0000000000012863
AUTHOR
M. Sacilotti
showing 29 related works from this author
Structural studies of nano/micrometric semiconducting GaInP wires grown by MOCVD
2004
Abstract 3D (Ga,In)/GaInP structures were grown on polycrystalline InP substrates by the MOCVD technique. The growth temperature was varied from 600 to 700 °C. Trimethyl-gallium and N 2 were, respectively, used as the Ga source and the carrier gas. These newly presented 3D structures have a scepter-like shape and are composed of a long GaInP internal support (rods of tens of μm long and tens of nm diameter) capped by a micrometer size metallic (Ga,In) structure. These structures were characterized by the SEM, EDX and TEM techniques. High-resolution TEM shows that the support rods present a GaInP single crystal structure. A preliminary discussion about the growth step mechanism, based on the…
Growth of nanometric CuGaxOystructures on copper substrates
2005
This paper presents an alternative method based on the metal–organic chemical vapour deposition technique to obtain new nanowire structures. Here, the metal–organic precursor acts as a catalyst and interacts with a metallic substrate to produce 3D structures such as nanowires. In the present case, trimethyl gallium interacts with a copper metallic substrate to build a single-crystalline CuGaxOy wire structure. Electronic microscopy techniques on image or diffraction modes have provided the structural and chemical characterization of the obtained nanowires.
Electrochemical Investigation of Lithium Intercalation in MOCVD Derived Nanostructured Anatase/Rutile TiO2
2011
In this paper we report on the lithium reversible storage in titanium dioxide (TiO2) prepared by metal-organic chemical vapor deposition (MOCVD). Electrochemical properties in terms of lithium reversible insertion depend on the deposited microstructure. For thick films deposited on silicon wafer electrochemical activity of the anatase type of TiO2 is registered in the potential range 1.8-2.1 V vs. Li. For thinner films the intercalation reaction takes place in two potential ranges: 1.8-2.1 V vs. Li and below 1.4 V vs. Li. The second electroactivity range is attributed to lithium insertion into rutile. We found that the decrease of the lower potential limit (0.5 V instead of commonly used 1 …
Cathodoluminescence and structural studies of nitrided 3D gallium structures grown by MOCVD
2009
Abstract Cathodoluminescence (CL) spectrum imaging and grazing incidence X-ray diffraction (GIXRD) are employed to investigate nitride three-dimensional (3D) gallium structures. The metallic precursors are naturally obtained on a large variety of substrates by metal-organic chemical vapor deposition (CVD) with different shape/size controlled by the growth conditions, especially the temperature. These 3D metallic structures are subsequently exposed to a nitridation process in a conventional CVD reactor to form GaN nanocrystals, as confirmed by GIXRD measurements. CL spectroscopy shows visible light emission (2.5–2.8 eV) excited from the GaN in the 3D structures.
Anisotropic and non-heterogeneous continuum percolation in titanium oxynitride thin columnar films
2002
International audience; We report the percolation behaviour of the conductivity of titanium oxynitride films grown by low-pressure metal-organic chemical vapour deposition, composed of TiNxOy mixed with TiO2. The usual DC parameters (t, s and Φc), obtained from the effective media theory equations, are compared to the universal values (s = sun while t < tun because of the film anisotropy). This is the first example of an electrical continuum percolation applied to columnar films with chemically similar conducting and insulating units (non-heterogeneous percolation) whose mixing is based upon the growth temperature during the film growth.
