Search results for "Epitaxy"

showing 10 items of 287 documents

MOVPE growth of Ga 3D structures for fabrication of GaN materials

2004

Abstract This paper presents the growth and characterization of metallic gallium three-dimensional (3D) structures and preliminary results of their transformation into GaN-like structures. The structures were grown by metal-organic vapour phase epitaxy (MOVPE), using trimethyl gallium as gallium precursor on silicon (1 0 0). The growth temperature was between 550°C and 750°C. Interesting and new metallic structures were obtained with our growth parameters: balloon (montgolfier-like structure) and cauliflower-like. These metallic structures can grow up perpendicular to the substrate surface and have diameters between 0.1 and 5 μm, depending on the growth conditions. Moreover, selective metal…

Materials scienceFabricationSiliconbusiness.industryAnnealing (metallurgy)Scanning electron microscopechemistry.chemical_elementCondensed Matter Physicslaw.inventionInorganic ChemistryMetalOpticschemistryOptical microscopeChemical engineeringlawvisual_artMaterials Chemistryvisual_art.visual_art_mediumMetalorganic vapour phase epitaxyGalliumbusinessJournal of Crystal Growth
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Single Photon Emission from Site-Controlled InAs Quantum Dots Grown on GaAs(001) Patterned Substrates

2009

5 páginas, 5 figuras.

Materials scienceFabricationbusiness.industryQuantum dotsQuantum point contactGeneral EngineeringPhysics::OpticsGeneral Physics and AstronomyCondensed Matter::Mesoscopic Systems and Quantum Hall EffectEpitaxySingle photon emissionCondensed Matter::Materials ScienceNanolithographyQuantum dotQuantum dot laserOptoelectronicsSingle photon emittersGeneral Materials SciencePatterned substratesbusinessQuantum
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Effects of the Buffer Layers on the Performances of (Al,Ga)N Ultraviolet Photodetectors

2004

The fabrication of (Al,Ga)N-based metal–semiconductor–metal (MSM) photovoltaic detectors requires the growth of high-quality (Al,Ga)N films. Inserting a low-temperature deposited buffer layer enables the growth of an epitaxial layer with a reduced density of defects. Two structures using GaN and AlN buffer layers have been deposited by low-pressure metalorganic chemical vapor deposition and used to fabricate MSM interdigitated detectors. The devices have been characterized to investigate the effects of the buffer layers on the detector performances.

Materials scienceFabricationbusiness.industryWide-bandgap semiconductorPhotodetectorsGeneral Physics and AstronomyPhotodetectorultraviolet photodetectorsChemical vapor depositionGallium nitrideEpitaxymedicine.disease_causeSettore ING-INF/01 - ElettronicaBuffer (optical fiber)medicineOptoelectronicsbusinessLayer (electronics)Ultraviolet
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Seed layer technique for high quality epitaxial manganite films

2016

We introduce an innovative approach to the simultaneous control of growth mode and magnetotransport properties of manganite thin films, based on an easy-to-implement film/substrate interface engineering. The deposition of a manganite seed layer and the optimization of the substrate temperature allows a persistent bi-dimensional epitaxy and robust ferromagnetic properties at the same time. Structural measurements confirm that in such interface-engineered films, the optimal properties are related to improved epitaxy. A new growth scenario is envisaged, compatible with a shift from heteroepitaxy towards pseudo-homoepitaxy. Relevant growth parameters such as formation energy, roughening tempera…

Materials scienceFerromagnetic material propertiesDielectrophoresisGeneral Physics and AstronomyMagnetic filmsNanotechnology02 engineering and technologySubstrate (electronics)Epitaxy01 natural sciencesNOPhysics and Astronomy (all)0103 physical sciencesThin film growthThin film010306 general physicsDeposition (law)business.industry021001 nanoscience & nanotechnologyManganitelcsh:QC1-999X-ray diffractionChemical stateOptoelectronics0210 nano-technologybusinessLayer (electronics)lcsh:PhysicsRegular ArticlesEpitaxyAIP Advances
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Faceting and structural anisotropy of nanopatterned CdO(110) layers

2005

CdO(110) layers with a self-organized surface structure have been grown on (10math0) sapphire (m plane) substrates by metal-organic vapor phase epitaxy. The epitaxial relationships between layer and substrate have been determined and a crystallographic model that accounts for the CdO in-plane orientation, which results in a reduced lattice mismatch when the CdO[001] direction is perpendicular to the sapphire c axis, has been proposed. Although the measured lattice parameters indicate that the layers are almost fully relaxed, an anisotropic mosaicity is detected with symmetrical rocking curves attaining minimum values when measured along the CdO[math10] direction. The layer morphology consis…

Materials scienceGeneral Physics and AstronomySemiconductor growthEpitaxyMosaicityVapour phase epitaxial growthCadmium compound ; Semiconductor epitaxial layers ; II-VI semiconductors ; Semiconductor growth ; Vapour phase epitaxial growth ; MOCVD ; Nanopatterning ; Self-assembly ; Lattice constants ; Mosaic structure ; Surface morphologyLattice constant:FÍSICA [UNESCO]PerpendicularMetalorganic vapour phase epitaxyAnisotropyCondensed matter physicsUNESCO::FÍSICASemiconductor epitaxial layersLattice constantsNanopatterningII-VI semiconductorsSelf-assemblyFacetingCrystallographyCadmium compoundMOCVDSapphireSurface morphologyMosaic structure
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X-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(001)

2006

Abstract TiO 2 and TiN x O y thin films grown by low pressure metal-organic chemical vapor deposition (LP-MOCVD) on top of Si(0 0 1) substrate were characterized by X-ray multiple diffraction. X-ray reflectivity analysis of TiO 2 [1 1 0] and TiNO[1 0 0] polycrystalline layers allowed to determine the growth rate (−80 A/min) of TiO 2 and (−40 A/min) of TiNO films. X-ray multiple diffraction through the Renninger scans, i.e., ϕ -scans for (0 0 2)Si substrate primary reflection is used as a non-conventional method to obtain the substrate lattice parameter distortion due to the thin film conventional deposition, from where the information on film strain type is obtained.

