Search results for "Xps"

showing 10 items of 66 documents

Phase mixture in MOCVD and reactive sputtering TiOxNy thin films revealed and quantified by XPS factorial analysis.

2006

Abstract Titanium oxynitride thin films have been deposited by low-pressure metalorganic chemical vapour deposition and reactive sputtering. The growth temperature for chemical vapour-deposited films and water vapour partial pressure for sputter-deposited films have been used to modulate the chemical composition. Both series have been analysed using X-ray photoelectron spectroscopy (XPS) in order to describe the structure of the materials using a factorial analysis approach. Titanium and metalloid concentrations have also been determined and compared to an elemental analysis performed using Rutherford backscattering spectroscopy and nuclear reaction analysis. The two deposition methods led …

Materials sciencePolymers and PlasticsAnalytical chemistrychemistry.chemical_element02 engineering and technologyChemical vapor deposition01 natural sciences7. Clean energyfactorial analysisX-ray photoelectron spectroscopySputteringNuclear reaction analysis0103 physical sciencesMetalorganic vapour phase epitaxyThin film010302 applied physicsTitanium oxynitrideMetals and AlloysX-ray photoelectron spectroscopy (XPS)[CHIM.MATE]Chemical Sciences/Material chemistry021001 nanoscience & nanotechnologyElectronic Optical and Magnetic MaterialsSurface coatingchemistrythin films[ CHIM.MATE ] Chemical Sciences/Material chemistryCeramics and Composites0210 nano-technologyTitanium
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Photoelectrochemical and XPS characterisation of oxide layers on 316L stainless steel grown in high-temperature water

2015

Passive films on AISI 316L stainless steel were grown by exposure in high temperature (300 °C and 150 bar) water. X-ray photoelectron spectroscopy was employed to study their composition as a function of immersion time. A photoelectrochemical investigation, supported by electrochemical and impedance measurements, allowed to get information on the solid-state properties of the investigated layers. The experimental results suggest the formation of a stratified layer with an outer iron-rich layer and an inner Cr-rich oxide layer, whose relative thickness and composition are dependent on the immersion time.

Materials sciencePressurised water reactorMetallurgyOxidePressurised water reactorCondensed Matter PhysicCondensed Matter PhysicsElectrochemistryStainless steelchemistry.chemical_compoundSettore ING-IND/23 - Chimica Fisica ApplicatachemistryChemical engineeringRelative thicknessX-ray photoelectron spectroscopyImmersion (virtual reality)Photocurrent spectroscopyXPSElectrochemistryGeneral Materials ScienceMaterials Science (all)Electrical and Electronic Engineering
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Chemical characterization of gallium droplets grown by LP-MOCVD.

2006

International audience; This study is concerned with the chemical characterization of metallic gallium droplets, obtained on silicon (1 0 0) substrates with a single growth step, by the LP-MOCVD technique with TMGa like precursor. These structures are characterized by SIMS, XPS and TEM. The analyses results lead to a structure proposition for the droplets. The core is composed of metastable metallic gallium with a non-negligible carbon quantity probably coming from incomplete precursor decomposition. The outer part, composed of gallium oxide maintains the structure stability. Covering of the substrate by a thin gallium layer of gallium compounds is observed.

Materials scienceSiliconAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_element02 engineering and technologySubstrate (electronics)Chemical vapor deposition010402 general chemistry01 natural sciencesX-ray photoelectron spectroscopyGallium dropletsXPSMetalorganic vapour phase epitaxyGalliumSurfaces and InterfacesGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter Physics0104 chemical sciencesSurfaces Coatings and FilmschemistryTransmission electron microscopyMOCVDTEM0210 nano-technologyLayer (electronics)SIMS
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Interfacial reaction during MOCVD growth revealed by in situ ARXPS.