Optical and structural studies of GaN 3D structures selectively grown by MOCVD
2004
Abstract This paper presents preliminary results on the selective growth of three-dimensional (3D) micrometric metallic structures by the MOCVD technique. The 3D structure growth occurs by simply feeding the reactor gas phase with a conventional flow of metal-organic (MO), trimethyl-gallium (TMGa) molecules. Selectivity occurs at the substrate surface in which MO species travel tens of micrometers in order to build up the 3D structure. After the growth, these structures are nitrided in order to give GaN-related optical visible emission. Optical emission results are presented and discussed in this paper. Both 3D structures deposition and annealing experiments can be extended to other III–V m…
Microchip Random Laser based on a disordered TiO2-nanomembranes arrangement
2012
International audience; We developed a new scheme for obtaining coherent random lasing based on a chip consisting of a polymer film doped with Rhodamine 6G, having as scatterers butterfly-like TiO2 nanomembranes (TiO2-NM) supported on a glass substrate. The feedback mechanism for laser action is due to the multiple scattering of light by TiO2-NM rather than provided by localized variations of the refractive index in the polymer film. The above-threshold multiple spikes signature indicative of random laser emission with coherent feedback is confirmed. As nanomembranes are foreseen as new MEMS/NEMS building blocks, a new generation of combined active/passive photonic devices can be envisaged.
Structural characterization of original 3D gallium structures grown by LP‐MOCVD
2004
This study is concerned with the growth and characterization of metallic gallium 3D structures, obtained with a single growth step, by the LP-MOCVD technique on various substrates. Commercial organo-metallic is used as gallium precursor and nitrogen as carrier gas. The growth temperature and the reactor pressure are ranking between 500 and 700 °C, and between 150 and 700 torr, respectively. Depending on the elaboration conditions, different 3D structures are obtained such as droplets, cauliflowers, aggregates or thin stems, with micrometer sizes. The morphology, substrate surface density and thermal stability are studied by optical and scanning electron microscopy. At last, X-ray microanaly…
MOVPE growth of Ga 3D structures for fabrication of GaN materials
2004
Abstract This paper presents the growth and characterization of metallic gallium three-dimensional (3D) structures and preliminary results of their transformation into GaN-like structures. The structures were grown by metal-organic vapour phase epitaxy (MOVPE), using trimethyl gallium as gallium precursor on silicon (1 0 0). The growth temperature was between 550°C and 750°C. Interesting and new metallic structures were obtained with our growth parameters: balloon (montgolfier-like structure) and cauliflower-like. These metallic structures can grow up perpendicular to the substrate surface and have diameters between 0.1 and 5 μm, depending on the growth conditions. Moreover, selective metal…
Structural and in depth characterization of newly designed conducting/insulating TiN O /TiO2 multilayers obtained by one step LP-MOCVD growth
2001
Abstract TiNxOy/TiO2 multilayers have been grown by LP-MOCVD using titanium isopropoxide (TIP) precursor during the whole growth, but with an ammonia flow interrupted for the TiO2 layers. The one step growth process used to grow these structures allowed to stack the conducting and insulating layers without any growth breakdown. SIMS and TEM analyses showed the presence of an alternated insulating/conducting layers structure. Moreover, electrical measurements allowed to measure the dielectric part of insulating TiO2 stacked in these structures, whose permittivity was found to be about 80 for a MOS structure. Thus, such multilayers may lead to very promising applications in the microelectroni…
X-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(001)
2006
Abstract TiO 2 and TiN x O y thin films grown by low pressure metal-organic chemical vapor deposition (LP-MOCVD) on top of Si(0 0 1) substrate were characterized by X-ray multiple diffraction. X-ray reflectivity analysis of TiO 2 [1 1 0] and TiNO[1 0 0] polycrystalline layers allowed to determine the growth rate (−80 A/min) of TiO 2 and (−40 A/min) of TiNO films. X-ray multiple diffraction through the Renninger scans, i.e., ϕ -scans for (0 0 2)Si substrate primary reflection is used as a non-conventional method to obtain the substrate lattice parameter distortion due to the thin film conventional deposition, from where the information on film strain type is obtained.
