ElettronicaIndustrial and Manufacturing Engineeringlaw.inventionchemical bath depositionComputer Networks and CommunicationArtificial IntelligencelawSapphireOptoelectronicsNanorodbusinessInstrumentationLayer (electronics)Chemical bath depositionLight-emitting diode2018 IEEE 4th International Forum on Research and Technology for Society and Industry (RTSI)
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METHOD FOR MANUFACTURING A UV-RADIATION DETECTOR DEVICE BASED ON SIC, AND UV-RADIATION DETECTOR DEVICE BASED ON SIC

2021

SiC UV detector ohmic-contact
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Memory cell structure integrated on semiconductor

2004

This invention relates to a memory cell Which comprises a capacitor having a ?rst electrode and a second electrode separated by a dielectric layer. Such dielectric layer com prises a layer of a semi-insulating material Which is fully enveloped by an insulating material and in Which an electric charge is permanently present or trapped therein. Such electric charge accumulated close to the ?rst or to the second electrode, depending on the electric ?eld betWeen the electrodes,therebyde?ningdifferentlogiclevels.

NULLMemory cellSi nanostructuresSilicon rich oxideSettore ING-INF/01 - ElettronicaCMOS technologynon volatile memories
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Pd/Au/SiC Nanostructured Diodes for Nanoelectronics: Room Temperature Electrical Properties

2010

Pd/Au/SiC nanostructured Schottky diodes were fabricated embedding Au nanoparticles (NPs) at the metalsemiconductor interface of macroscopic Pd/SiC contacts. The Au NPs mean size was varied controlling the temperature and time of opportune annealing processes. The electrical characteristics of the nanostructured diodes were studied as a function of the NPs mean size. In particular, using the standard theory of thermoionic emission, we obtained the effective Schottky barrier height (SBH) and the effective ideality factor observing their dependence on the annealing time and temperature being the signature of their dependence on the mean NP size. Furthermore, plotting the effective SBH as a fu…

SiCMaterials scienceAnnealing (metallurgy)Schottky barrierNanoparticleSettore ING-INF/01 - Elettronicabarrier heightSettore FIS/03 - Fisica Della Materiachemistry.chemical_compoundSilicon carbidePdSchottky diodeAuAu nanoparticles (NPs)Electrical and Electronic EngineeringDiodeNanoscale diodebusiness.industrySchottky diodeNanoscale diode; Au; SiCComputer Science Applications1707 Computer Vision and Pattern RecognitionElectrical contactsComputer Science ApplicationschemistryNanoelectronicsOptoelectronicsbusiness
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Coalescence of ZnO nanorods grown by chemical bath deposition

2018

In this work, a way to grow isolated and coalesced ZnO nanorods on p-GaN/sapphire structure is presented. Chemical bath deposition [1],[2] was used to grow ZnO nanorods of device-quality on a p-GaN/n-GaN/sapphire template, simply controlling the duration time of the growth process and the concentration of the nutrient solution in the bath. Several p-GaN templates were soaked in a nutrient solution, prepared with different concentration of zinc nitrate hexahydrate (Sigma-Aldrich, reagent grade 98%) and hexamethylenetetramine (Alfa Aesar, ACS 99%) in deionized water, while being heated at a temperature of 80 °C for a period varying from 8 to 25 hours; then, the samples were left in the soluti…

ZnO nanorods chemical bath depositionSettore ING-INF/01 - Elettronica
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Formation and Evolution of Nanoscale Metal Structures on ITO Surface by Nanosecond Laser Irradiations of Thin Au and Ag Films

2012

The effect of nanosecond laser irradiations on 5 nm thick sputter-deposited Au and Ag films on Indium-Tin-Oxide surface is investigated by atomic force microscopy (AFM) and scanning electron microscopy (SEM). After 500, 750, and 1000 mJ/cm 2 fluence irradiations, the breakup of the Au and Ag films into nanoscale islands is observed as a consequence of fast melting and solidification processes. The mean nanoparticles size and surface density are quantified, as a function of the laser fluence, by the AFM and SEM analyses. In particular, the comparison between the Au and Ag islands reveals the formation of larger islands in the case of Ag for each fixed fluence. The mechanism of the nanoscale …