Materials scienceGeneral Physics and Astronomychemistry.chemical_elementSurfaces and InterfacesGeneral ChemistryChemical vapor depositionSubstrate (electronics)Condensed Matter PhysicsSurfaces Coatings and FilmsCrystallographyLattice constantchemistryDeposition (phase transition)Metalorganic vapour phase epitaxyCrystalliteThin filmTinApplied Surface Science
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Evidence of hexagonal WO3 structure stabilization on mica substrate

2009

International audience; WO3 nanorods are grown by a simple vapor deposition method on a mica substrate and characterized by Selected Area Electron Diffraction and Energy Dispersive X-rays Spectroscopy. Experimental results show the clear evidence of an unexpected WO3 hexagonal structure as well as an epitaxial growth on the mica substrate. Besides, potassium is evidenced inside the nanorods. It is thus deduced that a metastable WO3 hexagonal phase is stabilized by epitaxy through a tungsten bronze interlayer having same hexagonal structure.

Materials scienceGrowth mechanismSupported nanostructureschemistry.chemical_elementMineralogy02 engineering and technologyChemical vapor depositionTungsten010402 general chemistryEpitaxy01 natural sciencesMaterials ChemistryMetals and AlloysHexagonal phaseTungsten oxideSurfaces and Interfaces021001 nanoscience & nanotechnology0104 chemical sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCrystallographychemistryElectron diffractionTransmission Electron MicroscopyNanorodMicaSelected area diffraction0210 nano-technologyThin Solid Films
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Temperature Effects on the Phonon Spectrum in YBa2Cu3O7 Single Crystals and Thin Films

1989

We have performed a detailed investigation of the temperature dependence of the 385cm-1 phonon in single crystals and thin films of the YBa2Cu3O7 superconductor by means of Raman spectroscopy. In the single crystal the frequency of this phonon shows a downshift of about 5 cm-1 on passing the superconducting transition from above, which is referred to a strong electron-phonon interaction in the superconductor. The shift of the phonon in thin epitaxial films on MgO or SrTiO3 substrates is only about 2.5 cm-1. This difference may be a result of a structural transition in the single crystal which is possibly suppressed in the films because of the epitaxy. The electron-phonon interaction is also…

Materials scienceHigh-temperature superconductivityPhononEpitaxylaw.inventionsymbols.namesakeCondensed Matter::Materials SciencelawCondensed Matter::SuperconductivityGeneral Materials Scienceddc:530Thin filmInorganic compoundLine (formation)chemistry.chemical_classificationSuperconductivityCondensed matter physicsSpectrum (functional analysis)General EngineeringCondensed Matter::Mesoscopic Systems and Quantum Hall EffectCondensed Matter PhysicsElectronic Optical and Magnetic MaterialschemistrysymbolsCondensed Matter::Strongly Correlated ElectronsSingle crystalRaman scattering
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Dopant radial inhomogeneity in Mg-doped GaN nanowires

2018

International audience; Using atom probe tomography, it is demonstrated that Mg doping of GaN nanowires grown by Molecular Beam Epitaxy results in a marked radial inhomogeneity, namely a higher Mg content in the periphery of the nanowires. This spatial inhomogeneity is attributed to a preferential incorporation of Mg through the m-plane sidewalls of nanowires and is related to the formation of a Mg-rich surface which is stabilized by hydrogen. This is further supported by Raman spectroscopy experiments which give evidence of Mg-H complexes in the doped nanowires. A Mg doping mechanism such as this, specific to nanowires, may lead to higher levels of Mg doping than in layers, boosting the po…

Materials scienceHydrogenNanowirechemistry.chemical_elementBioengineering02 engineering and technologyAtom probe01 natural scienceslaw.inventionsymbols.namesakelaw0103 physical sciencesGeneral Materials ScienceElectrical and Electronic Engineeringgallium nitride nanowires010302 applied physics[PHYS]Physics [physics]Dopantbusiness.industryMechanical EngineeringDopingGeneral Chemistryspatialinhomogeneity of dopants021001 nanoscience & nanotechnologymagnesium incorporationchemistryatom probe tomographyMechanics of MaterialsRaman spectroscopysymbolsOptoelectronics0210 nano-technologyRaman spectroscopybusinessMolecular beam epitaxyLight-emitting diode
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CVD elaboration and in situ characterization of barium silicate thin films.

2010

International audience; This study is concerned with the elaboration of barium silicate thin films by metal organic chemical vapor deposition (MOCVD) and in situ characterization by X-ray photoemission spectroscopy (XPS) with an apparatus connected to the deposition reactor. The difficulty to find an efficient metal organic precursor for barium is described. After characterizations of the selected reactant, Ba(TMHD)2tetraglyme, the development of an original specific vapor delivering source which allows reactant sublimation in the CVD reactor was performed. In the most optimized cases, including use of oxygen introduction during the deposition, barium silicate films were obtained. Moreover,…

Materials scienceInorganic chemistrychemistry.chemical_element02 engineering and technologyChemical vapor deposition01 natural scienceschemistry.chemical_compound0103 physical sciencesMaterials ChemistryMetalorganic vapour phase epitaxyThin filmSpectroscopyFilms010302 applied physicsBarium oxideBariumSilicate021001 nanoscience & nanotechnologySilicateCarbon filmchemistryBariumCeramics and CompositesSublimation (phase transition)Insulator0210 nano-technology
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