2006

International audience; Angle-resolved X-ray photoelectron spectroscopy (ARXPS) experiments were performed to study in situ the reaction at the film–substrate interface during metal organic chemical vapor deposition (MOCVD) growth of TiO2 thin films deposited on the silicon substrate. The in-depth distribution of chemical species was determined using several ARXPS thickness calculation models considering either single or bilayer systems. By the comparison of two single-layermodels, the presence of a second layer composed of silicon oxidewas evidenced. High-resolution transmission electron microscopy (HRTEM) observations confirmed the stratification of the film in two layers, as well as the …

Materials scienceSiliconthickness measurementthin filmAnalytical chemistrychemistry.chemical_elementARXPS02 engineering and technologyChemical vapor deposition01 natural sciencesX-ray photoelectron spectroscopy0103 physical sciencesMaterials ChemistryTiO2Thin filmSilicon oxideHigh-resolution transmission electron microscopy010302 applied physicsBilayer[CHIM.MATE]Chemical Sciences/Material chemistrySurfaces and InterfacesGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and Filmschemistry[ CHIM.MATE ] Chemical Sciences/Material chemistryMOCVDinterfaceWetting0210 nano-technology
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Angle resolved X-ray photoemission spectroscopy double layer model for in situ characterization of metal organic chemical vapour deposition nanometri…

2007

International audience; In situ Angle Resolved X-ray Photoemission Spectroscopy (ARXPS) characterizations of TiO2 thin films grown on silicon by Metal Organic Chemical Vapour Deposition were performed in order to get information on interfacial reactions at the first stages of the growth, one of the aims being to understand the influence of deposition conditions. Thickness measurements were also carried out from ARXPS analyses. As the real structure of the films was shown to be a double layer system such as TiO2/SiO2/Si, an ARXPS model of thickness and surface coverage determination was applied to each layer independently. However, the application of this model to very thin films underestima…

Materials scienceThickness measurementSiliconPhotoemission spectroscopyAnalytical chemistrychemistry.chemical_elementARXPS02 engineering and technologySubstrate (electronics)Chemical vapor deposition01 natural sciences0103 physical sciencesMaterials ChemistryTiO2Metalorganic vapour phase epitaxyThin filmThin filmSilicon oxide010302 applied physicsMetals and AlloysSurfaces and InterfacesInterface021001 nanoscience & nanotechnologySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialschemistryMOCVD0210 nano-technologyLayer (electronics)
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XPS and SIMS study of aluminium native oxide modifications induced by Q-switched Nd:YAG laser treatment

2006

Publié suite au congrès ECASIA: 11th European Conference on Applications of Surface and Interface Analysis, 25-30 September 2005, Vienna, Austria; International audience; During laser cleaning of aluminium in ambient atmosphere, modifications of the metal surface can be induced by transient thermal effects. This work aims to characterize the modification of the aluminium oxide layer on pure aluminium for a wide range of power per area using a Q-switched Nd :YAG (1064 nm) laser with two pulse durations, 10 and 180 ns. Experiments were carried out with single laser shots in ambient air at fluences (e.g. energy per area) below the ablation regime. For 10-ns pulses with fluences between 0.7 and…

Materials science[ SPI.MAT ] Engineering Sciences [physics]/MaterialsAnalytical chemistryOxidechemistry.chemical_element02 engineering and technology01 natural scienceslaw.invention[SPI.MAT]Engineering Sciences [physics]/Materialschemistry.chemical_compoundX-ray photoelectron spectroscopyAluminiumlaw0103 physical sciencesMaterials ChemistryXPSlaser cleaning010302 applied physicsAluminium oxidesThermal oxidationSurfaces and InterfacesGeneral Chemistry[CHIM.MATE]Chemical Sciences/Material chemistry021001 nanoscience & nanotechnologyCondensed Matter PhysicsLaserSurfaces Coatings and FilmschemistryNd:YAG laser[ CHIM.MATE ] Chemical Sciences/Material chemistryAluminium oxideMRI model0210 nano-technologysurface modificationSIMS
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Tantalum nitride thin film resistors by low temperature reactive sputtering for plastic electronics

2008

This article describes the fabrication and characterisation of tantalum nitride (TaN) thin film for applications in plastic electronics. Thin films of comparable thickness (50-60 nm) have been deposited by RF-magnetron-reactive sputtering at low temperature (100 °C) and their structure and physical (electrical and mechanical) properties have been correlated by using sheet resistance, stress measurements, atomic force microscopy (AFM), XPS, and SIMS. Different film compositions have been obtained by varying the argon to nitrogen flow ratio in the sputtering chamber. XPS showed that 5:1, 2:1 and 1:1 Ar:N 2 ratios gives Ta 2 N, TaN and Ta 3 N 5 phases, respectively. Sheet resistance revealed a…