Vapor-liquid-solid mechanisms: Challenges for nanosized quantum cluster/dot/wire materials
2006
International audience; The growth mechanism model of a nanoscaled material is a critical step that has to be refined for a better understanding of a nanostructure's dot/wire fabrication. To do so, the growth mechanism will be discussed in this paper and the influence of the size of the metallic nanocluster starting point, referred to later as “size effect,” will be studied. Among many of the so-called size effects, a tremendous decrease of the melting point of the metallic nanocluster changes the physical properties as well as the physical/mechanical interactions inside the growing structure composed of a metallic dot on top of a column. The thermodynamic size effect is related to the bend…
Structural characterization of TiNxOy/TiO2 single crystalline and nanometric multilayers grown by LP-MOCVD on (110)TiO2
2001
TiO2/TiNxOy superlattices were grown by Low Pressure-Metal-Organic Vapor Phase Epitaxy (LP-MOVPE) technique at deposition temperatures ranking from 650 to 750°C. The growth was performed on top of TiO2(110) rutile substrates. Intense peaks observed in the X-rays rocking curves and θ-2θ diffraction patterns show the presence of crystalline epilayers. The TiNxOy layers were grown in a (200) cubic structure on the (110) quadratic TiO2 epilayer structure. Transmission electron microscopy confirmed the XRD results and showed the formation of periodic and well structured epilayers.
Conductimetry and impedance spectroscopy study of low pressure metal organic chemical vapor deposition TiN O films as a function of the growth temper…
2001
Abstract Titanium oxinitride thin films have been grown by low pressure metal organic chemical vapor deposition (LP-MOCVD) using titanium isopropoxide, Ti(OCH(CH 3 ) 2 ) 4 (TIP) and NH 3 precursors in a growth temperature range from 450 to 750°C on sapphire substrates. The electrical behaviour of these films was studied between 400 and 173 K, revealing three different behaviours, ranking from a hopping conductivity (450–500°C) to a conducting one (700–750°C), with a dual behaviour for the intermediate growth temperatures. Moreover, at room temperature, both conductimetry and impedance spectroscopy highlighted a percolation behaviour, interpreted in terms of continuum percolation. The effect…
Magnetic and structural properties of the nanostructured Fe 1–x Si x system with x = 0.1, 0.2 and 0.3, mechanical alloyed and sintered
2007
The magnetic and structural properties of the nanostructured system Fe1–xSix with x = 0.1, 0.2 and 0.3 were studied by X-Ray diffraction (XRD), SEM, and Mossbauer Spectrometry (MS). The samples were prepared by compacting and sintering at two temperatures, 900 and 1000 uC, from powders obtained by means of two procedures: by elemental mixing of Fe and Si powders and by mechanical alloying (MA). For samples obtained from mixed powders and sintered at 900 and 1000 uC, XRD and MS show the presence of pure iron and silicon, indicating that these conditions do not favor alloying, except for the sample with 30 at.% and 1000 uC, for which, besides of iron and silicon patterns, the DO3 and FeSi pha…
Growth and characterization of AP-MOCVD iron doped titanium dioxide thin films
1999
Abstract Atmospheric pressure metal organic chemical vapor deposition (AP-MOCVD) was used to prepare iron doped titanium dioxide thin films. Thin films, between 40 and 150 nm thick, were deposited on Si, SiO 2 and Al 2 O 3 substrates using titanium tetra isopropoxide and ferrocene as metal organic precursors. TiO 2 iron doping was achieved in the range of 1–4 at.%. The film morphology and thickness, polycrystalline texture and doping content were studied using respectively scanning electron microscopy (SEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The influence of growth temperature, deposition time, substrate type and dopant partial pressure were studied. Electr…
Structural characterization of TiO2/TiN O (δ-doping) heterostructures on (1 1 0)TiO2 substrates
2003