NanoclusterMaterials scienceNanosecond laser irradiationScanning electron microscopeITO; Laser; Au; AgLaserNanoparticleNanotechnologyAgSettore ING-INF/01 - ElettronicaMolecular physicsFluenceSettore FIS/03 - Fisica Della MateriaMetalAtomic force microscopyAuGeneral Materials ScienceDewettingNanostructuringNanoscopic scaleBreakupvisual_artvisual_art.visual_art_mediumGoldNanosecond laserITO
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Color Conversion Light-Emitting Diodes Based on Carbon Dots: A Review

2022

This paper reviews the state-of-the-art technologies, characterizations, materials (precursors and encapsulants), and challenges concerning multicolor and white light-emitting diodes (LEDs) based on carbon dots (CDs) as color converters. Herein, CDs are exploited to achieve emission in LEDs at wavelengths longer than the pump wavelength. White LEDs are typically obtained by pumping broad band visible-emitting CDs by an UV LED, or yellow–green-emitting CDs by a blue LED. The most important methods used to produce CDs, top-down and bottom-up, are described in detail, together with the process that allows one to embed the synthetized CDs on the surface of the pumping LEDs. Experimental results…

carbon-dot-based light-emitting diodecolor conversionorganic materialLEDsGeneral Materials Sciencewhite light-emitting diodeCarbon dotSettore ING-INF/01 - Elettronicamulticolor light-emitting diodephosphor
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Photoluminescence transient study of surface defects in ZnO nanorods grown by chemical bath deposition

2015

Two deep level defects (2.25 and 2.03 eV) associated with oxygen vacancies (Vo) were identified in ZnO nanorods (NRs) grown by low cost chemical bath deposition. A transient behaviour in the photoluminescence (PL) intensity of the two Vo states was found to be sensitive to the ambient environment and to NR post-growth treatment. The largest transient was found in samples dried on a hot plate with a PL intensity decay time, in air only, of 23 and 80 s for the 2.25 and 2.03 eV peaks, respectively. Resistance measurements under UV exposure exhibited a transient behaviour in full agreement with the PL transient, indicating a clear role of atmospheric O-2 on the surface defect states. A model fo…

PhotoluminescencePhysics and Astronomy (miscellaneous)Analytical chemistryPhotovoltaic applicationFOS: Physical scienceschemistry.chemical_elementNanorodOxygen vacancieSettore ING-INF/01 - ElettronicaOxygensymbols.namesakeMesoscale and Nanoscale Physics (cond-mat.mes-hall)ultravioletSurface defect stateDepositionPhotoluminescenceChemical-bath depositionTransient studies Surface defectsPhysicsCondensed Matter - Mesoscale and Nanoscale PhysicsFermi levelDeep-level defectBand bendingnanowireschemistryZinc oxide Ambient environmentsymbolsNanorodPhotoluminescence intensitiefilmsTransient (oscillation)Resistance measurementIntensity (heat transfer)Chemical bath depositionApplied Physics Letters
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Light harvesting with Ge quantum dots embedded in SiO2 and Si3N4

2014

Cataloged from PDF version of article. Germanium quantum dots (QDs) embedded in SiO2 or in Si3N4 have been studied for light harvesting purposes. SiGeO or SiGeN thin films, produced by plasma enhanced chemical vapor deposition, have been annealed up to 850 degrees C to induce Ge QD precipitation in Si based matrices. By varying the Ge content, the QD diameter can be tuned in the 3-9 nm range in the SiO2 matrix, or in the 1-2 nm range in the Si3N4 matrix, as measured by transmission electron microscopy. Thus, Si3N4 matrix hosts Ge QDs at higher density and more closely spaced than SiO2 matrix. Raman spectroscopy revealed a higher threshold for amorphous-to-crystalline transition for Ge QDs e…