Materials sciencetantalum nitrideAnalytical chemistryTantalumchemistry.chemical_elementSurfaces and InterfacesGeneral ChemistryCondensed Matter PhysicsGrain sizeSurfaces Coatings and Filmschemistry.chemical_compoundTantalum nitridechemistryX-ray photoelectron spectroscopyElectrical resistivity and conductivitySputteringXPSMaterials ChemistryAFMThin filmplastic electronicsSIMSSheet resistanceplastic electronics tantalum nitride XPS AFMSIMSSurface and Interface Analysis
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A rapid and eco-friendly route to synthesize graphene-doped silica nanohybrids

2016

International audience; In the present study, the possibility to synthesize graphene oxide (GO)-based nanohybrids with pure and O2-doped silica nanoparticles by a rapid and easy hydrothermal process has been explored. The nanohybrids were prepared by varying the type of silica nanoparticles (average diameter 7 nm or 40 nm) and the silica/GO weight ratio. All the materials were fully characterized by spectroscopic and morphological techniques.The experimental results revealed that it is possible to tune the characteristics of the obtained nanohybrids, such as morphology and amount of ester/ether linkages upon varying the preparation parameters, together with the nanosilica's typology and the…

Morphology (linguistics)Materials scienceOxideNanotechnology02 engineering and technology010402 general chemistry01 natural sciencesHydrothermal circulation[SPI.MAT]Engineering Sciences [physics]/Materialslaw.inventionchemistry.chemical_compoundlawXPSMaterials ChemistryNanosilicaThermal stabilityGraphene oxideGrapheneMechanical EngineeringDopingMetals and Alloys021001 nanoscience & nanotechnology0104 chemical sciencesSettore ING-IND/22 - Scienza E Tecnologia Dei MaterialichemistryMechanics of MaterialsAgglomerateRaman spectroscopyNanohybridSurface modification0210 nano-technologyJournal of Alloys and Compounds
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Coupling chemical reaction to electrospray: a novel preparation of gold nanostructures

2014

The simultaneous reduction of Au(III) to Au(0), synthesis of gold nanoparticles and their deposition onto boron-doped silicon target have been attained by the electrospray technique. In this way the overall process can be considered as a novel chemical/physical hybrid method which synergically exploits the merits of both approaches. Various experimental conditions have been explored to optimize the process: it has been found that, by applying a negative high voltage to the boron-doped silicon target and with the presence of the surfactant Bis(2-ethylhexyl)sulfosuccinate sodium salt in the solution, a quantitative transformation of Au(III) to Au(0) nanoparticles has been obtained. The deposi…

NanostructureXRDXPSGoldElectrospraySettore CHIM/02 - Chimica Fisica
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Coupling of electrochemical, electrogravimetric and surface analysis techniques to study dithiocarbamate/bronze interactions in chloride media

2018

International audience; Interaction between ammonium pyrrolidinedithiocarbamate (PDTC) and bronze in 30 g L-1 NaCl was investigated at several concentrations between 0.1 and 10 mM by means of various electrochemical and spectroscopic techniques. Electrochemical measurements revealed a fast adsorption process of PDTC on Cu and Pb and the formation of a thick insulating and protective film with a high surface coverage. At high concentrations, PDTC prevents oxides formation. Surface analyses confirm PDTC adsorption on bronze mainly via interaction between sulphur atoms and Cu sites to form Cu I-PDTC complex.

Neutral inhibitionMaterials science020209 energyGeneral Chemical EngineeringInorganic chemistry02 engineering and technologyengineering.materialElectrochemistryChlorideCorrosionAdsorptionX-ray photoelectron spectroscopyPolarizationXPS0202 electrical engineering electronic engineering information engineeringmedicine[CHIM]Chemical SciencesGeneral Materials ScienceBronzePolarization (electrochemistry)Dithiocarbamatechemistry.chemical_classificationEISGeneral Chemistry021001 nanoscience & nanotechnologyBronzechemistryRaman spectroscopyengineering0210 nano-technologymedicine.drugCorrosion Science
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