Abstract TiO2/TiNxOy δ-doping structures were grown on the top of (1 1 0)TiO2 rutile substrates by low pressure metal-organic vapor phase epitaxy (LP-MOVPE) technique at 750 °C. The samples were analyzed by high resolution transmission electron microscopy (HRTEM), electron energy loss spectroscopy (EELS) and X-ray diffraction techniques (rocking curves and φ-scans). The presence of satellites in the (1 1 0)TiO2 rocking curve revealed the epitaxial growth of 10 period δ-doping structures. The thickness of the TiO2 layers, 84 nm, was deduced from the satellites period. HRTEM observations showed around 1.5 nm thick δ-doping layers, where the presence of nitrogen was detected by EELS. The analy…
Temperature and substrate influence on the structure of TiN O thin films grown by low pressure metal organic chemical vapour deposition
2000
Abstract This paper presents the growth and characterization of titanium oxinitride (TiN x O y ) films grown by low pressure metal organic chemical vapour deposition (LP-MOCVD). The film nitrogen content, obtained by Rutherford backscattering spectroscopy (RBS), increases as the growth temperature increases (from 23 at.% at 450°C to 46 at.% at 750°C). Below 550°C, the films do not show any X-ray diffraction pattern. Above 550°C, the deposited films present the (111) and (200) TiN textures. Films deposited on (100) Si exhibit a 2 θ shift to higher Bragg angles, depending on the N/O ratio. These shifts are explained by using a substitutional oxygen model. Moreover, the atomic structure of suc…
Random Laser Based on TiO2–Nanomembranes
2012
We demonstrated directional random laser emission from a dye-doped polymer film in the presence of a scattering medium consisting of TiO 2 nanomembranes. Evidence for coexistence of extended and localized modes are presented.
SEM and XPS studies of titanium dioxide thin films grown by MOCVD
1998
Abstract The metal organic chemical vapour deposition (MOCVD) method was used to prepare titanium dioxide thin films. Thin films of TiO2, about 100 nm thick, were deposited on (100)Si and (1102)Al2O3 sapphire substrates using titanium isopropoxide (Ti(OC3H7)4) as metal organic precursor. The morphology of the films and the presence of impurities on the thin films surfaces were studied using respectively, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The influence of the growth parameters such as the deposition temperature, the carrier gas (nitrogen) flow rate and the presence of an additional oxygen flow on the characteristics of the titanium dioxide films h…
(Ga,In)P nanowires grown without intentional catalyst
2015
Abstract We have grown (Ga,In)P nanowires through the MOCVD method without a intentional catalyst. The organometallic precursor triethylgallium ( ( C 2 H 5 ) 3 Ga ) , used as Ga source, is transported by the N 2 gas carrier to the reactor chamber where reacts with the InP vapor pressure producing the nanowires. Two different reactor pressures (70 and 740 Torr) were used leading to nanowires with different In contents. The nanowires are straight or wool-like and exhibit a twinned structure. They emit an intense orange to red color visible even to the naked eyes. Interface tunneling process at Ga 1 − x In x P / Ga 1 − y In y P interfaces ( x ≠ y ) is proposed to explain this efficient light e…
Synchrotron radiation multiple diffraction study of Al0.304Ga0.172In0.524As MOVPE grown onto InP(001)
1997
Synchrotron radiation multiple diffraction in Renninger scanning (RS) geometry is used to characterise an Al0.304Ga0.172In0.524 As hetero-epitaxial layer MOVPE grown onto InP(001). (006) RS data for bulk, InP substrate and the quaternary layer were obtained using a new experimental set-up on station 7.6 at the Daresbury synchrotron radiation source. Examination of the multiple diffraction peak profiles reveal the epitaxial layers to have a higher mosaic spread than the underlying substrate materials. Measurements of the layer parallel lattice parameter a∥ = 5.8755 ± 0.003 A, as deduced from the tetragonal distortion measured at the 6-beam case in the layer RS, agrees very well with that obt…
Study of TiO2 nanomembranes obtained by an induction heated MOCVD reactor
2015
Abstract Nanostructures of TiO2 were grown using the metal oxide chemical vapor deposition (MOCVD) technique. The procedure used induction heating on a graphite susceptor. This specific feature and the use of cobalt and ferrocene catalysts resulted in nanomembranes never obtained by common MOCVD reactors. The present study discusses the preparation of TiO2 nanomembranes and the dependence of nanomembrane structure and morphology on growth parameters.