Light-harvestingMaterials sciencegenetic structuresBand gapAnalytical chemistryGeneral Physics and AstronomyPhotodetectorchemistry.chemical_elementGermaniumGermanium NanocrystalsSettore ING-INF/01 - Elettronicasymbols.namesakeGe quantum dotPlasma-enhanced chemical vapor depositionThin filmFilmsbusiness.industrySilicon-nitridechemistryQuantum dotsymbolsOptoelectronicsQuantum efficiencyMechanismbusinessRaman spectroscopyConfinement
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Laser irradiation of ZnO:Al/Ag/ZnO:Al multilayers for electrical isolation in thin film photovoltaics

2013

Laser irradiation of ZnO:Al/Ag/ZnO:Al transparent contacts is investigated for segmentation purposes. The quality of the irradiated areas has been experimentally evaluated by separation resistance measurements, and the results are complemented with a thermal model used for numerical simulations of the laser process. The presence of the Ag interlayer plays two key effects on the laser scribing process by increasing the maximum temperature reached in the structure and accelerating the cool down process. These evidences can promote the use of ultra-thin ZnO:Al/ Ag/ZnO:Al electrode in large-area products, such as for solar modules. © 2013 Crupi et al.; licensee Springer.

Materials scienceTransparent electrodesThin film photovoltaicNanochemistryNanotechnologyTransparent electrode AluminumSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materialaw.inventionElectrical isolationIrradiated areaMaterials Science(all)PhotovoltaicslawTransparent electrodes ; Multilayers; Pulsed laser scribingMultilayerGeneral Materials ScienceIrradiationThin filmLaser scribingNano Expressbusiness.industryMaximum temperaturePulsed laser scribingCondensed Matter PhysicsLaserThin film photovoltaicsMultilayersElectrical isolationElectrodeOptoelectronicsResistance measurementLaser scribing proceZinc oxide Film preparationbusinessLaser scribing
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Direct measurement of optical losses in plasmon-enhanced thin silicon films (Conference Presentation)

2018

Plasmon-enhanced absorption, often considered as a promising solution for efficient light trapping in thin film silicon solar cells, suffers from pronounced optical losses i.e. parasitic absorption, which do not contribute to the obtainable photocurrent. Direct measurements of such losses are therefore essential to optimize the design of plasmonic nanostructures and supporting layers. Importantly, contributions of useful and parasitic absorption cannot be measured separately with commonly used optical spectrophotometry. In this study we apply a novel strategy consisting in a combination of photocurrent and photothermal spectroscopic techniques to experimentally quantify the trade-off betwee…

PhotocurrentMaterials scienceSiliconbusiness.industryScatteringchemistry.chemical_elementPhotothermal therapySettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaSilver nanoparticlechemistryPlasmonic-enhanced light trapping Localized surface plasmon resonance Self-assemblyNanoparticles PhotovoltaicsOptoelectronicsThin filmbusinessAbsorption (electromagnetic radiation)PlasmonPlasmonics: Design, Materials, Fabrication, Characterization, and Applications XVI
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Nanostructured CdO thin films for water treatments

2016

Abstract CdO was the very first transparent conducting metal oxide discovered. CdO thin films show electrical and optical properties of interest as photosensitive anode materials for photochemical cells, phototransistors, photodiodes, window electrodes in liquid crystal displays, IR detectors, antireflection coatings, gas sensors and in other solar energy applications. In the present study we report on the spectroscopic, microscopic, electrical and photo-catalytic properties of CdO thin films prepared by a metal organic chemical vapor method. The degenerate semiconducting CdO thin films are useful as photocatalysts for water treatments.

Materials sciencegenetic structuresCdO; Film; photocatalystsOxideNanotechnologyCondensed Matter Physic02 engineering and technology010402 general chemistrySettore ING-INF/01 - Elettronica01 natural sciencesSettore FIS/03 - Fisica Della Materialaw.inventionphotocatalystsMetalchemistry.chemical_compoundlawWater treatmentGeneral Materials ScienceThin filmFilmCdOLiquid-crystal displaybusiness.industryMechanical EngineeringPhotocatalyst021001 nanoscience & nanotechnologyCondensed Matter PhysicsSolar energy0104 chemical sciencesAnodePhotodiodechemistrySettore CHIM/03 - Chimica Generale E InorganicaMechanics of Materialsvisual_artElectrodevisual_art.visual_art_mediumMaterials Science (all)sense organs0210 nano-technologybusinessMaterials Science in Semiconductor Processing
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Characterization of soft breakdown in thin oxide NMOSFETs based on the analysis of the substrate current

2001

We have investigated the properties of soft breakdown (SBO) in thin oxide (4.5 nm) nMOSFETs with measurements of the gate and substrate leakage currents using the carrier separation technique. We have observed that, at lower gate voltages, the level of the substrate current exhibits a plateau. We propose that the observed plateau is due to the Shockley-Hall-Read (SHR) generation of hole-electron pairs in the space charge region and at the Si-SiO/sub 2/ interface. At higher voltages, the substrate current steeply increases with voltage, due to a tunneling mechanism, trap-assisted or due to a localized effective thinning of the oxide, from the substrate valence band to the gate conduction ban…

Materials sciencePhysics and Astronomy (miscellaneous)business.industryElectrical engineeringOxideTime-dependent gate oxide breakdownReliabilitySettore ING-INF/01 - ElettronicaElectronic Optical and Magnetic MaterialsThreshold voltagechemistry.chemical_compoundMOSFETDepletion regionchemistryLeakage currentMOSFETOptoelectronicsDielectric breakdownElectrical and Electronic EngineeringbusinessQuantum tunnellingLeakage (electronics)Voltage
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Light absorption in silicon quantum dots embedded in silica

2009

The photon absorption in Si quantum dots (QDs) embedded in SiO2 has been systematically investigated by varying several parameters of the QD synthesis. Plasma-enhanced chemical vapor deposition (PECVD) or magnetron cosputtering (MS) have been used to deposit, upon quartz substrates, single layer, or multilayer structures of Si-rich- SiO2 (SRO) with different Si content (43-46 at. %). SRO samples have been annealed for 1 h in the 450-1250 °C range and characterized by optical absorption measurements, photoluminescence analysis, Rutherford backscattering spectrometry and x-ray Photoelectron Spectroscopy. After annealing up to 900 °C SRO films grown by MS show a higher absorption coefficient a…

SOLAR-CELLSPhotoluminescenceMaterials scienceEFFICIENCYSiliconAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_elementChemical vapor depositionOPTICAL-PROPERTIESRutherford backscattering spectrometryFILMSSettore ING-INF/01 - Elettronica3RD-GENERATION PHOTOVOLTAICSSettore FIS/03 - Fisica Della MateriaMULTIPLE EXCITON GENERATIONchemistryX-ray photoelectron spectroscopyPlasma-enhanced chemical vapor depositionQuantum dotRAY PHOTOELECTRON-SPECTROSCOPYLUMINESCENCESI NANOCRYSTALSCOEFFICIENTAbsorption (electromagnetic radiation)
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Broadband light trapping in thin film solar cells with self-organized plasmonic nano-colloids

2015

The intense light scattered from metal nanoparticles sustaining surface plasmons makes them attractive for light trapping in photovoltaic applications. However, a strong resonant response from nanoparticle ensembles can only be obtained if the particles have monodisperse physical properties. Presently, the chemical synthesis of colloidal nanoparticles is the method that produces the highest monodispersion in geometry and material quality, with the added benefits of being low-temperature, low-cost, easily scalable and of allowing control of the surface coverage of the deposited particles. In this paper, novel plasmonic back-reflector structures were developed using spherical gold colloids wi…

Materials sciencePhotovoltaics light trapping plasmonics Mie scatterers thin film silicon solar cells.NanoparticlePhysics::OpticsBioengineeringMie scatterersMie scattererSettore ING-INF/01 - Elettronica7. Clean energyLight scatteringplasmonicsthin film silicon solar cellsMechanics of MaterialGeneral Materials SciencePlasmonic solar cellElectrical and Electronic EngineeringThin filmPlasmonbusiness.industryScatteringMechanical EngineeringChemistry (all)Surface plasmonNanocrystalline siliconGeneral ChemistryPlasmonicThin film silicon solar cellphotovoltaicsMechanics of MaterialsOptoelectronicslight trappingMaterials Science (all)businessPhotovoltaic
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Room-temperature efficient light detection by amorphous Ge quantum wells

2013

In this work, ultrathin amorphous Ge films (2 to 30 nm in thickness) embedded in SiO2 layers were grown by magnetron sputtering and employed as proficient light sensitizer in photodetector devices. A noteworthy modification of the visible photon absorption is evidenced due to quantum confinement effects which cause both a blueshift (from 0.8 to 1.8 eV) in the bandgap and an enhancement (up to three times) in the optical oscillator strength of confined carriers. The reported quantum confinement effects have been exploited to enhance light detection by Ge quantum wells, as demonstrated by photodetectors with an internal quantum efficiency of 70%. © 2013 Cosentino et al.