TiO2 nanostructures prepared by ferrocene/cobalt catalyst agents
2008
We present the growth and characterization of TiO2 nanocrystals. Nanostructured growth is obtained in a low-pressure CVD system by using an organometallic precursor Ti(OC3H7)4 as both the Ti and O source catalyzed by both ferrocene (an organometallic precursor) and cobalt metallic clusters prepared by the microwave-assisted polyol method. Two kinds of TiO2 structures were obtained in the cobalt clusters: a) pine-tree like (with short-leaf structure) and b) long-leaf structures as large as a few micrometers in size and both under 10 nm in thickness. Long-leaf TiO2 structures were grown at cobalt grain boundaries. For the growth conditions utilized, the TiO2 structures are composed of both an…
Structure and properties of GaNxOy films grown by nitridation of GaAs (100) substrates
2004
GaAs (100) substrates have been heat-treated in a metal-organic chemical vapor deposition reactor under flows of NH 3 and an oxygen organo-metallic precursor at temperatures between 650°C and 750°C. Yellowish films formed at the surface of all the samples. Gallium, nitrogen and oxygen were detected by EDX analysis of the films. The oxygen content was estimated in the range of at 5-10 at% depending on the heat-treatment temperature. X-ray diffraction and HRTEM results indicate that the structure of the films corresponds to the hexagonal wurtzite phase of GaN with an expanded unit cell. Raman spectra show hands corresponding to the Raman active GaN modes as well as disorder-activated broad ba…
Thermal effects on the growth by metal organic chemical vapour deposition of TiO2 thin films on (100) GaAs substrates
2002
Abstract TiO 2 thin films were deposited on (100) GaAs substrates by LP-MOCVD with deposition temperatures ( T d ) ranking from 450 to 750 °C. The structure of these layers was studied by X-ray diffraction (XRD) and Raman spectroscopy. The growth of the TiO 2 anatase phase was observed for T d T d >600 °C. Finally, X-ray photoelectron spectrometry (XPS) and secondary ion mass spectroscopy (SIMS) experiments showed the presence of small quantities of Ga and As through the whole film thickness, slightly increasing at the surface of the layers. This result was related to the SEM observations and explained by considering the growth conditions.
Correlation Between the Electrical Properties and the Morphology of Low-Pressure MOCVD Titanium Oxynitride Thin Films Grown at Various Temperatures
2000
Titanium oxynitride (TiN x O y ) thin films were deposited by low-pressure metal-organic CVD (LP-MOCVD) on (100) silicon, sapphire, and polycrystalline alumina substrates. Titanium isopropoxide (TIP) and ammonia were used as precursors. The influence of the growth temperature, ranking from 450°C to 750°C, was investigated by scanning electron microscopy (SEM), and electrical DC measurements. Rutherford back-scattering (RBS) measurements were used to determine the N/O ratio in the films. The surface observations of the deposited films showed two morphological transitions. The resistivity decreased with the growth temperature, while the nitrogen content increased. Moreover, for the highest de…
Amorphous TiO2 in LP-OMCVD TiNxOy thin films revealed by XPS
2001
Abstract TiN(O)–TiO 2 thin films were prepared on Si(1 0 0) by the low pressure organo metallic chemical vapor deposition (LP-OMCVD) method, using ammonia and titanium isopropoxide as precursors. In order to complete previous characterizations, an Ar + bombardment/XPS coupled study was carried out. This method is based on the fact that the behavior of a compound towards an ion bombardment is a function of its composition. In particular, Ar + bombardment of TiO 2 (whatever its form) leads to a preferential sputtering of oxygen atoms with subsequent reduction of titanium and formation of Ti 3+ and Ti 2+ easily detectable by XPS from a significant broadening of the Ti 2p lines. In the opposite…
A proposed quantum mechanics mechanism for (e−, h+) charges separation applied to photosynthesis and energy production efficiency improovement
2009
Based on concepts in semiconductor band gap engineering (the staggered one), a qualitative model is proposed for the first step mechanism in artificial catalysis and natural systems such as photosynthesis in green leaves.