NanostructurePhotonMaterials sciencePhotodetectorCONFINEMENTBlue shiftOptical oscillator strengthMaterials Science(all)Quantum confinement effectLight detectionQuantum confinementGeneral Materials ScienceLight absorptionPhotodetectorQuantum wellPotential wellNano ExpressPhoton absorptionSUPERLATTICESGermaniumbusiness.industryRoom temperature Amorphous filmInternal quantum efficiencyNANOCLUSTERSSemiconductor quantum wellCondensed Matter PhysicsPhotonNanostructuresBlueshiftAmorphous solidQuantum dotOptoelectronicsPHOTOLUMINESCENCEQuantum efficiencybusinessUltrathin films GermaniumGe quantum well
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Simulation analysis of Ruthenium-based Dye Sensitized Solar Cells

2016

Dye Sensitized Solar Cell (DSSC), usually referred as one of the most promising third generation photovoltaic devices, is an electrochemical device in which a molecule (i.e., the dye) chemisorbed onto the surface of a porous material absorbs the incident light and, thus, transfers an electron to the wide band gap semiconductor material. The injected electrons can diffuse through the semiconductor up to the collecting anode without the risk of recombination. The roles of the electrolyte which permeates the cell are to regenerate the ionized molecule and to implement a hole-transporting layer, allowing to repeat the abovementioned process. Thanks to this behaviour, semiconductors with large a…

photovoltaicDye Sensitized Solar Cell (DSSC)Settore ING-INF/02 - Campi Elettromagneticilight soakingSettore ING-INF/01 - Elettronica
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Current Spreading Length and Injection Efficiency in ZnO/GaN-Based Light-Emitting Diodes

2019

We report on carrier injection features in light-emitting diodes (LEDs) based on nonintentionally doped-ZnO/p-GaN heterostructures. These LEDs consist of a ZnO layer grown by chemical-bath deposition (CBD) onto a p-GaN template without using any seed layer. The ZnO layer (~1- $\mu \text{m}$ thickness) consists of a dense collection of partially coalesced ZnO nanorods, organized in wurtzite phase with marked vertical orientation, whose density depends on the concentration of the solution during the CBD process. Due to the limited conductivity of the p-GaN layer, the recombination in the n-region is strongly dependent on the spreading length of the holes, ${L}_{h}$ , coming from the p-contact…

010302 applied physicsMaterials sciencebusiness.industryGallium nitrideHeterojunction01 natural sciencesSettore ING-INF/01 - ElettronicaElectronic Optical and Magnetic Materialslaw.inventionchemistry.chemical_compoundchemistrylawPhase (matter)0103 physical sciencesElectrodeOptoelectronicsNanorodChemical-bath deposition (CBD) contact injection current spreading length zinc oxide (ZnO) nanorods ZnO/GaN-based light-emitting diodes (LEDs) ZnO/GaN heterostructures.Electrical and Electronic EngineeringbusinessWurtzite crystal structureLight-emitting diodeDiode
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Optimization of ZnO:Al/Ag/ZnO:Al structures for ultra-thin high-performance transparent conductive electrodes

2012

Al-doped ZnO (AZO)/Ag/AZO multilayer coatings (50-70 nm thick) were grown at room temperature on glass substrates with different silver layer thickness, from 3 to 19 nm, by using radio frequency magnetron sputtering. Thermal stability of the compositional, optical and electrical properties of the AZO/Ag/AZO structures were investigated up to 400 °C and as a function of Ag film thickness. An AZO film as thin as 20 nm is an excellent barrier to Ag diffusion. The inclusion of 9.5 nm thin silver layer within the transparent conductive oxide (TCO) material leads to a maximum enhancement of the electro-optical characteristics. The excellent measured properties of low resistance, high transmittanc…

High transmittanceDiffusionrf-Magnetron sputteringElectro-optical characteristicGlass substrateTransparent conductive oxide RF magnetron sputtering Optical properties Electrical resistivity Al-doped zinc oxide Silver MultilayersSettore ING-INF/01 - ElettronicaSUBSTRATE-TEMPERATUREAg diffusionAl-doped ZnOLow resistanceMultilayerZNOMaterials ChemistryVisible spectral rangeMULTILAYER FILMSAl-doped zinc oxideOptical propertiesMetals and AlloysAZO filmElectrical resistivityOPTICAL-PROPERTIESOXIDE-FILMSSurfaces and InterfacesZinc oxide AluminumRadio frequency magnetron sputteringSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsOptical and electrical propertieElectrodeOptoelectronicsFilm preparationLayer (electronics)Magnetron sputteringUltra-thinRF magnetron sputteringMaterials scienceSilverThermodynamic stabilityOpticsTransparent conductive oxideElectrical resistivity and conductivityThermal stabilityElectrical conductorTransparent conducting filmRoom temperatureThin film solar cellbusiness.industryTransparent conductiveOptical propertieSilver layerHigh transmittanceMultilayersMulti-layer-coatingZnO Electric conductivityMeasured propertiebusinessSubstrate
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Programming options for nanocrystal MOS memories

2003

Nanocrystal memories represent a promising candidate for the scaling of FLASH memories. In these devices, the charge is not stored in a continuous floating gate but in a discontinuous layer composed by numerous discrete silicon quantum dots well separated one from the other.The nanocrystals of radius of few nanometers are realized by chemical vapor deposition (CVD) of silicon on the tunnel oxide of 2.8 nm of thickness. These islands have been coated with a control oxide of 7 nm formed by CVD and incorporated in Metal-Oxide-Semiconductor structure. The devices are programmed and erased by tunnelling using low voltages and fast times. In addition, the programming can be easily achieved also b…

Nanocrystal memoryMaterials scienceSiliconbusiness.industryQuantum dotchemistry.chemical_elementBioengineeringNanotechnologyHardware_PERFORMANCEANDRELIABILITYChemical vapor depositionSettore ING-INF/01 - ElettronicaBiomaterialsTunnel effectSurface coatingNanocrystalchemistryHardware_GENERALMechanics of MaterialsQuantum dotHardware_INTEGRATEDCIRCUITSOptoelectronicsbusinessSingle electronQuantum tunnellingHot-carrier injection
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Nanocrystal MOS memories obtained by LPCVD deposition of Si nanograins

2001

We have realized silicon quantum dots embedded in SiO2 which act as nano-floating gates of MOS memories. The dots with nanometer sizes have been deposited by LPCVD on a 3nm tunnel oxide. Two processes at a fixed pressure have been explored by varying the temperature. SiH4 with a N2 carrier gas have been used in the former case, SiH4 and H2 have been used in the latter. In both cases a nanocrystalline silicon layer is obtained, with nanocrystals a density higher than 1011 cm-2. The process with H2 carrier gas is more controllable and leads to the formation of nanocrystals with a more regular shape. In both cases the density of grains is able to originate detectable threshold shifts in the me…

Materials sciencePhysics and Astronomy (miscellaneous)Quantum dotNanotechnologyChemical vapor depositionNanocrystalCondensed Matter PhysicCondensed Matter PhysicsMemory effectSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic MaterialsNanocrystalGeneral Materials ScienceMaterials Science (all)Deposition (chemistry)
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Light trapping by plasmonic nanoparticles

2020

Abstract Metallic nanoparticles sustaining localized surface plasmon resonances are of great interest for enhancing light trapping in thin film photovoltaics. In this chapter, we explore the correlation between the structural and optical properties of self-assembled silver nanostructures fabricated by a solid-state dewetting process on various substrates relevant for silicon photovoltaics and later integrated into plasmonic back reflectors. Our study allows us to optimize the performance of nanostructures by identifying the fabrication conditions in which desirable circular and uniformly spaced nanoparticles are obtained. Second, we introduce a novel optoelectronic spectroscopic method that…

Plasmonic nanoparticlesMaterials scienceSiliconbusiness.industryPhysics::Opticschemistry.chemical_elementSettore ING-INF/01 - ElettronicachemistryPhotovoltaicsLight trapping Localized surface plasmon resonance Photocurrent enhancement Plasmon-enhanced Self-assembly Silver nanoparticles Thin film silicon solar cellsOptoelectronicsQuantum efficiencyDewettingThin filmbusinessPlasmonLocalized surface plasmon
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Radiation tolerance of NROM embedded products

2010

Radiation tolerance of NROM memories is demonstrated at the level of industrial 4 Mbit memory embedded modules, specifically not designed for operation in radiation harsh environments. The memory fabricated in 0.18 um technology remains fully functional after total ionization doses exceeding 100 krad. The tests were performed by irradiating with γ-rays (60Co source) and 10 MeV 11B ions in active (during programming/erase and read-out) and passive (no bias) modes. Comprehensive statistics were obtained by using large memory arrays and comparison of the data with the parameters of irradiated single cells allowed deep understanding of the physical phenomena in the irradiated NROM devices for b…

Nuclear and High Energy PhysicsMaterials scienceONOradiation effectbusiness.industryFloating gate memorieRadiationSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materialaw.inventionNon-volatile memoryCapacitorRadiation toleranceNuclear Energy and EngineeringlawLogic gatePhysical phenomenaOptoelectronicsIrradiationElectrical and Electronic EngineeringbusinessRadiation hardeningradiation hardening
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Editorial for the Proceedings of the 2016 E-MRS Spring Meeting Symposium T - Advanced Materials and Characterization Techniques for Solar Cells III

2016

Abstract This paper contains the editorial of the proceedings of the 2016 E-MRS spring meeting symposium T on “Advanced materials and characterization techniques for solar cells III”.

EMRSgeographyEngineeringgeography.geographical_feature_categorybusiness.industrySolar cellNanotechnologyAdvanced materialsSettore ING-INF/01 - ElettronicaCharacterization (materials science)photovoltaicEnergy (all)Energy(all)PhotovoltaicsCharacterization of solar materialSpring (hydrology)businessperovskiteEnergy Procedia
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Erratum to: Sub-gap defect density characterization of molybdenum oxide: An annealing study for solar cell applications

2022

General Materials ScienceElectrical and Electronic EngineeringCondensed Matter PhysicsMolybdenum oxide density of states polaron theory silicon heterojunction solar cellSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and Optics
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Sub-gap defect density characterization of molybdenum oxide: An annealing study for solar cell applications

2020

AbstractThe application of molybdenum oxide in the photovoltaic field is gaining traction as this material can be deployed in doping-free heterojunction solar cells in the role of hole selective contact. For modeling-based optimization of such contact, knowledge of the molybdenum oxide defect density of states (DOS) is crucial. In this paper, we report a method to extract the defect density through nondestructive optical measures, including the contribution given by small polaron optical transitions. The presence of defects related to oxygen-vacancy and of polaron is supported by the results of our opto-electrical characterizations along with the evaluation of previous observations. As part…

Materials scienceAnnealing (metallurgy)Oxide02 engineering and technologyPolaronSettore ING-INF/01 - Elettronica01 natural scienceslaw.inventionmolybdenum oxidechemistry.chemical_compoundlaw0103 physical sciencesThermalSolar cellGeneral Materials Sciencepolaron theoryElectrical and Electronic Engineering010302 applied physicsbusiness.industrysilicon heterojunction solar cellHeterojunction021001 nanoscience & nanotechnologyCondensed Matter PhysicsAtomic and Molecular Physics and Opticschemistrymolybdenum oxide density of states polaron theory silicon heterojunction solar celldensity of statesDensity of statesOptoelectronicsDensity functional theory0210 nano-technologybusiness
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Plasmonic and diffractive nanostructures for light trapping—an experimental comparison

2015

Metal nanoparticles and diffractive nanostructures are widely studied for enhancing light trapping efficiency in thin-film solar cells. Both have achieved high performance enhancements, but there are very few direct comparisons between the two. Also, it is difficult to accurately determine the parasitic absorption of metal nanoparticles. Here, we assess the light trapping efficiencies of both approaches in an identical absorber configuration. We use a 240 nm thick amorphous silicon slab as the absorber layer and either a quasi-random supercell diffractive nanostructure or a layer of self-assembled metal nanoparticles for light trapping. Both the plasmonic and diffractive structures strongly…

Amorphous siliconMaterials scienceNanostructureNanostructureSubwavelength structuresbusiness.industryPhysics::OpticsDiffraction gratingPlasmonicSubwavelength structureSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic Materialschemistry.chemical_compoundOpticsSolar cell efficiencychemistryOptoelectronicsPlasmonic solar cellThin filmbusinessAbsorption (electromagnetic radiation)Diffraction gratingPhotovoltaicPlasmon
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Non-uniform doping concentration CIGS absorber profile for highefficiency solar cells

2016

The quaternary chalcopyrite semiconductor alloy Cu(In,Ga)Se2 (CIGS) is nowadays commonly considered one of the most suitable materials to fabricate cost-effective and high-efficiency photovoltaic cells. Thanks to the optical and structural properties of the absorber layer and to the tunable bandgap, thin-film CIGS cells have reached efficiencies around 20%, not far from the maximum values of traditional crystalline silicon cells. This high efficiency, together with the conceivable low fabrication costs, makes CIGS cells a promising alternative to silicon technology for large-scale production. In order to further improve the cells performance, in a previous work we have already proposed a si…

Settore ING-INF/02 - Campi ElettromagneticiCIGS simulations solar cell photovoltaicsSettore ING-INF/01 - Elettronica
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Influence of electrodes layout on hydrothermally-grown GaN/ZnO LEDs

2017

Light-emitting diodes (LEDs) based on zinc oxide, with wide direct band gap, have drawn much attention in the last years. ZnO, which is natural n-type, has excellent physical and chemical properties, is inexpensive, abundant and nontoxic. Unfortunately, the preparation of reproducible and high quality p-type ZnO film is comparatively difficult, due to the low solubility of acceptor dopants, self-compensating effects, and acceptor level energy height. Although many groups have reported on ZnO-based homostructure LEDs, the results are controversial as recently reviewed in [1]. Hence, heterojunction LEDs based on ZnO as the nside and GaN as the p-side of the junction have been put forward [2].…

blue-violet LED GaN ZnOSettore ING-INF/01 - Elettronica
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Distribution of the threshold voltage window in nanocrystal memories with Si dots formed by chemical vapor deposition: Effect of partial self-ordering

2004

Non volatile memories based on Si nanocrystals (Si-ncs) offer an important alternative to conventional floating gate devices, for the numerous potential advantages associated with the discrete-trap structures [1]. Isolated Si-ncs can be obtained by chemical vapor deposition (CVD) through a fully compatible CMOS process. So far, the main limitation for scaling the CVD Si-nc memories at sub-90 nm node is related to the expected fluctuation, from bit to bit, in the device threshold voltage (VTH), due to the spread in the sur- face fraction (Rdot) covered with Si dots [2]. The reason is the assumption that the dot position and the relative distance are fully random. It will be shown that the nu…

Non volatile memoriesSettore ING-INF/01 - Elettronica
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Effects of nitridation by N2O or NO on the electrical properties of thin gate or tunnel oxides

2001

We have studied the effects of nitridation on the leakage current of thin (7-8 nm) gate or tunnel oxides. A polarity dependence of the tunneling current has been found this behavior is related to the presence of a thin silicon oxynitride layer at the SiO2/Si-substrate interface. The oxynitride layer lowers the tunneling current when electrons are injected from the interface where the oxynitride is located (substrate injection). The current flowing across the oxide when electrons are injected from the opposite interface (gate injection) is not influenced by the oxynitride. The increase of nitrogen concentration leads to a decrease of the tunneling current for substrate electron injection.

Settore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaElectronic Optical and Magnetic Materials
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